• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.668-671
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• 2009

Photosensitive polyimide containing methoxy cinnamate derivatives as a photo-alignment layer is investigated. The anisotropy of alignment layer was induced by irradiation linearly polarized UV (LPUV). We studied the effect of the methoxy cinnamate groups on alignment LCs.

• Electrical & Electronic Materials
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• v.9 no.1
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• pp.59-66
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• 1996

Polyimides containing cyclobutane ring in main chain is known to be thermally stable and able to be developed in organic solvents after photolysis with 254 nm UV light. This type of polyimides can be used as promising positive photoresist in VLSI fabrication process. In the current VLSI process, photoresist films are formed by spin coating. The film thickness is more than several hundred nano meters. It seems that there is room for improvement of film coating process by introducing Langmuir Blodgett technique. Thereby ultra thin film photoresist can be formed, and higher density of integration in VLSI be achieved. In the present work, depositing procedure of LB films of this polyimide was investigated. LB film thickness was measured by ellipsometry to evaluate deposited film status. Chemical imidization procedure was studied to avoid several problems in thermal imidization. The pattern of submicron dimension has successfully formed on LB film of 8nm thick, which found showing good contrast.

• Journal of the Korean Applied Science and Technology
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• v.15 no.4
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• pp.21-25
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• 1998

Organic-based electroluminescent devices have attracted lots of interests because of their possible application as a large-area flat panel display. Polyimides have been used for photo-alignment in LCD(Liquid Crystal Display). However, the devices used in this study were fabricated with polyimide doped with N,N'-Diphenyl-N,N'-di(m-tolyl)-benzidine(TPD) (3, 10, 30wt%) for electroluminescent hole tranforting layer(EHTL). The photochemical and physical properties of EHTL was studied. The film thicknesses were reduced under illumination with UV light. Polyimide films doped with TPD(3wt%) was irradiated and the electrical properties of the films were studied.

• Polymer(Korea)
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• v.28 no.6
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• pp.494-501
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• 2004

A new alkali developable photosensitive poly(amic acid) (PAA-0) with transmittance at 400 nm was synthesized from cyclobutane-1,2,3,4-tetracarboxylic dianhydride, 2-(methacryloyloxy)ethyl-3,5-diamino-benzoate and 1,3-bis(3-aminopropyl)-1,1,3,3-tetramethyl disiloxane in N-methyl-2-pyrrolidinone. Photosensitivity of the PAA-0 was investigated at 365-400 nm in the presence of a photoinitiator using a high pressure mercury lamp. The photo-cured poly(amic acid) was insoluble toward aqueous 2.38 wt% tetramethylammonium hydroxide solution. Negative pattern of the PAA-0 with 25 ${\mu}{\textrm}{m}$ resolution was obtained by developing with 2.38 wt% tetramethylammonium hydroxide solution after exposure of 600 mJ/$\textrm{cm}^2$ in the presence of 2,2-dimethoxy-2-phenyl-acetophenone as a photoinitiator. The patterned poly(amic acid) was converted to polyimide by thermal curing at 25$0^{\circ}C$ for 50 min, which showed chemical resistance against photoresist stripper as well as good transmittance at 400 nm.

• Polymer(Korea)
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• v.26 no.6
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• pp.701-709
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• 2002

To synthesize a new positive photosensitive polyimide precursor, parts of carboxylic acid groups in poly (amic acid) were esterified with 4,5-dimethoxy-2-nitrobenzyl bromide in the presence of K$_2$CO$_3$/HMPA followed by the chemical imidization of residual carboxylic acid units. The chemical structure of resulting polymer was characterized by $^1$H-NMR, UV/vis and FT-IR spectroscopic methods, and its thermal properties were examined by DSC and TGA. Upon UV irradiation, 4,5-dimethoxy-2-nitrobenzyl moiety underwent the photodegradation. As a result, the polymer became soluble in alkaline developer due to the formation of carboxylic acid moiety, which was used to make a micron-sized positive pattern. Sensitivity curves were obtained from the gel fraction experiments with respect to the various 4,5-dimethoxy-2-nitrobenzyl ester contents. From those curves, the sensitivity was ranged iron 4000 to 6000 mJ/㎠, and the contrast was measured to be from 3.1 to 4.9.

• Polymer(Korea)
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• v.30 no.2
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• pp.97-107
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• 2006

In spite of excellent thermomechanical performance the majority of aromatic polyimides are so poor in processability due to their high backbone rigidity that their applications are greatly limited. The introduction of long side chains not only enhances their processiblity but also makes useful contribution to discovering new application fields. In this article, a variety of novel aromatic polyimides with flexible side chains were prepared either from new dimines or new dianhydrides to measure the influence of the side chains on structure and properties of the polymers and their new applications as liquid crystal alignment layers, photosensitive polymers, alternating multilayer nano-films and photoluminescent materials are discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1625-1628
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• 2006

Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFTLCD array. In the case of photocurable polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then was incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimde were also formulated. For photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared. An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that viaholes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.480-483
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• 2005

We report on studies of photoalignment of cholesteric liquid crystals on photosensitive phenylon-based polymer. We found that reflective and electro-optical characteristics of cholesteric cells strongly depend on UV exposure doze. The optimized UV treatment of the polymer allowed us to obtain the same quality of alignment on standard rubbed polyimide orientants. At the same time, the photosensitive orientant possesses evident advantage of the effective control of cholesteric textures

• Macromolecular Research
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• v.8 no.4
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• pp.172-178
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• 2000

We synthesized polymethacrylate and polyurethane bearing a photosensitive azobenzene chromophore. Photo-induced birefringence of the thin film was observed under a linearly polarized light(λ = 532 nm). Dynamic behaviors of birefringence in two polymers were investigated in terms of the rate constants of growth and decay. An induced dichroism was observed from polarized UV-VIS absorption spectroscopy. Layers of two photosensitive polymers were used for aligning liquid crystal (LC) molecules instead of one of the rubbed polyimide layers in the conventional twisted nematic cell. For producing homogeneous alignment of a nematic LC molecule, a linearly polarized light was exposed to the films of two polymers. The stability of the LC alignment upon the linearly polarized light exposure was also studied.

• Macromolecular Research
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• v.9 no.5
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• pp.247-252
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• 2001

Tricyclic aliphatic dianhydride monomer, tricycle[4.2.2.0]dec-9-ene exo, endo-3,4: 7,8-tetra-carboxylicdianhydride (TCDDA), was synthesized by photochemical reaction and poly(amic acid)s from TCDDA and diamines such as 1,4-bis-(4-aminophenoxy)benzene (BAB), 2,2-bis(4-(4-aminophenoxy) phenyl) propane (BAPP), 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane (BAPHF), bis(4-(4-ami-nophenoxy) phenyl)sulfone (BAPS), and 1,4-bis-(4-aminophenoxy)biphenyl (BABP) were prepared. The inherent viscosities of the poly(amic acid)s were between 0.39 and 0.50 dL/g. The poly(amic acid)s were converted to polyimide films by thermal imidization. The glass transition temperatures (T$\_$g/) of the polyimides were in the range of 201-263$\^{C}$. The thermogravimetric analysis (TGA) thermogram of these polyimides showed the temperatures of 5% weight losses between 375 and 393$\^{C}$ in nitrogen atmosphere. To show their utility for image generation, degradations of these polyimides in UV exposure were investigated by UV spectroscopy.