• Title/Summary/Keyword: plasma flow

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Stress in Olive Flounder (Paralichthys olivaceus) and Fat Cod (Hexagrammos otakii) by the Sudden Drop and Rise of Water Temperature (수온의 급하강과 급상승이 넙치 (Paralichthys olivaceus)와 쥐노래미(Hexagrammos otakii)에 미치는 스트레스)

  • CHANG Young Jin;HUR Jun Wook;LIM Han Kyu;LEE Jong Kwan
    • Korean Journal of Fisheries and Aquatic Sciences
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    • v.34 no.2
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    • pp.91-97
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    • 2001
  • The effects of sudden changes of water temperature (WT) on the stress response and physiological change of the cultured olive flounder in large (FL) and small (FS) size, and fat cod (FC) were examined by manipulating WT (2 types) in a flow through seawater culture system with 6 tanks (water vol. 270 L/tank). The WT was decreased from $20^{\circ}C$ to $10^{\circ}C$ within 5 hours ($2^{\circ}C/hour$) and maintained at $10^{\circ}C$ for 21 hours (Exp. I), and it was raised from $20^{\circ}C$ to $30^{\circ}C$ within 5 hours and maintained at $30^{\circ}C$ for 21 hours (Exp.II). In Exp. I, the levels of blood hematocrit at 5 hours ($10^{\circ}C$) in FS was significantly decreased from $13.5\pm2.0\%\;to\;11.3\pm2.3\%$, but FC at 2.5 hours ($15^{\circ}C$) ($19.0\pm0.3\%\;to\;23.2\pm3.8\%$) was increased, The blood hemoglobin concentration of all fish in Exp, II was significantly increased until 8 hours after raising WT from $20^{\circ}C$ to $30^{\circ}C$. In Exp. I and II , the levels of plasma cortisol in FL, FS and FC was changed from $5.2\pm8.5ng/mL,\;4.4\pm4.5ng/mL\;and\;2.7\pm0.4ng/mL$, respectively, before sudden drop and rise of WT. The levels of plasma cortisol of in FL ($164.0\pm53.1ng/mL$) and FC ($207.9\pm25.4ng/mL$) were significantly increased by the lowering WT sharply during whole experiment. The FL ($12.6\pm2.0ng/mL$) and FS ($4.0\pm3.9ng/mL$) showed no significant differences in cortisol level according to sudden rise of WT (5 hours). But it in FC ($44.7\pm18.2ng/mL$) was increased. In Exp. I, the plasma glucose levels of all fish groups were decreased after 5 hours ($10^{\circ}C$), The plasma lactic acid concentration of FL and FS showed no significant differences until 5 hours after raising WT from $20^{\circ}C$ to $30^{\circ}C$, But it in FC was significantly increased with WT raise.

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PREPARATION OF AMORPHOUS CARBON NITRIDE FILMS AND DLC FILMS BY SHIELDED ARC ION PLATING AND THEIR TRIBOLOGICAL PROPERTIES

  • Takai, Osamu
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2000.11a
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    • pp.3-4
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    • 2000
  • Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.

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Effect of 4 Weeks' Walking Exercise with Blood Flow Restriction on Inflammatory index, Isokinetic Muscle Function, and Thigh Circumference in Obese Women (4주간의 혈류를 제한한 걷기운동이 비만여성의 혈중 염증지표와 등속성근기능, 대퇴둘레에 미치는 영향)

  • Park, Man-Soo;Zang, Seok-Am;Lee, Jang-Kyu
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.18 no.10
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    • pp.480-489
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    • 2017
  • Blood flow restriction(BFR) exercise is defined as low intensity and short term exercise using pneumatic pressure belts at the top of limbs, which affects the physiological functions of the body. The purpose of this study was to investigate the effects of walking exercise with BFR on inflammatory index, isokinetic muscle function, and thigh circumference in obese women. Eleven obese women(> BMI $25kg/m^2$ & > body fat 30%) wore pneumatic pressure belts on both femurs and performed walking exercise twice per day, 3 days/wk for 4 weeks (walking 2 min; resting 1 min). Data analysis was carried out using paired t-test. Body weight, BMI, and body fat significantly decreased after exercise(p<.05), and right thigh circumference significantly decreased(p<.05). The concentration of plasma IL-6 significantly increased(p<.05) after exercise. TNF-${\alpha}$ level was not statistically different but tended to slightly increase. CRP slightly decreased, although it did not reach statistical significance after exercise. Muscle strength significantly increased in the $60^{\circ}/sec$ of right/left side extension, left side flexion, and $180^{\circ}/sec$ of left side extension after training(p<.05). These results suggest that 4 weeks of blood flow restriction walking exercise has positive effects on inflammatory index and isokinetic muscle function. Therefore, we consider that blood flow restriction exercise can be used for treatment of obesity, related chronic diseases, and metabolic syndrome. Further, blood flow restriction exercise for a short time has similar effects as a high intensity resistance program.

Liquid Chromatography Quadrupole Time-Of-Flight Tandem Mass Spectrometry for Selective Determination of Usnic Acid and Application in Pharmacokinetic Study

  • Fang, Minfeng;Wang, Hui;Wu, Yang;Wang, Qilin;Zhao, Xinfeng;Zheng, Xiaohui;Wang, Shixiang;Zhao, Guifang
    • Bulletin of the Korean Chemical Society
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    • v.34 no.6
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    • pp.1684-1688
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    • 2013
  • A rapid and sensitive method for determining usnic acid of Lethariella cladonioides in rat was established using high performance liquid chromatography (HPLC) quadrupole time-of-flight (QTOF) tandem mass (MS/MS). Rat plasma was pretreated by mixture of acetonitrile and chloroform to precipitate plasma proteins. Chromatographic separation was achieved on a column ($50{\times}2.1$ mm, $5{\mu}m$) with a mobile phase consisting of water (containing $5{\times}10^{-3}$ M ammonium formate, pH was adjusted to 3.0 with formic acid) and acetonitrile (20:80, v/v) at a flow rate of 0.3 mL/min. A tandem mass spectrometric detection with an electrospray ionization (ESI) interface was conducted via collision induced dissociation (CID) under negative ionization mode. The MS/MS transitions monitored were m/z 343.0448 ${\rightarrow}$ m/z 313.2017 for usnic acid and m/z 153.1024 ${\rightarrow}$ m/z 136.2136 for protocatechuic acid (internal standard). The linear range was calculated to be 2.0-160.0 ng/mL with a detection limit of 3.0 pg/mL. The inter- and intra-day accuracy and precision were within ${\pm}7.0%$. Pharmacokinetic study showed that the apartment of usnic acid in vivo confirmed to be a two compartment open model. The method was fully valid and will probably be an alternative for pharmacokinetic study of usnic acid.

Effect of Sludge Pellets on $NO_x$ REmoval in $BaTiO_3$-sludge Packed-bed Reactor ($BaTiO_3$-슬러지 Packed-bed형 반응기에서 $NO_x$제거에 미치는 슬러지의 영향)

  • 박재윤;송원섭;고희석;박상현
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.10
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    • pp.861-867
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    • 2001
  • In this paper, in order to investigate the catalytic effect of the sludge exhausted from waterworks on NO$_{x}$ removal, we measure NO removal characteristics with and without sludge pellets in BaTiO$_3$-sludge packed-bed reactor of plate-plate geometry. NO initial concentration is 50 ppm balanced with air and a gas flow rate is 5ι/min. Gas temperature is changed from 25 to 10$0^{\circ}C$ to investigate the role of sludge pellet on removing active oxygen species and NO$_2$. BaTiO$_3$pellets is filled for coronal discharge at upstream of reactor and sludge pellets is filled for catalytic effect at downstream of reactor. The volume percent of sludge pellets to BaTiO$_3$pellets is changed from 0% to 100% and AC voltage is supplied to the reactor for discharging simulated gases. In the results, when sludge pellets is put at the downstream of plasma reactor, NO removal rate is slightly increased. However, NO$_2$and $O_3$ as by-products during NO removal is significantly decreased from 51ppm without sludge pellets to 5 ppm with sludge pellets and from 50 ppm without sludge pellets to 0.004ppm with sludge pellets, respectively. Therefore, NO$_{x}$(NO+NO$_2$) removal rate is increased up to 93%. It is thought that sludge pellet maybe react with active oxygen species and NO$_2$ generated by corona discharge in surface of BaTiO$_3$pellets, the then NO$_2$O$_3$as by-products are considerably decreased. When we increase gas temperature from room temperature to 10$0^{\circ}C$, NO removal rate is decreased, while NO$_2$ concentration is independent on gas temperature. These result suggest that the removal mechanism of active oxygen species and NO$_2$in sludge pellet is not absorption, but chemical reaction. Therefore we expect that sludge pellets exhausted for waterworks could be used as catalyst for NO$_{x}$ removal with high removal rate and low by-product.oduct.

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Effect of CH4 Addition in Case of Decomposition of NOx, SOx by Discharge Plasma (방전플라스마에 의한 NOx, SOx 분해시 메탄첨가의 영향)

  • Kang, Hyun-Choon;Woo, In-Sung;Kang, An-Soo
    • Journal of the Korean Society of Safety
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    • v.15 no.2
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    • pp.70-77
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    • 2000
  • For hazardous air pollutants(HAP) such as NO, $NO_2$ and $SO_2$ decomposition efficiency, power consumption, and applied voltage were investigated by SPCP(Surface induced discharge Plasma Chemical Processing) reactor to obtain optimum process variables and maximum decomposition efficiencies. Decomposition efficiency of HAP with various electric frequencies(5~50 kHz), flow rates(100~1,000 mL/min), initial concentrations(100~1,000 ppm) and additive($CH_4$) were measured and the products were analyzed with FT-IR. Experimental results showed that for the frequency of 10 kHz, the highest decomposition efficiency of 94.3 % for NO, 84.7 % for $NO_2$ and 99 % far $SO_2$ were observed at the power consumptions of 19.8, 20 and 19W, respectively, and that decomposition efficiency decreased with increasing frequency above 20 kHz. And decomposition efficiency per unit power were 5.21 %/W for $SO_2$, 4.76 %/W for NO and 4.24 %/W for $NO_2$ and the highest decomposition efficiency was observed with $SO_2$. Decomposition efficiency was increased with increasing residence times and with decreasing initial concentration of pollutants. When the additive of $CH_4$ was used, decomposition efficiency was increased with increasing $CH_4$ content, and NO, $NO_2$ and $SO_2$ were almost completely decomposed with the efficiency of 99 %, 98 % and 99 %, respectively and therefore $CH_4$ was a good additive material. The optimum power for the maximum decomposition efficiency were 7.5 W for $SO_2$, 9.5 W for NO and 15.5 W for $NO_2$, respectively. Optimum power with the maximum decomposition efficiency were 9.5 W at 1,000 ppm of NO, 7~8 W at 100~500 ppm of NO and 15.5 W at all concentration range of $NO_2$ and 11.5 W at 1,000 ppm, 4.9 W at 500 ppm, 3.7 W at 100~300 ppm of $SO_2$ and power efficiency was best in these case.

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Study for Conductive and Non-conductive Multi-layers Depth Profiling Analysis of Radio Frequency Gas-jet Boosted Glow Discharge Spectrometry (Modified Gas-jet Boosted Radio-frequency Glow Discharge 셀의 개발 및 최적화에 관한 연구)

  • Cho, Won Bo;Borden, Stuart;Jeong, Jong Pil;Kang, Won Kyu;Kim, Kyu Whan;Kim, Hyo Jin
    • Analytical Science and Technology
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    • v.15 no.2
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    • pp.108-114
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    • 2002
  • The new system using a glow discharge atomic emission spectrometer for the direct analysis of solid samples has been developed and characterized. The system was consisted of new glow discharge cell improved previous gas-jet boosted nozzle and radio-frequency power supply. In the case of previous type glow discharge chamber, it had been fitted trace analysis of low alloy steel with low discharge power, because it was to decrease redeposition and increase sample weight loss. But it had a problem that plasma becomes unstale due to increased sample weight loss and redeposition resulting from the high discharge power. Because of being problem of previous glow discharge, it is impossible to analyze using high power. The modified gas-jet boosted glow discharge to solve this problem would improve to be less sample loss rate of modified nozzle than sample loss rate of previous nozzle on the equal discharge condition, and improve to increase stability of plasma. The effect of discharge parameters such as discharge pressure, gas flow rate and power on the sample loss rate, emission intensity has been studied to find optimum discharge conditions. The calibration curves of Fe were obtained with 3 low-alloy samples.

Performance of Beam Extractions for the KSTAR Neutral Beam Injector

  • Chang, D.H.;Jeong, S.H.;Kim, T.S.;Lee, K.W.;In, S.R.;Jin, J.T.;Chang, D.S.;Oh, B.H.;Bae, Y.S.;Kim, J.S.;Cho, W.;Park, H.T.;Park, Y.M.;Yang, H.L.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.240-240
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    • 2011
  • The first neutral beam injector (NBI-1) has been developed for the Korea Superconducting Tokamak Advanced Research (KSTAR) tokamak. A first long pulse ion source (LPIS-1) has been installed on the NBI-1 for an auxiliary heating and current drive of KSTAR core plasmas. Performance of ion and neutral beam extractions in the LPIS-1 was investigated initially on the KSTAR NBI-1 system, prior to the neutral beam injection into the main plasmas. The ion source consists of a JAEA magnetic bucket plasma generator with multi-pole cusp fields and a set of KAERI prototype-III tetrode accelerators with circular apertures. The inner volume of plasma generator and accelerator column in the LPIS-1 is approximately 123 liters. Final design requirements for the ion source were a 120 kV/ 65 A deuterium beam and a 300 s pulse length. The extraction of ion beams was initiated by the formation of arc plasmas in the LPIS-1, called as an arc-beam extraction method. A stable ion beam extraction of LPIS-1 has been achieved up to an 100 kV/42 A for a 4 s pulse length and an 80 kV/25 A for a 14 s pulse length. Optimum beam perveance of 1.21 microperv has been found at an accelerating voltage of 80 kV. Neutralization efficiency has been measured by using a water flow calorimetry (WFC) method of calorimeter and an operation of bending magnet. The full-energy species of ion beams have been detected by using the diagnostic method of optical multichannel analyzer (OMA). An arc efficiency of the LPIS was 0.6~1.1 A/kW depending on the operating conditions of arc discharge.

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Opto-Electrochemical Sensing Device Based on Long-Period Grating Coated with Boron-Doped Diamond Thin Film

  • Bogdanowicz, Robert;Sobaszek, Michał;Ficek, Mateusz;Gnyba, Marcin;Ryl, Jacek;Siuzdak, Katarzyna;Bock, Wojtek J.;Smietana, Mateusz
    • Journal of the Optical Society of Korea
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    • v.19 no.6
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    • pp.705-710
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    • 2015
  • The fabrication process of thin boron-doped nanocrystalline diamond (B-NCD) microelectrodes on fused silica single mode optical fiber cladding has been investigated. The B-NCD films were deposited on the fibers using Microwave Plasma Assisted Chemical Vapor Deposition (MW PA CVD) at glass substrate temperature of 475 ℃. We have obtained homogenous, continuous and polycrystalline surface morphology with high sp3 content in B-NCD films and mean grain size in the range of 100-250 nm. The films deposited on the glass reference samples exhibit high refractive index (n=2.05 at λ=550 nm) and low extinction coefficient. Furthermore, cyclic voltammograms (CV) were recorded to determine the electrochemical window and reaction reversibility at the B-NCD fiber-based electrode. CV measurements in aqueous media consisting of 5 mM K3[Fe(CN)6] in 0.5 M Na2SO4 demonstrated a width of the electrochemical window up to 1.03 V and relatively fast kinetics expressed by a redox peak splitting below 500 mV. Moreover, thanks to high-n B-NCD overlay, the coated fibers can be also used for enhancing the sensitivity of long-period gratings (LPGs) induced in the fiber. The LPG is capable of measuring variations in refractive index of the surrounding liquid by tracing the shift in resonance appearing in the transmitted spectrum. Possible combined CV and LPG-based measurements are discussed in this work.

Characteristics of TiN Barrier Metal Prepared by High Density Plasma CVD Method (고밀도 플라즈마 CVD 방법에 의한 TiN barrier metal 형성과 특성)

  • Choe, Chi-Gyu;Gang, Min-Seong;O, Gyeong-Suk;Lee, Yu-Seong;O, Dae-Hyeon;Hwang, Chan-Yong;Son, Jong-Won;Lee, Jeong-Yong;Kim, Geon-Ho
    • Korean Journal of Materials Research
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    • v.9 no.11
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    • pp.1129-1136
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    • 1999
  • TIN films were prepared on Si(100) substrate by ICP-CVD(inductive1y coupled plasma enhanced chemical vapor deposition) using TEMAT(tetrakis ethylmethamido titanium : Ti$[\textrm{N}\textrm{(CH)}_{3}\textrm{C}_{2}\textrm{H}_{5}]_{4}$) precursor at various deposition conditions. Phase, microstructure, and the electrical properties of TIN films were characterized by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and electrical measurements. Polycrystalline TiN films with B1 structure were grown at temperatures over $200^{\circ}C$. Preferentially oriented along TiN(111) films were obtained at temperatures over $300^{\circ}C$ with the flow rates of 10, 5, and 5 sccm for TEMAT, $\textrm{N}_{2}$ and Ar gas. The TiN/Si(100) interface was flat and no chemical reaction between TIN and $\textrm{SiO}_2$ was found. The resistivity, carrier concentration and the carrier mobility for the TiN sample prepared at $500^{\circ}C$ are 21 $\mu\Omega$cm, 9.5$\times\textrm{10}^{18}\textrm{cm}^{-3}$ and $462.6\textrm{cm}^{2}$/Vs, respectively.

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