• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.5
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• pp.30-35
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• 2013

In order to increase cell efficiency in crystalline silicon solar cell, reduction of light reflection is one of the essential problem. Until now silicon wafer was textured by wet etching process which has random patterns along crystal orientation. In this study, high aspect ratio patterns are manufactured by nano imprint process and reflectance could be minimized under 1%. After that, screen printed solar cell was fabricated on the textured wafer and I-V characteristics was measured by solar simulator. Consequently cell efficiency of solar cell fabricated using the wafer textured by nano imprint process increased 1.15% than reference solar cell textured by wet etching. Internal quantum efficiency was increased in the range of IR wave length but decreased in the UV wavelength. In spite of improved result, optimization between nano imprinted pattern and solar cell process should be followed.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.10a
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• pp.527-528
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• 2006

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1847-1850
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• 2008

The process conditions during ultraviolet nanoimprint lithography (UV-NIL) process such as temperature, stamping pressure, UV irradiation, etc. are effective factors for successful imprinting of complex and fine patterns. In this study, the effects of aluminum mold on the thermal characteristics of UV-NIL process were investigated through imprinting experiments and numerical simulations. The temperature of polymer resin on mold was measured to study thermal characteristics during UV curing. From the experimental and numerical results, the importance of curing reaction control for UV-NIL process was discussed for deformation characteristics.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.827-831
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• 2008

In this paper, kinematic analysis for a planar 3-DOF redundant stage which has four actuators is presented by using SimMechanics software package. SimMechanics is a block sets of the Matlab/Simulink package. The SimMechanics enables a simplified model for a complex kinematic mechanism, since kinematic relationship between joints and linkages for the kinematic chains are expressed as line vectors and block diagrams. Here, positional error and limit values of movement ranges of the stage are evaluated by using the SimMechanics. The validity of the kinematic characteristics model was compared with theoretical kinematic analyses for the 3-DOF stage.

• Transactions of the Society of Information Storage Systems
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• v.1 no.2
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• pp.192-196
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. The nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. In nano-injection molding process, since the solidified layer, generated during the polymer filling, deteriorates transcribability of nano patterns by preventing the polymer melt from filling the nano cavities, an injection-mold system was constructed to actively control the stamper surface temperature using MEMS heater and sensors. The replicated polymeric patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth. The replicated polymeric patterns can be applied to high density patterned media.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.5
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• pp.267-271
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• 2006

A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimpring technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.05a
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• pp.60-63
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.330-333
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• 2005

The fabrication of mold fur nano imprint lithography (NIL) is experimentally reported using the scanning probe lithography (SPL) technique, instead of the conventional I-beam lithography technique. The nanometer scale patterning structure is fabricated by the localized generation of oxide patterning on the silicon (100) wafer surface with a thin oxide layer, The fabrication method is based on the contact mode of scanning probe microscope (SPM) in air, The precision cleaning process is also performed to reach the low roughness value of $R_{rms}=0.084 nm$, which is important to increase the reproducibility of patterning. The height and width of the oxide dot are generated to be 15.667 nm and 209.5 nm, respectively, by applying 17 V during 350 ms.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.153-153
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• 2012

자연계에는 다양한 생물체들의 표면 구조가 특수한 기능을 갖는 형태로 되어 있다. 이와 같이 특수한 기능을 갖는 생물체들의 표면 구조는 일반적으로 화학적 조성과 표면의 더불어 나노와 마이크로 구조가 혼합되어 있는, 이른바 hierarchical 구조를 보인다. 그 중에서도 표면 초소수성 특성을 보이는 연잎의 표면과 같은 hierarchical 구조는 self-cleaning effect 등의 기능성 표면 제작에 활용이 가능하여 이를 모사하기 위한 연구가 활발히 진행중에 있다. 이에 본 연구에서는 연잎과 같은 초소수성을 띄는 ZnO nano-in-micro hierarchical 구조를 저온 공정을 통하여 다양한 기판에 제작하였다. 이를 위하여 ZnO 나노 입자 분산 레진을 제작하였고 UV imprinting 과 수열합성법을 통하여 마이크로 패턴 상부에 ZnO 나노 입자가 형성된 ZnO nano-in-micro hierarchical 구조를 형성하였다. 제작된 ZnO hierarchical 구조의 젖음 특성은 표면 접촉각이 $160^{\circ}C$이상인 초소수성을 보였으며, 제작 공정에는 고온의 열처리가 수반되지 않아 PET film 등 다양한 기판에 ZnO hierarchical 구조를 제작할 수 있었다.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.41 no.1
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• pp.63-67
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• 2017

In bioscience and biotechnology, the research of fundamental life mechanisms and their diseases caused by insufficiency is important. The study of a whole organism is difficult and sometimes impossible because of DNA, RNA, proteins, cellular organelles, various cells, and organs. Cell cultures can provide a simple method for researching cellular mechanisms and conditions, both in terms of physiological performance, and in response to chemical stimulation. According to conventional cell culture methodology, the flat surface is used with surface treatments for cell adhesion on the surface. Micro- and nanoscale patterns have been developed with chemical and biochemical modifications for cell immobilization. In this study, HeLa cell culture on nanostructures patterns was studied, including the 300 nm line and 150 nm pillar structures, using nanoimprint lithography and pyrrole as a biocompatible conducting polymer.