• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2001년도 하계학술대회 논문집 C
• /
• pp.1872-1874
• /
• 2001

This paper presents an implantable telemetry LC resonance-type pressure sensor to measure the cerebral ventricle pressure. The sensor consists of an inductor and a capacitor. The LC resonant circuit consists of the sensor and an external antenna coil that are coupled magnetically. The resonance frequency of the circuit decreases as the applied pressure increases the capacitance of the sensor. The sensor is designed in consideration of the biocompatibility and long lifetime for continuous monitoring of the ventricle pressure. The sensor is simple to fabricate and small in comparison with others reported previously. The inductor is fabricated by electroplating and the variable capacitor is constructed with a flexible p+ diaphragm. Also, the deflection of the diaphragm, the variation of the capacitance and the resonance frequency are analyzed and calculated.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2000년도 하계학술대회 논문집 C
• /
• pp.1760-1762
• /
• 2000

본 논문은 기존의 $Si_{3}N_4$, SiN 물질 대신 Pt를 사용해 HF 용액속에서 다공질 실리콘과 전극을 동시에 형성하는 기술을 개발하였다. Pt를 실리콘 웨이퍼 위에 직접 증착한 후 습식 에칭과 Lift-off 공정을 사용하여 Pt를 패터닝하였다. 습식 에칭은 에칭용액의 온도를 일정하게 유지하는 것이 중요하며, 증착한 Pt 박막이 BOE 에칭에 견디고, Lift-off 공정이 가능하기 위해서는 기판온도를 l100$^{\circ}C$ 이하로 해야한다. Pt를 사용하면 기존의 mask에서 발생하는 가장자리 부분에서의 전류 집중이 방지되기 때문에 다공질 실리콘이 일정한 깊이로 형성되고, Al대신 오믹 전극으로 사용할 수 있다. 현재 Pt를 mask와 전극으로 이용한 P-I-N UV detector, 광 바이오센서, 습도센서 제작등에 응용 연구가 진행되고 있다.

• 동위원소회보
• /
• 제21권4호
• /
• pp.55-65
• /
• 2006

A passive type radon monitor adopting two silicon PIN detector as radiation detector has been developed, manufactured and test-evaluated. A radiation signal processing circuit has been electronically tested and then the radiation detection characteristics of this instrument has been performance-tested by using reference radon concentration and a reference photon radiation field. As a result, in a electronic performance test, radiation signals from each detector were well observed in each signal processing circuit. The radiation detection sensitivity of this instrument after several test-irradiations to a Cs-137 gamma radiation source and a standard radon concentration appeared to be 1.37 cph/$\mu$Svh-1 and 1.66 pCi/L respectively. The developed radon monitor in this paper could be used conveniently in monitoring of radon concentration in buildings which population utilize in Korea.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 2001년도 하계학술대회 논문집 C
• /
• pp.1454-1456
• /
• 2001

신장병 진단에 중요한 요소의 농도를 측정하기 위한 요소 센서를 반도체 위에 개발이 연구의 목적이다. 센서의 감도 측정은 선형 전위 주사법(Linear sweep voltammtry)을 이용하였다. 선형 전위 주사법은 가역적이든 비가역적이든 관계없이 cottrell 식에 의한 전류와 농도의 직선관계로부터 감도를 측정할 수 있는 장점이 있고 또한 저 농도에서 민감하게 반응한다. 따라서 기존 전위차 측정형 바이오 센서(Potentiometric biosensor)에서 규명할 수 없는 감도 문제를 선형 전위 주사법으로 규명하고자 하였다. 센서전극은 p-type 실리콘 웨이퍼 위에 전극을 제작했다. 그 위에 cyclic voltammetry 법을 사용하여 전도성 고분자를 전기 중합 하였고, 그위에 다시 chronoamperometry법을 사용하여 우레아제를 고정화 하여 작업전극으로 제작하였다. 센서의 감도는 phosphate buffer 용액(pH7.4)속에서 온도 35$^{\circ}C$를 유지하며 측정하였다.

• 반도체디스플레이기술학회지
• /
• 제3권1호
• /
• pp.35-39
• /
• 2004

Statistical design of experiments was successfully employed to investigate the effect of alternating magnetic field on activation of polycrystalline Si (p-Si) doped as n-type using $\textrm{PH}_3$, by full factorial design of three factors with two levels. In this design, the input variables are graphite size, alternating current, and activation time. The output parameter, sheet resistance, is analyzed in terms of the primary effects and multi-factor interactions. Notably, the three-factor interaction is calculated to be a dominant interaction. The interaction between graphite size and activation time and the main effect of current are important effects compared to the other variables and relevant interactions. Alternating magnetic flux activation is proved a significantly beneficial processing technique.

• 한국산학기술학회:학술대회논문집
• /
• 한국산학기술학회 2001년도 춘계학술대회 발표논문집
• /
• pp.155-161
• /
• 2001

반도체 소자의 기판 재료로 사용되고 있는 실리콘 웨이퍼는 그 정밀도가 매우 중요하다. 본 연구에서는 균일한 Dopant 농도 분포를 얻을 수 있는 중성자 변환 Doping을 이용하여 실리콘에 인(P)을 Doping하는 연구를 수행하였다. 중성자 변환 Doping, 즉 NTD(Neutron Transmutation Doping)란 원자번호 30인 실리론 동위원소에 중성자가 조사되면 원자번호 31인 실리콘으로 변환되고, 2.6시간의 반감기를 갖고 decay 되면서 인(P)으로 변하게 되어 실리콘 웨이퍼에 n-type 전도를 갖게 하는 것을 말한다. 본 연구에서는 하나로 원자로를 이용하여 고저항(1000-2000Ω㎝) FZ 실리콘 웨이퍼에 중성자 조사하여 저항의 변화를 관찰하였고, 중성자 조사시 발생하는 점결함을 분석하여 점결함이 저항 변화에 미치는 영향을 알아보았다. 중성자 조사 전 이론적 계산에 의해 16.8Ω㎝와 4.76Ω㎝의 저항을 얻을 수 있을 것으로 예상되었고, 중성자 조사 후 SRP로 측정한 결과 실리콘 웨이퍼가 3Ω㎝과 2.5Ω㎝의 저항을 가지고 있을 확인할 수 있었으며, FT-IR 분석결과 점결함의 변화 양상을 확인할 수 있었다.

• Bulletin of the Korean Chemical Society
• /
• 제35권8호
• /
• pp.2494-2504
• /
• 2014

P38 mitogen activated protein (MAP) kinase is an important anti-inflammatory drug target, which can be activated by responding to various stimuli such as stress and immune response. Based on the conformation of the conserved DFG loop (in or out), binding inhibitors are termed as type-I and II. Type-I inhibitors are ATP competitive, whereas type-II inhibitors bind in DFG-out conformation of allosteric pocket. It remains unclear that how these allosteric inhibitors stabilize the DFG-out conformation and interact. Organosilicon compounds provide unusual opportunity to enhance potency and diversity of drug molecules due to their low toxicity. However, very few examples have been reported to utilize this property. In this regard, we performed docking of an inhibitor (BIRB) and its silicon analog (Si-BIRB) in an allosteric binding pocket of p38. Further, molecular dynamics (MD) simulations were performed to study the dynamic behavior of the simulated complexes. The difference in the biological activity and mechanism of action of the simulated inhibitors could be explained based on the molecular mechanics/generalized Born surface area (MM/GBSA) binding free energy per residue decomposition. MM/GBSA showed that biological activities were related with calculated binding free energy of inhibitors. Analyses of the per-residue decomposed energy indicated that van der Waals and non-polar interactions were predominant in the ligand-protein interactions. Further, crucial residues identified for hydrogen bond, salt bridge and hydrophobic interactions were Tyr35, Lys53, Glu71, Leu74, Leu75, Ile84, Met109, Leu167, Asp168 and Phe169. Our results indicate that stronger hydrophobic interaction of Si-BIRB with the binding site residues could be responsible for its greater binding affinity compared with BIRB.

• 한국신재생에너지학회:학술대회논문집
• /
• 한국신재생에너지학회 2010년도 춘계학술대회 초록집
• /
• pp.91.1-91.1
• /
• 2010

There are some methods for increasing efficiency of crystalline silicon solar cells. Among them, It is important to reduce the recombination loss of surface for high efficiency. In order to reduce recombination loss is a way to use the BSF(Back Surface Field). The BSF on the back of the p-type wafer forms a p+layer. so, it is prevented to act electrons of the p-area for the rear recombination. As a result, the leakage current is reduced and the rear-contact has a good Ohmic contact. therefore, open-circuit-voltage and Fill factor(FF) of solar cells are increased. This paper investigates the formation of rear contact process comparing Aluminum-paste(Al-paste) with Aluminum-Metal(99.9%). It is shown that the Aluminum-Metal provides high conductivity and low contact resistance of $21.35m{\Omega}cm$ using the Vacuum evaporation process but, it is difficult to apply the standard industrial process because high Vacuum is needed and it costs a tremendous amount more than Al-paste. On the other hand, using the Al-paste process by screen printing is simple for formation of metal contact and it is possible to produce the standard industrial process. however, it is lower than Aluminum-Metal(99.9) of conductivity because of including mass glass frit. In this study, contact resistances were measured by 4-point prove. each of contact resistances is $21.35m{\Omega}cm$ of Aluminum-Metal and $0.69m{\Omega}cm$ of Al-paste. and then rear contact have been analyzed by Scanning Electron Microscopy(SEM).

• 한국정보통신학회:학술대회논문집
• /
• 한국해양정보통신학회 2001년도 추계종합학술대회
• /
• pp.644-647
• /
• 2001

이 연구에서는 P-MOS 커패시터에 Co $u^{60}$-${\gamma}$선을 조사한 후 조사선량 및 산화막 두께에 따른 전하의 거동을 고찰하고자 1[MHz]의 고주파 신호에서 정전용량-전압(C-V) 특성 및 유전손실계수-전압(D-V)특성을 측정하였다. C-V 특성에서 플랫밴드 전압과 문턱전압을 구하여 이들 파라메타와 D-V 특성의 피크와의 관련성을 검토하였다. C-V 특성이 P-MOS 커패시터의 정상상태의 전하의 거동 및 계면 상태특성을 해석하기가 편리하고 D-V 특성은 C-V 특성보다 산화막 내부의 공간전하분포와 계면상태의 밑도 등을 더 명확하게 파악할 수 있으며 산화막내 캐리어의 전도철상에 관한 미시적 전하 거동의 고찰에도 편리함이 확인되었다.

• 한국전기전자재료학회논문지
• /
• 제23권7호
• /
• pp.571-574
• /
• 2010

Surface recombination loss should be reduced for high efficiency of solar cells. To reduce this loss, the BSF (back surface field) is used. The BSF on the back of the p-type wafer forms a p+layer, which prevents the activity of electrons of the p-area for the rear recombination. As a result, the leakage current is reduced and the rear-contact has a good Ohmic contact. Therefore, the open-circuit-voltage (Voc) and fill factor (FF) of solar cells are increased. This paper investigates the formation of the rear contact process by comparing aluminum-paste (Al-paste) with pure aluminum-metal(99.9%). Under the vacuum evaporation process, pure aluminum-metal(99.9%) provides high conductivity and low contact resistance of $4.2\;m{\Omega}cm$, but It is difficult to apply the standard industrial process to it because high vacuum is needed, and it's more expensive than the commercial equipment. On the other hand, using the Al-paste process by screen printing is simple for the formation of metal contact, and it is possible to produce the standard industrial process. However, Al-paste used in screen printing is lower than the conductivity of pure aluminum-metal(99.9) because of its mass glass frit. In this study, contact resistances were measured by a 4-point probe. The contact resistance of pure aluminum-metal was $4.2\;m{\Omega}cm$ and that of Al-paste was $35.69\;m{\Omega}cm$. Then the rear contact was analyzed by scanning electron microscope (SEM).