• Korean Journal of Materials Research
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• v.19 no.9
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• pp.481-487
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• 2009

The photocatalysts of Fe-ACF/$TiO_2$ compositeswere prepared by the sol-gel method and characterized by BET, XRD, SEM, and EDX. It showed that the BET surface area was related to adsorption capacity for each composite. The SEM results showed that ferric compound and titanium dioxide were distributed on the surfaces of ACF. The XRD results showed that Fe-ACF/$TiO_2$ composite only contained an anatase structure with a Fe mediated compound. EDX results showed the presence of C, O, and Ti with Fe peaks in Fe-ACF/$TiO_2$ composites. From the photocataytic degradation effect, $TiO_2$ on activated carbon fiber surface modified with Fe (Fe-ACF/$TiO_2$) could work in the photo-Fenton process. It was revealed that the photo-Fenton reaction gives considerable photocatalytic ability for the decomposition of methylene blue (MB) compared to non-treated ACF/$TiO_2$, and the photo-Fenton reaction was improved by the addition of $H_2O_2$. It was proved that the decomposition of MB under UV (365 nm) irradiation in the presence of $H_2O_2$ predominantly accelerated the oxidation of $Fe^{2+}$ to $Fe^{3+}$ and produced a high concentration of OH radicals.

• Journal of Environmental Health Sciences
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• v.30 no.5 s.81
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• pp.358-365
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• 2004

The photocatalytic oxidation of Rhodamine B(RhB) was studied using photocatalytic reactor filled with module of quartz tube. Module of quartz tube consisted of small quartz tube (inner diameter, 1.5 mm; outer diameter, 3 mm) bundle coated with powder $TiO_2$ and uncoated large quartz tube (inner diameter, 20 mm; outer diameter, 22 mm). Two 30 W germicidal lamp was used as the light source and the reactor volume was 0.5 l. The effects of parameters such as the coating materials and numbers, initial concentration, $H_{2}O_2$ dose and metal deposition (Ag, Pt and Fe) and simultaneous application of $H_{2}O_2$ and metal deposition. The results showed that the initial reaction constant of quartz module coated with powder $TiO_2$ was higher 1.4 time than that of the $TiO_2$ sol and optimum coating number is twice. In order to increase reaction rate, simultaneous application of photocatalytic and photo-fenton reaction using Fe coating and dose $H_{2}O_2$ dose increased reaction rate largely.

• KSCE Journal of Civil and Environmental Engineering Research
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• v.28 no.4B
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• pp.441-447
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• 2008

Volatile organic compounds (VOCs) emitted from various industrial sources commonly consist of biodegradable chemicals and recalcitrant compounds. Therefore, it is not effective to employ a single method to treat such mixtures. In this study, a novel hybrid system coupled with a ultraviolet (UV) photolysis reactor and a biofilter in a series was developed and evaluated using toluene and TCE as model VOCs. When only TCE was applied to the UV reactor, greater than 99% of TCE was degraded and the concentration of soluble byproducts from photo-oxidation reaction increased significantly. However, the toluene and TCE mixture was not effectively degraded by the UV photo-oxidation standalone process. The hybrid system showed high toluene removal efficiencies, and TCE degradation at a low toluene/TCE ratio was improved by UV pretreatment. These findings indicated that the UV photo-oxidation were effective for TCE degradation when the concentration of toluene in the mixture was relatively low. A restively high toluene content in the mixture resulted in an inhibition of TCE degradation. Thus, chemical interactions in both photo-oxidation and biodegradation need to be carefully considered to enhance overall performance of the hybrid system.

• Nuclear Engineering and Technology
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• v.51 no.8
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• pp.1957-1963
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• 2019

A UVC photo-Fenton advanced oxidation process (AOP) was studied to develop a process for the decomposition of oxalic acid waste generated in the chemical decontamination of nuclear power plants. The oxalate decomposition behavior was investigated by using a UVC photo-Fenton reactor system with a recirculation tank. The effects of the three operational variables-UVC irradiation, H₂O₂ and Fenton reagent-on the oxalate decomposition behavior were experimentally studied, and the behavior of the decomposition product, CO₂, was observed. UVC irradiation of oxalate resulted in vigorous CO₂ bubbling, and the irradiation dose was thought to be a rate-determining variable. Based on the above results, the oxalate decomposition kinetics were investigated from the viewpoint of radical formation, propagation, and termination reactions. The proposed UVC irradiation density model, expressed by the first-order reaction of oxalate with the same amount of H₂O₂ consumption, satisfactorily predicted the oxalate decomposition behavior, irrespective of the circulate rate in the reactor system within the experimental range.

• Journal of Korean Society of Water and Wastewater
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• v.12 no.1
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• pp.88-95
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• 1998

The Electron/Hole Pair is generated when the Activation Energy produces by Ultraviolet Ray illumination to the Semiconductor. And $OH^-$ ion produces by Water Photo-Cleavage reacts with Positive Hole. As a result, OH Radical acting as strong oxidant is generated and then Photocatalytic Oxidation Reaction occurs. The Photocatalytic Oxidation can oxidize the chlorophenol to Chloride and Carbon Dioxide easier, safer and shorter than conventional Water Treatment Process With the same degree of chlorination, the $Cl^-$ ion at para (C4) position is most easily replaced by the OH radical. And then, the blocking effect of $OH^-$ ion between the $Cl^-$ ions and $Cl^-$ ions at symmetrical location is easily replaced by the OH radical. For mono-, di-, tri-chlorophenols, there is no obvious difference in decomposition rate, decomposition efficiency and completeness of the decomposition reaction except for 2,3-dichloropheno, 2,4,5-, 2,3,4-trichlorophenol. The decomposition efficiency is higher than 75% and completeness of the decomposition reaction is higher than 70%. Therefore, continuous flow photocatalytic reactor is promising process to remove the chlorinated aromatic compounds which is more toxic than non-chlorinated aromatic compound.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.177-180
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• 2000

We studied the degradation of EVA for the protection of solar cell by UV-rays irradiation. We investigated the reduction of electrical efficiency, photo transmmitance and degradation of EVA by UV-rays irradiation. We utilized the UV irradiation equiped with fluorescent 313nm UV lamp and radiated for 400 hours. For the chemial analysis, we used the UV-vis spectrometer, XPS and examined the degradation mechanism by UV irradiation. It is found that the discolored phenomena, the decrease of photo transmmitance and oxidation reaction is occured by UV irradiation on the EVA sample for the protection of solar cell.

• Journal of Korean Society of Water and Wastewater
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• v.24 no.1
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• pp.109-117
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• 2010

In the present study, the degradation characteristics of Lindane by Advanced Oxidation Processes(UV/$H_2O_2$, Photo-Fenton process) were studied. The degradation efficiency of Lindane in aqueous solution was investigated at various initial pH values, Fenton's reagent concentrations and initial concentrations of Lindane. GC-ECD was used to analyze lindane. Lindane has not been degraded without application of AOPs over two hours. But, approximately 5% of lindane was degraded with UV or $H_2O_2$ alone. Lindane with UV/$H_2O_2$ process showed approximately 7% higher removal efficiency than $H_2O_2$ process. In the UV/$H_2O_2$ process, the pH values did not affect the removal efficiency. The optimal mole ratio of $H_2O_2/Fe^{2+}$ for lindane degradation is about 1.0 in Photo-Fenton process. Also, the experimental results showed that lindane removal efficiency increased with the decrease of initial concentration of lindane. Under the same conditions, the order lindane of removal efficiency is as following : Photo-Fenton process > UV/$H_2O_2$ process > $H_2O_2$ process. In addition, intermediate products were identified by GC-MS techniques. Than PCCH(Pentachlorocyclohexene) was identified as a reaction intermediate of the Photo-Fenton process.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.11
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• pp.985-993
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• 2006

An experiment to find out the removal mechanism of PEG(polyethyleneglycol) by using UV-enhanced $O_2$ GPC (gas phase cleaning) at low substrate temperature below $200^{\circ}C$ was executed under various process conditions, such as substrate temperature, UV exposure, and $O_2$ gas. The possibility of using $UV/O_2$ GPC as a low-temperature in-situ cleaning tool for organic removal was confirmed by the removal of a PEG film with a thickness of about 200 nm within 150 sec at a substrate temperature of $200^{\circ}C$. Synergistic effects by combining photo-dissociation and photo oxidation can only remove the entire PEG film without residues within experimental splits. In $UV/O_2$ GPC with substrate temperatures higher than the glass transition temperature, the substantial increase in the PEG removal rate can be explained by surface-wave formation. The photo-dissociation of PEG film by UV exposure results in the formation of end aldehyde by dissociation of back-bone chain and direct decomposition of light molecules. The role of oxygen is forming peroxide radicals and/or terminating the dis-proportionation reaction by forming peroxide.

• ETRI Journal
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• v.26 no.4
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• pp.315-320
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• 2004

This paper proposes a 10-${\mu}m$ thick oxide layer structure that can be used as a substrate for RF circuits. The structure has been fabricated using an anodic reaction and complex oxidation, which is a combined process of low-temperature thermal oxidation (500 $^{\circ}C$ for 1 hr at $H_2O/O_2$) and a rapid thermal oxidation (RTO) process (1050 ${\circ}C$, for 1 min). The electrical characteristics of the oxidized porous silicon layer (OPSL) were almost the same as those of standard thermal silicon dioxide. The leakage current density through the OPSL of 10 ${\mu}m$ was about 10 to 50 $nA/cm^2$ in the range of 0 to 50 V. The average value of the breakdown field was about 3.9 MV/cm. From the X-ray photo-electron spectroscopy (XPS) analysis, surface and internal oxide films of OPSL prepared by a complex process were confirmed to be completely oxidized. The role of the RTO process was also important for the densification of the porous silicon layer (PSL) oxidized at a lower temperature. The measured working frequency of the coplanar waveguide (CPW) type short stub on an OPSL prepared by the complex oxidation process was 27.5 GHz, and the return loss was 4.2 dB, similar to that of the CPW-type short stub on an OPSL prepared at a temperature of 1050 $^{\circ}C$ (1 hr at $H_2O/O_2$). Also, the measured working frequency of the CPW-type open stub on an OPSL prepared by the complex oxidation process was 30.5 GHz, and the return was 15 dB at midband, similar to that of the CPW-type open stub on an OPSL prepared at a temperature of $1050^{\circ}C$ (1 hr at $H_2O/O_2$).

• Journal of Environmental Science International
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• v.13 no.1
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• pp.37-40
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• 2004

In this study, the decomposition of gas-phase TCE, Benzene and Toluene, in air streams by direct UV Photolysis and UV/TiO$_2$ process was studied. For direct UV Photolysis, by regressing with computer calculation to the experimental results the value of reaction rate constant k of TCE, Toluene and Benzene in this work were determined to be 0.00392s$\^$-l/, 0.00230s$\^$-1/ and 0.00126s$\^$-1/, respectively. And the adsorption constant K of TCE, Toluene and Benzene in this work were determined to be 0.0519 mol$\^$-l/ ,0.0313mo1$\^$-1/ and 0.0084mo1$\^$-1/, respectively. For UV/TiO$_2$ system by regressing with computer calculation to the experimental results the value of reaction rate constant k of TCE, Toluene, and Benzene in this work were determined to be 5.74g/$\ell$$.$min, 3.85g/$\ell$$.$min, and 1.18g/$\ell$$.$min, respectively. And the catalyst adsorption constant K of TCE, Toluene, and Benzene in this work were determined to be 0.0005㎥/mg, 0.0043㎥/mg and 0.0048㎥/mg, respectively.