• Elastomers and Composites
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• v.29 no.5
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• pp.444-452
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• 1994

Emulsion graft copolymerizations of vinyl monomers, butyl acrylate(BA), methyl methacrylate(MMA), 2-ethylhexyl acrylate (EHA), glycidyl methacrylate (GMA), 2-hydroxyethyl methacrylate(HEMA), methacrylonitrile(MAN), dimethylaminoethyl methacrylate(DAMA) or 2-vinyl pyridine(VP), onto carboxyl-terminated SBR latex were carried out under different experimental conditions. In case of synthesizing SBR-g-poly(butyl acrylate), the degree of grafting was increased with increasing the amount of emulsifier, polymerization temperature and the amount of initiator. Pull-out strength of resorcinol-formaldehyde-latex(RFL) adhesives formulated with modified latexes was very higher than that of RFL adhesive formulated with ungrafted latex. When the modified latexes with GMA, HEMA, MAN, DAMA or VP were used, the break occurred at cords. Peel strength of RFL adhesives formulated with SBR-g-poly(GMA), SBR-g-poly(HEMA) or SBR-g-poly(VP) was higher by about 1.3 times than that of RFL adhesives formulated with unmodified SBR against nylon cord and was higher by about 2.0 times against polyester cord.

• Elastomers and Composites
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• v.43 no.3
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• pp.157-165
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• 2008

Suspension polymerization was carried out to synthesize poly(butyl methacrylate) (PBMA) composite particles containing carbon black. Water was selected as a reaction medium, hydrophobic silica as a stabilizer and azobisisobutyronitrile as an initiator. Concentration of stabilizer was varied from 0.67 to 2.55 weight% with respect to the water, and that of initiator was varied from 0.25 to 3.00 weight% with respect to the butyl methacrylate (BMA) monomer. All polymerization reactions were conducted at 75$^{\circ}C$. It is found that stabilizer concentration has no impact on reaction kinetics, while an increase in initiator concentration enhances polymerization reaction rate. Increase of carbon black concentration from 1 to 3 to 5 wt% into PBMA displayed progressive decrease in reaction conversion. The particle diameter of PBMA composite particles containing carbon black was found to be between 5 and 30 ${\mu}m$. Glass transition was determined to range from 23.8 to 24.7$^{\circ}C$, irrespective of variation in the concentration of stabilizer, initiator or carbon black.

• Membrane Journal
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• v.20 no.3
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• pp.203-209
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• 2010

Amphiphilic graft copolymers based on poly(epichlorohydrine) (PECH) were synthesized using atom transfer radical polymerization (ATRP). Successful graft polymerization of poly(methyl methacrylate)(PMMA) and poly(butyl methacrylate) (PBMA) from PECH was confirmed by nuclear magnetic resonance ($^1H$ NMR) and FT-IR spectroscopy. Upon the introduction of KI or LiI to the graft copolymers, the ether stretching bands were shifted to a lower wavenumber due to coordinative interactions. Ionic conductivities of PECH-g-PBMA complexes were always higher than those of PECH-g-PMMA complexes, resulting from higher mobility of rubbery PBMA chains. The maximum ionic conductivity of $2.7{\times}10^{-5}\;S/cm$ was obtained at 10 wt% of KI for PECH-g-PBMA electrolytes.

• Korean Membrane Journal
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• v.9 no.1
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• pp.57-63
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• 2007

Amphiphilic graft copolymer from poly(vinylidene fluoride) (PVDF) was synthesized using atom transfer radical polymerization (ATRP) for composite nanofiltration membranes. Direct initiation of the secondary fluorinated site of PVDF facilitates grafting of tert-butyl methacrylate (tBMA). Amphiphilic PVDF-g-PMAA graft copolymer with a 51:49 wt ratio was obtained by hydrolyzing poly(tert-butyl methacrylate) (PtBMA) to poly(methacrylic acid) (PMAA). Wide angle X-ray scattering (WAXS) and differential scanning calorimetry (DSC) confirmed the decrease of crystallinity of PVDF upon graft copolymerization. Composite nanofiltration membranes were prepared from PVDF-g-PMAA as a top layer coated onto PVDF ultrafiltration (UF) support membrane. The morphology and hydrophilicity of membranes were characterized using scanning electron microscopy (SEM) and contact angle measurement. The rejections of composite membranes were 80.2% for $Na_2SO_4$ and 28.4% for NaCl, and the solution flux were 9.5 and $14.5\;L/m^2\;h$ at 1.0 MPa pressure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.8
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• pp.806-811
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• 2004

1-Hydroxy-4-(2-naphthalenesulfonyloxy) cyclohexane(1), 1,4-di-(2-naphthalenesulfonyloxy) cyclohexane(2), 1-hydroxy-4-(2-thiophenesulfonyloxy) cyclohexane(3), 1,4-di-(2-thiophenesulfonyloxy) cyclohexane(4) were synthesized and evaluated for their performance as novel acid amplifiers for 193 nm photoresists. These acid amplifiers(1-4) showed reasonable thermal stability at the usual resist-processing temperature, 9$0^{\circ}C$-12$0^{\circ}C$. And estimated by the sensitivity curve, (1)-(4) enhanced the sensitivity of poly(tert-butyl methacrylate) film by 1.2-1.4 times, compared to poly(tert-butyl methacrylate) film whithout acid amplifiers, in the presence of a photoacid generator.

• Applied Chemistry for Engineering
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• v.16 no.2
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• pp.262-266
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• 2005

We compared the effects of a representative aliphatic acid amplifier, 4-hydroxy-4'-p-tosyloxy isopropylidene dicyclohexane, doped in poly[tert-butyl methacrylate] (pTBMA), poly[tetrahydropyranyl methacrylate] (pTHPMA) or poly[tert-butoxycarbonyloxystyrene] (pTBOCST) resin film as acid labile polymer in view of thermal stability and photosensitivity enhancement. The acid amplifier was stable up to 20 min in pTBMA and pTBOCST film and up to 5 min in pTHPMA film at $120^{\circ}C$. pTBMA and pTHPMA films doped with the acid amplifier showed four times and two times higher photosensitivity, respectively. But pTBOCST showed negligible photosensitivity enhancement. Photosensitivity enhancement and thermal stability were found to be affected by the resin.

• Journal of the Korean Graphic Arts Communication Society
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• v.20 no.2
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• pp.131-140
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• 2002

Chemically amplified deep UV(CA-DUV) resists are typically based on a combination of an acid labile polymer and a photoacid generator(PAG) but acid amplification type photoresist is formulated by addition of the acid amplifiers to chemically amplified resist system(CAPs). We developed acid amplifiers base on cyclohexanediol such as 1-methacryloyloxy-4-tosyloxy cyclohexane(MTC) and poly(MTC$_{10}$-co-tBMA$_{90}$)(P-1) to enhance photosensitivity. P-1 is a copolymer of tert-butyl methacrylate and MTC as a positive working photoresist based on polymeric acid amplifier in order to enhance photosensitivity and simplify the process of fomulating a photoresist. P-1 exhibited 2X higher photosensitivity compared with PtBMA. The acid amplifiers showed reasonable thermal stability for resist processing temperature and higher photosensitivity compared with chemically amplified resist.

• Journal of the Korean Applied Science and Technology
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• v.19 no.2
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• pp.131-136
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• 2002

As model waterborne acrylic coatings, mono-dispersed poly(butyl acrylate-methyl methacrylate) copolymer latexes of random copolymer and core/shell type graft copolymer were prepared by seeded multi-staged emulsion polymerization with particle size of $180{\sim}200$ nm using semi-batch type process. Sodium lauryl sulfate and potassium persulfate were used as an emulsifier and an initiator, respectively. The effect of particle texture including core/shell phase ratio, glass transition temperature and crosslinking density, and film forming temperature on the film formation and final properties of film was investigated using SEM, AFM, and UV in this study. The film formation behavior of model latex was traced simultaneously by the weight loss measurement and by the change of tensile properties and UV transmittance during the entire course of film formation. It was found that the increased glass transition temperature and higher crosslinking degree of latex resulted in the delay of the onset of coalescence of particles by interdiffusion during film forming process. This can be explained qualitatively in terms of diffusion rate of polymer chains. However, the change of weight loss during film formation was insensitive to discern each film forming stages-I, II and III.

• Elastomers and Composites
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• v.28 no.3
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• pp.191-197
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• 1993

The graft copolymerization of methyl methacrylate(MMA) onto natural rubber latex(NRL) initiated by t-butyl hydroperoxide(t-BHPO) was investigated in aquous medium. The grafting percentage, grafting efficiency and total conversion were observed in various reaction conditions such as monomer, initiator and emulsifier concentration, reaction temperature, reaction time and agitation speed. The optimum conditions for the graft copolymerization onto natural rubber latex were as follows ; At given monomer concentration of $3{\times}10^{-2}mole/l$, the maximum grafting percentage was appeared in the case of grading in initiator concentration of $4{\times}10^{-2}mo1e/l$ and emulsifier concentration of 0.2wt.% at $40^{\circ}C$ for 5hrs.

• Journal of the Korean Chemical Society
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• v.48 no.1
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• pp.39-45
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• 2004

Acid amplifying copolymers are synthesized by the copolymerization of tert-butyl methacrylate(tBMA) with acid-sensitive functional group and 4-hydroxy-4'p-styrenesufonyloxyisopropylidene dicyclohexane(HSI) or 4-p-styrenesulfonyloxy-4'-tosyloxyisopropylidenedicyclohexane(STI) with acid-amplifying group as novel polymeric acid amplifying photoresists. Poly(HSI-co-tBMA) film and Poly(STI-co-tBMA) film as acid amplifying photoresists show reasonable thermal stability in the absence of an acid species. Poly(STI-co-tBMA) film exhibits 2X higher photosensitivity, whereas Poly(HSI-co-tBMA) film show 2X lower photosensitivity compared with ptBMA homopolymer. The attachment of acid-amplifying units to polymer backbones could provide a novel way to enhance the photosensitivity of acid-sensitive polymers depending on the structure of acid-amplifying units.