• Title/Summary/Keyword: plasma application

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A Study on the Preparation and Resist Characterization of the Plasma Polymerized Thin Films (플라즈마중합막의제작과레지스트 특성에 관한 연구)

  • 이덕출;박종관;한상옥;김종석;조성욱
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.43 no.5
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    • pp.802-808
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    • 1994
  • The purpose of this paper is to describe an application of plasma polymerized thin film as an electron beam resist. Plasma polymerized thin film was prepared using an interelectrode capacitively coupled gas-flow-type reactor, and chosen methylmethacrylate(MMA)and methylmethacrylate-tetrameth-yltin(MMA-TMT) as a monomer. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage of 30kV and an expose dose ranging from 20 to 900$\mu$C/cmS02T. The delineated pattern in the resist was developed with the same reactor which is used for polymerization using an argon as etching gas. The growth rate and etching rate of the thin film is increased with increasing of discharge power. Thin films by plasma polymerization show polymerization rate of 30~45($\pm$3) A/min, and etching rate of 440($\pm$30) A/min during Ar plasma etching at discharge power of 100W. In apparently lower than that of conventional PMMA, but the plasma-etching rate of PP(MMA-TMT) was higher than that of PPMMA.

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Optical properties of the $O_2$ plasma treatment on BZO (ZnO:B) thin films for TCO of a-Si solar cells

  • Yoo, Ha-Jin;Son, Chang-Gil;Cho, Won-Tea;Park, Sang-Gi;Choi, Eun-Ha;Kwon, Gi-Chung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.454-454
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    • 2010
  • In order to achieve a high efficient a-Si solar cell, the TCO (transparent conductive oxide) substrates are required to be a low sheet resistivity, a high transparency, and a textured surface with light trapping effect. Recently, a zinc oxide (ZnO) thin film attracts our attention as new coating material having a good transparent and conductive for TCO of solar cells. In this paper the optical properties of $H_2$ post-treated BZO (boron doped ZnO, ZnO:B) thin film are investigated with $O_2$-plasma treatment. The BZO thin films by MOCVD (Metal Organic Chemical Vapor Deposition) are investigated and the samples of $H_2$ post-treated BZO thin film are tested with $O_2$-plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. We measured the optical properties and surface morphology of BZO thin film with and without $O_2$-plasma treatment. The optical properties such as transmittance, reflectance and haze are measured with integrating sphere and ellipsometer. This result of the BZO thin film with and without $O_2$-plasma treatment is application to the TCO for solar cells.

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Oxidative Etching of Imprinted Nanopatterns by Combination of Vacuum Annealing and Plasma Treatment

  • Park, Dae Keun;Kang, Aeyeon;Jeong, Mira;Lee, Jae-Jong;Yun, Wan Soo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.251.1-251.1
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    • 2013
  • Combination of oxidative vacuum annealing and oxygen plasma treatment can serve as a simple and efficient method of line-width modification of imprinted nanopatterns. Since the vacuum annealing and oxygen plasma could lead mass loss of polymeric materials, either one of the process can yield a narrowed patterns. However, the vacuum annealing process usually demands quite high temperatures (${\geq}300^{\circ}C$) and extended annealing time to get appreciable line-width reduction. Although the plasma treatment may be considered as an effective low temperature rapid process for the line-width reduction, it is also suffering for the lowered controllability on application to very fine patterns. We have found that the vacuum annealing temperature can be lowered by introducing the oxygen in the vacuum process and that the combination of oxygen plasma treatment with the vacuum annealing could yield the best result in the line-with reduction of the imprinted polymeric nanopatterns. Well-defined line width reduction by more than 50% was successfully demonstrated at relatively low temperatures. Furthermore, it was verified that this process was applicable to the nanopatterns of different shapes and materials.

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Quantification of Fargesin in Mouse Plasma Using Liquid Chromatography-High Resolution Mass Spectrometry: Application to Pharmacokinetics of Fargesin in Mice

  • Lee, Min Seo;Lim, Chang Ho;Bang, Young Yoon;Lee, Hye Suk
    • Mass Spectrometry Letters
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    • v.13 no.1
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    • pp.20-25
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    • 2022
  • Fargesin, a tetrahydrofurofuranoid lignan isolated from Flos Magnoliae, shows anti-inflammatory, anti-oxidative, anti-allergic, and anti-hypertensive activities. To evaluate the pharmacokinetics of fargesin in mice, a sensitive, simple, and selective liquid chromatography-high resolution mass spectrometric method using electrospray ionization and parallel reaction monitoring mode was developed and validated for the quantification of fargesin in mouse plasma. Protein precipitation of 6 µL mouse plasma with methanol was used as sample clean-up procedure. The standard curve was linear over the range of 0.2-500 ng/mL in mouse plasma with the lower limit of quantification level at 0.2 ng/mL. The intra- and inter-day coefficient variations and accuracies for fargesin at four quality control concentrations including were 3.6-11.3% and 90.0-106.6%, respectively. Intravenously injected fargesin disappeared rapidly from the plasma with high clearance values (53.2-55.5 mL/min/kg) at 1, 2, and 4 mg/kg doses. Absolute bioavailability of fargesin was 4.1-9.6% after oral administration of fargesin at doses of 1, 2, and 4 mg/kg to mice.

Research on the cable-driven endoscopic manipulator for fusion reactors

  • Guodong Qin;Yong Cheng;Aihong Ji;Hongtao Pan;Yang Yang;Zhixin Yao;Yuntao Song
    • Nuclear Engineering and Technology
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    • v.56 no.2
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    • pp.498-505
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    • 2024
  • In this paper, a cable-driven endoscopic manipulator (CEM) is designed for the Chinese latest compact fusion reactor. The whole CEM arm is more than 3000 mm long and includes end vision tools, an endoscopic manipulator/control system, a feeding system, a drag chain system, support systems, a neutron shield door, etc. It can cover a range of ±45° of the vacuum chamber by working in a wrap-around mode, etc., to meet the need for observation at any position and angle. By placing all drive motors in the end drive box via a cable drive, cooling, and radiation protection of the entire robot can be facilitated. To address the CEM motion control problem, a discrete trajectory tracking method is proposed. By restricting each joint of the CEM to the target curve through segmental fitting, the trajectory tracking control is completed. To avoid the joint rotation angle overrun, a joint limit rotation angle optimization method is proposed based on the equivalent rod length principle. Finally, the CEM simulation system is established. The rationality of the structure design and the effectiveness of the motion control algorithm are verified by the simulation.

Molecular Emission of CF4 Gas in Low-pressure Inductively Coupled Plasma

  • Jung, T.Y.;Kim, D.H.;Lim, H.B.
    • Bulletin of the Korean Chemical Society
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    • v.27 no.3
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    • pp.373-375
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    • 2006
  • $CF_4$ gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of $CF_4$ gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other $CF_x$ radicals, such as $CF_2$ and $CF_3$, were not seen in this experiment whereas strong C and $C_2$ emissions, dissociation products of $CF_4$ gas, were observed.

Plasma를 통한 기판 전처리가 구리박막 성장에 미치는 영향

  • Jin, Seong-Eon;Choe, Jong-Mun;Lee, Do-Han;Lee, Seung-Mu;Byeon, Dong-Jin;Jeong, Taek-Mo;Kim, Chang-Gyun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.11a
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    • pp.29.1-29.1
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    • 2009
  • 반도체 공정에서의 금속 배선 공정은 매우 중요한 공정 중 하나이다. 기존에 사용되던 알루미늄이 한계에 다다르면서, 대체 재료로 사용되고있는 구리는 낮은 비저항, 높은 열전도도, 우수한 electromigration(EM)저항특성 등을 바탕으로 차세대 nano-scale집적회로의 interconnect application에 적합한 금속재료로서 각광받고 있다. Electroplating을 위한 구리 seed layer CVD 공정은 타 공정에 비해 step coverage가 우수한 막을 증착할 수 있어 고집적 소자의 구현이 가능하다. 본 연구에 이용된 2가 전구체 Cu(dmamb)2는 높은 증기압과 높은 활성화 에너지를 가짐으로서 열적안정성 및 보관안정성이 우수하며, 플루오르를 함유하지 않아 친환경적이다. 구리 증착 전 기판에 plasma 처리를 하면 표면 morphology가 변함에 따라 표면 에너지가 변화하고, 이는 구리의 2차원 성장에 유리하게 작용할 것으로 여겨진다. Plasma의 조건변화에 따른 기판의 morphology 변화 및 성막된 구리의 특성 변화를 분석하였다.

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A Study on FEM Application in PIC Plasma Simulation (PIC 플라즈마 시뮬레이션에서의 유한요소법 적용에 관한 연구)

  • Min, Woong-Kee;Kim, Hyeong-Seok;Lee, Seok-Hyun;Hahn, Song-Yop
    • Proceedings of the KIEE Conference
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    • 1996.07a
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    • pp.163-165
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    • 1996
  • In the PIC simulation of plasma, the fields are commonly calculated on uniform spatial grids using FDM. But, FDM has a difficulty in modeling a complex shaped model. FEM has a good flexibiblity in treating a complex shape, so that we calculated the field by using FEM not FDM. In this paper, the plasma between plane-to-plane electrodes was simulated using FEM and FDM. Comparing the results of those two methods told us that FEM is also valid as a calculating method in PIC plasma simulation. In order to verify the use of FEM, the discharge of rod-to-plane was simulated. There was not a little distortion of the electric field between the electrodes due to the distribution of space charges.

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Plasma Channel Expansion in a Laser-Induced Plasma (LIP) Using a Focused Laser Beam (집속된 레이저빔에 의한 레이저 유도 플라즈마 채널의 형성 및 팽창에 관한 연구)

  • Kim, Jong-Uk;Kim, Chang-Bum;Kim, Guang-Hoon;Lee, Hae-June;Hyyong Suk
    • Proceedings of the Optical Society of Korea Conference
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    • 2002.07a
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    • pp.240-241
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    • 2002
  • Propagation of an intense laser pulse through fully ionized plasma has been an interesting topic in many fields. It includes laser-driven electron accelerators,(1) generation of high harmonics,(2) soft x-ray laser development(3) and so on. Specifically, in the application of laser-driven electron accelerators a large laser-plasma interaction length is required to get sufficient acceleration energy of electron. (omitted)

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Application Research on LPG Injector type Plasma Reformer (LPG 인젝터형 플라즈마 개질기 적용연구)

  • Kim, Changup;Lee, Deahoon
    • Journal of the Korean Institute of Gas
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    • v.18 no.1
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    • pp.1-7
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    • 2014
  • In this study, plasma reformer technology with a LPG injector was investigated. It was developed with injection of LPG fuel and air in a region where the plasma discharge to make the thermal decomposition carbon fuel and to generate additional hydrogen. As a result of reforming test, when power is 70~100W supply, about HC 0.7% of the full reformed gas and hydrogen was generated from 1.2 to 1.5 %.