• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.159-159
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• 2013

In this studying, we investigated the basic properties of N-doped plasma polymer. The N-doped plasma polymer thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Various carbon-source were used as organic precursor with hydrogen gas as the precursor bubbler gas. Additionally, ammonia gas [NH3] was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using cyclic voltammetry, ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, Raman spectroscopy, FE-SEM, and water contact angle measurement. Electronic property of N-doped plasma thin film is changed as flow rate of the NH3 gas.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1307-1310
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• 1995

During measurement of atomic hydrogen in a silane plasma using two-photon excited laser induced fluoresecence, laser-induced dissociation of the gas was observed. This was investigated untill conditions for the input laser fluence were determined where the effect was negligible. A measurement of the atomic hydrogen distribution was then performed within the limits of these conditions. Absolute density determinations showed atomic hydrogen densities of around $3{\times}10^{17}m^{-3}$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.284-287
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• 2000

We analyzed the 3-dimensional discharge characteristic in plasma display panel(PDP) cell using the 3-dimensional emission distribution of 828nm light measured by scanned point detecting method(SPDM). The emitted light distributions on the ITO electrode show the stronger light intensity near to the electrode gap than outside. Also, 828nm light is widely detected outside of the bus electrode. We consider that measurement using new SPDM is effective to analyze the discharge physics and propose the new panel structures.

• Journal of Welding and Joining
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• v.14 no.4
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• pp.43-52
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• 1996

The plasma sprayed Cr$_{2}$C$_{2}$-NiCr coatings are widely used as wear-resistant and corrosion-resistant materials. The mechanical properties of the plasma sprayed Cr$_{2}$C$_{2}$-NiCr coatings were examined in this study. The distribution of the residual stress with the coating thickness was also examined by X-ray diffraction method. The pore in the coatings could be classified into two types ; one is the intrinsic pore originated from the spraying powder, the other is the extrinsic pore formed during spraying. During the tensile adhesion test, the fracture occurred at the interface of top coat and substrate or top coat and bond coat depending on the existence of bond coat. It was found that the compressive residual stress near the interface decreased with the increase of the top coat thickness. The tensile adhesion strength of the coating without bond coat was higher than that with bond coat, because the coating with bond coat has higher horizontal crack density near the interface between bond coat and top coat.

• The KSFM Journal of Fluid Machinery
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• v.15 no.3
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• pp.46-50
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• 2012

Plasma actuator makes parallel flow on the wall surface by the interaction between plasma and neutral air particles. Dielectric barrier discharge (DBD) plasma actuator is widely studied as one type of plasma actuators, which consists of one electrode exposed to the environmental gas and the other encapsulated by a dielectric material. This paper is experimentally focused on the performance of DBD plasma actuator mounted on a flat plate, which depends on kinds of the electrode materials, their thicknesses and the supplied voltage including its frequency. We measured the velocity magnitudes of the induced flow by a stagnation probe as a performance parameter of the plasma actuators. The velocity profiles of the flow induced by the plasma actuators are similar in all measurement cases. The magnitude of the induced velocity is strongly influenced by the thickness of the electrodes and the frequency of the input voltage. The performance of DBD plasma actuators is related to the electric properties of the electrode materials such as the ionization energy and the electrical resistivity.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.12
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• pp.113-118
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• 2010

For a present study, woven type carbon fibers were surface-modified by oxygen plasma to improve adhesive strength between carbon fibers and epoxy. The change of hydrophilic properties by the plasma modification was investigated through the contact angle measurement and the calculation of surface energy of carbon fiber due to the oxygen plasma modification. FESEM and XPS analyses were performed to study the chemical and physical changes on the surface of carbon fibers due to the oxygen plasma modification. Pin-on-disk wear tests were conducted under dry condition using unmodified and plasma-modified carbon/epoxy composites to investigate the effect of plasma modification on the wear behavior of woven type carbon/epoxy composites. The results showed that the friction coefficient and the wear rate of plasma-modified carbon/epoxy composites were lower than those of unmodified carbon/epoxy composites, respectively. XPS analysis showed that new functional group of a carbonyl type was created on the carbon fibers by the $O_2$ plasma treatment, which enhanced adhesive strength between carbon fibers and epoxy, leading to improve wear properties

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.57 no.2
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• pp.79-83
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• 2008

In this paper, we introduced a LIF measurement method and summarized the theoretical side. When an altered wavelength of laser and electric power, lamp applied electric power, we measured the relative density of the metastable state in mercury after observing a laser induced fluorescence signal of 404.8nm and 546.2nm, and confirmed the horizontal distribution of plasma density in the discharge lamp. Due to this generation, the extinction of atoms in a metastable state occurred through collision, ionization, and excitation between plasma particles. The density and distribution of the metastable state depended on the energy and density of plasma particles, intensely. This highlights the importance of measuring density distribution in plasma electric discharge mechanism study. The results confirmed the resonance phenomenon regarding the energy level of atoms along a wavelength. change, and also confirmed that the largest fluorescent signal in 436nm, and that the density of atoms in 546.2nm ($6^3S_1{\to}6^3P_2$) were larger than 404.8nm ($6^3S_1{\to}6^3P_2$). According to the increase of lamp applied electric power, plasma density increased, too. When increased with laser electric power, the LIF signal reached a saturation state in more than 2.6mJ. When partial plasma density distribution along a horizontal axis was measured using the laser induced fluorescence method, the density decreased by recombination away from the center.

• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1408-1409
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• 2006

In this paper, poly methyl methacrylate thin films were deposited on a ITO glass substrate using a plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized poly methyl methacrylate (ppMMA) thin film properties, inductively coupled (ICP) and capacitively coupled plasma (CCP) were used to generate the plasma and the plasma parameters were varied. Molecular structures of the ppMMAs were investigated using a Fourier Transform Infrared (FT-IR) spectroscopy. Dielectric constants of the ppMMA thin films were investigated using a impedance analyzer (HP4192A, LF Impedance Analyzer). Current-Voltage (I-V) characteristics of the ppMMA thin films were investigated using a source measurement unit (SMU: Keithley 2400). Relationship between the plasma coupling technique/process parameter and ppMMA thin films properties were investigated.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1347-1348
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• 2007

In this paper, ITO gate electrode surface was modified using $O_2$ plasma and organic gate insulating layers were deposited on the ITO surface using plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized methyl methacrylate (ppMMA) thin film properties, inductively coupled (ICP) and capacitively coupled plasma (CCP) were used to generate the plasma and the plasma parameters were varied. The ppMMAs were investigated using atomic force microscopy (AFM) and a Fourier Transform Infrared (FT-IR) spectroscopy. Dielectric constants of the ppMMA thin films were investigated using a impedance analyzer (HP4192A, LF Impedance Analyzer). Current-Voltage (I-V) characteristics of the organic thin film transistors (OTFTs) were investigated using a source measurement unit (SMU: Keithley 2612). Proposed method can be applied to dry-process to fabricate OTFTs during overall fabricating steps.

• Journal of the Korean institute of surface engineering
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• v.34 no.5
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• pp.475-480
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• 2001

Diffusion of Cu into the low-k para-xylene based plasma polymer (pXPP) thin films deposited by plasma-enhanced chemical vapor deposition using the para-xylene precursor was comparatively measured using various methods. Cu layer was deposited on the surfaces of pXPPs treated by $N_2$ plasma generated in a magnetically enhanced inductively coupled plasma reactor. Diffusion characteristics of Cu into pXPPs were measured using Rutherford backscattering spectroscopy (RBS), secondary ion mass spectroscopy (SIMS), cross-sectional transmission electron microscopy (XTEM), and current-voltage (I-V) measurements for the vacuum-annealed Cu/pXPPs for 1 hour at $450^{\circ}C$ and were compared. The results showed a correlation between the I-V measurement and SIMS data are correlated and have a sensitivity enough to evaluate the dielectric properties but the RBS or XTEM measurements are not sufficient to conclude the electrical properties of low-k dielectrics with Cu in the film bulk. The additional results indicate that the pXPP layers are quite resistant to Cu diffusion at the annealing temperature of $450^{\circ}C$ compared to the other previously reported organic low-k materials.