• Analytical Science and Technology
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• v.19 no.5
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• pp.394-399
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• 2006

The polishing performance and the relationships of electrochemistry depending upon oxidizers and additives in the tungsten CMP slurry used in semiconductor industry were investigated. Hydrogen peroxide, ferric nitrate and potassium iodate were used as oxidizers and they showed different oxidation reactions on tungsten film depending on the kind of oxidizers and pH of slurry. The differences influenced the polishing performance. Etching reaction was predominated in the hydrogen peroxide. However, passivation reaction was prevailed in ferric nitrate and potassium iodate. TMAH and KOH raised the potential energy and removal rate of tungsten, and improved a dispersion characteristic of slurry by increasing absolute value of zeta potential. Addition of 100 ppm of poly(acrylic acid) of M.W. 250,000 improved dispersion ability.

• Membrane Journal
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• v.8 no.4
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• pp.235-242
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• 1998

Pervaporation separation of methyl tert-butyl ether (MTBE) and methanol (MeOH) mixture, of which the former compound is well known as the octane booster was carried out. Poly(vinyl alcohol) (PVA) membranes crosslinked with poly(acrylic acid) which have been successfully applied on the water-alcohol mixtures were used in this study. The PVA/PAA ratio in the crosslinked membranes was 95/5, 90/10, 85/15, 80/20, and 75/25 by weight. The operating temperatures were 30, 40, and 50$\circ$C, and the compositions of MTBE and MeOH to be separated were 95/5, 90/10, and 80/20 (MTBE/MeOH) solutions. PVA/PAA=85/15 membrane showed the separation factor $\alpha_{MeOH/MTBE}$=4000 and the permeation rate of 10.1 g/m$^2$hr for MTBE/MeOH=80/20 solution at 50$\circ$. When the same membrane was used, the separation factor and permeation rate for MTBE/MeOH=90/10 solution at 40$\circ$C were $\alpha_{MeOH/MTBE}$=6000 and 8.5 g/m$^2$hr, respectively. Also, the hydrophilic/hydrophobic balance of the membranes would take an important role in the relationships between the membranes and separation performances in terms of the flux and the separation factor.