• 제목/요약/키워드: plasma temperature

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Enhanced Inductively Coupled Plasma의 자화 주파수 의존 특성 (Magnetized Frequency characteristics of Enhanced Inductively Coupled Plasma)

  • 라상호;박세근;오범환
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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    • pp.302-305
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    • 2000
  • It is important to control the electron energy distribution to have high quality plasma process. A conventional inductively coupled plasma(ICP) source with 13.56MHz power is not adequate for low damage sub-half micron patterning process due to higher electron temperature. Only the pulsed plasma technique seems to provide low electron temperature, and thus low process damage. Recently, a novel method proposed by us, named as ‘Enhanced-ICP’, which uses periodic weak axial magnetic field added to a normal ICP source, has shown great improvement in etch characteristics. changes of plasma characteristics according to the frequency of time-varying axial magnetic field have been observed by probe-time-averaged Langmuir probe.

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반도전성 실리콘 고무의 플라즈마 처리에 따른 표면의 특성변화 (Changes of Surface Properties by Plasma Treatment on the Surface of Semiconductive Silicone Rubber)

  • 이기택;허창수
    • 한국전기전자재료학회논문지
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    • 제18권8호
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    • pp.696-701
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    • 2005
  • This paper was investigated the changes of surface properties of high-temperature-vulcanized (HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone rubber surface by oxygen plasma were accessed using Fourier transform infrared spectroscopy(FTIR), X-ray photoelectron spectroscopy(XPS), contact angle and Surface Roughness Tester. The results of the chemical analysis Showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx, x=$3\~4$) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized (HTV) semiconductive silicone rubber also, Surface roughness was increased with cleavage of side-chains and oxidation process, it confirmed change as the SEM. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.

Al-Cr의 동시확산과 플라즈마 질화의 복합처리에의한 표면향상에 관한연구 (A Study on the Duplex Treatment of Simultaneous Aluminizing-Chromizing and Plasma Nitriding for Improvement of Surface Properties)

  • 양준혁;이상률;한전건
    • 한국표면공학회지
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    • 제31권6호
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    • pp.325-333
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    • 1998
  • A duplex surface treatment process of simultaneous aluminizing-chromizing process followed by plasma nitriding was performed on AISI HI3 steel and STS 403 steel. The properties of these duplex-treated steels were investigated and were compared with those of steels treated by single process of either simultaneous aluminizing-chromizing or plasma nilriding, in terms of microstructure, microhardness and high temperature wear resistance. Sim~dtaneous alumizing-chromizing process was done using a 2-step coating cycle and plasma nitriding process was done at $530^{\circ}C$ for 1.5 hour. AISI HI3 steel and STS 403 steel showed a FeA1 compound layer of approximately 350$\mu\textrm{m}$ thickness on the surface after simultaneous diffusion coating and nitrided layer of approximately 70-80$\mu\textrm{m}$ formed after the subsequent plasma nitriding process. The microhardness was improved much more by the duplex surface heatment than only by plasma nitriding. In addition the duplex treated specimens showed an improved high temperature wear resistance.

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바이오-메디컬 응용을 위한 마이크로 플라즈마 분사 소자 (Microplasma-Jet Device for Bio-medical Application)

  • 김강일;홍용철;김근영;양상식
    • 전기학회논문지
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    • 제58권12호
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    • pp.2474-2479
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    • 2009
  • This paper presents an atmospheric microplasma-jet device for bio~medical application. The microplasma-jet device consists of four components; a thin Ni anode, porous alumina insulator, a stainless steel cathode and an aluminum case. The anode has 8 holes, and hole diameter and depth are $200 {\mu}m$ and $60 {\mu}m$, respectively. The discharge test was performed in atmospheric pressure using nitrogen gas and AC voltage at the optimum gas flow rate of 4 Vmin. The plasma-jet is ejected stably for the input voltage ranging from 5.5 to $9.5 kV_{p-p}$. The plasma becomes dense as the input voltage increases, which was verified by the hydrophilicity change of PMMA surface treated by the plasma. The temperature increasement of the aluminum film exposed to plasma-jet illustrates that the micro plasma-jet device is feasible for bio-medical application.

자장의 배열 및 형태가 유도결합형 플라즈마에 미치는 효과에 관한 연구 (A study on the effects of variously configured magnets on the characteristics of inductively coupled plasma)

  • 황순원;이영준;유지범;이재찬;염근영
    • 한국표면공학회지
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    • 제32권4호
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    • pp.513-520
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    • 1999
  • In this study, we investigated the effects of variously configured magnets on the characteristics of the plasmas to enhance plasma uniformity and density of an inductively coupled plasma source. As the magnets, Helmholtz type axial electromagnets and various multi-dipole magnets types around the chamber wall were used. To characterize the plasma as a function of the combination of the magnets and magnetic field strengths, ion density, electron temperature, and plasma potential were measured using an electrostatic probe along the chamber diameter for Ar plasmas. The measured maximum ion densities were $8$\times$10^{ 11}$$cm^{-3}$ with 600W inductive power and at 5mTorr of operational pressure and the uniformity of ion density was less than 5.9% at 2mTorr of operational pressure. The combination of an optimized multi-dipole magnet type and an axial electromagnet showed the lowest electron temperature (3eV) and plasma potential ($34V{p}$ )

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산소 플라즈마 처리에 의한 반도전성 실리콘 고무 표면의 특성변화 (A Study of the Changes of Surface Properties on Semiconductive-Insulating of Silicone Rubber by Oxygen Plasma Treatment)

  • 이기택;황선묵;홍주일;허창수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집
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    • pp.25-28
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    • 2005
  • This paper was investigated the changes of surface properties of high-temperature-vulcanized(HTV) semiconductive silicone rubber due to oxygen plasma discharge. The modifications produced on the silicone surface by oxygen plasma were accessed using x-ray photoelectron spectroscopy(XPS), contact angle and Scanning Electron Microscope(SEM). The results of the chemical analysis showed that C-H bonds were broken due to plasma discharge and Silica-like bonds (SiOx. x=3~4) increased. It is thought that the above changes lead to the increase of surface energy of high-temperature-vulcanized(HTV) semiconductive silicone rubber. The micromorphology of surface and hydrophobicity due to plasma discharge based on our results were discussed.

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저온플라즈마 처리가 발포체의 특성에 미치는 영향 (The Effect of Low Temperature Plasma on the Properties of Foam)

  • 박차철;김호정
    • 한국염색가공학회지
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    • 제17권6호
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    • pp.36-41
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    • 2005
  • The effects of low temperature plasma treatment on the properties of three types of foams, polyurethane(PU), injection phylon(IP), and phylon(PH) that used for footwear mid-sole were examined. The change of surface properties of foams were characterized by electron scanning microscope, contact angle measurement, and universal testing machine. Adhesion was tested by T-peel tests of plasma treated foams/polyurethane adhesive joints. The contact angle of three types of foams were decreased dramatically with the plasma treatment time, specifically noticeable in the case of phylon(Ph). It has shown the relationship with the contact angle of phylon(PH) and the distance between electrode and samples. The peel strength of foams were increased with the increase of plasma treatment time.

MICP(Multi-pole Inductively Coupled Plasma)를 이용한 deep contact etch 특성 연구

  • 김종천;구병희;설여송
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2003년도 춘계학술대회 발표 논문집
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    • pp.12-17
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    • 2003
  • 본 연구에서는 MICP Etching system 을 이용한 Via contact 및 Deep contact hole etch process 특성을 연구하였다. Langmuir probe 를 이용한 MICP source 의 Plasma density & electron temperature 측정하였고 탄소와 플로우르를 포함하는 혼합 Plasma 를 형성하여 RF frequency, wall temperature, chamber gap, gas chemistry 등의 변화에 따른 식각 특성을 조사하였다. Plasma density 는 1000w 에서 $10^{11}$/$cm^3$ 이상의 high density plasma와 uniform plasma 형성을 확인하였고 $CH_{2}F_{2}$와 CO의 적절한 혼합비를 이용하여 Oxide to PR 선택비가 10 이상인 고선택비 조건을 확보하였다. 고선택비 형성에 따라 Polymer 형성이 많이 되었고 이를 개선하기 위하여 반응 챔버의 온도 조절을 통하여 Polymer 증착 방지에 효과적인 것을 확인하였다. MICP source를 이용하여 탄소와 플로우르의 혼합 가스와 식각 챔버의 온도 조절에 의한 선택비 증가를 확보하여 High Aspect Ratio Contact Hole Etch 가능성을 확보하였다.

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CORONAL TEMPERATURE AS AN AGE INDICATOR

  • Sung, Hwan-Kyung;Bessell, M.S.;Sana, Hugues
    • 천문학회지
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    • 제41권1호
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    • pp.1-6
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    • 2008
  • The X-ray spectra of late type stars can generally be well fitted by a two temperature component model of the corona. We find that the temperatures of both components are strong functions of stellar age, although the temperature of the hotter plasma in the corona shows a larger scatter and is probably affected by the activity of stars, such as flares. We confirm the power-law decay of the temperature of the hot plasma, but the temperature of the cool plasma component decays linearly with log(age).

Excitation Temperature and Electron Number Density Measured for End-On-View Indectively Coupled Plasma Discharge

  • 남상호;김영조
    • Bulletin of the Korean Chemical Society
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    • 제22권8호
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    • pp.827-832
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    • 2001
  • The excitation temperature and electron number density have been measured for end-on-view ICP discharge. In this work, end-on-view ICP-AES equipped with the newly developed “optical plasma interface (OPI)” was used to eliminate or remove the neg ative effects caused by end-on-plasma source. The axial excitation temperature was measured using analyte (Fe I) emission line data obtained with end-on-view ICP-AES. The axial electron number density was calculated by Saha-Eggert ionization equilibrium theory. In the present study, the effects of forward power, nebulizer gas flow rate and the presence of Na on the excitation temperature and electron number density have been investigated. For sample introduction, two kinds of nebulizers (pneumatic and ultrasonic nebulizer) were utilized.