• Proceedings of the Korean Magnestics Society Conference
• /
• 2007.05a
• /
• pp.61.2-61.2
• /
• 2007

• International Journal of Quality Innovation
• /
• v.10 no.1
• /
• pp.89-105
• /
• 2009

This study aims to probe into the influence of new product design and new product development process management on development performance. The research finding demonstrates that product design reveals positive and significant influence on new product development performance. Through statistical analysis, this study finds that companies in Taiwan value new product design. When companies value it more, they tend to have better new product development performance. With regard to the relation between new product development process management and new product development performance, the empirical results demonstrate that companies would pay more attention on new product development process management. With regard to new product idea and assessment, concept design and development, product function test and mass production in the market, through statistical analysis, this study finds that companies that value process management of new product development tend to have better new product development performance. As to the influence of new product design and new product process management on new product development performance, statistical analysis result demonstrates that the integration between new product design valued by companies in Taiwan and development process management would lead to significantly positive influence on new product development performance of the companies.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2005.07a
• /
• pp.721-723
• /
• 2005

We applied the Atmospheric Pressure Plasma (AP-plasma) to the MgO film to try to control the Aging-time on the PDP production-line. The MgO film surface and the discharge characteristics of AC-PDPs were investigated, using the plasma-treated MgO film. The Aging-time change can be achieved by treating the MgO film with plasma. This method can be adapted to the mass production-line.

• Proceedings of the Korea Society of Design Studies Conference
• /
• 2001.10a
• /
• pp.64.2-64
• /
• 2001

• Journal of Korea Technology Innovation Society
• /
• v.4 no.1
• /
• pp.32-48
• /
• 2001

Many Korean companies have grown up through technology import, learning, development, innovation and export. This process is called as "the dynamic development process of technology". Among many companies which have grown up by way of this process, the Hyundai Motor Company has shown a very remarkable achievement in technological growth. In short, this paper deals with the growth of Korean companies in the view of the dynamic development process of technology. As a case study, the paper analyzes the Hyundai Motor Company.r Company.

• Journal of Korean Society of Rural Planning
• /
• v.20 no.2
• /
• pp.23-43
• /
• 2014

This study aims to analyze the affecting factors-construction of collaborative planning process and effect on Comprehensive Rural Village Development Project. To this end, targeting the 36 districts which were selected for 2004 Comprehensive Rural Village Development Project and completed their 2010 5-year projects, components of collaborative planning process and planning effect will be drawn and the affecting factors-construction of collaborative planning and effect on Comprehensive Rural Village Development Project will be analyzed below. According to the results of this study, the affecting factors of collaborative planning process of Comprehensive Rural Village Development Project on planning effect, The level of effect of individual component on endogenous variable appeared greatest mostly in the upper groups. In terms of the level of individual component effect, social learning process and interaction among participants affected greatest. The process of Comprehensive Rural Village Development Project is evaluated that it reflected collaborative planning theory of Healey enough. Therefore, in the course of Comprehensive Rural Village Development Project progress, collaborative planning model must pass social learning process and interaction among participants which are the most important components out of collaborative planning process as we saw in the upper groups. And in order to maximize the performance and results of Comprehensive Rural Village Development Project, the following sequential affecting factors model as Figure 7 must be suggested as optimal collaborative planning models of Comprehensive Rural Village Development Project. Based on the results of the study, the policy implication was drawn as follows. First, systematic supplementations in the form of a consultative body are required to perform Comprehensive Rural Village Development Project efficiently. Second, network needs to be built among different participants in Comprehensive Rural Village Development Project process. Third, systematic mechanism is required to improve social learning among different participants. Fourth, systematic rearrangement is required to guarantee the residents' realistic participation in the course of Comprehensive Rural Village Development Project process.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2006.08a
• /
• pp.826-829
• /
• 2006

In order to increase the transmittance of panel, in process of FFS TFT-LCD, fine patterning process which is adopted to the optimum passivation(PVX) hole was applied fine metal line patterning process and was made with optimum efficiency of liquid crystal by using space/bar size control of pixel electrode. We fabricated 2.03" mobile FFS devices with fine patterning process. Further, this technology will be applied to the basis of other process for higher PPI or higher aperture ratio technology.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2002.06a
• /
• pp.172-173
• /
• 2002

• 한국정보디스플레이학회:학술대회논문집
• /
• 2008.10a
• /
• pp.258-260
• /
• 2008

Developed halftone exposure technique was successfully applied to the fabrication of narrow transistor channels below $4\;{\mu}m$ with conventional photolithography method. Asymmetric slits concept of photo mask was applied to make channel lengths (L) shorter for thin film transistor's (TFT) high performance. These short channel TFTs verified better quality transistor characteristics.

• Proceedings of the PSK Conference
• /
• 2003.04a
• /
• pp.252.3-252.3
• /
• 2003

An effective and convenient regioselective reduction of 5-benzylidene 2,4-thiazolidinedione derivatives to the corresponding 5-benzyl 2,4-thiazolidinedione derivatives has been accomplished using 3,5-dicarboethoxy-2,6-dimethyl-1,4-dihydropyridine (Hantzsch dihydropyridine ester: HEH) with silica gel as an acid catalyst in a good yield.