• 제목/요약/키워드: plasma chemical

검색결과 2,432건 처리시간 0.03초

저온 플라즈마 장치에서 $C_2H_4$의 첨가량이 NOx 저감에 미치는 영향에 대한 실험적 연구 (An Experimental Study on Effect of Adding $C_2H_4$ for Reduction of NOX using Low Temperature Plasma Apparatus)

  • 권준호;강우정;정태용
    • 한국자동차공학회논문집
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    • 제6권4호
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    • pp.211-218
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    • 1998
  • The purpose of this study is to investigate the reduction rate of NOX according to several parameters(NOX concentration, the flow rate of gas, the additional amount of C2H4, input voltage, input frequency and so in) when NOX is reduced by using PPCP(Pulse-induced Plasma Chemical Process). PPCP is based on the plasma-chemical technology, which induces narrow voltage pulses to binary electrode structure.

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알루미늄 압출용 금형의 플라즈마 표면처리 (Plasma Surface Treatment of Aluminum Extrusion Die)

  • 최인규;이수영;김상호
    • 한국표면공학회지
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    • 제47권6호
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    • pp.282-286
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    • 2014
  • Wear characteristic of the nitrided SKD61 which is a typical mold material using for the extrusion of Al6061 alloy was investigated. The surface of SKD61 was nitrided by salt bath and plasma processes. The thickness of surface nitride layer was about $8.9{\mu}m{\sim}21.3{\mu}m$. Reciprocating friction wear test conducted using pin on disk type indicated the plasma treatment followed salt bath has a lower friction coefficient and a smaller adhesive wear with Al6061 alloy. That was identified by the $Fe_4N$ which has a better wear resistance than FeN mainly formed by plasma nitriding.

The Study on Characteristics of N-Doped Ethylcyclohexane Plasma-Polymer Thin Films

  • 서현진;조상진;이진우;전소현;부진효
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.540-540
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    • 2013
  • In this studying, we investigated the basic properties of N-doped plasma polymer. The N-doped ethylcyclohexane plasma polymer thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Ethylcyclohexenewas used as organic precursor (carbon source) with hydrogen gas as the precursor bubbler gas. Additionally, ammonia gas [NH3] was used as nitrogen dopant. The as-grown polymerized thin films were analyzed using ellipsometry, Fourier-transform infrared [FT-IR] spectroscopy, Raman spectroscopy, FE-SEM, and water contact angle measurement. The ellipsometry results showed the refractive index change of the N-doped ethylcyclohexene plasma polymer film. The FT-IR spectrashowed that the N-doped ethylcyclohexene plasma polymer films were completely fragmented and polymerized from ethylcyclohexane.

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Dissolution Characteristics of Copper Oxide in Gas-liquid Hybrid Atmospheric Pressure Plasma Reactor Using Organic Acid Solution

  • Kwon, Heoung Su;Lee, Won Gyu
    • 공업화학
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    • 제33권2호
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    • pp.229-233
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    • 2022
  • In this study, a gas-liquid hybrid atmospheric pressure plasma reactor of the dielectric barrier discharge method was fabricated and characterized. The solubility of copper oxide in the organic acid solution was increased when argon having a larger atomic weight than helium was used during plasma discharge. There was no significant effect of mixing organic acid solutions under plasma discharge treatment on the variation of copper oxide's solubility. As the applied voltage for plasma discharge and the concentration of the organic acid solution increased, the dissolution and removal power of the copper oxide layer increased. Solubility of copper oxide was more affected by the concentration in organic acid solution rather than the variation of plasma applied voltage. The usefulness of hybrid plasma reactor for the surface cleaning process was confirmed.

Role of oxygen in plasma induced chemical reactions in solution

  • Ki, Se Hoon;Uhm, Han Sup;Kim, Minsu;Baik, Ku Youn;Choi, Eun Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.208.2-208.2
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    • 2016
  • Many researchers have paid attention to the studies on the interaction between non-thermal plasma and aqueous solutions for biomedical applications. The gas composition in the plasma is very important. Oxygen and nitrogen are the main gases of interest in biological applications. Especially, we focus on the oxygen concentration. In this experiment, we studied the role of oxygen concentration in plasma induced chemical reactions in solution. At first, the amount of ions are measured according to changing the oxygen concentration. And we checked the relationship between these ions and pH value. Secondly, when the oxygen concentration is changed, it identified the type and amount of radical generated by the plasma. In order to confirm the effect of these chemical property change to biological material, hemoglobin and RBCs are chosen. RBCs are one of the common basic biological cells. Thirdly, when plasma treated according to oxygen concentration in nitrogen feeding gas, oxidation of hemoglobin and RBC is checked. Finally, membrane oxidation of RBC is measured to examine the relation between hemoglobin oxidation and membrane damage through relative hemolysis and Young's modulus. Our results suggest that reactive species generated by the plasma differsdepending on the oxygen concentration changes. The pH values are decreased when oxygen concentration increased. OH decrease and NO increase are also observed. These reactive species makes change of chemical properties of solution. We also able to confirm that the difference in these reactive species to affect the oxidation of the Hb and RBCs. The Hb and RBCs are more oxidized with the high oxygen concentration conditions. But membrane is damaged more by plasma treatment with only nitrogen gas. It is shown that red blood cells membrane damage and oxidation of hemoglobin are not directly related.

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플라즈마 충진 촉매 시스템을 이용한 에틸렌 저감 연구 (Decomposition of Ethylene using a Hybrid Catalyst-packed Bed Plasma Reactor System)

  • 이상백;조진오;장동룡;목영선
    • 한국대기환경학회지
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    • 제30권6호
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    • pp.577-585
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    • 2014
  • A series of experiments using atmospheric-pressure non-thermal plasma coupled with transition metal catalysts were performed to remove ethylene from agricultural storage facilities. The non-thermal plasma was created by dielectric barrier discharge, which was in direct contact with the catalyst pellets. The transition metals such as Ag and $V_2O_5$ were supported on ${\gamma}-Al_2O_3$. The effect of catalyst type, specific input energy (SIE) and oxygen content on the removal of ethylene was examined to understand the behavior of the hybrid plasma-catalytic reactor system. With the other parameters kept constant, the plasma-catalytic activity for the removal of ethylene was in order of $V_2O_5/{\gamma}-Al_2O_3$ > $Ag/{\gamma}-Al_2O_3$ > ${\gamma}-Al_2O_3$ from high to low. Interestingly, the rate of plasma-catalytic ozone generation was in order of $V_2O_5/{\gamma}-Al_2O_3$ > ${\gamma}-Al_2O_3$ > $Ag/{\gamma}-Al_2O_3$, implying that the catalyst activation mechanisms by plasma are different for different catalysts. The results obtained by varying the oxygen content indicated that nitrogen-derived reactive species dominated the removal of ethylene under oxygen-lean condition, while ozone and oxygen atoms were mainly involved in the removal under oxygen-rich condition. When the plasma was coupled with $V_2O_5/{\gamma}-Al_2O_3$, nearly complete removal of ethylene was achieved at oxygen contents higher than 5% by volume (inlet ethylene: 250 ppm; gas flow rate: $1.0Lmin^{-1}$; SIE: ${\sim}355JL^{-1}$).

Large Scale Treatment of Perfluorocompounds Using a Thermal Plasma Scrubber

  • Han, Sung-Han;Park, Hyun-Woo;Kim, Tae-Hee;Park, Dong-Wha
    • 청정기술
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    • 제17권3호
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    • pp.250-258
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    • 2011
  • Thermal plasma has been presented for the decomposition of perfluorocompounds (PFCs) which are extensively used in the semiconductor manufacturing and display industry. We developed pilot-scale equipment to investigate the large scale treatment of PFCs and called it a "thermal plasma scrubber". PFCs such as $CF_4$, $C_2F_6$, $SF_6$, and $NF_3$ used in experiments were diluted with $N_2$. There were two different types of experiment setup related to the water spray direction inside the thermal plasma scrubber. The first type was that the water was sprayed directly into the gas outlet located at the exit of the reaction section. The second type was that the water was sprayed on the wall of the quenching section. More effective decomposition took place when the water was sprayed on the quenching section wall. For $C_2F_6$, $SF_6$, and $NF_3$ the maximum destruction and removal efficiency was nearly 100%, and for $CF_4$ was up to 93%.

유도결합플라즈마 질량분석법에 의한 납 취급 근로자와 일반인의 혈장 중 납 분석 및 상관성 분석 (Analysis of Trace Level and Correlation of Lead in the Plasma of Field Workers and General Public by ICP-MS)

  • 이성배;양정선;최성봉;김남수;이병국;신호상
    • 한국산업보건학회지
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    • 제23권2호
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    • pp.65-74
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    • 2013
  • Objectives: This study attempted to develop a method to measure ultra-trace lead concentrations in plasma using Inductively Coupled Plasma Mass Spectrometry(ICP-MS) and to test whether plasma lead can be used as a biomarker for the biological monitoring of exposure to lead. Methods: Lead concentrations in 160 plasma samples of field workers and 42 plasma samples from the control group were measured by ICP-MS. Blood zinc protophorphyrin(ZPP) concentrations and urinary ${\delta}$-aminolevulinic acid${\delta}-ALA$) were measured for correlation analysis with plasma lead. Results: The mean lead level in the plasma of the workers exposed to lead at work were 786.1 ng/L. Plasma lead levels were not correlated with blood ZPP or urinary ${\delta}-ALA$ concentrations. Otherwise, plasma lead levels showed a good correlation coefficient of 0.400 with blood lead levels, and their correlation coefficient had a better value of 0.552 for the non-smoking and drinking group. In the general population group which was not exposed to lead in the workplace and was considered the control group, the mean concentration of plasma lead was 123.1 ng/L. The plasma lead levels for the general population group showed a good correlation coefficient of 0.520 with blood ZPP and urinary ${\delta}-ALA$ concentrations.

고밀도 플라즈마 화학 증착 장치를 이용한 $TiB_2$ 박막 제조 (Deposition Of $TiB_2$ Films by High Density Plasma Assisted Chemical Vapor Deposition)

  • 이승훈;남경희;홍승찬;이정중
    • 한국표면공학회지
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    • 제38권2호
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    • pp.60-64
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    • 2005
  • The ICP-CVD (inductively coupled plasma chemical vapor deposition) process was applied to the deposition of $TiB_2$ films. For plasma generation, 13.56 MHz r.f. power was supplied to 2-turn Cu coil placed inside chamber. And the gas mixture of $TiCl_4,\;BCl_3,\;H_2$ and Ar was used for $TiB_2$ deposition. $TiB_2$ films with high hardness (<40 GPa) were obtained at extremely low deposition temperature $(250^{\circ}C)$, and the films hardness increased with ICP power and gas flow ratio of $TiCl_4/BCl_3$. The film structure was changed from (100) preferred orientation to random orientation with increasing RF power. It is supposed that the enhanced hardness of films was caused by a strong Ti-B chemical bonding of stoichiometric $TiB_2$ films and film densification induced by high density plasma.

Superb Mechanical Stability of n-Octadecyltriethoxysilane Monolayer Due to Direct Chemical Bonds between Silane Headgroups and Mica Surface: Part II

  • 김성수
    • 통합자연과학논문집
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    • 제3권2호
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    • pp.96-102
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    • 2010
  • It is still controversial where the improved stability of n-octadecyltriethoxysilane self-assembled monolayer (OTE SAM) on plasma-pretreated mica surface exactly originates from. To date, it has been well known that the extensive cross-polymerization between silane headgroups is a crucial factor for the outstanding mechanical strength of the monolayer. However, this study directly observed that the stability comes not only from the cross-links but also, far more importantly, from the direct chemical bonds between silane headgroups and mica surface. To observe this phenomenon, n-octadecyltrichlorosilane monolayers were self-assembled on both untreated and plasma treated mica surfaces, and their adhesion properties at various stress conditions and force profiles in pure water were investigated and compared through the use of the surface forces apparatus technique. It revealed that, in pure water, there is a substantial difference of stability between untreated and plasma treated cases and the plasma treated surface is mechanically much more stable. In particular, the protrusion behavior of the monolayer during contact repetition experiment was always observed in the untreated case, but never in the plasma treated case. It directly demonstrates that the extensive chemical bonds indeed exist between silane head-groups and plasma treated mica surface and dramatically improve the mechanical stability of the OTE monolayer-coated mica substrate.