• Title/Summary/Keyword: photochemical process

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Photochemical Kinetics of Maleic to Fumaric Acid on Silver Nanoparticle Surfaces

  • Jang, Nak-Han;Jeong, Dae-Hong;Suh, Jung-Sang
    • Bulletin of the Korean Chemical Society
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    • v.26 no.5
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    • pp.791-794
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    • 2005
  • A visible photochemistry of maleic to fumaric acid adsorbed on silver nanoparticle surfaces was investigated as probed by SERS using a simple flow method. Photoisomerization of maleic to fumaric acid was consecutively observed in the condition of various flow rates, which varied the exposure time of laser beam. The sequential SERS spectra of maleic acid indicated that the photochemical isomerization and desorption took place simultaneously on silver nanoparticle surfaces as a function of laser fluency and wavelength. For 530.9nm laser line excitation, the rate constant coefficients were obtained with a = 5.9 $sec^{-1}$ mW for isomerization and b = 13.9 $sec^{-1}$ mW for desorption, which $k_1\;=\;aI^n\;and\;k_2\;=\;bI^m$. Both reactions were one photon process (n = 1, m = 1) of a visible light and relatively fast process whose decay time was in the range of milli-second for 50 mW laser power. The rate of photochemical reaction increased on going toward the blue and photodesorption was a dominant process. A simple flow method used in this study was very useful to study a relatively fast photochemical reaction of molecules adsorbed on silver nanoparticle surfaces.

Case study of ozone photochemistry in the Seoul metropolitan area during the summer 2003 (2003년 여름동안 서울지역에서의 오존의 광화학적 특성에 대한 사례 연구)

  • Shon Zang-Ho
    • Journal of Environmental Science International
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    • v.14 no.8
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    • pp.749-760
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    • 2005
  • This study examines the local ozone photochemistry in the urban air. The photochemical formation and destruction of ozone was modeled using a photochemical box model. For the model prediction of ozone budget, measurements were carried out from an urban monitoring station in Seoul ($37.6^{\circ}N,\;127^{\circ}E$), Korea for intensive sampling time period (Jun. $1\~15$, 2003). Photochemical process is likely to play significant role in higher ozone concentrations during the sampling period. The results of model simulation indicated that photochemical ozone production pathway was the reaction of NO with $HO_2$ while ozone destruction was mainly controlled by a photochemical destruction pathway, a reaction of $H_2O$ with $O(^1D).$ The contribution of NMHCs to formation and destruction of ozone in the urban was significant. This was entirely different from remote marine environment. The rates of net photochemical ozone production ranged from 0.1 to 1.3 ppbv $h^{-1}$ during the study period.

Electric-field Assisted Photochemical Metal Organic Deposition for Forming-less Resistive Switching Device (전기장 광화학 증착법에 의한 직접패턴 비정질 FeOx 박막의 제조 및 저항변화 특성)

  • Kim, Su-Min;Lee, Hong-Sub
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.4
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    • pp.77-81
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    • 2020
  • Resistive RAM (ReRAM) is a strong candidate for the next-generation nonvolatile memories which use the resistive switching characteristic of transition metal oxides. The resistive switching behaviors originate from the redistribution of oxygen vacancies inside of the oxide film by applied programming voltage. Therefore, controlling the oxygen vacancy inside transition metal oxide film is most important to obtain and control the resistive switching characteristic. In this study, we introduced an applying electric field into photochemical metal-organic deposition (PMOD) process to control the oxidation state of metal oxide thin film during the photochemical reaction by UV exposure. As a result, the surface oxidation state of FeOx film could be successfully controlled by the electric field-assisted PMOD (EFAPMOD), and the controlled oxidation states were confirmed by x-ray photoelectron spectroscopy (XPS) I-V characteristic. And the resistive switching characteristics with the oxidation-state of the surface region could be controlled effectively by adjusting an electric field during EFAPMOD process.

A Review on the Photochemical Oxidant Modeling as Applied to Air Quality Studies in Complex Terrain

  • Hwa-Woon Lee;Yoo
    • Journal of Environmental Science International
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    • v.1 no.1
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    • pp.19-33
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    • 1992
  • The high oxidants, which occur the daily maximum concentrations in the afternoon, are transported into the other region via long range transport mechanisms or trapped within the shallow mixing boundary layer and then removed physically (deposition, transport by mountain wind, etc.) and chemically (reaction with local sources). Therefore, modeling formation of photochemical oxidants requires a complex description of both chemical and meteorolog ital processecs . In this study, as a part of air quality studies, we reviewed various aspects of photochemical modeling on the basis of currently available literature. The result of the review shows that the model is based on a set of coupled continuity equations describing advection, diffusion, transport, deposition, chemistry, emission. Also photochemical oxidant models require a large amount of input data concerned with all aspects of the ozone life cycle. First, emission inventories of hydrocarbon and nitrogen oxides, with appropriate spatial and temporal resolution. Second, chemical and photochemical data allowing the quantitative description of the formation of ozone and other photochemically-generated secondary pollutants. Third, dry deposition mechanisms particularly for ozone, PAN and hydrogen peroxide to account for their removal by absorption on the ground, crops, natural vegetation, man-made and water surfaces. Finally, meteorological data describing the transport of primary pollutants away from their sources and of secondary pollutants towards the sensitive receptors where environmental damage may occur. In order to improve our present study, shortcomings and limitation of existing models are pointed out and verification Process through observation is emphasized.

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A Study on the Characteristics of the Functional Groups of the Alkanethiol Molecules in UV Laser Photochemical Patterning and Wet Etching Process (UV Laser를 이용한 광화학적 패터닝과 습식에칭에 따른 알칸티올 분자 작용기의 특성 연구)

  • Huh, Kab-Soo;Chang, Won-Seok
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.5
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    • pp.104-109
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    • 2007
  • Photochemical patterning of self-assembled mono layers (SAMs) has been performed by diode pumped solid state (DPSS) 3rd harmonic Nd:$YVO_4$ laser with wavelength of 355 nm. SAMs patternings of parallel lines have subsequently been used either to generate compositional chemical patterns or fabricate microstructures by a wet etching. This paper describes a selective etching process with patterned SAMs of alkanetiolate molecules on the surface of gold. SAMs formed by the adsorption of alkanethiols onto gold substrate employs as very thin photoresists. In this paper, the influence of the interaction between the functional group of SAMs and the etching solution is studied with optimal laser irradiation conditions. The results show that hydrophobic functional groups of SAMs are more effective for selective chemical etching than the hydrophilic ones.

Excimer laser induced ablation of PMMA and PET (엑시머 레이저를 이용한 PMMA와 PET의 가공)

  • Shin, Dong-Sik;Lee, Je-Hoon;Seo, Jung;Kim, Do-Hoon
    • Laser Solutions
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    • v.6 no.1
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    • pp.33-40
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    • 2003
  • The ablative decomposition mechanism of PMMA(polymethyl methacrylate) and PET(polyethylene terephthalate) with KrF excimer laser(λ : 248nm, pulse duration: 5㎱) is investigated. The UV/Vis spectrometer analysis showed that PMMA is a weak absorber and PET is a strong absorber at the wavelength of 248nm. The results(surface debris, melt, etch depth, etching shape) from drilling and direct writing experiments imply that ablation mechanism of PMMA is dominated by photothermal process, while that of PET is dominated by photochemical process.

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A study of excimer laser ablation of polymer (폴리머의 엑시머레이저 어블레이션에 관한 연구)

  • Shin, Dong-Sik;Lee, Je-Hoon;Seo, Jung;Kim, Do-Hoon
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.1857-1860
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    • 2003
  • The ablative decomposition mechanism of PMMA(polymethyt methacrylate), PET(polyethylene terephthalate) and PC(polycarbonate) with KrF excimer laser(λ: 248nm, pulse duration: 5ns) is investigated. The UV/Vis spectrometer analysis showed that PMMA is a weak absorber and PET, PC are a strong absorber at the wavelength of 248nm. The results(surface debris, melt, etch depth, etching shape) from drilling and direct writing experiments imply that ablation mechanism of PMMA is dominated by photothermal process, while that of PET, PC are dominated by photochemical process.

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Excimer Laser Ablation of Polymer for Electroformed Mold (전주금형 제작을 위한 폴리머의 엑시머 레이저 어블레이션)

  • Lee Jae Hoon;Shin Dong Sig;Suh Jeong;Kim To Hoon
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.12
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    • pp.13-20
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    • 2004
  • Manufacturing process for the microfluidic device can include such sequential steps as master fabrication, electroforming, and injection molding. The laser ablation using masks has been applied to the fabrication of channels in microfluidic devices. In this study, manufacturing of polymer master and mold insert for micro injection molding was investigated. Ablation of PET (polyethylene terephthalate) by the excimer laser radiation could be used successfully to make three dimensional master fur nickel mold insert. The mechanism fur ablative decomposition of PET with KrF excimer laser $({\lambda}: 248 nm, pulse duration: 5 ns)$ was explained by photochemical process, while ablation mechanism of PMMA (polymethyl methacrylate) is dominated by photothermal process, the .eaction between PC (polycarbonate) and KrF excimer laser beam generate too much su.face debris. Thus, PET was adopted in polymer master for nickel mold insert. Nickel electroforming using laser ablated PET master was preferable for replication method. Finally, it was shown that excimer laser ablation can substitute for X-ray lithography of LIGA process in microstructuring.

Decrease of Photochemical Efficiency Induced by Methyl Viologen in Rice(Oryza sativa L.) Leaves is Partly due to the Down-Regulation of PSII

  • Kim, Jin-Hong;Lee, Choon-Hwan
    • Journal of Photoscience
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    • v.9 no.3
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    • pp.65-70
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    • 2002
  • In the rice leaves treated with methyl viologen (MV), the photochemical efficiency of PSII (or $F_{v/}$F $m_{m}$) was significantly decreased, and significant portion of the photoinactivation process was reversible during the dark-recovery. The dark-reactivation process was relatively slow, reaching its plateau after 2-2.5 h of dark incubation. The damaged portion of functional PSII was 13%, based on the value of I/ $F_{o}$- I/ $F_{m}$ after this dark-recovery period. The reversible photoinactivation process of PSII function in the MV-treated leaves consisted of a xanthophyll cycle-dependent development of NPQ and a xanthophyll cycle-independent process. The latter process was reversible in the presence of nigericin. As well as the increase in the values of Chl fluorescence parameters, the epoxidation process during the dark-recovery after the MV-induced photooxidation was very slow. These results suggest that the photooxidative effect of MV is partly protected by the down-regulation of PSII before inducing physical damages in core proteins of PSII.I.I.I.I.

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