• Title/Summary/Keyword: plasma application

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Passivation properties of SiNx and SiO2 thin films for the application of crystalline Si solar cells (결정질 실리콘 태양전지 응용을 위한 SiNx 및 SiO2 박막의 패시베이션 특성 연구)

  • Jeong, Myung-Il;Choi, Chel-Jong
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.24 no.1
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    • pp.41-45
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    • 2014
  • We have investigated the passivation property of $SiN_x$ and $SiO_2$ thin films formed using various process conditions for the application of crystalline Si solar cells. An increase in the thickness of $SiN_x$ deposited using plasma enhanced chemical vapor deposition (PECVD) led to the improvement of passivation quality. This could be associated with the passivation of Si dangling bonds by hydrogen atoms which were supplied during PECVD deposition. The $SiO_2$ thin films grown using dry oxidation process exhibited better passivation behavior than those using wet oxidation process, implying the dry oxidation process was more effective in the formation of high quality $SiO_2$ thin films. The relative effective life time gradually decreased with increasing dry oxidation temperature. Such a degradation of passivation behavior could be attributed to the increase in interface trap density caused by thermal damages.

Simple and Rapid Liquid Chromatography-Tandem Mass Spectrometry Analysis of Arctigenin and its Application to a Pharmacokinetic Study

  • Thapa, Subindra Kazi;Weon, Kwon-Yeon;Jeong, Seok Won;Kim, Tae Hwan;Upadhyay, Mahesh;Han, Yo-Han;Jin, Jong-Sik;Hong, Seung-Heon;Youn, Yu Seok;Shin, Beom Soo;Shin, Soyoung
    • Mass Spectrometry Letters
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    • v.8 no.2
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    • pp.23-28
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    • 2017
  • Arctigenin is the main active ingredient of Fructus Arctii, which has been reported with a variety of therapeutic activities including anti-cancer, anti-inflammation, anti-virus, and anti-obesity effects. In this study, a simple and sensitive liquid chromatography-tandem mass spectrometry (LC-MS/MS) method was developed and validated for the determination of arctigenin in rat plasma. The assay utilized a simple protein precipitation with methanol and the mobile phase consisted of 100% methanol and water containing 0.1% formic acid (65:35 v/v). Arctigenin and the internal standard (psoralen) were monitored using a positive electrospray turbo ionspray mode with multiple reaction monitoring transitions of m/z $373.2{\rightarrow}136.9$ and m/z $187.2{\rightarrow}130.9$, respectively, and total chromatographic run time was within 5 min. The lower limit of quantification (LLOQ) of arctigenin was 5 ng/mL in the rat plasma. The intra- and inter-day accuracy of arctigenin at LLOQ and matrix-matched quality control samples ranged 97.4 - 104.8% and 97.2 - 102.0%, respectively. The intra-day precision was within 4.80% and the inter-day precision was within 5.92%. Application of the present method was demonstrated through a pharmacokinetic study after intravenous and oral administration of arctigenin in male Sprague Dawley rats.

Comparative Study on Ablation Characteristics of Ti-6Al-4V Alloy and Ti2AlN Bulks Irradiated by Femto-second Laser (펨토초 레이저에 의한 티타늄 합금과 티타늄질화알루미늄 소결체의 어블레이션특성 비교연구)

  • Hwang, Ki Ha;Wu, Hua Feng;Choi, Won Suk;Cho, Sung Hak;Kang, Myungchang
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.18 no.7
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    • pp.97-103
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    • 2019
  • Mn+1AXn (MAX) phases are a family of nano-laminated compounds that possess unique combination of typical ceramic properties and typical metallic properties. As a member of MAX-phase, $Ti_2AlN$ bulk materials are attractive for some high temperature applications. In this study, $Ti_2AlN$ bulk with high density were synthesized by spark plasma sintering method. X-ray diffraction, micro-hardness, electrical and thermal conductivity were measured to compare the effect of material properties both $Ti_2AlN$ bulk samples and a conventional Ti-6Al-4V alloy. A femto-second laser conditions were conducted at a repetition rate of 6 kHz and laser intensity of 50 %, 70% and 90 %, respectively, laser confocal microscope were used to evaluate the width and depth of ablation. Consequently, the laser ablation result of the $Ti_2AlN$ sample than that of the Ti-6Al-4V alloys show a considerably good ablation characteristics due to its higher thermal conductivity regardless of to high densification and high hardness.

Conceptual Design of Soft X-ray Microscopy for Live Biological Samples

  • Kim, Kyong-Woo;Nam, Ki-Yong;Kwon, Young-Man;Shim, Seong-Taek;Kim, Kyu-Gyeom;Yoon, Kwon-Ha
    • Journal of the Optical Society of Korea
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    • v.7 no.4
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    • pp.230-233
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    • 2003
  • This study describes the conceptual design of a soft x-ray microscope system based on a laserbased source for biomedical application with high resolution (${\leq}$50nm). The laboratory scale soft x-ray microscope consists of high power laser plasma x-ray source and grazing incidence mirrors with high reflectivity. The laser plasma source used for developing this system employs Q-switched Nd-YAG pulsed laser. The laser beam is focused on a tantalum (Ta) target. The Wolter type I mirror was used as condenser optics for sample illumination and as objective mirror for focusing on a detector. The fabrication of the Wolter type I mirror was direct internal cutting using ultraprecision DTM. A hydrated biological specimen was put between the two silicon wafers, the center of which was $Si_3N_4$ windows of 100㎚ thickness. The main issues in the future development work are to make a stable, reliable and reproducible x-ray microscope system.

The Characteristics of Titanium Oxide Films Deposited by the Nozzle-type HCP RT-MOCVD (노즐 형태 HCP RT-MOCVD에 의해 증착된 티타늄 산화막 특성)

  • Jung, Il-hyun
    • Applied Chemistry for Engineering
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    • v.17 no.2
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    • pp.194-200
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    • 2006
  • Titanium oxide films were deposited by the nozzle type HCP RT-MOCVD for the application of metal-oxide films. In the case of TTNB, after depositing films, films must be annealed at a proper temperature, but in the case of titanium ethoxide, titanium oxide films could be directly deposited by titanium ethoxide without general annealing. We could confirm that ratio of O to Ti in the films was about 2 : 1 at RF-power of 240 watt, distance between cathode and substrate of 3 cm, deposition time of 20 min, and ratio of Ar to $O_2$ of 1 : 1. Therefore, we could obtain the titanium oxide film deposited by the nozzle type HCP RT-MOCVD without an annealing process and could apply in the metal-oxide deposition process at a low temperature.

A Case Study on the Application of Low Vibration Explosives(LoVEX) in Tunnel Blasting (미진동화약을 적용한 터널발파 사례 연구)

  • Lee, Dong-Hoon;Park, Yun-Seok;Lee, Dong-Hee;Yoo, Joung-Hoon
    • Explosives and Blasting
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    • v.30 no.2
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    • pp.59-65
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    • 2012
  • This study improved constructability and cost efficiency that are disadvantages of existing a mechanical excavation & similar blasting methods(plasma, gel, etc) and introduced cases of development and practical applications of Low vibration explosives(LoVEX) that minimizes blast vibration. The low vibration explosives(LoVEX) is suitable to Type-1 in standard blasting patterns of Ministry of Land, Transport and Maritime Affairs(MLTM) and delay blasting is possible. Moreover, the low vibration explosives improve construction and work efficiency while the level of vibration is reduced to about 60~70% of normal emulsion explosives. Additionally, this study suggested standard blasting patterns, the prediction equation of blasting vibration, and construction methods.

Fabrication of One-Dimensional Graphene Metal Edge Contact without Graphene Exfoliation

  • Choe, Jeongun;Han, Jaehyun;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.371.2-371.2
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    • 2016
  • Graphene electronics is one of the promising technologies for the next generation electronic devices due to the outstanding properties such as conductivity, high carrier mobility, mechanical, and optical properties along with extended applications using 2 dimensional heterostructures. However, large contact resistance between metal and graphene is one of the major obstacles for commercial application of graphene electronics. In order to achieve low contact resistance, numerous researches have been conducted such as gentle plasma treatment, ultraviolet ozone (UVO) treatment, annealing treatment, and one-dimensional graphene edge contact. In this report, we suggest a fabrication method of one-dimensional graphene metal edge contact without using graphene exfoliation. Graphene is grown on Cu foil by low pressure chemical vapor deposition. Then, the graphene is transferred on $SiO_2/Si$ wafer. The patterning of graphene channel and metal electrode is done by photolithography. $O_2$ plasma is applied to etch out the exposed graphene and then Ti/Au is deposited. As a result, the one-dimensional edge contact geometry is built between metal and graphene. The contact resistance of the fabricated one-dimensional metal-graphene edge contact is compared with the contact resistance of vertically stacked conventional metal-graphene contact.

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Study on therapeutic application of toxicity of Uranylnitrate in rats (천연 우라늄 독성에 관한 치료 연구)

  • Ryu, Yong-Wun;Lee, Jhin-Oh;Yun, Taik-Koo
    • Journal of Radiation Protection and Research
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    • v.12 no.2
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    • pp.9-18
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    • 1987
  • The present study has determined BUN, createinine, c-AMP and $PGE_2$ activities as a clinical signs of radiation toxicity caused by uranylnitrate in rats. The significant increasing of $PGE_2$ concentration in plasma between the administration of uranylnitrate and lead nitrate were shown radiotoxic in nature on the effect of radiation energy. The reduction of PGE activities in plasma in uranylnitrate treated rats after furosemide, aldosterone and glucagone I.P. administration have observed the stimulating effect of uranium excretion into cells.

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Thermochemical Stability and Mechanical Properties of Ceramic-Filler Added BaO-ZnO-$B_2O_3$ Based Glass for Application to Barrier Rib in Plasma Display Panels

  • Kim, Sang-Gon;Shin, Hyun-Ho;Park, Jong-Sung;Hong, Kug-Sun;Kim, Hyung-Sun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.220-222
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    • 2004
  • Feasibility of BaO-ZnO-$B_2O_3$ (BZB) based glass system in the light of dielectric and thermal expansion properties are reported in the literature. Effects of addition of various types of ceramic fillers to the BZB-based glass on the thermochemical stability and mechanical properties were investigated in the present work. The studied filler-glass system demonstrated a capability to host various types of ceramic fillers to form thermochemically stable microcomposites at the processing temperature suitable for PDP systems. At the same time, mechanical strength of the filler-glass composites was much improved as compared to the glass itself These observations brighten the feasibility of the Pb-free BZB-based glass system as a host to employ various types of crystalline ceramic fillers so that it can be applied to barrier rib material in plasma display panels.

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The etching characteristics of $(Ba_{0.6}Sr_{0.4})TiO_{3}$ film Using $Ar/CF_{4}$ Inductively Coupled Plasma ($Ar/CF_{4}$ 유도결합 플라즈마로 식각된 $(Ba_{0.6}Sr_{0.4})TiO_{3}$ 박막의 특성분석)

  • Kang, Pill-Seung;Kim, Kyoung-Tae;Kim, Dong-Pyo;Kim, Chang-Il;Lee, Soo-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05b
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    • pp.16-19
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    • 2002
  • (Ba,Sr)TiO3(BST) thin film is an attractive material for the application in high-density dynamic random access memories (DRAMs) because of the high relative dielectric constant and small variation in dielectric properties with frequency. In this study, (Ba0.6,Sr0.4)TiO3 thin films on Pt/Ti/SiO2/Si substrates were deposited by a sol-gel method and the CF4/Ar inductively coupled plasma (ICP) etching behavior of BST thin films had been investigatedby varying the process parameters such as chamber pressure, ICP power, and substrate bias voltage. To analysis the composition of surface residue following etching BST films etched with different Ar/CF4 gas mixing ratio were investigated using x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometer (SIMS).

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