• 제목/요약/키워드: nanoporous $SiO_2/Si$ substrate

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PdOx가 도핑된 나노 기공구조 SiO2/Si 기반의 수소 게터 제작 및 특성평가 (Fabrication and Characterization of Hydrogen Getter Based on Palladium Oxide Doped Nanoporous SiO2/Si Substrate)

  • 엄누시아;임효령;최요민;정영훈;조정호;좌용호
    • 한국재료학회지
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    • 제24권11호
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    • pp.573-577
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    • 2014
  • The existing metal getters are invariably covered with thin oxide layers in air and the native oxide layer must be dissolved into the getter materials for activation. However, high temperature is needed for the activation, which leads to unavoidable deleterious effects on the devices. Therefore, to improve the device efficiency and gas-adsorption properties of the device, it is essential to synthesize the getter with a method that does not require a thermal activation temperature. In this study, getter material was synthesized using palladium oxide (PdOx) which can adsorb $H_2$ gas. To enhance the efficiency of the hydrogen and moisture absorption, a porous layer with a large specific area was fabricated by an etching process and used as supporting substrates. It was confirmed that the moisture-absorption performance of the $SiO_2/Si$ was characterized by water vapor volume with relative humidity. The gas-adsorption properties occurred in the absence of the activation process.

ICPCVD방법에 의한 나노기공을 갖는 Si-O-C 박막의 형성에 관한 연구 (A study on the structure of Si-O-C thin films with films size pore by ICPCVD)

  • Oh, Teresa
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2002년도 추계종합학술대회
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    • pp.477-480
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    • 2002
  • ULSI(ultra large scaled integrated circuits)의 고집적화와 고속화를 위한 다층 배선 기술 중에서 층간 절연막의 특성을 향상시켜주는 것은 매우 중요한 요소이다. 소자의 소형화에 따른 절연층의 용량에 의한 신호의 지연을 방지하고 금속배선간의 상호간섭을 막아주기 위해서 현재 요구되는 0.13$\mu\textrm{m}$급 소자의 경우에서는 유전율이 매우 낮은 k$\leq$2.0인 층간 절연막이 필요하게 된다. 이러한 차세대 반도체 소자의 층간 절연물질로서 사용될 유력한 저유전 물질로 Nanoporous silica(k=1.3~2.5)를 적용하려는 연구가 진행되고 있다(1)-(3). 그러한 물질 중에 하나가 organosilicate films이 있는데 carbon-doped oxides, silicon-oxicarbides, carbon-incorporated silicon oxide film, organic-inorganic hybrid type Si-O-C thin films 혹은 organic-inorganic hybrid silica materials 등으로 불린다. 이에 본 연구에서는 nano-pore를 갖는 유무기 하이브리드 구조의 저유전 박막을 BTMSM/O$_2$의 혼합된 precursor를 사용하여 ICPCVD 방법에 의해 형성하였다. 총 유량을 20sccm이 되도록 하여 $O_2$:BTMSM(Ar)의 유량비를 변화시키며, 작업진공도는 300mTorr였다. 기판은 가열하지 않고, p-type Si(100) 위에 Si-O-C-H 박막을 형성하였다. 열적안정성을 조사하기 위하여 30$0^{\circ}C$, 40$0^{\circ}C$, 50$0^{\circ}C$에서 30분간 열처리하여 비교 분석하였다. 형성된 박막의 특성은 XPS로 분석하여 유전상수와의 상관관계를 조사하였다.

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Chemical Vapor Deposition Using Ethylene Gas toward Low Temperature Growth of Single-Walled Carbon Nanotubes

  • Jo, Sung-Il;Jeong, Goo-Hwan
    • Applied Science and Convergence Technology
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    • 제24권6호
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    • pp.262-267
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    • 2015
  • We demonstrate the growth of single-walled carbon nanotubes (SWNTs) using ethylene-based chemical vapor deposition (CVD) and ferritin-induced catalytic particles toward growth temperature reduction. We first optimized the gas composition of $H_2$ and $C_2H_4$ at 500 and 30 sccm, respectively. On a planar $SiO_2$ substrate, high density SWNTs were grown at a minimum temperature of $760^{\circ}C$. In the case of growth using nanoporous templates, many suspended SWNTs were also observed from the samples grown at $760^{\circ}C$; low values of $I_D/I_G$ in the Raman spectra were also obtained. This means that the temperature of $760^{\circ}C$ is sufficient for SWNT growth in ethylene-based CVD and that ethylene is more effective that methane for low temperature growth. Our results provide a recipe for low temperature growth of SWNT; such growth is crucial for SWNT-based applications.