• Journal of the Korean Society for Precision Engineering
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• v.21 no.3
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• pp.139-146
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• 2004

In this study, to achieve the optimal conditions for mechanical hyper-fine pattern fabrication process, deformation behavior of the materials during indentation scratch test was studied with numerical method by ABAQUS S/W. Brittle materials (Si, Pyrex glass 7740) were used as specimens, and forming conditions to reduce the elastic recovery and pile-up were proposed. The indenter was modeled as a rigid surface. Minimum mesh sizes of specimens are 1-l0nm. Variables of the nanoindentation scratch test analysis are scratching speed, scratching load, tip radius and tip geometry. The nano-indentation scratch tests were performed by using the Berkovich pyramidal diamond indenter. Comparison between the experimental data and numerical result demonstrated that the FEM approach can be a good model of the nanoindentation scratch test. The result of the investigation will be applied to the fabrication of the hyper-fine pattern.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2009.05a
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• pp.294-297
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• 2009

The frictional behaviors of Cermets/Cr-Ceramics and Cu-Al coatings of piston ring were investigated. Friction tests were carried out by pin-on-disk test and materials properties of coating layer were analyzed by nano indentation tester. Higher friction coefficient was obtained at harder coating with rougher surface. In case of hard-coating, the scratch depth, width and pile-up height had close relationship with indentation hardness. So the scratch width, depth and pile-up height increases with decreasing friction coefficient. But in case of soft-coating, the friction coefficients are strongly dependent on the morphological characteristics after nano scratching more than indentation hardness.

• Transactions of Materials Processing
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• v.13 no.1
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• pp.59-64
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• 2004

Nano-scratch tests were performed on PMMA thin films spin-coated on a Si substrate using an atomic force microscopy (AFM) with loads ranging form 10nN to 100nN. At low loads, a ridge pattern was formed on the PMMA thin film surface. No wear particles were observed during the pattern-forming mild wear. At high loads, severe wear by plowing occurred, accompanied by wear particles. The film with the highest hardness showed the highest wear resistance. Friction force generated during the scratching was measured, which was closely related with surface deformation of the film. A simple empirical equation to deduce scratch hardness of the film from a linear fixed-distance scratch test was proposed, and scratching-speed dependency of the scratch hardness was displayed.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.178-179
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• 2014

In this study, $Ni-W-Si_3N_4$ alloy composite coatings were prepared by pulse electrodeposition method using nickel sulfate bath with different contents of tungsten source, $Na_2WO_4.2H_2O$, and dispersed $Si_3N_4$ nano particles. The structure and microstructure ofcoatings was separately analyzed by X-ray diffraction (XRD) and scanning electron microscope (SEM). Results indicated that nano $Si_3N_4$ and W content in alloy had remarkable effect on microstructure, microhardness and scratch resistant properties. Tungsten content in Ni-W and $Ni-W-Si_3N_4$ alloy ranged from 7 to 14 at.%. Scratch test results suggest that as compared to Ni-W only, $Ni-W-Si_3N_4$ prepared from Ni/W molar ratio of 1:1.5 dispersed with 20 g/L $Si_3N_4$ has shown the best result among different samples.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.351-351
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• 2010

Nanoscale patterning using an atomic force microscope tip induced scratching was systematically investigated in AI thin film on 4H-SiC. To identify the effects of the scratch parameters, including the tip loading force, scratch speed, and number of scratches, we varied each parameters and evaluated the major parameter which has intimate relationship with the scale of patterns. In this work, we present the successful demonstration of nano patterning of Al thin film on a 4H-SiC substrate using an AFM scratching and evaluated the scratch parameters on Al/4H-SiC.

• Transactions of Materials Processing
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• v.18 no.6
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• pp.465-470
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• 2009

The frictional behaviors of Cermets/Cr-Ceramics and Cu-Al coatings of piston ring were investigated. Friction tests were carried out by pin-on-disk test and materials properties of coating layer were analyzed by nano indentation tester. The effect of surface roughness of cylinder liner on the friction coefficient was analyzed. This study provided tribological data of hard and soft piston ring coatings against cylinder liner. The surface roughness does exert an influence on the average friction coefficient, with smoother surfaces generally yielding lower friction coefficients. In case of hard-coating, the scratch depth, width and pile-up height had close relationship with hardness. So the scratch width, depth and pile-up height increases with decreasing friction coefficient. But in case of soft-coating, the friction coefficients are strongly dependent on the morphological characteristics such as, scratch depth, width, pile-up height and elastic modulus.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 1998.04a
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• pp.263-270
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• 1998

상용화된 박막 코팅 자기 저장 디스크의 기계역학 및 윤활적 물성치를 도출하기 위하여 Nano-Indentation 과 Nano-Scratch 실험이 수행되었다. 자기 디스크는 원주방향으로 일정한의 분석을 위하여 AFM(Atomic Force Microscopy)이 사용되었다. 텍스처 방향에 따른 표면조도의 변화는 가우스 확률 분포(Gaussian probability distribution)와 Weibull누적 확률 이론(Weibull cumulative probability theory)에 의하여 분석되었다. 표면 조도와 마찰계수는 텍스처의 스캐닝(scanning) 방향에 의존한다는 것이 확인 되었다.

• Tribology and Lubricants
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• v.15 no.1
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• pp.52-58
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• 1999

Nano-indentation and nano-scratch tests were peformed to assess the mechanical and tribological properties of the coating on a commercially available thin-film magnetic recording disk. Surface topography and roughness of the disk was studied using atomic force microscopy. The hardness and elastic modulus data show a peak at an indentation depth equivalent to the thickness of carbon overcoat, indicating strong influence of the coatin $g_strate interaction and the coating surface roughness on the measurements. The variations of surface roughness data were analysed statistically based on the normal probability distribution theories and Weibull cumulative probability theories.es.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.301-302
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• 2010

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.59-59
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• 2009

현재 CMP분야는 광역 평탄화 반도체 소자의 집적화 및 소형화가 진행됨에 따라서 CMP 공정의 중요성은 날로 성장하고 있다. 하지만 이러한 CMP공정은 불가피하게도 scratch, pit, CMP residue와 같은 defect들을 발생시키고 있으며, 점점 선폭이 작아짐에 따라, 이러한 defect들이 반도체 수율에 미치는 영향은 심각해지고 있다. Defect들 중에 특히 scratch는 반도체에 치명적인 circuit failure를 일으키게 된다. 또한 반도체 내구성과 신뢰성을 감소시키게 되고, 누전전류를 증가시키는 등 바람직하지 못한 현상들이 생기게 된다. 본 연구에서는 scratch 와 같은 deflect들을 효율적으로 검출, 분석하고, scratch를 감소시키는데 그 목적이 있다. 본 실험을 위해 8" TEOS wafer와 commercial oxide slurry 및 friction polisher (Poli-500, G&P tech., Korea)를 사용하여 CMP 공정을 진행하였으며, CMP 공정조건은 각각 80rpm/80rpm/1psi(Platen speed/Head speed/Pressure)에서 1분 동안 연마를 한 후 scratch 발생 경향을 살펴보았다. CMP 후 wafer위에 오염되어 있는 slurry residue들을 제거하기 위해 SC-1, HF 세정을 이용하여 최적화된 post-CMP 공정기술을 제안하였다. Scratch 검출 및 분석을 위해 wafer surface analyzer (Surfscan 6200, Tencor, USA)와 optical microscope (LV100D, Nicon, Japan)를 사용하였다. CMP 공정 변수들에 따른 scratch 발생정도를 비교하였으며, scratch 발생 요인들에 따른 scratch 형태 및 발생정도를 살펴보았다. 최적화된 post-CMP 세정 조건은 메가소닉과 함께 SC-1 세정을 실시하여 slurry residue들을 제거한 후, HF 세정을 실시하여 잔여 오염물들을 제거하고 검출이 용이하도록 scratch를 확장시킬 수 있도록 제안하였으며, 100%의 particle removal efficiency (PRE)를 얻을 수 있었다. 실제 CMP 공정후 post-CMP 세정 단계별 scratch 개수를 측정한 결과, SC-1 세정 후 약 220개의 scratch가 검출되었으며, 검출되지 않았던 scratch가 HF 세정 후 확장되어 드러남에 따라 약 500개의 scratch 가 검출되었다.