• 제목/요약/키워드: pulsed power

검색결과 588건 처리시간 0.037초

압밀 금속 마이크로 입자의 펄스 레이저 ABLATION에 의한 나노입자 합성 (Nanoparticle Synthesis by Pulsed Laser Ablation of Consolidated Microparticles)

  • 장덕석;오부국;김동식
    • 한국레이저가공학회지
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    • 제5권2호
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    • pp.31-38
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    • 2002
  • This paper describes the process of nanoparticle synthesis by laser ablation of consolidated microparticles. We have generated nanoparticles by high-power pulsed laser ablation of Al, Cu and Ag microparticles using a Q-switched Nd:YAG laser (wavelength 355 nm, FWHM 5 ㎱, fluence 0.8∼2.0 J/㎠). Microparticles of mean diameter 18∼80 ㎛ are ablated in the ambient air The generated nanoparticles are collected on a glass substrate and the size distribution and morphology are examined using a scanning electron microscope and a transmission electron microscope. The effect of laser fluence and collector position on the distribution of particle size is investigated. The dynamics of ablation plume and shock wave is analyzed by monitoring the photoacoustic probe-beam deflection signal. Nanosecond time-resolved images of the ablation process are also obtained by laser flash shadowgraphy. Based on the experimental results, discussions are made on the dynamics of ablation plume.

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Minimization of Rising and Falling Times of A Boost Type Converter Output Voltage in Pulsed Mode Operation

  • Nho Eui-Cheol;Kim In-Dong;Joe Cheol-Je;Chun Tae-Won;Kim Heung-Geun
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2001년도 Proceedings ICPE 01 2001 International Conference on Power Electronics
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    • pp.286-290
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    • 2001
  • This paper describes an improved short-circuit protection method with a boost type rectifier using a multilevel ac/dc power converter. The output dc power of the proposed converter can be disconnected from the load within several hundred microseconds at the instant of short-circuit fault. Once the fault has been cleared the dc power is reapplied to the load. The rising time of the dc load voltage is as small as several hundred microseconds, and there is no overshoot of the dc voltage because the dc output capacitors hold undischarged state. The converter, which employs the proposed method, has the characteristics of a simplified structure, reduced cost, weight, and volume compared with a conventional power supply, which has frequent output short-circuits. Experimental results are presented to verify the usefulness of the proposed converter.

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다중 병렬 부하를 가지는 DC 배전 시스템에서의 전력 품질 향상을 위한 Voltage Bus Conditioner의 PI 제어 (The PI control of the Voltage Bus Conditioner for the improvement of the Power Quality in the DC Power Distribution System with multiple parallel loads)

  • 이병헌;우현민;나재두;신재화;김영석
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1234-1235
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    • 2011
  • A DC Power Distribution Systems(DC PDS) are widely used in telecommunication system, electric vehicle, aircraft, military system, etc. In the DC PDS, DC bus voltage instability may be occurred by the operation of multiple loads such as pulsed power load, motor drive system, and constant power loads. To damp the transients of the DC bus voltage, the Voltage Bus Conditioner(VBC) with the PI compensator is used. In this paper, the validity of the proposed VBC system is verified by PSIM simulation package.

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Development of CO Laser-Arc Hybrid Welding Process

  • Lee, Se-Hwan
    • 한국레이저가공학회지
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    • 제5권3호
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    • pp.15-20
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    • 2002
  • The principal obstacle to selection of a laser processing method in production is its relatively high equipment cost and the natural unwillingness of production supervision to try something new until it is thoroughly proven. The major objective of this work is focused on the combined features of gas tungsten arc and a low-power cold laser beam. In this work, the laser beam from a 7 watts carbon monoxide laser was combined with electrical discharges from a short-pulsed capacitive discharge GTA welding power supply. When the low power CO laser beam passes through a special composition shielding gas, the CO molecules in the gas absorbs the radiation, and ionizes through a process blown as non-equilibrium, vibration-vibration pumping. The resulting laser-induced plasma(LIP) was positioned between various configurations of electrodes. The high-voltage impulse applied to the electrodes forced rapid electrical breakdown between the electrodes. Electrical discharges between tungsten electrodes and aluminum sheet specimens followed the ionized path provided by LIP. The result was well-focused melted spots.

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발전소 급수계통 부식생성물 농도 측정에 관한 연구 (Study on The Measurement of Corrosion Product Concentration in The Feed Water System of A Power Plant)

  • 문전수;이재근
    • Corrosion Science and Technology
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    • 제10권4호
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    • pp.151-155
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    • 2011
  • The iron oxide particles could be resulted from the corrosion of the circulating water system of a power plant. Because it may be one of the trouble materials which affect the power generation efficiency due to the deposition on steam generator tube and turbine blade, the continuous observation of its concentration is very important. The laser induced break-down detection (LIBD) technology was applied to monitor continuously the concentration of corrosion products with the detection limit of ppb level. The measurement system consists of a Nd:YAG pulsed laser, a polarizing beam splitter, a flow-type sample cell, an acoustic emission sensor, a high speed data acquisition board, a personal computer, etc.. The performance test results confirmed that this technology can be effective to monitor the corrosion product concentration of the circulating water system of a power plant.

산화 마그네슘 박막의 스퍼터 제조기술 (Sputtering technique for magnesium oxide thin films)

  • 최영욱
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1560-1561
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    • 2006
  • A high rate deposition sputtering process of magnesium oxide thin film in oxide mode has been developed using a 20 kW unipolar pulsed power supply. The power supply was operated at a maximum constant voltage of 500 V and a constant current of 40 A. The pulse repetition rate and the duty were changed in the ranges of $10{\sim}50\;kHz$ and $10{\sim}60%$, respectively. The deposition rate increased with rising incident power to the target. Maximum incident power to the magnesium target was obtained by the control of frequency, duty and current. The deposition rate of a moving state was 9 nm m/min at the average power of 1.5 kW.

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유전체 장벽 방전을 위한 양방향 펄스 전원장치 (Bidirectional Pulse Power Supply for Dielectric Barrier Discharge)

  • 신완호;홍원석;정환명;최재호
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 제36회 하계학술대회 논문집 B
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    • pp.1521-1523
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    • 2005
  • High voltage plasma power supply was adopted to control polluted gases and an ozone generation. Bidirectional pulse power supply consisted of power semiconductor switch devices, a high voltage transformer, and a control board adapted switching method. Plasma power supply with sinusoidal bidirectional pulse, which has output voltage range of 0-20kV and output frequency range of 1kHz-20kHz, is realized. Using proposed system, pulsed high voltage/high frequency discharges were tested in a DBD(dielectric barrier discharge) reactor, and the spatial distribution of a glow discharge was observed. The system showed stable operational characteristics, even though the voltage and the frequency increased. Above features were verified by experiments.

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A Design and Implement of the Medical Nd:YAG Laser Firmware under in ZCC method

  • Kim, Whi-Young
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2001년도 ICCAS
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    • pp.40.3-40
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    • 2001
  • The pulsed Nd:YAG laser is the most commonly used type of solid-state laser in many fields. In material processing and medical treatment, the power density control of a laser beam Considered to be significant, which depends on the flashlamp current pulse width and pulse repetition rate. For general laser power supply to control the laser power density, the secondary of the power transformer is connected to the rectifier and filter capacitor. The output of a rectifier is applied to a switching element in the secondary of the transformer. So power supply is complicated and the loss of switching is considerably. In addition, according to increasing pulse repetition rate, charged energy of energy-storage capacitor bank is not transferred sufficiently to flashlamp, and laser output efficiency decreases. In this study, we have ...

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Non-gaseous Plasma Immersion Ion Implantation and Its Applications

  • Han, Seung-Hee;Kim, En-Kyeom;Park, Won-Woong;Moon, Sun-Woo;Kim, Kyung-Hun;Kim, Sung-Min
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.151-151
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    • 2012
  • A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/$cm^2$ of its peak power density is applied to the magnetron sputtering target while the average power density remains manageable to the cooling capacity of the equipment by using a very small duty ratio of operation. Due to the high peak power density applied to the sputtering target, a large fraction of sputtered atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed plasma of sputtered target material by HIPIMS operation, the implantation of non-gaseous ions can be successfully accomplished. The new process has great advantage that thin film deposition and non-gaseous ion implantation along with in-situ film modification can be achieved in a single plasma chamber. Even broader application areas of PIII&D technology are believed to be envisaged by this newly developed process. In one application of non-gaseous plasma immersion ion implantation, Ge ions were implanted into SiO2 thin film at 60 keV to form Ge quantum dots embedded in SiO2 dielectric material. The crystalline Ge quantum dots were shown to be 5~10 nm in size and well dispersed in SiO2 matrix. In another application, Ag ions were implanted into SS-304 substrate to endow the anti-microbial property of the surface. Yet another bio-application was Mg ion implantation into Ti to improve its osteointegration property for bone implants. Catalyst is another promising application field of nongaseous plasma immersion ion implantation because ion implantation results in atomically dispersed catalytic agents with high surface to volume ratio. Pt ions were implanted into the surface of Al2O3 catalytic supporter and its H2 generation property was measured for DME reforming catalyst. In this talk, a newly developed, non-gaseous plasma immersion ion implantation technique and its applications would be shown and discussed.

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Plasma Display Panel용 산화마그네슘 박막의 산화영역에서의 스퍼터 성막기술 (A sputtering technique of magnesium oxide thin film in oxide mode for plasma display panel)

  • 최영욱;김지현
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 C
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    • pp.1874-1875
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    • 2004
  • A high rate deposition sputtering process of magnesium oxide thin film in oxide mode has been developed using a 20 kW unipolar pulsed power supply. The powersupply was operated at a maximum constant voltage of 500 V and a constant current of 40 A. The pulse repetition rate and the duty were changed in the ranges of 10 ${\sim}$ 50 kHz and 10 ${\sim}$ 60 %, respectively. The deposition rate increased with increasing incident power to the target. Maximum incident power to the magnesium target was obtained by the control of frequency, duty and current. The deposition rate of a moving state was 9 nm m/min at the average power of 1.5 kW. This technique is proposed to apply high through-put sputtering system for plasma display panel.

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