• Title/Summary/Keyword: pulsed PECVD

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High-Efficiency a-Si:H Solar Cell Using In-Situ Plasma Treatment

  • Han, Seung Hee;Moon, Sun-Woo;Kim, Kyunghun;Kim, Sung Min;Jang, Jinhyeok;Lee, Seungmin;Kim, Jungsu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.230-230
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    • 2013
  • In amorphous or microcrystalline thin-film silicon solar cells, p-i-n structure is used instead of p/n junction structure as in wafer-based Si solar cells. Hence, these p-i-n structured solar cells inevitably consist of many interfaces and the cell efficiency critically depends on the effective control of these interfaces. In this study, in-situ plasma treatment process of the interfaces was developed to improve the efficiency of a-Si:H solar cell. The p-i-n cell was deposited using a single-chamber VHF-PECVD system, which was driven by a pulsed-RF generator at 80 MHz. In order to solve the cross-contamination problem of p-i layer, high RF power was applied without supplying SiH4 gas after p-layer deposition, which effectively cleaned B contamination inside chamber wall from p-layer deposition. In addition to the p-i interface control, various interface control techniques such as thin layer of TiO2 deposition to prevent H2 plasma reduction of FTO layer, multiple applications of thin i-layer deposition and H2 plasma treatment, H2 plasma treatment of i-layer prior to n-layer deposition, etc. were developed. In order to reduce the reflection at the air-glass interface, anti-reflective SiO2 coating was also adopted. The initial solar cell efficiency over 11% could be achieved for test cell area of 0.2 $cm^2$.

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Characterization of Plate Wear and Printing Quality of Concave Polymer Printing Plate Prepared by Diamond-Like Carbon Deposition Conditions (DLC(Diamond-Like Carbon) 코팅에 의한 오목 폴리머인쇄판의 내구성 및 인쇄 품질 특성)

  • Yoo, Han-Sol;Kim, Jun-Hyung;Moon, Kyoung-Il;Hwang, Taek-Sung;Lee, Hyok-Won
    • Korean Journal of Materials Research
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    • v.22 no.10
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    • pp.552-561
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    • 2012
  • Diamond-like carbon (DLC) films have been widely used in many industrial applications because of their outstanding mechanical and chemical properties like hardness, wear resistance, lubricous property, chemical stability, and uniformity of deposition. Also, DLC films coated on paper, polymer, and metal substrates have been extensively used. In this work, in order to improve the printing quality and plate wear of polymer printing plates, different deposition conditions were used for depositing DLC on the polymer printing plates using the Pulsed DC PECVD method. The deposition temperature of the DLC films was under $100^{\circ}C$, in order to prevent the deformation of the polymer plates. The properties of each DLC coating on the polymer concave printing plate were analyzed by measuring properties such as the roughness, surface morphology, chemical bonding, hardness, plate wear resistance, contact angle, and printing quality of DLC films. From the results of the analysis of the properties of each of the different DLC deposition conditions, the deposition conditions of DLC + F and DLC + Si + F were found to have been successful at improving the printing quality and plate wear of polymer printing plates because the properties were improved compared to those of polymer concave printing plates.

Influence of Perfluorinated Polymer Passivation on AlGaN/GaN High-electron-mobility Transistors (질화갈륨계 고전자이동도 트랜지스터에 대한 불소계 고분자 보호막의 영향)

  • Jang, Soohwan
    • Korean Chemical Engineering Research
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    • v.48 no.4
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    • pp.511-514
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    • 2010
  • Perfluorinated polymer($Cytop^{TM}$) was deposited on selective area of AlGaN/GaN HEMT structure using low cost and simple spin-coating method, and the electrical characteristics of the device was analyzed for application of passivation layer on semiconductors. Gate lag measurement results of $Cytop^{TM}$ passivated and unpassivated HEMT were compared. Passivated device shows improved 65 % pulsed drain current of dc mode value. Rf measurements were also performed. $Cytop^{TM}$ passivated HEMT have similar rf performance to PECVD grown $Si_3N_4$ passivated device. $Cytop^{TM}$ passivation layer may play an important role in mitigating surface state trapping in the region between gate and drain.

Highly Sensitive and Transparent Pressure Sensor Using Double Layer Graphene Transferred onto Flexible Substrate

  • Chun, Sungwoo;Kim, Youngjun;Jin, Hyungki;Jung, Hyojin;Park, Wanjun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.229.2-229.2
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    • 2014
  • Graphene, an allotrope of carbon, is a two-dimensional material having a unique electro-mechanical property that shows significant change of the electrical conductance under the applied strain. In addition of the extraordinary mechanical strength [1], graphene becomes a prospective candidate for pressure sensor technology [2]. However, very few investigations have been carried out to demonstrate characteristics of graphene sensor as a device form. In this study, we demonstrate a pressure sensor using graphene double layer as an active channel to generate electrical signal as the response of the applied vertical pressure. For formation of the active channel in the pressure sensor, two single graphene layers which are grown on Cu foil (25 um thickness) by the plasma enhanced chemical vapor deposition (PECVD) are sequentially transformed to the poly-di-methyl-siloxane (PDMS) substrate. Dry and wet transfer methods are individually employed for formation of the double layer graphene. This sensor geometry results a switching characteristic which shows ~900% conductivity change in response to the application of pulsed pressure of 5 kPa whose on and off duration is 3 sec. Additionally, the functional reliability of the sensor confirms consistent behavior with a 200-cycle test.

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열분해법을 이용한 실리콘 나노입자 형성과정 수치해석 연구

  • U, Dae-Gwang;Ha, Su-Hyeon;Kim, Myeong-Jun;Hang, Zhang;Kim, Tae-Seong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.117-117
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    • 2010
  • 나노입자 제조 기술이 점차 발전하면서 금속산화물, 반도체용 및 태양전지용, 신소재 등 다양한 응용분야에 사용하고 있다. 따라서 이와 같은 나노입자 제조방법으로는 펄스 레이저 용사법(pulsed laser ablation), 플라즈마 아크 합성법(plasma arc synthesis), 열분해법(pyrolysis), plasma-enhanced chemical vapor deposition (PECVD)법 등과 같은 기상공정이 많이 사용되고 있다. 기상공정은 기존의 공정에 비해 고순도 입자의 대량 생산, 다성분 입자의 화학적 균질성 유지, 비교적 간단하고 깨끗한 공정 등의 장점을 가지고 있다. 기상공정에서 일반적인 입자 형성 메커니즘은 기체 상태의 화학 물질이 물리적 공정 혹은 화학 반응에 의해 과포화상태에 도달하게 되며, 이 때 동질 핵생성(homogeneous nucleation)이 일어나고 생성된 핵(nuclei)에 기체가 응축되고 충돌, 응집하면서 입자는 성장하게 된다. 열분해법은 실리콘 나노입자를 생산하는 기상공정 중 하나이다. 일반적으로 열분해 공정은 지속적으로 열이 가해지는 반응기 내에 반응기체인 $SiH_4$을 주입하고, 운반기체는 He, $H_2$, Ar, $N_2$ 등을 사용하였을 때, 높은 열로 인해 $SiH_4$가 분해되며, 이 때 가스-입자 전환 현상(gas to particle conversion)이 일어나 실리콘 입자가 형성된다. 그러나 입자 형성과정은 $SiH_4$ 농도, 유량, 작동 압력, 온도 등 매우 다양한 요소에 영향을 받는다. 고, 복잡한 화학반응 메커니즘에 의해 명확히 규명되지는 못하고 있다. 이에 본 연구에서는 복잡한 화학반응을 해석하는 상용코드 CHEMKIN 4.1.1을 이용하여 열분해 반응기 내에서의 실리콘 입자 형성, 성장, 응집, 전송 모델을 만들고 이를 수치해석하였다. 표면 반응, 응집, 전송에 의한 입자 성장 메커니즘을 포함하고 있는 aerosol dynamics model을 method of moment법으로 해를 구하였으며, 이를 실험 결과와 비교하여 모델링을 검증하였다. 또한 반응기의 온도, 압력, 가스 농도, 유량 등의 요소를 고려하여 실리콘 나노입자를 형성하는 최적의 조건을 연구하였다.

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Trend in Research and Application of Hard Carbon-based Thin Films (탄소계 경질 박막의 연구 및 산업 적용 동향)

  • Lee, Gyeong-Hwang;Park, Jong-Won;Yang, Ji-Hun;Jeong, Jae-In
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.111-112
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    • 2009
  • Diamond-like carbon (DLC) is a convenient term to indicate the compositions of the various forms of amorphous carbon (a-C), tetrahedral amorphous carbon (ta-C), hydrogenated amorphous carbon and tetrahedral amorphous carbon (a-C:H and ta-C:H). The a-C film with disordered graphitic ordering, such as soot, chars, glassy carbon, and evaporated a-C, is shown in the lower left hand corner. If the fraction of sp3 bonding reaches a high degree, such an a-C is denoted as tetrahedral amorphous carbon (ta-C), in order to distinguish it from sp2 a-C [2]. Two hydrocarbon polymers, that is, polyethylene (CH2)n and polyacetylene (CH)n, define the limits of the triangle in the right hand corner beyond which interconnecting C-C networks do not form, and only strait-chain molecules are formed. The DLC films, i.e. a-C, ta-C, a-C:H and ta-C:H, have some extreme properties similar to diamond, such as hardness, elastic modulus and chemical inertness. These films are great advantages for many applications. One of the most important applications of the carbon-based films is the coating for magnetic hard disk recording. The second successful application is wear protective and antireflective films for IR windows. The third application is wear protection of bearings and sliding friction parts. The fourth is precision gages for the automotive industry. Recently, exciting ongoing study [1] tries to deposit a carbon-based protective film on engine parts (e.g. engine cylinders and pistons) taking into account not only low friction and wear, but also self lubricating properties. Reduction of the oil consumption is expected. Currently, for an additional application field, the carbon-based films are extensively studied as excellent candidates for biocompatible films on biomedical implants. The carbon-based films consist of carbon, hydrogen and nitrogen, which are biologically harmless as well as the main elements of human body. Some in vitro and limited in vivo studies on the biological effects of carbon-based films have been studied [$2{\sim}5$].The carbon-based films have great potentials in many fields. However, a few technological issues for carbon-based film are still needed to be studied to improve the applicability. Aisenberg and Chabot [3] firstly prepared an amorphous carbon film on substrates remained at room temperature using a beam of carbon ions produced using argon plasma. Spencer et al. [4] had subsequently developed this field. Many deposition techniques for DLC films have been developed to increase the fraction of sp3 bonding in the films. The a-C films have been prepared by a variety of deposition methods such as ion plating, DC or RF sputtering, RF or DC plasma enhanced chemical vapor deposition (PECVD), electron cyclotron resonance chemical vapor deposition (ECR-CVD), ion implantation, ablation, pulsed laser deposition and cathodic arc deposition, from a variety of carbon target or gaseous sources materials [5]. Sputtering is the most common deposition method for a-C film. Deposited films by these plasma methods, such as plasma enhanced chemical vapor deposition (PECVD) [6], are ranged into the interior of the triangle. Application fields of DLC films investigated from papers. Many papers purposed to apply for tribology due to the carbon-based films of low friction and wear resistance. Figure 1 shows the percentage of DLC research interest for application field. The biggest portion is tribology field. It is occupied 57%. Second, biomedical field hold 14%. Nowadays, biomedical field is took notice in many countries and significantly increased the research papers. DLC films actually applied to many industries in 2005 as shown figure 2. The most applied fields are mold and machinery industries. It took over 50%. The automobile industry is more and more increase application parts. In the near future, automobile industry is expected a big market for DLC coating. Figure 1 Research interests of carbon-based filmsFigure 2 Demand ratio of DLC coating for industry in 2005. In this presentation, I will introduce a trend of carbon-based coating research and applications.

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