• 제목/요약/키워드: plasma ion

검색결과 1,286건 처리시간 0.028초

Double layer $TiB_2$-TiN Films

  • LizhiChen;YunjieYang;ZhihongZheng;XiWang;XianghuaiLiu;Han, J.G.;Yoon, J.S.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1995년도 제9회 학술발표회 논문개요집
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    • pp.141-141
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    • 1995
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Helical Resonator 배열을 통한 대면적 고밀도 Plasma Source (Preparation of Large Area Plasma Source by Helical Resonator Arrays)

  • 손민영;김진우;박세근;오범환
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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    • pp.282-285
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    • 2000
  • Four helical resonators are distributed in a 2 ${\times}$ 2 array by modifying upper part of the conventional reactive ion etching(RIE) type LCD etcher in order to prepare a large area plasma source. Since the resonance condition of the RF signal to the helical antenna, one RF power supply is used for delivering the power efficiently to all four helical resonators without an impedance matching network Previous work of 2 ${\times}$ 2array inductively coupled plasma(ICP)requires one matching circuit to each ICP antenna for more efficient power deliverly Distributions of ion density and electron temperature are measured in terms of chamber pressure, gas flow rate and RF power . By adjusting the power distribution among the four helical resonator units, argon plasma density of higher than 10$\^$17/㎥ with the uniformity of better than 7% can be obtained in the 620 ${\times}$ 620$\textrm{mm}^2$ chamber.

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혈중 목표 농도 자동 조절기(TCI) 개발 PART2: 시스템 구현 및 평가 (Development of Target-Controlled Infusion system in Plasma Concentration. PART2: Design and Evaluation)

  • 안재목
    • 대한의용생체공학회:의공학회지
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    • 제24권1호
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    • pp.45-53
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    • 2003
  • Based on the 4-compartmental pharmacokinetic model developed in PART1, target-controlled infusion(TCI) pump system was designed and evaluated. The TCI system consists of digital board including microcontroller and digital signal process(DSP), analog board, motor-driven actuator, user friendly interface, power management and controller. It provides two modes according to the drugs: plasma target concentration and effect target concentration. Anaesthetist controls the depth of anaesthesia for patients by adjusting the required concentration to maintain both plasma and effect site in drug concentration. The data estimated in DSP include infusion rate, initial load dose, and rotation number of motor encoder. During TCI operation, plasma concentration. effect site concentration, awaken concentration, context-sensitive decrement time and system error information are displayed in real time. Li-ion battery guarantees above 2 hours without power line failure. For high reliability of the system, two microprocessors were used to perform independent functions for both pharmacokinetic algorithm and motor control strategy.

MeV 이온주입에 의한 매입층을 갖는 BILLI retrograde well과 latchup 특성 (Latchup characteristics of BL/BILLI retrograde twin well CMOS with MeV ion implanted Bored Layer)

  • 김종관;김인수;김영호;신상우;성영권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 하계학술대회 논문집 C
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    • pp.1270-1273
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    • 1997
  • We have investigated the latchup characteristics of BL/BILLI retrograde twin well CMOS that has the high energy ion implanted buried layer to intend for more improvement of latchup compare to conventional retrograde well and BILLI structures. We explored the dependence of various latchup characteristics such as n+ trigger latchup and p+ trigger latchup on the buried layer implant doses. We show various DC latchup characteristics that allow us to evaluate each technology and suggest guidelines for the reduction of latchup susceptibility.

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펄스직류방전과 유도결합방전의 복합에 의한 SCM440강의 이온질화 (Ion Nitriding Using Pulsed D.C Glow Discharge Combined with Inductively Coupled Plasma)

  • 김윤기
    • 한국표면공학회지
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    • 제43권2호
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    • pp.91-96
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    • 2010
  • SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.

3D Plasma simulation을 이용한 Cylindrical Rotating Magnetron Sputtering Cathode 개발

  • 천용환;오지영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.179.1-179.1
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    • 2013
  • Cylindrical Rotating Magnetron Sputtering Cathode (이하 Rotary Cathode)는 기존에 사용 되던 rectangular type 보다 Target 사용 효율이 높다는 큰 이점을 가지고 있다. 높은 Target 사용 효율은 비용 절감 효과와 직접적으로 관련 된다. 이번 연구는 3D Plasma simulation(PIC-MCC)을 통한 Target 사용 효율 80% 이상의 Rotary Cathode 개발을 목적으로 한다. Plasma simulation에 External Magnetic fields를 접목하여 Electron의 이동 궤적을 제어하였고, 생성된 Ion (Ar+)의 밀도 및 속도로 Plasma의 안정성과 Erosion 계산 구간을 선정 하였다. Target Erosion Profile은 Sputtering yield Data와 Target에 충돌한 Ion 정보를 사용하여 산출 하였으며, Sputtered Particles의 Deposition Profile은 계산된 Target Erosion Profile과 The cosine law of emission을 이용하여 계산 하였다. 실험 조건은 Plasma simulation의 초기조건 바탕으로 하여 2G size의 ITO Target을 대상으로 실험 하였다. 비 Erosion 영역 최소화하기 위해 Magnet Length를 변경하여 제작 적용 하였다. Simulation 계산 시간의 제약으로 인하여 simulation에서 생성된 최대 이온 밀도는 일반적으로 알려진 값 보다 적게 계산 되었지만, Simulation으로 예측한 Erosion Profile 및 Deposition Profile은 실험 값과 유사한 형태를 나타났으며, 실험 결과는 Target 사용 효율 80%이상의 결과를 보였다.

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Roll-to-Roll Barrier Coatings on PET Film by Using a Closed Drift Magnetron Plasma Enhanced Chemical Vapor Deposition

  • Lee, Seunghun;Kim, Jong-Kuk;Kim, Do-Geun
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 춘계학술발표회 논문집
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    • pp.124-125
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    • 2012
  • Korea institute of materials science (KIMS) use a linear deposition source called as a closed drift linear plasma source (CDLPS) as well as dual magnetron sputtering (DMS) to deposit SiOxCyHz films in $HMDSO/O_2$ plasma. The CDLPS generates linear plasma using closed drifting electrons and can reduce device degradations due to energetic ion bombardments on organic devices such as organic photovoltaic and organic light emission diode by controlling an ion energy. The deposited films are investigated by Fourier transform infrared (FT-IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Optical emission spectroscopy (OES) is used to measure relative radical populations of dissociation and recombination products such as H, CH, and CO in plasma. And SiOx film is applied to a barrier film on organic photovoltaic devices.

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Research Status of Sail Propulsion using the Solar Wind

  • Funaki, Ikkoh;Yamakawa, Hiroshi
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2008년 영문 학술대회
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    • pp.583-588
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    • 2008
  • A spacecraft propulsion system utilizing the energy of the solar wind was reviewed. The first plasma sail concept was proposed by Prof. Winglee in 2000, and that was called M2P2(mini-magnetospheric plasmapropulsion). However, the first M2P2 design adopting a small(20-cm-diamter) coil and a small helicon plasma source design was criticized by Dr. Khazanov in 2003. He insisted that: 1) MHD is not an appropriate approximation to describe the M2P2 design by Winglee, and with ion kinetic simulation, it was shown that the M2P2 design could provide only negligible thrust; 2) considerably larger sails(than that Winglee proposed) would be required to tap the energy of the solar wind. We started our plasma ssail study in 2003, and it is shown that moderately sized magnetic sails can produce sub-Newton-class thrust in the ion inertial scale(${\sim}70$ km). Currently, we are continuing our efforts to make a feasibly sized plasma sail(Magnetoplasma sail) by optimizing the magnetic field inflation process Winglee proposed.

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Ce ion이 첨가된 황산 아노다이징의 온도 변화에 따른 내플라즈마 특성 (Plasma Corrosion and Breakdown Voltage Behavior of Ce Ion Added Sulfuric Acid Anodizing According to Electrolyte Temperature)

  • 소종호;윤주영;신재수
    • 반도체디스플레이기술학회지
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    • 제20권1호
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    • pp.37-41
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    • 2021
  • We report on the formation of anodic aluminum oxide (AAO) film using sulfuric acid containing cerium salt. When the temperature of the sulfuric acid containing cerium salt changes from 5 ℃ to 20 ℃, the current density and the thickness growth rate increase. The surface morphology of the AAO film change according to the temperature of the electrolytes. And that affected the breakdown voltage and the plasma etch rate. The breakdown voltage per unit thickness was the highest at 15 ℃, and the plasma etch rate was the lowest at 10 ℃ at 2.80 ㎛/h.

The Effect of Ion-Beam Treatment on TiO2 Coatings Deposited on Polycarbonate Substrates

  • Park, Jung-Min;Lee, Jai-Yeoul;Lee, Hee-Young;Park, Jae-Bum
    • Transactions on Electrical and Electronic Materials
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    • 제11권6호
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    • pp.266-270
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    • 2010
  • The effect of an Ar plasma treatment on polycarbonate substrates was investigated using $TiO_2$ coatings produced by reactive ion-beam assisted sputtering. The typical pressure used during sputtering was about $10^{-4}$ Torr. After the Ar plasma treatment, the contact angle of a water droplet was reduced from $88^{\circ}$ to $52^{\circ}$ and then further decreased to $12^{\circ}$ with the addition of oxygen into the chamber. The surface of the polycarbonate substrate hanged from hydrophobic to hydrophilic with these treatments and revealed its changing nano-scale roughness. The $TiO_2$ films on the treated surface showed various colors and periodic ordering dependant on the film thickness due to optical interference.