• Title/Summary/Keyword: plasma application

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Mechanical property of porous Ti implants by sintering method (소결방법에 따른 다공성 티타늄 임플란트의 기계적 특성)

  • Kim, Yung-Hoon
    • Journal of Technologic Dentistry
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    • v.34 no.3
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    • pp.221-226
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    • 2012
  • Purpose: This study was performed to compare mechanical properties for sintering methods of porous Ti implants. Methods: The specimens of Ti implant were fabricated by several sintering methods. One of them is spark plasma sintering(SPS). Another is electro discharge singering(EDS) and the other is high vacuum sintering(HVS). Mechanical properties of porous Ti implants were evaluated by universal testing machine(UTM) and their fracture surface was examined under a sanning electron microscope(SEM). Results: The tensile strength was in a range of 71 to 230 MPa, and Young's modulus was in a range of 11 to 21 Gpa. It matched with range of cortical bone. Conclusion: Mechanical properties of porous Ti implants were similar to human bone. It was shown that sintering methods of spherical powders can efficiently produce porous Ti implants with various porosities. Porous metals will be commonly used in orthopedic and dental application despite of initial focus has been on bioceramics.

A study on the anti-wear properties of surface modified cast iron by metal spray method (용사법에 의한 주철제 표면개질부의 내마모성 연구)

  • Lee, Kwang-Ryeol;Choi, Young-Kook;Kim, Young-Sik
    • Proceedings of the Korea Committee for Ocean Resources and Engineering Conference
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    • 2002.10a
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    • pp.312-317
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    • 2002
  • A experimental try was conducted for the purpose of establishment of the cast iron modification by the metal spray method. The friction and wear resistance properties of the metal sprayed cast iron surface were evaluated. The application experiment for the cast iron modification by the metal spray method was conducted in order to develope the restoring method of the scrapped cast iron cylinder liner of the marine engine.

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THIN FILM SENSORS FOR AUTOMOBILE

  • Taga, Yasunori
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.459-466
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    • 1996
  • A great amount of effort has been devoted to the constant improvement of such basic performance as dirvability, safety and enviromental protection. As a result, the total combination of various technologies has made it possible to produce safer and more comfortable automobiles. Among these technologies, plasma and thin film techniques are mainly cocerned with sensors, optics, electronics and surface modification. This paper first describes a concept of thin film processing in materials synthesis for sensors based on particle-surface interaction during deposition to provide a long life sensor applicable to sutomobiles. Some examples of parctical application of thin films to sensors are then given. These include(1) a thin films strain gauge for gravity sensors, (2) a giant magneto resistance film for speen sensors, and (3) a Magneto-impedance sensors fordetection of low magnetic field. Further progress of sophisticated thin film technology must be considered in detail to explore advanced thin film materials science and to ensure the field reliability of future sensor devices for automobile.

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Plasma Aided Process As Alternative to Hard Chromium Electroplating

  • Kwon, Sik-Chol;Lee, K.H.;Kim, J.K.;Kim, M.;Lee, G.H.;Nam, K.S.;Kim, D.;Chang, D.Y.
    • Journal of the Korean institute of surface engineering
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    • v.36 no.1
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    • pp.48-58
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    • 2003
  • This paper will present an overview of toxicity of hexavalent chromium as well as effort for its replacement by a wide spectrum of alternative materials and technologies. Cr-based materials such as trivalent electrodeposit will be one of strong candidates for hard chromium by surface modification of its surface hardness. Ni-base alloy deposits has proved its application in specific mold for glass. HVOF has been studied in aircraft and military sector. There are still under way of development for commercially available alternatives. To date, no single coating has been identified as universal process as comparable to conventional hard chromium electroplating.

Neuron gradient control by random generator and application to modeling a plasma etch process data (난수발생기를 이용한 뉴런경사 제어와 플라즈마 식각공정 데이터 모델링에의 응용)

  • Kim, Sung-Mo;Kim, Byung-Whan
    • Proceedings of the KIEE Conference
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    • 2003.07d
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    • pp.2582-2584
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    • 2003
  • 역전파 신경망 (BPNN)은 반도체 공정 모델링에 효과적으로 응용되고 있다. 뉴런의 활성화 함수는 동일한 값을 가지며, 이로 인해 예측정확도를 증진하는 데에는 한계가 있었다. 본 연구에서는 난수발생기(Random generator-RG)를 이용하여 뉴런 경사들이 다중값을 가지도록 최적화하였다. 본 기법은 은닉충의 뉴런수의 함수로 고찰하였으며, 종래의 고정된 경사를 갖는 모델과 그 성능을 비교 평가하였다. 평가에 이용된 데이터는 플라즈마 식각 공정데이터이며, 모델에 이용된 응답은 식각률과 프로파일 각이다. 비교결과 종래의 모델에 비해 예측정확도가, 식각률의 경우 19%-43%, 프로파일의 경우 10%-56% 정도 향상하였으며, 이는 제안된 기법이 모델개발에 매우 효과적으로 적용될 수 있음을 보여준다.

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Power system analysis and power consumption breakdown for an ac PDP system (AC PDP 시스템의 전원회로 해석과 소비전력 분석)

  • Ahn, Jae-Woo;Ha, Jung-Jun;Choi, Byung-Cho
    • Proceedings of the KIPE Conference
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    • 2001.07a
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    • pp.446-449
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    • 2001
  • This paper presents the results of the power system analysis and power loss breakdown peformed on a 40-inch ac plasma display panel (PDP) TV set. The architecture and function of power system is reviewed. The power flow inside the PDP TV set is presented, and the distribution of the power loss is analyzed. It was found that the sustain driver circuit and power factor correction (PFC) circuit are the two major sources of the power loss. The results of this paper can be used as a preliminary guideline to improve the architecture and efficiency of power systems for ac PDP application systems.

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Characteristics of indium zinc oxide thin films with input power and film thickness (투입전력 및 두께 변화 조건에 따른 Indium zinc oxide 박막의 특성)

  • Rim, You-Seung;Kim, Sang-Mo;Keum, Min-Jong;Son, In-Hwan;Jang, Kyung-Wook;Kim, Kyung-Hwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.406-407
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    • 2007
  • We prepared indium zinc oxide (IZO) thin film for cathode electrode such as an application of flat panel display by using the facing targets sputtering (FTS) method at room temperature. The effects of input power and film thickness were investigated with respect to physical and optical properties of films such as deposition rate, electrical properties, microstructure and transmittance. We could obtain properties of IZO thin films of under $10^{-3}\;{\Omega}-cm$ in resistivity and the thin films of over 90% in transmittance. Also, we obtained IZO thin films which were an amorphous structure.

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Application of Low Temperature Plasma Treatment to the Fabrication of Thin Film Composite Membrane (저온 플라즈마 공정의 복합막 제조에의 응용)

  • 김현일;김성수;전배혁
    • Proceedings of the Membrane Society of Korea Conference
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    • 1998.10a
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    • pp.120-122
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    • 1998
  • 현재 상업화되어있는 RO membrane으로는 크게 asymmetric membrane과 composite membrane으로 구분될 수 있다. Asymmetric membrane의 소재로는 Cellulose acetate나 Cellulose triacetate와 같은 것들이 사용되며 현재에도 많이 사용되고 있으나, 보다 더 우수한 성능을 갖는 분리막을 제조하기 위해 현재에는 주로 composite membrane 형태로 제조된다. 대부분의 composite membrane은 계면중합에 의해 제조되는데 대표적인 membranem으로는 FT-30이 있다. 이 밖에도 support의 표면을 직접 플라즈마 처리하여 복합막을 제조하는 공정이 있으며 polyactrylonitrile과 같은 membrane이 이에 속한다. 플라즈마 처리된 복합막은 처리 대상에 크게 영향을 받지 않고 support 표면에 crosslinking의 형태로 형성되기 때문에 active layer가 매우 안정하며 따라서 우수한 물리화학적 성질을 기대할 수 있다. 이밖에도 분리막 표면을 친수성 단량체로 플라즈마 처리함으로써 분리막 표면에 친수성을 부여하거나 관능기를 도입함으로써 불활성 표면을 활성화 시킬 수도 있는 등의 여러가지 장점을 가지고 있다.

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Effects of High Voltage pulse on Seed Germination and Plant Growth

  • Kim, Taesoo;Park, Gyungsoon;Choi, Eunha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.184.1-184.1
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    • 2013
  • It is generally known that electron beam has sterilization effects and can activate plant germination and growth. Compared to electron beam, electrical pulse has not been frequently studied with respect to the biological application. In this study, we have analyzed the effects of high voltage pulse on seed germination and growth using various plant species. We have used the high voltage generator for examining seed's responses to the high voltage pulse. The operating voltage and currents of the generator are about 300 kV and 30 kA, respectively. Pulse width is 60 ns. High voltage pulse has slightly activated germination and growth of radish during early stage. Various levels of germination and growth are observed in different plant species after treated with high voltage pulse.

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$Al_2O_3$ coating on transparent polycarbonate substrates for the hard-coating application (투명 폴리카보네이트 보호코팅을 위한 산화알루미늄 박막)

  • Kim, Hun;Nam, Kyoung-Hee;Jang, Dong-Su;Lee, Jung-Joong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.51-54
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    • 2007
  • 타겟 전압 제어를 통한 반응성 스퍼터링 방법과 유도결합 플라즈마(ICP: inductively coupled plasma)를 통해 산화알루미늄 박막을 증착하였다. 폴리카보네이트 기판과 산화알루미늄 박막사이의 접착력은 플라즈마 표면처리 하여 향상시켰다. 박막 특성은 ICP power 변화에 대한 경도, 구조, 밀도변화, 투과율, 증착속도, 표면 거칠기 및 잔류응력을 조사하여 보호코팅으로서 성능을 평가하였다.

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