Dependency of Planarization Efficiency on Crystal Characteristic of Abrasives in Nano Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing (STI CMP용 나노 세리아 슬러리에서 연마입자의 결정특성에 따른 평탄화 효율의 의존성)
-
- Proceedings of the Materials Research Society of Korea Conference
- /
- 2003.11a
- /
- pp.65-65
- /
- 2003