• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2004.10a
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• pp.305-310
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• 2004

The Hot Embossing Lithography(HEL) as a method for the fabrication of nanostructure with polymer is becoming increasingly important because of its simple process, low cost, high replication fidelity and relatively high throughput. In this study, we investigated the characteristics of hot embossing lithography as a nanoreplication technique. To grasp characteristics of nano patterning rheology by process parameters(embossing temperature, pressure and time), we have carried out various experiments by using the DVD(400nm pattern width) and Blu-ray nickel stamps(150nm pattern width). During the hot embossing process, we have observed the characteristics of the size effect. The quality of products made by hot embossing is affected by its cooling shrinkage. The demolding process at the glass transition temperature results in low quality because of the shrinkage of the polymer. Therefore, the quantification of the temperature condition is essential for the replication of high quality.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.632-632
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• 2013

We generated single-crystal organic nanowire arrays using a direct printing method (liquidbridge- mediated nanotransfer molding) that enables the simultaneous synthesis, alignment and patterning of nanowires from molecular ink solutions. Using this method, single-crystal organic nanowires can easily be synthesized by self-assembly and crystallization of organic molecules within the nanoscale channels of molds, and these nanowires can then be directly transferred to specific positions on substrates to generate nanowire arrays by a direct printing process. The position of the nanowires on complex structures is easy to adjust, because the mold is movable on the substrates before the polar liquid layer, which acts as an adhesive lubricant, is dried. Repeated application of the direct printing process can be used to produce organic nanowire-integrated electronics with twoor three-dimensional complex structures on large-area flexible substrates. This efficient manufacturing method is used to fabricate all-organic nanowire field-effect transistors that are integrated into device arrays and inverters on flexible plastic substrates.

• Journal of the Korean Society for Precision Engineering
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• v.29 no.1
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• pp.19-24
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• 2012

We demonstrate the desert beetle back mimicking hybrid superhydrophilic/superhydrophobic patterned surface by using the combination method of colloidal lithography and gravure offset printing for nano and micro patterning, respectively. The two methods are cost-effective and industrially available techniques compared to the other nano/micro patterning methods. To verify the water collecting function of the hybrid surface, the water condensation behavior is investigated on the chilled surface in ambient temperature and high humidity. Due to the synergetic effect of drop and film wise condensation, the hybrid superhydrophobic/superhydrophilic surface shows the higher efficiency than one of single wettability surfaces. The work is underway to get the good patterns of hybrid surfaces for water collecting from the dew or fog.

• Journal of the Korean Vacuum Society
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• v.21 no.1
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• pp.55-61
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• 2012

We fabricated a-Si:H thin-film solar cell using the two-dimensional (2D) periodic patterned glass substrate. The use of a 3D periodic texture rather than a randomly texture at surface of TCO can result in higher short circuit current densities ($J_{sc}$). In order to analyze the optical effect of patterning glasses, ray-tracing simulations were performed. Also, p-i-n cells were deposited on patterned glasses as substrate by PECVD. UV-Vis spectroscopy, light I-V measurement were carried out for the optoelectronic characterization. The anti-reflective and light-trapping performance of patterning glass substrate was investigated by a comparison of experimental results with numerical simulations.

• Journal of the Korea Convergence Society
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• v.11 no.7
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• pp.157-162
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• 2020

In recent years, laser induced graphene process have been intensively studied for eco-friendly electronic device such as flexible electronics or thin film based energy storage devices because of its simple and effective process. In order to increase the performance and efficiency of an electronic device using such a graphene patterned structure, it is essential to study an optimized laser patterning condition as small as possible linewidth while maintaining the graphene-specific 2-dimensional characteristics. In this study, we analyzed to find the optimal line pattern by using a Ti:sapphire femtosecond laser based photo-thermal reduction process. we tuned intensity and scanning speed of laser spot for generating effective graphene characteristic and minimum thermal effect. As a result, we demonstrated the reduced graphene pattern of 30㎛ in linewidth by using a focused laser beam of 18㎛ in diameter.

• Korean Journal of Optics and Photonics
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• v.20 no.6
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• pp.334-338
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• 2009

Recently, with increasing demand for flat-panel display product, methods for large area patterning are required. TIR (total internal reflection) holographic photo-lithography isstudied as one of the methods of large area lithography. In conventional TIR holography, light sources for hologram recording and image reconstruction are coherent beams such as laser beams. If the image is reconstructed with an incoherent light source such a UV lamp, the image noise from the coherence of light will be reduced and the UV lamp will be a better light source for large area exposure. We analyzed the effect of spectral bandwidth and angular bandwidth of the light source in image reconstruction and verified image blurring with experiments. For large area patterning which has micro-scale line width, it is expected that TIR holographic photo lithography by UV lamp will become a low-noise and low-priced technique.

• Macromolecular Research
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• v.17 no.3
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• pp.197-202
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• 2009

Solution-based, direct-write patterning by an automated, computer-controlled, inkjet technique is of particular interest in a wide variety of industrial fields. We report the construction of three-dimensional (3D), micro-patterned structures by polymer inkjet printing. A piezoelectric, drop-on-demand (DOD) inkjet printing system and a common polymer, PVA (poly(vinyl alcohol)), were explored for 3D construction. After a systematic preliminary study with different solvent systems, a mixture of water and DMSO was chosen as an appropriate solvent for PVA inks. The use of water as a single solvent resulted in frequent PVA clogging when the nozzles were undisturbed. Among the tested polymer ink compositions, the PVA inks in a water/DMSO mixture (4/1 v/v) with concentrations of 3 to 5 g/dL proved to be appropriate for piezoelectric DOD inkjet printing because they were well within the proper viscosity and surface tension range. When a dot was printed, the so-called 'coffee-ring effect' was significant, but its appearance was not prominent in line printing. The optimal polymer inkjet printing process was repeated slice after slice up to 200 times, which produced a well-defined, 3 D micro-patterned surface. The overall results implied that piezoelectric DOD polymer inkjet printing could be a powerful, solid-freeform, fabrication technology to create a controlled 3D architecture.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1523_1524
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• 2009

Inkjet technology has various merits as a direct patterning process in plenty of industrial applications, but critical issue such as coffee ring effect should be overcome for the application to an industrial manufacturing process. In this paper, we introduced the morphological analysis of inkjet printed pattrerns on the characristics of inks and substrates. In case of Triethlene Glycol Monoethly Ether based ink, the coffee ring effect was observed. However, an ethanol based ink showed the round shaped morphology under the same printing conditions and surface conditions. An ink consisted of the solvent with high boiling point results in coffee ring effect. This experimental results showed that the morphological change of the printed droplet is caused by the main solvent of ink, rather than the metal content, viscosity and surface tension.

• Bulletin of the Korean Chemical Society
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• v.33 no.4
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• pp.1128-1134
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• 2012

We investigated a new method for patterning organic field-effect transistors (OFETs) using a photopatternable conducting polymer nanocomposite, consisting of poly(3-hexylthiophene) (P3HT)-coated gold nanoparticles (AuNPs) that had been modified with a photoreactive cinnamate group, to form P3HT-AuNP-CI. We found that the addition of the cinnamate group to the nanoparticle surface assisted the preparation of a solvent-resistive semiconducting film and preserved the P3HT ordering, which was interrupted by Au-P3HT interactions, as well as provided UV-controllable electrical properties. The P3HT-AuNPs-CI films could be microscale-patterned via a UV crosslinking photoreaction, represented as a promising photopatternable semiconductor material for use in advanced applications, with tunable electrical properties for fabrication of sub-micron and microscale electronic devices.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.322-325
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• 2005

The shrinking critical dimensions of modern technology place a heavy requirement on optimizing feature shapes at the micro- and nano scale. In addition, the use of ion beams in the nano-scale world is greatly increased by technology development. Especially, Focused ion Beam (FIB) has a great potential to fabricate the device in nano-scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the re-deposition effect due to the sputtered atoms. In recent years, many approaches and research results show that the re-deposition effect is the most outstanding effect to overcome or reduce in fabrication of micro and nano devices. A 2D string based simulation software AMADEUS-2D $(\underline{A}dvanced\;\underline{M}odeling\;and\;\underline{D}esign\;\underline{E}nvironment\;for\;\underline{S}putter\;Processes)$ for ion milling and FIB direct fabrication has been developed. It is capable of simulating ion beam sputtering and re-deposition. In this paper, the 2D FIB simulation is demonstrated and the characteristics of ion beam induced direct fabrication is analyzed according to various parameters. Several examples, single pixel, multi scan box region, and re-deposited sidewall formation, are given.