• Title/Summary/Keyword: organic conductors

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A Study on the Phase Transition of DPPC Organic Films (DPPC 유기박막의 상전이에 관한 연구)

  • 김동관;이순형;최영일;최충석;장희동;이경섭
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.491-494
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    • 2000
  • Conductive Langmuir-Blodgett(LB) films have recently attracted much interest from the viewpoint of ultrathin film conductors at the molecular level. The result shows that the Maxwell-displacement-current(MDC) measuring technique is useful in the detection of phase-transition over the entire range of molecule areas. At the liquid-solid phase transition, a striking feature in the present current measurement was observed; the I-A isotherm for a DPPC monolayer has sharp bend. Dynamic behavior of monolayers in the presence of an external field was also investigated using the current-measuring technique. Dynamic behavier of DPPC monolayer was measured by displacement current when the molecules are stimulated by pressure velocity. As result, it is known that current is generated of higher current pe마 as compression velocity become faster. Also, in order to clarify the reorganization of the lipid monolayers, it is instructive to plot the relationship between I and 1/$A^2$.

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New processing technique of TFA-MOD YBCO coated conductors using the '211' process (211 공정을 이용한 새로운 TFA-MOD YBCO 박막 선재 제조)

  • Lim, Jun-Hyung;Jang, Seok-Hern;Kim, Kyu-Tae;Lee, Jin-Sung;Yoon, Kyung-Min;Park, Eui-Cheol;Joo, Jin-Ho
    • Progress in Superconductivity
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    • v.7 no.2
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    • pp.140-144
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    • 2006
  • We fabricated the YBCO films on single crystal $LaAlO_3$ substrates via a metal organic deposition (MOD) process. In the process, $Y_2Ba_1Cu_1O_x$ and $Ba_3Cu_5O_8$ powders were dissolved in trifluoroacetic acid (TFA) followed by calcining and firing heat treatments. To evaluate the effects of the firing temperature on YBCO phase formation and critical properties, the films were fired at $750^{\circ}C,\;775^{\circ}C\;and\;800^{\circ}C$ after calcining at $430^{\cric}C$. Microstructure observation indicated that a crack-free surface formed and a strong biaxial texture was developed. The FWHM of out-of-plane texture was measured to be in the range of $4.3^{\cric}-7.0^{\circ}$ for all the films. When the YBCO film was fired at $775^{\cric}C$, it had the highest critical properties: 88.5 K of critical temperature and 16 A/cm-width of critical current ($1MA/cm^2$ as critical current density). On the other hand, those properties were degraded as firing at $750^{\circ}C\;and\;800^{\circ}C$. It is considered that the improved critical values are partly owing to dense and homogeneous microstructure, strong texture, and high oxygen content.

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Via Formation in Dielectric Layers Made of Photosensitive BCB (감광성 BCB를 이용한 절연막층에서의 비아형성)

  • 주철원;임성훈;한병성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.5
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    • pp.351-355
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    • 2001
  • Via for achieving reliable fabrication of MCM(Multichip Module) substrate was formed on photosensitive BCB layer. The MCM substrate consists of photosensitive BCB(Benzocyclobutene) interlayer dielectric and copper conductors. In order to form the vias in the photosensitive BCB layer, the process of forming the BCB layer and its via forming plasma etch using C$_2$F$\_$6//O$_2$ gas were evaluated. The thickness of the BCB layer after hard bake was shrunk down to 40% of the original. The resolution of vias formed on the BCB was 15㎛ and the slope after develop was 85 degree. AES analysis was done on two vias, one is etched in C$_2$F$\_$6/O$_2$ gas and the other isnot etched. On the via etched in C$_2$F$\_$6//O$_2$, native C was detected and the amount of native C was reduced after Ar sputter. On the via not etched in C$_2$F$\_$6//O$_2$, organic C was detected. As a result of AES, BCB residue was not removed by Ar sputter, so plasma etch is necessary for achieving reliable vias.

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Deposition condition of NiO deposited on biaxially textured Ni by a MOCVD process (2축 정렬된 Ni 위에 MOCVD법에 의한 NiO의 증착조건)

  • 선종원;김형섭;지봉기;박해웅;홍계원;박순동;정충환;전병혁;김찬중
    • Progress in Superconductivity and Cryogenics
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    • v.4 no.2
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    • pp.5-10
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    • 2002
  • Deposition condition of NiO that is one of Possible buffer layers for YBCO coated conductors was studied. NiO was deposited on textured Ni substrates by a MOCVD (metal-organic chemical vapor deposition) method. The degree of texture, and the surface roughness were analyzed by X-ray Pole figure, atomic force microscope and scanning electron microscope. The (111) and (200) textures were competitively developed , depending on an oxygen partial Pressure(PO2) and deposition temperature (Tp). The (200) textured NiO layer was deposited at Tp=450~47$0^{\circ}C$ and PO2= 1.67 Torr Out-of-Plane ($\omega$-scan) and in-plane ($\Phi$-scan) textures of the (200) NiO films were as good as 10.34$^{\circ}$ and 10.00$^{\circ}$ respectively The AFM surface roughness of NiO was in the range of 3~4.5 nm at PO2=0.91~3.34 Torr and at Tp=47$0^{\circ}C$ , and in the range of 3~13 nm at TP=450~53$0^{\circ}C$ and at PO2=1.67 Torr.

Inorganic Printable Materials for Printed Electronics: TFT and Photovoltaic Application

  • Jeong, Seon-Ho;Lee, Byeong-Seok;Lee, Ji-Yun;Seo, Yeong-Hui;Kim, Ye-Na;More, Priyesh V.;Lee, Jae-Su;Jo, Ye-Jin;Choe, Yeong-Min;Ryu, Byeong-Hwan
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.1.1-1.1
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    • 2011
  • Printed electronics based on the direct writing of solution processable functional materials have been of paramount interest and importance. In this talk, the synthesis of printable inorganic functional materials (conductors and semiconductors) for thin-film transistors (TFTs) and photovoltaic devices, device fabrication based on a printing technique, and specific characteristics of devices are presented. For printable conductor materials, Ag ink is designed to achieve the long-term dispersion stability and good adhesion property on a glass substrate, and Cu ink is sophisticatedly formulated to endow the oxidation stability in air and even aqueous solvent system. The both inks were successfully printed onto either polymer or glass substrate, exhibiting the superior conductivity comparable to that of bulk one. In addition, the organic thin-film transistor based on the printed metal source/drain electrode exhibits the electrical performance comparable to that of a transistor based on a vacuum deposited Au electrode. For printable amorphous oxide semiconductors (AOSs), I introduce the noble ways to resolve the critical problems, a high processing temperature above $400^{\circ}C$ and low mobility of AOSs annealed at a low temperature below $400^{\circ}C$. The dependency of TFT performances on the chemical structure of AOSs is compared and contrasted to clarify which factor should be considered to realize the low temperature annealed, high performance AOSs. For photovoltaic application, CI(G)S nanoparticle ink for solution processable high performance solar cells is presented. By overcoming the critical drawbacks of conventional solution processed CI(G)S absorber layers, the device quality dense CI(G)S layer is obtained, affording 7.3% efficiency CI(G)S photovoltaic device.

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Inorganic Printable Materials for Thin-Film Transistors: Conductor and Semiconductor

  • Jeong, Sun-Ho;Song, Hae-Chon;Lee, Byung-Seok;Lee, Ji-Yoon;Choi, Young-Min;Ryu, Beyong-Hwan
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.18.2-18.2
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    • 2010
  • For the past a few years, we have intensively researched the printable inorganic conductors and ZnO-based amorphous oxide semiconductors (AOSs) for thin-film transistors. For printable conductor materials, we have focused on the aqueous Ag and Cu ink which possess a variety of advantages, comparing with the conventional metal inks based on organic solvent system. The aqueous Ag ink was designed to achieve the long-term dispersion stability using a specific polymer which can act as a dispersant and capping agent, and the aqueous Cu ink was carefully formulated to endow the oxidation stability in air and even aqueous solvent system. The both inks were successfully printed onto either polymer or glass substrate, exhibiting the superior conductivity comparable to that of bulk one. For printable ZnO-based AOSs, we have researched the noble way to resolve the critical problem, a high processing-temperature above $400^{\circ}C$, and recently discovered that Ga doping in ZnO-based AOSs promotes the formation of oxide lattice structures with oxygen vacancies at low annealing-temperatures, which is essential for acceptable thin-film transistor performance. The mobility dependence on annealing temperature and AOS composition was analyzed, and the chemical role of Ga are clarified, as are requirements for solution-processed, low-temperature annealed AOSs.

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Substrate dependence of the deposition behavior of $CeO_2$ buffer layer prepared by MOCVD method (MOCVD 법에 의해 제조된 $CeO_2$ 버퍼층 증착 거동의 기판 의존성)

  • Jun, Byung-Hyu;Choi, Jun-Kyu;Jung, Woo-Young;Lee, Hee-Gyoun;Hong, Gye-Won;Kim, Chan-Joong
    • Progress in Superconductivity
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    • v.7 no.2
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    • pp.130-134
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    • 2006
  • Buffer layers such as $CeO_2\;and\;Yb_2O_3$ films for YBCO coated conductors were deposited on (100) $SrTiO_3$ single crystals and (100) textured Ni substrates by a metal organic chemical vapor deposition (MOCVD) system of the hot-wall type. The substrates were moved with the velocity of 40 cm/hr. Source flow rate, $Ar/O_2$ flow rate and deposition temperature were main processing variables. The degree of film epitaxy and surface morphology were investigated using XRD and SEM, respectively. On a STO substrate, the $CeO_2$ film was well grown epitaxially above the deposition temperature of $450^{\circ}C$. However, on a Ni substrate, the XRD showed NiO (111) and (200) peaks due to Ni oxidation as well as (111) and (200) film growth. For the films deposited with $O_2$ gas as oxygen source, it was found that the NiO film was formed at the interface between the buffer layer and the Ni substrate. The NiO layer interrupts the epitaxial growth of the buffer layer. It seems that the epitaxial growth of the buffer layer on Ni metal substrates using $O_2$ gas is difficult. We are considering a new method avoiding Ni oxidation with $H_2O$ vapor instead of $O_2$ gas.

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ZnO nanostructures for e-paper and field emission display applications

  • Sun, X.W.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.993-994
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    • 2008
  • Electrochromic (EC) devices are capable of reversibly changing their optical properties upon charge injection and extraction induced by the external voltage. The characteristics of the EC device, such as low power consumption, high coloration efficiency, and memory effects under open circuit status, make them suitable for use in a variety of applications including smart windows and electronic papers. Coloration due to reduction or oxidation of redox chromophores can be used for EC devices (e-paper), but the switching time is slow (second level). Recently, with increasing demand for the low cost, lightweight flat panel display with paper-like readability (electronic paper), an EC display technology based on dye-modified $TiO_2$ nanoparticle electrode was developed. A well known organic dye molecule, viologen, was adsorbed on the surface of a mesoporous $TiO_2$ nanoparticle film to form the EC electrode. On the other hand, ZnO is a wide bandgap II-VI semiconductor which has been applied in many fields such as UV lasers, field effect transistors and transparent conductors. The bandgap of the bulk ZnO is about 3.37 eV, which is close to that of the $TiO_2$ (3.4 eV). As a traditional transparent conductor, ZnO has excellent electron transport properties, even in ZnO nanoparticle films. In the past few years, one-dimension (1D) nanostructures of ZnO have attracted extensive research interest. In particular, 1D ZnO nanowires renders much better electron transportation capability by providing a direct conduction path for electron transport and greatly reducing the number of grain boundaries. These unique advantages make ZnO nanowires a promising matrix electrode for EC dye molecule loading. ZnO nanowires grow vertically from the substrate and form a dense array (Fig. 1). The ZnO nanowires show regular hexagonal cross section and the average diameter of the ZnO nanowires is about 100 nm. The cross-section image of the ZnO nanowires array (Fig. 1) indicates that the length of the ZnO nanowires is about $6\;{\mu}m$. From one on/off cycle of the ZnO EC cell (Fig. 2). We can see that, the switching time of a ZnO nanowire electrode EC cell with an active area of $1\;{\times}\;1\;cm^2$ is 170 ms and 142 ms for coloration and bleaching, respectively. The coloration and bleaching time is faster compared to the $TiO_2$ mesoporous EC devices with both coloration and bleaching time of about 250 ms for a device with an active area of $2.5\;cm^2$. With further optimization, it is possible that the response time can reach ten(s) of millisecond, i.e. capable of displaying video. Fig. 3 shows a prototype with two different transmittance states. It can be seen that good contrast was obtained. The retention was at least a few hours for these prototypes. Being an oxide, ZnO is oxidation resistant, i.e. it is more durable for field emission cathode. ZnO nanotetropods were also applied to realize the first prototype triode field emission device, making use of scattered surface-conduction electrons for field emission (Fig. 4). The device has a high efficiency (field emitted electron to total electron ratio) of about 60%. With this high efficiency, we were able to fabricate some prototype displays (Fig. 5 showing some alphanumerical symbols). ZnO tetrapods have four legs, which guarantees that there is one leg always pointing upward, even using screen printing method to fabricate the cathode.

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