Characterization of Semiconductor Using Neutron Activation Analysis-II - Manufacturing Process and Surface Depth Profile Analysis - (중성자 방사화분석법에 의한 반도체 특성조사-II - 반도체 제조공정 및 표면 적층분석 -)
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- Analytical Science and Technology
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- v.11 no.6
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- pp.1065-1074
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- 1998