• KIEE International Transactions on Electrophysics and Applications
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• 제4C권3호
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• pp.101-105
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• 2004

The efficient power MOSFET inverter applied for a simple and low cost power supply is proposed for driving the dielectric barrier discharge (DBD) lamp load. For decades, the DBD phenomenon has been used for ozone gas production in industry. In this research, the ultraviolet and visible light sources utilizing the DBD lamp is considered as the load for solid-state high frequency power supply. It is found that the simple voltage-source single-ended quasi-resonant ZVS inverter with only one active power switch could effectively drive this load with the output power up to 700 W. The pulse density modulation based control scheme for the single-ended quasi-resonant ZVS inverter using a low voltage and high current power MOSFET switching device is proposed to provide a linear power regulation characteristic in the wide range 0-100％ of the full power as compared with the conventional control based Royer type parallel resonant inverter type power supplies.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 광주전남지부
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• pp.71-74
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• 2006

Discharge of the flat lamp lighting source research arc requested very much. For improving brightness, life time, efficiency of flat lamp, plasma diagnosis of the flat lamp lighting source to understand property of lighting source is very important. distance of discharge electrode is 5.5mm and width is 16.5mm, we measured electron temperature and electron density measured with single langmuir probe in flat lamp. we tested the discharge from 100 Torr to 300 Torr pressure. the Pulse is rectangular pulse with frequency 20kHz and Duty ratio 20%. Resultly, electron temperature decreases and electron density increase as increase the gas pressure and electron temperature decreases and electron density increase as increase the voltage.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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• pp.2190-2192
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• 2005

Discharge of the flat lamp lighting source research are requested very much. For improving brightness, life time, efficiency of flat lamp, plasma diagnosis of the flat lamp lighting source to understand property of lighting source is very important. distance of discharge electrode is 5.5mm and width is 16.5mm, we measured electron temperature and electron density measured with single langmuir probe in flat lamp. we tested the discharge from 100 Torr to 300 Torr pressure. the Pulse is rectangular pulse with frequency 20kHz and Duty ratio 20%. Resultly, electron temperature decreases and electron density increase as increase the gas pressure and electron temperature decreases and electron density increase as increase the voltage.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.476-477
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• 2007

This paper described the partial discharge (PD) measurement techniques for diagnosing gas-insulated switches in overhead power distribution system. A capacitive voltage probe to detect PD pulse was designed and fixed on the surface of a bushing. We also designed a coupling network to attenuate AC voltage by 270 dB, and a low-noise amplifier having the gain of 40 dB and 500 kHz~20 MHz 3 dB. From the calibration, it was calculated that the sensitivity of the measurement system was 0.94mV/pC. In the application experiment, we could measure a PD pulse of 45 pC.

• 전기학회논문지
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• 제62권9호
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• pp.1297-1301
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• 2013

This paper analyzes of PD occurrence position through an analysis of the arrival time difference between the GIS partial discharge signal. Because of GIS (Gas Insulated Switchgear) is a facility very important power equipment and as part of the equipment that make up the power system, the stabilization of the power industry, which accounted for 88.5% share of GIS substation in the form of a substation is an important equipment for power supply. In the situation where we are gradually expanding the need for preventive diagnosis in order to improve the efficiency of equipment management and failure prevention for Preventive diagnosis. In this paper as a method for extracting pre-defect of failure of GIS Apply the average value method of calculating the 5 times each using a pulse of the first time of the second pulse (${\Delta}t$) with an oscilloscope generation position PD(Partial Discharge). the results of GIS internal inspection, the partial discharge of the actual the position of the partial discharge was confirmed with an accuracy of about 82% of positions. Arrival time difference in the most effective manner if the partial discharge of GIS internal occurs by applying the averaging method and TOA(Time of arrival) method, the partial discharge occurs you through the measurement and analysis of PD signal occurs was confirmed in the experiment are presented and diagnostic methods location tracking.

• KIEE International Transactions on Electrophysics and Applications
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• 제4C권2호
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• pp.55-59
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• 2004

Throughout manufacturing processes, pulse shaping is required for material processing and it is regarded as an important (actor according to the specific characteristics of materials. Therefore, this study suggests a highly appropriate pulse shaping technique using a multi-switching method. This is a pulse superposition method in which one flash lamp can consecutively turn on by the double switching of the discharging system. It is possible to construct a variety of pulse shapes and pulse widths by the consecutive trigger of the silicon-controlled rectifiers (SCR) of a PIC (program integrated circuit) one-chip microprocessor. The use of this technique can provide a number of advantages to people who require suitable pulse shaping for particular applications such as welding, cutting, and drilling.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2008년도 Techno-Fair 및 추계학술대회 논문집 전기물성,응용부문
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• pp.97-98
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• 2008

In 6.6kV Rotary Machine Stator Windings, Corona Discharge, Discharge at Conductor Surface, Slot Discharge and Endwinding Discharge is happended by electronic degradation. Also, if Partial Discharge cause in inner-part of Rotary Machine Stator Windings, it will be happended voltage and current pulse. In case of discharge spark, RF electromagnetic wave, which transmits at discharge position, can happen. To detect this kind of RF electromagnetic wave efficiently, we have designed Planar Antenna Sensor with the CST MWS simulation program. Also we have confined the application possibility, which can analyzes the partial discharge in Rotary Machine Stator Windings. In the Future, sample of planar antenna sensor will be able to compare with the data of simulation by CST MWS program.

• 한국기계가공학회지
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• 제4권3호
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• pp.5-12
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• 2005

In wire discharge machining which is using STD 11 as die materials, the major factors of machining speed are discharge voltage, discharge current, and discharge time. All of the three factors give the effect. Increasing of the discharge pulse time gets groove width wider and it relatively increases surface roughness and clearance. If no load voltage is decreased, surface roughness is good but it decreases machining speed. If on time is increased, machining speed will get faster and clearance and offset value also get bigger.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 Techno-Fair 및 추계학술대회 논문집 전기물성,응용부문
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• pp.222-223
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• 2007

In 6.6kV Rotary Machine Stator Windings, Corona Discharge, Discharge at Conductor Surface, Slot Discharge and Endwinding Discharge is happended by electronic degradation. Also, if Partial Discharge cause in inner-part of Rotary Machine Stator Windings, it will be happended voltage and current pulse. In case of discharge spark, RF electromagnetic wave, which tranmits at discharge position, can happen. To detect this kind of RF electromagnetic wave efficiently, we have designed Planar Antenna Sensor with the CST MWS simulation program. Also we have confined the application possibility, which can analize the partial discharge in Rotary Machine Stator Windings. In the Future, sample of planar antenna sensor will be able to compare with the data of simulation by CST MWS program.