• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1539-1542
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• 2005

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, $HS(CH_2)_nX$, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the wellknown diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser coupled to a near-field scanning optical microscope (NSOM).

• Proceedings of the Korea Concrete Institute Conference
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• 2004.05a
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• pp.292-295
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• 2004

Recently, polymer-clay hybrid materials have received considerable attention from both a fundamental research and application point of view. This organ-inorganic hybrid, which contains a nanoscale dispersion of the layered silicates, is a material with greatly improved thermal and mechanical characteristics. Two classes of nanocomposites were synthesized using an unsaturated polyester resin as the matrix and sodium montmorillonite as well as an organically modified montmorillonite as the reinforcing agents. X -ray diffraction pattern of the composites showed that the interlayer spacing of the modified montmorillonite were exfoliated in polymer matrix. The mechanical properties also supported these findings, since in general, tensile strength, modulus with modified montmorillonite were higher than the corresponding properties of the composites with unmodified montmorillonite. Adding organically modified clay improved the tensile strength of unsaturated polyester by $22\%$ and the tensile modulus of unsaturated polyester was also improved by $34\%$.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.19 no.5
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• pp.616-621
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• 2010

New type of the base material of the light-emitting diode requires copper wafer in view of heat and electrical conductance. Therefore, polishing process of the substrate level is needed to get a nanometer level of surface roughness as compared with pattern structure of nano-size in the semiconductor industry. In this paper, a series of lapping and polishing technique is shown for the rough and deflected copper substrate of thickness 3mm. Lapping by sand papers tried air cooling method. And two steps of polishing used the diamond abrasives and the $Al_2O_3$ slurry of size 100mm considering the residual scratch. White-light interferometer proved successfully a mirror-like surface roughness of Ra 6nm on the area of $0.56mm{\times}0.42mm$.

• 한국신재생에너지학회:학술대회논문집
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• 2011.05a
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• pp.126.1-126.1
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• 2011

박막형 태양전지의 효율 향상을 위하여 광확산 패턴이 형성된 기판을 제작하고 이를 이용하여 비정질 실리콘 박막 태양전지를 제작하였다. 나노 임프린트 방법을 사용하여 제작된 광확산 패턴은 불규칙한 마이크로-나노 크기의 미세구조를 가지고 있어 빛의 확산투과 비율을 향상시켜주는 역할을 하였다. 제작된 광확산 기판위에 TCO물질을 증착하고, PECVD법을 사용하여 비정질 실리콘 p-i-n 접합 구조를 형성하였다. 제작된 태양전지 소자를 1.5 AM의 조건에서 I-V 특성을 분석하였으며, 비교군으로 사용된 일본 Asahi 사의 U-type glass에 비해 높은 Jsc 값을 나타내었다. 또한 외부양자효율을 측정함으로써 광확산 패턴에 의한 양자효율 변화를 확인 할 수 있었다.

• Journal of Powder Materials
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• v.10 no.5
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• pp.318-324
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• 2003

The nano-scale crystallite sizes of uranium oxide powders in simulated spent fuel were measured by the neutron diffraction line broadening method in order to analyze the sintering behavior of the dry process fuel. The mixed $UO_2$ and fission product powders were dry-milled in an attritor for 30, 60, and 120 min. The diffraction patterns of the powders were obtained by using the high resolution powder diffractometer in the HANARO research reactor. Diffraction line broadening due to crystallite size was measured using various techniques such as the Stokes' deconvolution, profile fitting methods using Cauchy function, Gaussian function, and Voigt function, and the Warren-Averbach method. The non-uniform strain, stacking fault and twin probability were measured using the information from the diffraction pattern. The realistic crystallite size could be obtained after separation of the contribution from the non-uniform strain, stacking fault and twin.

• Korean Journal of Materials Research
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• v.26 no.9
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• pp.455-459
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• 2016

The deposition process for the gap-filling of sub-micrometer trenches using DMDMOS, $(CH_3)_2Si(OCH_3)_2$, and $C_xH_yO_z$ by flowable chemical vapor deposition (F-CVD) is presented. We obtained low-k films that possess superior gap-filling properties on trench patterns without voids or delamination. The newly developed technique for the gap-filling of submicrometer features will have a great impact on IMD and STI for the next generation of microelectronic devices. Moreover, this bottom up gap-fill mode is expected to be universal in other chemical vapor deposition systems.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2006.05a
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• pp.243-246
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• 2006

In this paper, Experimental results on the measurement of mechanical properties of fine patterns in the MEMS structure are described. The mechanical properties of embossing patterns on metallic thin foil is measured using the nano indentation system, that is developed by Korea Institute of Industrial Technology(KITECH). These micro embossing patterns are fabricated using CIP(Cold Isostatic Press) process on micro metallic thin foils(Al-1100) that are made by rolling process. These embossing patterned metallic thin foils(Al-1100) are used in the reflecting plate of BLU(Back Light Unit) and electrical/mechanical MEMS components. If these mechanical properties of fine patterns are utilized in a design procedure, the optimal design can be achieved in aspects of reliability as well as economy.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.989-992
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• 2008

X-ray lithography is one of the most powerful processes in the fabrication of nano/micro structures with a high aspect ratio. This process enables the fabrication of ultra-thin barrier ribs for PDP using X-ray sensitive paste. In this paper, organic material including photo-monomers, photo-oligomers, binder polymer and additives as well as inorganic powders with different size were optimized to fabricate high aspect ratio barrier rib pattern for PDP.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.63-63
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• 2010

나노 구조를 제작은 나노 기술을 기반으로 하는 electronics, optoelectronics, sensing, ultra display등의 여러 분야에서 이용되고 있다. 특히 나노 구조를 갖는 금속 패터닝의 경우 전자빔 리소 그래피 (electron beam lithography)나 레이저 패터닝(laser patterning)과 같은 방법들이 많이 사용되고 있다. 하지만 공정이 복잡하고 그로 인해 공정 비용이 많이 든다는 단점이 있었다. 나노 임프린트 리소그래피 기술은 master mold 표면의 나노 패턴을 가열, 가압 공정을 통해 기판 위의 고분자 레지스트 층으로 전사하는 기술이다. 이 기술은 간단한 공정을 통해 나노 패턴을 형성할 수 있는 기술이기 때용에 차세대 나노 패터닝 기술로써 각광받고 있다. 특히 이 기술은 레지스트 층과의 직접적인 접촉을 통해 나노 패턴을 형성하기 때문에 다양한 방법을 통해 기능성 나노 패턴을 직접적으로 형성할 수 있는 가능성을 지니고 있다. 본 연구는 novel meta1의 하나인 Ag 입자가 첨가된 ink solution를 master mold로부터 복제한 PDMS mold를 이용하여 다양한 구조의 나노 패턴을 만드는 방법에 대한 연구이다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.263-263
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• 2010

High temperature annealing is required to synthesize graphene using CVD. When thin metal catalyst is used for the synthesis, the high temperature pre-annealing makes the thin catalyst highly agglomerated. We investigated the agglomeration effect on the shape of the synthesized graphene. It is found that high temperature annealing makes randomly distributed many hole or blister on metal catalyst, and the synthesized graphene features floral pattern around the hole. The floral patterns of graphene turned out to be multi-layers and higher D peaks in raman spectrum.