• Title/Summary/Keyword: plasma stability

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Effects of Lysozyme, Clupeine, Sucrose, and Sodium Chloride on the Foaming Properties of Egg Albumen and Powdered Beef Plasma (Lysozyme, Clupeine, Sucrose 및 Sodium Chloride가 난백 및 분말 우혈장의 거품성에 미치는 영향)

  • 양승택;최정민
    • Journal of the Korean Society of Food Science and Nutrition
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    • v.24 no.1
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    • pp.82-91
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    • 1995
  • This study was designed to elucidate the effects of lysozyme, clupeine, sucrose, and sodium chloride on the foaming properties of egg albumen and podered beef plasma. Surface tensions of egg albumen(5%, w/w) and powdered beef plasma(5%, w/w) adding to lysozyme, clupeine, sucrose, and sodium chloride were 46.8$\pm$0.379~52.4$\pm$ 0.404dyne/cm(control, 51.5$\pm$0.416dyne/cm) and 54.6$\pm$0.231~60.7$\pm$0.467dyne/cm(control, 53.9$\pm$0.153dyne/cm), respectively. Turbidities of the solutions were 77.0$\pm$0.058~97.9$\pm$ 0.058(control, 91.2$\pm$0.153) and 90.3$\pm$0.058~98.5$\pm$0.115 (control, 82.7$\pm$0.100), respectively. Surface hydrophobicities of the solutions were 524~811(control, 485) and 5102~ 7128(control, 4665), respectively. The solution with high hydrophobicity revealed good foaming properties. Analysis of egg albumen and powdered beef plasma foam by electrophoresis showed that lysozyme was retained for a long time in foam. The optimal concentraitons of lysozyme and clupeine for foaming properties were 0.5% and 0.3% in egg albumen(5%, w/w) and 0.5% and 0.5% in powdered beef plasma(5%, w/w), respectively. In case of egg albumen, sodium chloride dominantly enhanced the action of clupeine. The addition of 0.3% clupeine with sodium chloride(2.0M) to egg albumen(5%, w/w) increased overrun and foam stability by 119.5% and 70.9%, respectively. The addition of 0.5% clupeine to powdered beef plasma(5%, w/w) also increased overrun and foam stability by 43.7% and 127.3%, respectively.

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On Stability of the Pulsed Plasma Thruster for STSAT-2 based on the Lyapunov Function (리아프노프 함수에 기초한 과학기술위성 2호 펄스형 플라즈마 전기추력기의 동작 안정성 연구)

  • Sin, Gu-Hwan;Nam, Myeong-Yong;Gang, Gyeong-In;Im, Jong-Tae;Cha, Won-Ho
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.34 no.1
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    • pp.95-102
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    • 2006
  • The PPT being currently developed for the flight model represents a significant leap in techniques and technology compared to the previous flight ones. The electrical energy to be charged in the pulsed plasma thruster (PPT) is a very important aspect to provide an uniform impulse bit ,, and a specific impulse ,, for satellite attitude control. In this paper, we propose a nonlinear control technique and a stability analysis based on the Lyapunov function for the pulsed plasma thruster. Specifically, the proposed control law guarantees to charge and discharge the electrical energy generated from the power processing unit (PPU) within the specified time.

Development of Internal linear Inductively Coupled Plasma Sources for Large Area Flat Penal Display Processing

  • Lim, Jong-Hyeuk;Park, Jung-Kyun;Kim, Kyong-Nam;Yeom, Geun-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.933-936
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    • 2007
  • An inductively coupled plasma source with internaltype linear inductive antennas named as "multiple Utype antenna" was developed for the substrate size of $2,300mm\;{\times}\;2,000mm$. High density plasmas on the order of $1.18\;{\times}\;10^{11}\;cm^{-3}$ could be obtained and the RF power of 8kW with good plasma stability.

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Hydrophilic Modification of Polypropylene Hollow Fiber Membrane by Dip Coating, UV Irradiation and Plasma Treatment

  • Kim Hyun-Il;Kim Jin Ho;Kim Sung Soo
    • Korean Membrane Journal
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    • v.7 no.1
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    • pp.19-27
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    • 2005
  • PP hollow fiber membrane was hydrophilized by EVOH dip coating followed by low temperature plasma treatment and UV irradiation. EVOH coating attained high water flux without any prewetting but its stability did not guaranteed at high water permeation rate. At high water permeation rate, water flux declined gradually due to swelling and delamination of the EVOH coating layer causing pore blocking effect. However, plasma treatment reduces the swelling, which suppress delamination of the EVOH coating layer from PP support result in relieving the flux decline. Also, UV irradiation helped the crosslinking of the EVOH coating layer to enhance the performance at low water permeation rate. FT-IR and ESCA analyses reveal that EVOH dip coating performed homogeneously through not only membrane surface but also matrix. Thermogram of EVOH film modified plasma treatment and W irradiation show that crosslinking density of EVOH layer increased. Chemical modification by plasma treatment and UV irradiation stabilized the hydrophilic coating layer to increase the critical flux of the submerged membrane.

Characteristics of linearly Extended Inductively Coupled Plasmas with Magnetic Fields

  • Lee, Young-Joon;Kim, Kyung-Nam;Song, Byoung-Kwan;Yeom, Geun-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.846-848
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    • 2002
  • A large-area (830mm ${\times}$ 1,020mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. By employing the magnetic fields perpendicular to the six straight antenna currents using permanent magnets, improved plasma characteristics such as increase of the ion density and decrease of both electron temperature and plasma potential could be achieved in addition to the stability of the plasma possibly due to the reduction of the electron loss. However, the application of the magnetic field decreased the plasma uniformity slightly even though the uniformity within 10% could be maintained in the 800mm processing area.

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Plasma Technology of Coal Gasification

  • Karpenko, E.I.;Messerle, V.E.;Lockwood, F.;Ustimenko, A.
    • Transactions on Electrical and Electronic Materials
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    • v.2 no.3
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    • pp.7-11
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    • 2001
  • Utility boiler operators seeking to gain the greatest economic advantage from their units are faced with three challenges, namely the obligatory light-up fuel costs, the additional expense of supplementary fuel firing should they wish to use a cheaper fuel that may be beyond the original burner manufacturer’s stability and combustion performance assurances and the immediate environmental impact of both. The novel use of plasma arc technology can provide a solution to these challenges. This paper introduces the work being undertaken through a joint collaboration between the EU, Kazahkstan and Russia in order to develop a tried and tested engineering methodology and a mathematical based application and sensitivity analysis approach for the design and optimisation stage of these plasma devices that, as a consequence, their assist in their universal introduction.

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Effects of Hydrogen Plasma Treatment of the Underlying TaSiN Film Surface on the Copper Nucleation in Copper MOCVD

  • Park, Hyun-Ah;Lim, Jong-Min;Lee, Chong-Mu
    • Journal of the Korean Ceramic Society
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    • v.41 no.6
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    • pp.435-438
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    • 2004
  • MOCVD is one of the major deposition techniques for Cu thin films and Ta-Si-N is one of promising barrier metal candidates for Cu with high thermal stability. Effects of hydrogen plasma pretreatment of the underlying Ta-Si-N film surface on the Cu nucleation in Cu MOCVD were investigated using scanning electron microscopy, X-ray photoelectron spectroscopy and Auger electron emission spectrometry analyses. Cu nucleation in MOCVD is enhanced as the rf-power and the plasma exposure time are increased in the hydrogen plasma pretreatment. The optimal plasma treatment process condition is the rf-power of 40 Wand the plasma exposure time of 2 min. The hydrogen gas flow rate in the hydrogen plasma pretreatment process does not affect Cu nucleation much. The mechanism through which Cu nucleation is enhanced by the hydrogen plasma pretreatment of the Ta-Si-N film surface is that the nitrogen and oxygen atoms at the Ta-Si-N film surface are effectively removed by the plasma treatment. Consequently the chemical composition was changed from Ta-Si-N(O) into Ta-Si at the Ta-Si-N film surface, which is favorable for Cu nucleation.

Decomposition of HFCs using Steam Plasma (스팀 플라즈마를 이용한 HFCs 분해특성)

  • Kim, Kwan-Tae;Kang, Hee Seok;Lee, Dae Hoon;Lee, Sung Jin
    • Journal of Korean Society for Atmospheric Environment
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    • v.29 no.1
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    • pp.27-37
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    • 2013
  • CFCs (Chlorofluorocarbons) and HCFCs (Hydrochlorofluorocarbons) that are chemically stable were proven to be a greenhouse gases that can destroy ozone layer. On the other hand, HFCs (Hydrofluorocarbons) was developed as an alternative refrigerant for them, but HFCs still have a relatively higher radiative forcing, resulting in a large Global Warming Potential (GWP) of 1,300. Current regulations prohibit production and use of these chemicals. In addition, obligatory removal of existing material is in progress. Methods for the decomposition of these material can be listed as thermal cracking, catalytic decomposition and plasma process. This study reports the development of low cost and high efficiency plasma scrubber. Stability of steam plasma generation and effect of plasma parameters such as frequency of power supply and reactor geometry have been investigated in the course of the development. Method for effective removal of by-product also has been investigated. In this study, elongated rotating arc was proven to be efficient in decomposition of HFCs above 99% and to be able to generate stable steam plasma with steam contents of about 20%.

Development of an advanced atmospheric pressure plasma source with high spatial uniformity and selectiveness for surface treatment

  • Im, Yu-Bong;Choe, Won-Ho;Lee, Seung-Hun;Han, U-Yong;Lee, Jong-Hyeon;Lee, Sang-Gyun;Ha, Jeong-Min;Kim, Jong-Hun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.176-177
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    • 2016
  • In the last few decades, attention toward atmospheric pressure plasma (APP) has been greatly increased due to the numerous advantages of those applications, such as non-necessity of high vacuum facility, easy setup and operation, and low temperature operation. The practical applications of APP can be found in a wide spectrum of fields from the functionalization of material surfaces to sterilization of medical devices. In the secondary battery industry, separator film has been typically treated by APP to enhance adhesion strength between adjacent films. In this process, the plasma is required to have high stability and uniformity for better performance of the battery. Dielectric barrier discharge (DBD) was usually adopted to limit overcurrent in the plasma, and we developed the pre-discharge technology to overcome the drawbacks of streamer discharge in the conventional DBD source which makes it possible to produce a super-stable plasma at atmospheric pressure. Simulations for the fluid flow and electric field were parametrically performed to find the optimized design for the linear jet plasma source. The developed plasma source (Plasmapp LJPS-200) exhibits spatial non-uniformity of less than 3%, and the adhesion strength between the separator and electrode films was observed to increase 17% by the plasma treatment.

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23' LCD TV by using ALT plasma beam alignment technology

  • Lee, C.Y.;Tang, H.C.;Chen, C.W.;Shih, Y.J.;Liu, C.H.;Lin, C.H.;Yang, K.H.;Lin, S.H.;Chang, H.C.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.776-779
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    • 2006
  • The alignment of liquid crystal (LC) is one of the key issues of liquid crystal display (LCD) technologies. In this study, we aligned polyimide (as the LC alignment layer) by ALT plasma beam and to realize the stability and characteristics of this technology. The characteristics such as anchoring energy, pre-tilt angle, voltage holding ratio(VHR) and residual direct current(Rdc) were discussed. Besides, we applied it to the in plane switch (IPS) mode 23" WXGA real panel, the performance parameters and electrical properties were measured and compared with those of rubbing alignment. From the result, we demonstrated a successful LC alignment treatment process in real panel by ALT plasma beam.

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