• Title/Summary/Keyword: process measurement

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Evaluation Method for Measurement System and Process Capability Using Gage R&R and Performance Indices (게이지 R&R과 성능지수를 이용한 측정시스템과 공정능력 평가 방법)

  • Ju, Youngdon;Lee, Dongju
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.42 no.2
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    • pp.78-85
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    • 2019
  • High variance observed in the measurement system can cause high process variation that can affect process capability badly. Therefore, measurement system analysis is closely related to process capability analysis. Generally, the evaluation for measurement system and process variance is performed separately in the industry. That is, the measurement system analysis is implemented before process monitoring, process capability and process performance analysis even though these analyses are closely related. This paper presents the effective concurrent evaluation procedure for measurement system analysis and process capability analysis using the table that contains Process Performance (Pp), Gage Repeatability & Reproducibility (%R&R) and Number of Distinct Categories (NDC). Furthermore, the long-term process capability index (Pp), which takes into account both gage variance and process variance, is used instead of the short-term process capability (Cp) considering only process variance. The long-term capability index can reflect well the relationship between the measurement system and process capability. The quality measurement and improvement guidelines by region scale are also described in detail. In conclusion, this research proposes the procedure that can execute the measurement system analysis and process capability analysis at the same time. The proposed procedure can contribute to reduction of the measurement staff's effort and to improvement of accurate evaluation.

Measurement and Analysis Process Improvement Based on CMMI (CMMI 기반의 측정 및 분석 프로세스 개선)

  • Han, Hyuk-Soo;Do, Sung-Ryong
    • Journal of Information Technology Services
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    • v.10 no.4
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    • pp.229-242
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    • 2011
  • It is necessary to have measurement and analysis activity for managing software project. At least, every project measures time and cost in order to figure it out whether it will finish within its deadline. CMMI has Measurement and Analysis process in Maturity Level 2. In Measurement and Analysis process, Indicators for decision making in project management are defined and analysis procedure of the measurements to get the indicators are specified. Also, the way of collecting the data and storing them is also planned. Establishing efficient and effective measurement and analysis process in the organization by improving existing process is very important for project success. In this paper, we provide a method for analyzing the measurement and analysis process and improving it based on IDEAL model. It will support the organizations which are trying to adopt CMMI to establish measurement and analysis process.

A study of in-process optical measurement of surface roughness

  • Noda, Atsuhiko;Harada, Hiroshi
    • 제어로봇시스템학회:학술대회논문집
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    • 1993.10b
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    • pp.541-544
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    • 1993
  • This paper attempts to propose new procedures to evaluate roughness of ground metallic surface in the range of 1-10.mu.m from data gained by an optical, in-process measurement of the surfaces. Studies are made to process the data of reflected lights pointed at the surface to be measured. Results obtained are compared with those of measurement by stylus roughness meter. Correlations between the two types of roughness measurement are well. The proposed method can be used as a sensor for a polishing robot.

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An Auto Metrology Sampling Method Considering Quality and Productivity for Semiconductor Manufacturing Process (반도체 제조공정에서 품질과 생산성을 고려한 자동 계측 샘플링 방법)

  • Shin, Myung-Goo;Lee, Jee-Hyung
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.61 no.9
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    • pp.1330-1335
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    • 2012
  • This paper proposes an automatic measurement sampling method for the semiconductor manufacturing process. The method recommends sampling rates using information of process capability indexes and production scheduling plan within the restricted metrology capacity. In addition, it automatically controls the measurement WIP (Work In Process) using measurement priority values to minimize the measurement risks and optimize the measurement capacity. The proposed sampling method minimizes measurement controls in the semiconductor manufacturing process and improves the fabrication productivity via reducing measurement TAT (Turn Around Time), while guaranteeing the level of process quality.

A Statistical Program for Measurement Process Capability Analysis based on KS Q ISO 22514-7 Using R (R을 이용한 KS Q ISO 22514-7 측정 프로세스 능력 분석용 프로그램)

  • Lee, Seung-Hoon;Lim, Keun
    • Journal of Korean Society for Quality Management
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    • v.47 no.4
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    • pp.713-723
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    • 2019
  • Purpose: The purpose of this study is to develop a statistical program for capability analysis of measuring system and measurement process based upon KS Q ISO 22514-7. Methods: R is a powerful open source functional programming language that provides high level graphics and interfaces to other languages. Therefore, in this study, we will develop the statistical program using R language. Results: The R program developed in this study consists of the following five modules. ① Measuring system capability analysis with Type 1 study data: MSCA_Type1.R ② Measuring system capability analysis with Linearity study(Type 4 study) data: MSCA_Type4.R ③ Measurement process capability analysis with Type 1 study & Gage R&R study data: MPCA_T1GRR.R ④ Measurement process capability analysis with Type 4 study & Gage R&R study data: MPCA_T4GRR.R ⑤ Attribute measurement processes capability analysis : AttributeMP.R Conclusion: KS Q ISO 22514-7 evaluates measuring systems and measurement processes on the basis of the measurement uncertainty that was determined according to the GUM(KS Q ISO/IEC Guide 98-3). KS Q ISO 22514-7 offers precise procedures, however, computations are more intensive. The R program of this study will help to evaluate the measurement process.

Design of On-line Process Control with Variable Measurement Interval

  • Park, Changsoon
    • Journal of the Korean Statistical Society
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    • v.29 no.3
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    • pp.319-336
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    • 2000
  • A mixed model with a white noise process and an IMA(0,1,1) process is considered as a process model. It is assumed that the process is a white noise in the absence of a special cause and the process changes to an IMA(0,1,1) due to a special cause. One useful scheme in measuring the process level is to use the variable measurement interval (VMI) between measurement times according to the value of the previous chart statistic. The advantage of the VMI scheme is to measure the process level infrequently when in control to save the measurement cost and to measure frequently when out of control to save the off-target cost. This paper considers the VMI scheme in order to detect changes in the process model from a white noise to an IMA(0,1,1). The VMI scheme is shown to be effective compared to the standard fixed measurement interval (FMI) scheme in both statistical and economic contexts.

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Process capability index for single process with multiple measurement locations (다수 측정 위치를 갖는 단일 공정의 공정능력지수)

  • Lee, Do-Kyung;Lee, Hyun-Seok
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.30 no.3
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    • pp.28-36
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    • 2007
  • Process Capability indices (PCIs) have been widely used in manufacturing industries to provide a quantitative measure of process performance. PCIs have been developed to represent process capability more exactly. In the previous studies, only one designated location on each part is measured. But even though in single process, multiple measurement locations on each part are required to calculate the reliable process capability. In this paper, we propose a new process capability index with multiple measurement locations on each part. We showed numerical examples and sensitivity analysis according to the number of measurement locations.

Process Quality Improvement through Improving Measurement System for Internal Diameter of Gun Barrel (포신 내경 측정시스템 개선을 통한 공정품질 향상)

  • Park, Young Min;Bae, In Hwa;Kim, Sang Boo
    • Journal of Korean Society for Quality Management
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    • v.51 no.4
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    • pp.633-642
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    • 2023
  • Purpose: The variation of the internal diameters of gun barrel incurs a lot of reworks in gun barrel manufacturing process and the significant quality problem of gun barrel. And it is likely to stem from the current measurement system for the internal diameter of gun barrel and the related manufacturing process as well. The purpose of this study is to improve the gun barrel manufacturing process through improving measurement system. Methods: The improved measurement system using laser can measure the internal diameters of gun barrel more accurately, and the properly adjusted honing process reduces the variation of internal diameters of gun barrel. Results: Comparing the mean square error of internal diameters for 6 gun barrels measured before and after process improvement shows that the variation of gun barrel internal diameters was significantly reduced after the process improvement. Conclusion: The introduction of improved measurement system for the internal diameters of gun barrel and the adjustment of related honing process results in the reduction of reworks of gun barrels and their internal diameter variations.

A Technique and software of analysis and control for measurement process

  • Zhao, Fengyu;Xu, Jichao;Bergman, Bo
    • International Journal of Quality Innovation
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    • v.1 no.1
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    • pp.97-105
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    • 2000
  • In this paper, a two-section method for measuring is introduced and the variation sources of measurement process are analysed. Measuring is a special process in general process. Various variation source must be firstly decomposed so that the statistical distribution law of measuring process can be established, and then implement monitoring control of the measuring process. A special method to obtain the measuring variation is discussed, and a monitoring control technique for measuring process is studied based statistical distribution. Towards the end, we briefly introduce software design for the analysis and control of a measurement process.

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The Economic Design of $\bar{x}$ -S Chart Considering Measurement Error (측정오차를 고려한 $\bar{x}$ -S 관리도의 경제적 설계)

  • 유영창;강창욱
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.23 no.61
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    • pp.89-98
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    • 2000
  • For statistical process control, the process data are collected by the measurement system. But, the measurement system may have instrument error or/and operator error. In the measured values of products, the total observed variance consists of process variance and variance due to error of measurement system. In this paper, we design more practical T-s control chart considering estimated measurement error The effects of measurement error on the expected total cost and design parameters are investigated.

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