• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.24-24
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• 2018

One of the challenges in tissue engineering is the design of optimal biomedical scaffolds, which can be governed by topographical surface characteristics, such as size, shape, and direction. Of these properties, we focus on the effects of nano - to micro - sized hierarchical surface. To fabricate the hierarchical surface structure on poly(${\varepsilon}$-caprolactone) (PCL) film, we employed a nano/micro-casting technique (NCT) and modified plasma process. The micro size topography of PCL film was controlled by sizes of the micro structures on lotus leaf. Also, the nano-size topography and hydrophilicity of PCL film were controlled by modified plasma process. After the plasma treatment, the hydrophobic property of the PCL film was significantly changed into hydrophilic property, and the nano-sized structure was well developed, as increasing the plasma exposure time and applied power. The surface properties of the modified PCL film were investigated in terms of initial cell morphology, attachment, and proliferation using osteoblast-like-cells (MG63). In particular, initial cell attachment, proliferation and osteogenic differentiation in the hierarchical structure were enhanced dramatically compared to those of the smooth surface.

• Journal of Microbiology
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• v.44 no.3
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• pp.269-275
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• 2006

Atmospheric-pressure cold plasma (APCP) using helium/oxygen was developed and tested as a suitable sterilization method in a clinical environment. The sterilizing effect of this method is not due to UV light, which is known to be the major sterilization factor of APCP, but instead results from the action of reactive oxygen radicals. Escherichia coli, Staphylococcus aureus, and Saccharomyces cerevisiae deposited on a nitrocellulose filter membrane or Bacillus subtilis spores deposited on polypropylene plates were exposed to helium/oxygen plasma generated with AC input power at 10 kHz, 6 kV. After Plasma treatment, nitrocellulose filter membranes were overlaid on fresh solid media and CFUs were counted after incubation overnight. D-values were 18 sec for E. coli, 19 sec for S. aureus, 1 min 55 sec for S. cerevisiae, and 14 min for B. subtilis spores. D-values of bacteria and yeast were dependent on the initial inoculation concentration, while the D-value of B. subtilis spores showed no correlation. When treated cells were observed with a scanning electron microscope, E. coli was more heavily damaged than S. aureus, S. cevevisiae exhibited peeling, and B. subtilis spores exhibited shrunken morphology. Results showed that APCP using helium/oxygen has many advantages as a sterilization method, especially in a clinical environment with conditions such as stable temperature, unlimited sample size, and no harmful gas production.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.204-205
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• 2011

In thin film silicon solar cells, p-i-n structure is adopted instead of p/n junction structure as in wafer-based Si solar cells. PECVD is a most widely used thin film deposition process for a-Si:H or ${\mu}c$-Si:H solar cells. For best performance of thin film silicon solar cell, the dopant profiles at p/i and i/n interfaces need to be as sharp as possible. The sharpness of dopant profiles can easily achieved when using multi-chamber PECVD equipment, in which each layer is deposited in separate chamber. However, in a single-chamber PECVD system, doped and intrinsic layers are deposited in one plasma chamber, which inevitably impedes sharp dopant profiles at the interfaces due to the contamination from previous deposition process. The cross-contamination between layers is a serious drawback of a single-chamber PECVD system in spite of the advantage of lower initial investment cost for the equipment. In order to resolve the cross-contamination problem in single-chamber PECVD systems, flushing method of the chamber with NH3 gas or water vapor after doped layer deposition process has been used. In this study, a new plasma process to solve the cross-contamination problem in a single-chamber PECVD system was suggested. A single-chamber VHF-PECVD system was used for superstrate type p-i-n a-Si:H solar cell manufacturing on Asahi-type U FTO glass. A 80 MHz and 20 watts of pulsed RF power was applied to the parallel plate RF cathode at the frequency of 10 kHz and 80% duty ratio. A mixture gas of Ar, H2 and SiH4 was used for i-layer deposition and the deposition pressure was 0.4 Torr. For p and n layer deposition, B2H6 and PH3 was used as doping gas, respectively. The deposition temperature was $250^{\circ}C$ and the total p-i-n layer thickness was about $3500{\AA}$. In order to remove the deposited B inside of the vacuum chamber during p-layer deposition, a high pulsed RF power of about 80 W was applied right after p-layer deposition without SiH4 gas, which is followed by i-layer and n-layer deposition. Finally, Ag was deposited as top electrode. The best initial solar cell efficiency of 9.5 % for test cell area of 0.2 $cm^2$ could be achieved by applying the in-situ plasma cleaning method. The dependence on RF power and treatment time was investigated along with the SIMS analysis of the p-i interface for boron profiles.

• The Korean Journal of Nuclear Medicine
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• v.1 no.1
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• pp.1-19
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• 1967

The effects of X-ray irradiation and the thyroid gland on the erythropoietic system were studied in the white male rabbits. The total body irradiation was done in doses of 250 r and 500 r to each of 5 rabbits for 10days. The factors were 220KV, 10mA, FLI/4 Cu+1 mmAI(HVL:2.0 mm Cu) 50 cm F.S.D. The thyroid dysfunction was experimentally induced, by giving 2mg of thyroid tablets per kg body weight for 15 days in 5 rabbits for hyperthyroidism and by giving 1.5 mC of $^{131}I$ per kg body weight in another 5 rabbits for hypothyroidism. Fourteen healthy rabbits were used as control. The hematologic changes and ferrokinetic data obtained from $^{59}Fe$ and apparent half survival of the red blood cells obtained from $^{51}Cr$ were compared. Following were the results: A. X-ray irradiated group; 1. There were no significant changes in hematologic findings except for leucopenia. A slight decrease of red blood cells was observed in 500 r irradiated animals. 2. The decreases in the iron turnover rates of the plasma and red blood cells as well as in the red cell renewal rate were found in both groups. A :significant decrease of the red cell iron utilization rate was observed in the 500 r irradiated animals. 3. The apparent half survival times of the red blood cells were slightly, in the 250 r ($12.1{\pm}0.80$ days), and markedly shortened in the 500 r irradiated animals ($9.8{\pm}1.38$ days), the normal being $14.0{\pm}1.6$ days. 4. It appears, therefore, that the anemia caused by X-ray irradiation is due to the inhibition of hemopoietic function and the excess destruction of the red blood cells. B. Thyroid dysfunction group; 1. The slight increases of the red blood cell count and circulating blood volume with the normal serum iron level were observed in the hyperthyroid group, while the decreases of the red and white blood cell counts, hemoglobin and hematocrit values with a marked decrease of the serum iron level in the hypothyroid group. 2. A marked decrease of the plasma iron disappearance rate with increases of plasma iron turnover, red cell iron utilization and red cell iron turnover were observed in the hyperthyroid group, while the marked delay and decreases in the hypothyroid group. 3. The apparent half survival times of the red blood cells were almost the same with the control in the hyperthyroid group, ($14.0{\pm}1.58$ while a marked shortening in the hypothyroid group $10.6{\pm}0.30$. 4. It was reconfirmed that the thyroid hormones bear a close relationship with the erythropoietic system, namely, the latter is stimulated by the former. The lack of the thyroid hormones thus induces the bone marrow depression leading to anemia the major cause of which, therefore, is not hemolysis.

• Applied Microscopy
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• v.31 no.2
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• pp.157-165
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• 2001

Sertoli cells in the normal adult testis are nondividing cells, which are relatively inconspicuous on cross section of the seminiferous tubule and comprise about 10% to 15% of the tubular cellular elements. Ultrastructurally, Sertoli cells have characteristic nucleoli, plasma membrane, and cytoplasmic components. The plasma membrane has two types of intercellular junctions which are developed at puberty: junctions between adjacent Sertoli cells and Sertoli cell-germ ceil junction. However, the ultrastructural findings of Sertoli cells in human fetus is not fully elucidate yet. In the present study, human fetal testes ($14\sim27$ weeks) obtained from artificially induced abortions legally without gross malformation were studied using transmission electron microscopy to make clear the differentiation process of Sertoli cells in human. In human fetal testes from 14 weeks to 27 weeks, the cell junctions of Sertoli-germ cells and Sertoli-Sertoli cells are desmosome like structure and not tight junction or desmosome. The Overall intracytoplasmic organelles of Sertoli cells are relatively sparse. The mitochondrias are relatively abundant but no developed cristae. And the rough endoplasmic reticuli are abundant and smooth endoplasmic reticuli are sparse. The amount of lipid droplets are regularly observed in human fetal Sertoli cells. No microfilaments or Charcot-Bottcher's crystalloids are present. From the results, Sertoli cells in human fetal testes are somewhat different ultrastructural findings with puberty or adult. However, to make clear the differentiation process of Sertoli cells in human, further study for 28 weeks to puberty is required.

• The Journal of the Korean Society for Microbiology
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• v.35 no.1
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• pp.1-8
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• 2000

In order to explore the potential of ascorbic acid supplementation for the prevention and treatment of herpes simplex viral diseases, plaque reduction assays were performed. Ascorbic acid as well as copper chloride/ferric chloride were added to wells containing Vero cells infected with herpes simplex virus type 1 (HSV-1), and the infectivity of HSV-1 was determined. Since copper and iron are major transition metals in human plasma, near the normal human plasma concentrations of them were used for experiments. When Cu(II) and Fe(III) were applied, there were no significant differences between virus control and Cu(II)/Fe(III)-treated groups. But, when appropriate concentrations of ascorbic acid were added to wells, meaningful differences between control and ascorbate-treated groups were found. In the presence of Cu(II)/Fe(III) at $5.8/3.7\;{\mu}M$, 72-h treatment with ascorbate at $50\;{\mu}M$ reduced HSV-1 infections to $10.77%{\pm}4.25%$ (P < 0.001) and $500\;{\mu}M$ did to $3.06%{\pm}1.62%$ (P < 0.001). Moreover, the cytotoxicities for Vero cells at those concentrations were insignificant (P > 0.05). Current recommended dietary allowance (RDA) of ascorbic acid is 60 mg/day, and the oral intake of 60 mg/day of ascorbic acid yields plasma ascorbic acid at 45 to $58\;{\mu}M$ in a healthy adult man. Therefore, the results of this study suggest that the maintenance of appropriate level (more than $50\;{\mu}M$) of ascorbic acid in human plasma by appropriate amount (more than the RDA) of ascorbic acid supplementation may be helpful for the prevention and treatment of diseases caused by HSV -1 in an adult man. In addition, this study also suggests that ascorbic acid may be useful for the prophylaxis of fatal HSV-1 infections in neonates and the prevention of HSV-1 reactivation in immunocompromised hosts.

• Korean Journal of Head & Neck Oncology
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• v.21 no.2
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• pp.165-169
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• 2005

Extramedullary plasmacytoma(EMP) is a rare tumor that originates as a clone of malignant transformed plasma cells. EMPs make up 4% of all plasma cell tumors and 90% of EMP cases occur in the head and neck area. The diagnosis of EMP is based on the morphologic and immunophenotypical finding of a localized collection of monoclonal plasma cells in the absence of plasma cell proliferation elsewhere. Patients with EMP can be treated by surgery or radiotherapy alone or in combination. EMP has good prognosis but long-term follow-up is critical because local recurrence or systemic progression to multiple myeloma may develop more than 30 years after the initial diagnosis of EMP. We report a case of EMP in palatine tonsil of 21-year old man who was treated successfully by radiotherapy alone.

• The Journal of Korean Academy of Prosthodontics
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• v.34 no.4
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• pp.800-815
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• 1996

Pulsed Nd : YAG laser has been used to treat various soft tissue lesions. However, there have been warnings of using laser to treat peri-implantitis because the laser can alter the surface of implant and can rise its temperature so that it might be harmful to implant itself and its surrounding tissue. However, the study in vivo has not been done yet. The purpose of this study was to evaluate the biocompatibility to the pulsed Nd:YAG lased dental implant. 16 HA coated implants and 16 titanium plasma sprayed implants were used. They were divided 4 groups as unlased control, 0.3 watt, 1.0 watt and 2.0 watt lased groups after lasing. And they were implanted in the peritonial walls of 12 rabbits. The rabbits were sacrificed 6 weeks after implantation and the LM and EM specimems were made. 1. In the unlased implant group, both HA coated and titanium plasma sprayed implants were surrounded by fibroblasts and collagen fibers. No macrophages and inflammatory cells were seen. 2. In HA coated implants 0.3 watt, 1.0 watt lased group had a little inflammation, but in 2.0 watt lased group had scattered macrophages, a significantly larger number of chronic imflammatory cells were seen. 3. In titanium plasma sprayed implant 0.3 watt, 1.0 watt lased group had a little inflammation, but in 2.0 watt group had severe inflammation as in the conditions of HA coated group. 4. The inflammatory reaction of both lased HA coated and titanium plasma sprayed implant groups increased as the increase of the power of the laser.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.276-279
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• 2004

Plasma enhanced chemical vapor deposition (PECVD) of silicon nitride (SiN) is a proven technique for obtaining layers that meet the needs of surface passivation and anti-reflection coating. In addition, the deposition process appears to provoke bulk passivation as well due to diffusion of atomic hydrogen. This bulk passivation is an important advantage of PECVD deposition when compared to the conventional CVD techniques. A further advantage of PECVD is that the process takes place at a relatively low temperature of 300t, keeping the total thermal budget of the cell processing to a minimum. In this work SiN deposition was performed using a horizontal PECVD reactor system consisting of a long horizontal quartz tube that was radiantly heated. Special and long rectangular graphite plates served as both the electrodes to establish the plasma and holders of the wafers. The electrode configuration was designed to provide a uniform plasma environment for each wafer and to ensure the film uniformity. These horizontally oriented graphite electrodes were stacked parallel to one another, side by side, with alternating plates serving as power and ground electrodes for the RF power supply. The plasma was formed in the space between each pair of plates. Also this paper deals with the fabrication of multicrystalline silicon solar cells with PECVD SiN layers combined with high-throughput screen printing and RTP firing. Using this sequence we were able to obtain solar cells with an efficiency of 14% for polished multi crystalline Si wafers of size 125 m square.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.193-193
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• 2012

In thin film silicon solar cells, p-i-n structure is adopted instead of p/n junction structure as in wafer-based Si solar cells. PECVD is the most widely used thin film deposition process for a-Si:H or ${\mu}c$-Si:H solar cells. Single-chamber PECVD system for a-Si:H solar cell manufacturing has the advantage of lower initial investment and maintenance cost for the equipment. However, in single-chamber PECVD system, doped and intrinsic layers are deposited in one plasma chamber, which inevitably impedes sharp dopant profiles at the interfaces due to the contamination from previous deposition process. The cross-contamination between layers is a serious drawback of single-chamber PECVD system. In this study, a new plasma process to solve the cross-contamination problem in a single-chamber PECVD system was suggested. In order to remove the deposited B inside of the plasma chamber during p-layer deposition, a high RF power was applied right after p-layer deposition with SiH4 gas off, which is then followed by i-layer, n-layer, and Ag top-electrode deposition without vacuum break. In addition to the p-i interface control, various interface control techniques such as FTO-glass pre-annealing in O2 environment to further reduce sheet resistance of FTO-glass, thin layer of TiO2 deposition to prevent H2 plasma reduction of FTO layer, and hydrogen plasma treatment prior to n-layer deposition, etc. were developed. The best initial solar cell efficiency using single-chamber PECVD system of 10.5% for test cell area of 0.2 $cm^2$ could be achieved by adopting various interface control methods.