• Title/Summary/Keyword: plasma coating

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Corrosion Behavior of $Y_2O_3$ Coating in an Electrolytic Reduction Process (전해환원공정에서 $Y_2O_2$ 코팅층의 부식거동)

  • Cho, Soo-Haeng;Hong, Sun-Seok;Kang, Dae-Seung;Jeong, Myeong-Soo;Park, Byung-Heong;Hur, Jin-Mok;Lee, Han-Soo
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.8 no.1
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    • pp.33-39
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    • 2010
  • The electrolytic reduction of a spent oxide fuel involves a liberation of the oxygen in a molten LiCl electrolyte, which results in a chemically aggressive environment that is too corrosive for typical structural materials. Accordingly, it is essential to choose the optimum material for the processing equipment that handles the high molten salt. In this study, hot corrosion studies were performed on bare as well as coated superalloy specimens after exposure to lithium molten salt at $675^{\circ}C$ for 216 h under an oxidizing atmosphere. The IN713LC superalloy specimens were sprayed with an aluminized NiCrAlY bond coat and then with an $Y_2O_3$ top coat. The bare superalloy reveals an obvious weight loss due to spalling of the scale by the rapid scale growth and thermal stress. The chemical and thermal stability of the top coat has been found to be beneficial for increasing to the corrosion resistance of the structural materials for handling high temperature lithium molten salts.

A STUDY ON THE RESISTANCE OF WEAR AND CYTOTOXICITY OF THE TITANIUM SURFACE AFTER FILM DEPOSITIONS (박막증착시 티타늄 표면의 마손저항도와 세포독성에 관한 연구)

  • Kim Hyung-Woo;Kim Chang-Whe;Kim Yung-Soo
    • The Journal of Korean Academy of Prosthodontics
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    • v.39 no.1
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    • pp.84-95
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    • 2001
  • Titanium is widely used in dentistry for its low density, high strength, fatigue resistance, corrosion resistance, and biocompatibility. But it has a tendency of surface damage under circumstance of friction and impact for its low hardness of the surface. Coating is one of methods fir increasing surface hardness. Its effect is to improve surface physical characteristics without change of titanium. Diamond-like carbon and titanium nitride are known for its high hardness of the surface. So that this study was aimed at the wear test and the cytotoxicity test of the commercially pure titanium and Ti-6Al-4V alloy which were deposited by diamond-like carbon film or titanium nitride film to acertain improvement of the surface hardness and the biocompatibility. A disk (25mm diameter, 2mm thickness) was made of commercially pure titanium and Ti-6Al-4V alloy and these substrates were deposited by diamond-like carbon film or titanium nitride film. Diamond-like carbon film was deposited by the method of radiofrequency plasma assisted chemical vapor deposition and titanium nitride film was deposited by the method of reactive arc ion plating. Then these substrates were tested about wear characteristics by the pin-on-disk type wear tester in which ruby ball was used as a wear causer under the load of 32N, The fracture cycles were measured by rotating the substrates until their films were fractured. The wear volume was measured after 150 cycles and 3,000 cycles using surface profiler. The cytotoxicity test was peformed by the method of the MTT assay. The results were as follows : 1. In the results of the wear volume test, commercially pure titanium and titanium alloy which were coated by diamond-like carbon film or titanium nitride aim had higher resistance against wear than the substrates which were not coated by any films (P<0.05). 2. In the results of the fracture cycle test and the wear volume test, diamond-like carbon film had higher resistance against wear than titanium nitride film (P<0.05). 3. In both coatings of diamond-like carbon aim and titanium nitride film, Ti-6Al-4V alloy had higher resistance against wear than commercially pure titanium (P<0.05) 4. In the results of the cytotoxicity test, diamond-like carbon film and titanium nitride film had little cytotoxicity as like commercially pure titanium or Ti-6Al-4V alloy (P>0.05).

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Process Optimization of the Contact Formation for High Efficiency Solar Cells Using Neural Networks and Genetic Algorithms (신경망과 유전알고리즘을 이용한 고효율 태양전지 접촉형성 공정 최적화)

  • Jung, Se-Won;Lee, Sung-Joon;Hong, Sang-Jeen;Han, Seung-Soo
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.11
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    • pp.2075-2082
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    • 2006
  • This paper presents modeling and optimization techniques for hish efficiency solar cell process on single-crystalline float zone (FZ) wafers. Among a sequence of multiple steps of fabrication, the followings are the most sensitive steps for the contact formation: 1) Emitter formation by diffusion; 2) Anti-reflection-coating (ARC) with silicon nitride using plasma-enhanced chemical vapor deposition (PECVD); 3) Screen-printing for front and back metalization; and 4) Contact formation by firing. In order to increase the performance of solar cells in terms of efficiency, the contact formation process is modeled and optimized using neural networks and genetic algorithms, respectively. This paper utilizes the design of experiments (DOE) in contact formation to reduce process time and fabrication costs. The experiments were designed by using central composite design which consists of 24 factorial design augmented by 8 axial points with three center points. After contact formation process, the efficiency of the fabricated solar cell is modeled using neural networks. Established efficiency model is then used for the analysis of the process characteristics and process optimization for more efficient solar cell fabrication.

Mechanical Properties and Bio-Compatibility of Ti-Nb-Zr-HA Biomaterial Fabricated by Rapid Sintering Using HEMM Powders (고에너지 밀링분말과 급속소결을 이용한 Ti-Nb-Zr-HA 생체복합재의 기계적 성질 및 생체적합성)

  • Park, Sang-Hoon;Woo, Kee-Do;Kim, Sang-Hyuk;Lee, Seung-Min;Kim, Ji-Young;Ko, Hye-Rim;Kim, Sang-Mi
    • Korean Journal of Materials Research
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    • v.21 no.7
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    • pp.384-390
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    • 2011
  • Ti-6Al-4V ELI (Extra Low Interstitial) alloy has been widely used as an alternative to bone due to its excellent biocompatibility. However, it still has many problems, including a high elastic modulus and toxicity. Therefore, nontoxic biomaterials with a low elastic modulus should be developed. However, the fabrication of a uniform coating is challenging. Moreover, the coating layer on Ti and Ti alloy substrates can be peeled off after implantation. To overcome these problems, it is necessary to produce bulk Ti and Ti alloy with hydroxyapatite (HA) composites. In this study, Ti, Nb, and Zr powders, which are biocompatible elements, were milled in a mixing machine (24h) and by planetary mechanical ball milling (1h, 4h, and 6h), respectively. Ti-35%Nb-7%Zr and Ti-35%Nb-7%Zr-10%HA composites were fabricated by spark plasma sintering (SPS) at $1000^{\circ}C$ under 70MPa using mixed and milled powders. The effects of HA addition and milling time on the biocompatibility and physical and mechanical properties of the Ti-35%Nb-7%Zr-(10%HA) alloys have been investigated. $Ti_2O$, CaO, $CaTiO_3$, and $Ti_xP_y$ phases were formed by chemical reaction during sintering. Vickers hardness of the sintered composites increases with increased milling time and by the addition of HA. The biocompatibilty of the HA added Ti-Nb-Zr alloys was improved, but the sintering ability was decreased.

Improvement of Polycarbonate Properties by Coating of TiO2 and SiO2 Thin Film (TiO2/SiO2 박막 코팅에 의한 폴리카보네이트 특성 개선)

  • Won, Dong So;Lee, Won Gyu
    • Applied Chemistry for Engineering
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    • v.25 no.1
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    • pp.41-46
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    • 2014
  • The property improvement of polycarbonate coated with a multilayer film composed of an inorganic $SiO_2$ film and a photocatalytic $TiO_2$ film was studied. The $SiO_2$ film as a binder had an excellent light transmission characteristic. After the treatment with atmospheric pressure plasma, the surface of $SiO_2$ film showed the hydrophilicity, which increased the film coating uniformity with a $TiO_2$-containing aqueous solution. When $TiO_2$ film was over 200 nm thick, the absorption effect of UV rays in the range of 180~400 nm suppressed the yellowing phenomena of polycarbonate substrate. The inorganic film improved the heat resistance of polycarbonate substrates. $TiO_2$ film in the outmost under the exposure of UV rays promotes the catalytic oxidation characteristics and yields the capability to the decomposition of organic contaminants, and also increases the self-cleaning properties due to the increase of hydrophilicity. Structural stability of the polycarbonate substrate coated with inorganic $TiO_2$ and $SiO_2$ film was shown. The role of $SiO_2$ film between $TiO_2$ and polycarbonate substrate suppressed the peeling of $TiO_2$ film by inhibiting the photocatalytic oxidation effect of $TiO_2$ film on the polycarbonate substrate.

Dry etching of polycarbonate using O2/SF6, O2/N2 and O2/CH4 plasmas (O2/SF6, O2/N2와 O2/CH4 플라즈마를 이용한 폴리카보네이트 건식 식각)

  • Joo, Y.W.;Park, Y.H.;Noh, H.S.;Kim, J.K.;Lee, S.H.;Cho, G.S.;Song, H.J.;Jeon, M.H.;Lee, J.W.
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.16-22
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    • 2008
  • We studied plasma etching of polycarbonate in $O_2/SF_6$, $O_2/N_2$ and $O_2/CH_4$. A capacitively coupled plasma system was employed for the research. For patterning, we used a photolithography method with UV exposure after coating a photoresist on the polycarbonate. Main variables in the experiment were the mixing ratio of $O_2$ and other gases, and RF chuck power. Especially, we used only a mechanical pump for in order to operate the system. The chamber pressure was fixed at 100 mTorr. All of surface profilometry, atomic force microscopy and scanning electron microscopy were used for characterization of the etched polycarbonate samples. According to the results, $O_2/SF_6$ plasmas gave the higher etch rate of the polycarbonate than pure $O_2$ and $SF_6$ plasmas. For example, with maintaining 100W RF chuck power and 100 mTorr chamber pressure, 20 sccm $O_2$ plasma provided about $0.4{\mu}m$/min of polycarbonate etch rate and 20 sccm $SF_6$ produced only $0.2{\mu}m$/min. However, the mixed plasma of 60 % $O_2$ and 40 % $SF_6$ gas flow rate generated about $0.56{\mu}m$ with even low -DC bias induced compared to that of $O_2$. More addition of $SF_6$ to the mixture reduced etch of polycarbonate. The surface roughness of etched polycarbonate was roughed about 3 times worse measured by atomic force microscopy. However examination with scanning electron microscopy indicated that the surface was comparable to that of photoresist. Increase of RF chuck power raised -DC bias on the chuck and etch rate of polycarbonate almost linearly. The etch selectivity of polycarbonate to photoresist was about 1:1. The meaning of these results was that the simple capacitively coupled plasma system can be used to make a microstructure on polymer with $O_2/SF_6$ plasmas. This result can be applied to plasma processing of other polymers.

The Silicon Nitride Films according to The Frequency Conditions of Plasma Enhanced Chemical Vapor Deposition (PECVD의 주파수 조건에 따른 $SiN_x$막 증착)

  • Choi, Jeong-Ho;Roh, Si-Cheol;Jung, Jong-Dae;Seo, Hwa-Il
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.4
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    • pp.21-25
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    • 2014
  • The silicon nitride ($SiN_x$) film for surface passivation and anti-reflection coating of crystalline silicon solar cell is very important and it is generally deposited by plasma enhanced chemical vapor deposition (PECVD). PECVD can be divided into low and high frequency method. In this paper, the $SiN_x$ film deposited by low and high frequency PECVD method was studied. First, to optimize the $SiN_x$ film deposited by low frequency PECVD method, the refractive index was measured by varying the process conditions like $SiH_4$, $NH_3$, $N_2$ gas rate, and RF power. When $SiH_4$ gas rate was increased and $NH_3$ gas rate was decreased, the refractive index was increased. The refractive index was also increased with RF power decline. Second, to compare the characteristics of the low and high frequency PECVD $SiN_x$ film, the refractive index was measured by varying $NH_3/SiH_4$ gas ratio and RF power and the minority carrier lifetime of before and after high temperature treatment process was also measured. The refractive index of both low and high frequency PECVD $SiN_x$ film was decreased with increase in $NH_3/SiH_4$ gas ratio and RF power. After high temperature treatment process, the minority carrier lifetime of both low and high frequency PECVD $SiN_x$ film was increased and increased degree was similar. The minority carrier lifetime of low frequency PECVD $SiN_x$ was increased from $11.03{\mu}m$ to $28.24{\mu}m$ and that of high frequency PECVD $SiN_x$ was increased from $11.60{\mu}m$ to $27.10{\mu}m$.

The Effect of Pre-Treatment Methods for the Life Time of the Insoluble Electrodes (불용성 전극의 전처리 방법이 전극의 수명에 미치는 영향)

  • Park, Mi-Jung;Lee, Taek-Soon;Kang, Meea;Han, Chi-Bok
    • Journal of Korean Society of Environmental Engineers
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    • v.38 no.6
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    • pp.291-298
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    • 2016
  • Electrochemical water treatment process as a useful treatment method for the removal of non-degradable matter has been consistently studied for several decades. Key process of electrochemical water treatment are oxidation reaction from an anode and reduction from a cathode. In this study, the effect of pre-treatment methods in the insoluble electrode manufacturing process for the water treatment has been evaluated for the life time of electrode The results of this study showed that pre-treatment methods of a base metal such as surface roughness, clean method and interlayer formation influenced to life time of electrode when the same condition (catalyst electrode layer coating method and material system) was applied for pre-treatment methods. This study was conducted by using $IrO_2/Ti$ electrode In the test of sand-blasting process, an electrode manufactured by using sanding media of different sizes resulted in the most effective electrode life time when the size of alumina was used for $212{\sim}180{\mu}m$ praticle size (#80). The most effective method was considered using arc plasma in the additional roughness control and cleaning process, sputtering method to form Ta type interlayer formation process.

Effect of $Ca^{2+}$ and $Co^{3+}$ cations substitution on the properties of $LaCrO_3$ for SOFC interconnect (SOFC 연결재용 $LaCrO_3$ Perovskite 구조에서 $Ca^{2+}$$Co^{3+}$치환첨가효과)

  • An, Yongtae;Choi, Byunghyun;Ji, Mijung;Kwon, Yongjin;Seo, Han;Hwang, Haejin
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.136.1-136.1
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    • 2010
  • 고체산화물 연료전지(SOFC)에서 사용되는 연결재의 주 기능은 각 단위 셀의 연료극과 다음 셀의 공기극을 전기적으로 연결하여, 공기와 사용연료의 분리역할을 하기위해 사용된다. SOFC용 연결재는 다른 구성요소 소재보다 높은 전기전도성, 낮은 이온전도성이 요구되며 SOFC는 고온에서 작동되기 때문에 다른 구성 소재들과 유사한 열팽창계수와 물리, 화학적인 안정성이 요구된다. 현재 연결재 제조기술은 plasma coating, sputtering, screen printing, 전사법등 다양한 연구가 진행되고 있다. 본 연구에서는 저렴한 비용으로 대량생산이 용이한 고상반응법을 적용하여 세라믹연결재를 제조하고, 그 특성을 연구하였다. 세라믹 연결재로서 선정한 합성조성은 $(La_{0.7}Ca_{0.3})(Cr_{0.9}Co_{0.1})O_3$로 SOFC 작동온도에서 높은 전기전도도를 나타낸다. LCCO 연결재를 1300, 1400 및 $1500^{\circ}C$에서 합성을 진행하였을 때 출발원료로 $CaCO_3$$CaF_2$로 대체하였을 때의 소결특성을 평가하였고, SEM과 XRD분석을 통하여 균질하고 결정성이 우수한 분말이 합성된 것을 확인하였고 DC impedance analyzer를 사용하여 전기전도도를 측정하였다. TMA를 사용하여 열팽창계수를 측정한 결과 YSZ(${\sim}10.8{\times}10^{-6}/^{\circ}C$)와 동일한 값을 나타내었다.

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Study on SiNx double layer anti-reflection coating for crystalline solar cell application (결정질 태양전지 적용을 위한 SiNx 이중구조 반사방지막에 관한 연구)

  • Gong, Daeyeong;Park, Seungman;Yi, Junsin
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.93.1-93.1
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    • 2010
  • 반사방지막은 태양전지 표면에서의 광 반사를 낮춰주며, Si wafer 표면에서의 carrier의 재결합을 줄이는 passivation 역할을 한다. 이를 위한 다양한 물질이 반사방지막으로 사용된다. 단일박막은 passivation 효과가 미미하여 최근 passivation 향상에 도움이 되는 이중구조 반사방지막이 널리 연구되어지고 있다. 하지만 물질이 다양해짐에 따라 공정시간 및 비용이 늘어나고, passivation에 최적화된 물질사용이 필수적으로 요구되는 단점이 있다. 따라서 본 연구에서는 기존에 passivation 효과가 뛰어나다고 알려진 SiNx의 굴절률 가변을 통하여 이중구조를 갖는 박막을 반사방지막으로 이용하여 그 특성을 비교, 분석하였다. SiNx 이중반사방지막은 0.8 Torr~1 Torr의 압력에서 $450^{\circ}C$의 기판온도로 PECVD를 이용하여 증착되었으며 이때의 plasma power는 180mW/$cm^2$으로 고정 하였다. 굴절률 1.9 및 2.3을 갖는 가스 조성비를 이용하여 각 layer의 두께를 20/60nm, 30/50nm, 40/40nm로 가변하였다. 샘플 제작 후 Sun-Voc 측정을 통하여 implied Voc 및 효율을 측정하였다. 단일반사방지막을 사용한 샘플의 경우 608mV의 implied Voc가 측정되었으며, FF는 82.8%, 효율은 17.6%로 측정되었다. 가장 우수한 특성을 나타낸 20/60nm의 두께로 증착된 샘플의 경우 implied Voc는 625mV, FF는 84.1%, 효율은 18.3%로 우수한 결과를 나타내었다. 반사도 측정 결과 단일반사방지막은 2.27%로 높았으나 SiNx 이중구조를 이용한 반사방지막은 1.67%로 낮은 값을 확인 하여 이중구조의 반사방지막이 반사도 저감 및 passivation 효과 향상에 도움이 되는 것을 확인할 수 있었다.

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