• Title/Summary/Keyword: nano-pattern

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A study on Linear Pattern Fabrication of Plate-type Polymer by Using Thermal Nano Imprint Lithography Process (열간나노임프린트공정을 이용한 평판형 폴리머 소재의 선형 패턴 제작에 관한 연구)

  • Joung, Y.N.;Lee, C.S.;Youn, S.W.;Kang, C.G.
    • Transactions of Materials Processing
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    • v.18 no.8
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    • pp.616-624
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    • 2009
  • In this work we demonstrate the hot-embossing process under different forming conditions such as forming temperature, load, and holding time in pressing, in order to determine the suitable conditions required for linear patterning on polymer plates (PC). Results showed that the replicated pattern depth increased in proportion to an increase in the forming temperature, load, and time. The reduction of the workpiece thickness increased according to the holding time in the pressing process. In the process of time, the reduction ratio of the workpiece thickness decreased due to the surface area increment of the workpiece, while the pressure on the workpiece declined. In order to reduce the bulging ratio we introduced a temperature difference between the upper and the lower punch.

Surface Heating Method Using Hot Jet Impingement for Improving Transcription of Nano-Pattern (나노 패턴의 전사성 향상을 위한 고온 기체 분사를 이용한 금형 표면의 가열 기법)

  • Kim, K.H.;Yoo, Y.E.;Je, T.J.;Choi, D.S.;Kim, S.K.
    • Transactions of Materials Processing
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    • v.16 no.1 s.91
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    • pp.9-14
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    • 2007
  • In this paper, a mold temperature control method for injection molding is proposed. The inner surface of mold is locally heated by jet impingement to improve pattern transcription. Heating by hot jet is completed while the mold is open. An experimental system that realizes the proposed idea has been built, which includes mold, nozzle assembly and heater. Actual injection molding process including the proposed heating procedure has been conducted to verify the validity of the method. The process has been done for several conditions with different jet temperatures and duration of heating. The results from different conditions are compared.

Trends of Flat Mold Machining Technology with Micro Pattern (미세패턴 평판 금형가공 기술동향)

  • Je, Tae-Jin;Choi, Doo-Sun;Jeon, Eun-Chae;Park, Eun-Suk;Choi, Hwan-Jin
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.11 no.2
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    • pp.1-6
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    • 2012
  • Recent ultra-precision machining systems have nano-scale resolution, and can machine various shapes of complex structures using five-axis driven modules. These systems are also multi-functional, which can perform various processes such as planing, milling, turning et al. in one system. Micro machining technology using these systems is being developed for machining fine patterns, hybrid patterns and high aspect-ratio patterns on large-area molds with high productivity. These technology is and will be applied continuously to the fields of optics, display, energy, bio, communications and et al. Domestic and foreign trends of micro machining technologies for flat molds were investigated in this study. Especially, we focused on the types and the characteristics of ultra-precision machining systems and application fields of micro patterns machined by the machining system.

Modeling and Simulation of Electron-beam Lithography Process for Nano-pattern Designs using ZEP520 Photoresist (ZEP520 포토리지스트를 이용한 나노 패턴 형성을 위한 전자빔 리소그래피 공정 모델링 및 시뮬레이션)

  • Son, Myung-Sik
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.3
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    • pp.25-33
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    • 2007
  • A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

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Study on the Nano Semiconductor Structure due to the Electrical Characteristics of Thin Films with Schottky Contacts (쇼키 접합을 갖는 박막의 전기적인 특성에 따른 나노반도체구조에 관한 연구)

  • Oh, Teresa
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.1
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    • pp.70-74
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    • 2017
  • To research the electrical properties of ZnS thin films with various annealing conditions, ZnS was prepared by RF magnetron sputtering system and annealed in a vacuum for 10 minutes. All films were analyzed by the XRD, PL and I-V measurement system. The XRD pattern of ZnS film annealed at $100^{\circ}C$ was shifted to lower 2 theta because of the formation of a depletion region at the interface between a substrate and ZnS thin film, and the capacitance was abruptly increased. However, the pattern of XRD of ZnS film annealed at $100^{\circ}C$ with a Schottky contact was showed the amorphous structure, and the current-voltage characteristics were non-linearly observed by the Schottky contact.

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Organic thin-film transistors and transistor diodes with transfer-printed Au electrodes

  • Cho, Hyun-Duck;Lee, Min-Jung;Yoon, Hyun-Sik;Char, Kook-Heon;Kim, Yeon-Sang;Lee, Chang-Hee
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1122-1124
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    • 2009
  • Organic thin-film transistors (OTFTs) were fabricated by using the transfer patterning method. In order to remove Au pattern easily, UV-curable polymer mold was surface treated. Au source/drain (S/D) pattern was transferred to insulator-coated substrate surface. Fabricated OTFTs were compared to OTFTs using vacuum-deposited Au S/D. Additionally, transistor diodes were characterized.

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Fabrication of Ceramic Line Pattern by UV-Nanoimprint Lithography of Inorganic Polymers (무기고분자의 나노임프린트법에 의한 세라믹 선형 패턴의 제조)

  • Park Jun-Hong;Pham Tuan-Anh;Lee Jae-Jong;Kim Dong-Pyo
    • Polymer(Korea)
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    • v.30 no.5
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    • pp.407-411
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    • 2006
  • The SiC-based ceramic nanopatterns were prepared by placing polydimethylsiloxane (PDMS) mold from DVD master on the spincoated polyvinylsilaeane (PVS) or allylhydridopolycaybosilane (AHPCS) as ceramic precursors to fabricate line pattern via UV-nanoimprint lithography (UV-NIL), and subsequent pyrolysis at $800^{\circ}C$ in nitrogen atmosphere. As the dimensional change of polymeric and ceramic patterns was comparatively investigated by AFM and SEM, the shrinkage in height was 38.5% for PVS derived pattern and 24.1% for AHPCS derived pattern while the shrinkage in width was 18.8% for PVS and 16.7% for AHPCS. It indicates that higher ceramic yield of the ceramic precursor resulted in less shrinkage, and the strong adhesion between the substrate and the pattern caused anisotropic shrinkage. This preliminary work suggests that NIL is a promissing route for fabricating ceramic MEMS devices, with the development on the shrinkage control.

Micro-patterning for Biomimetic Functionalization of Surface

  • Jeon, Deok-Jin;Lee, Jun-Yeong;Yeo, Jong-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.272-273
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    • 2013
  • Some living thingsuse micro- or nano- structures for living in nature. Scientists and engineers made efforts to mimic them, and they succeeded in making new types of applications. They used 'Namib desert beetle' to self-filling device by moisture harvesting and 'lotus leaf' to self-cleaning device by water repelling. 'Namib desert beetle' and lotus leaf have micro-patterns on their surface, which consists of hydrophobic or hydrophilic materials [1]. Moreover, micro-patterns on the surface make self-filling or self-cleaning property enhanced because of the surface roughness. Surface roughness enhances wettability [2]. Micro-pattern is a significant factor to make the surface be functional, so we want to make new types of functional surface by micro-patterning. In this work,we make several functional micro-patterns (radial, line, and dot arrays) using maskless lithography and analyze the characteristics of each micro-pattern. In order to analyze and understand surface characteristics, micro-patterns with varying sizes are investigated. All experiments are proceeded on mr-DWL5 photo resists coated on silicon wafers in same condition. All the experiments have demonstrated good performances about hydrophobic or hydrophilic property corresponding to their material and structural combinations. In radial micro-pattern, although the surface is flat, water drops on hydrophilic radial pattern can be convergent to a middle point and water drops on hydrophobic radial pattern can be divergent from the middle point. In line array micro-pattern, water drops can roll off along only one direction in parallel with the line arrays. Such phenomena might be mainly caused by the local change of surface roughness. From these results, controlling the movement and direction of water drops is made feasible without introducing a slope, which can potentially be used for new types of applications.

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A Study on Rheology Property and Characteristics of Thermal-curable Ag Paste for Polymer Gravure Printing (Polymer Gravure Printing용 열경화형 Ag Paste의 물성과 레올로지 특성 연구)

  • Ku, Tae-Hee;Nam, Su-Yong;Kim, Sung-Bin
    • Journal of the Korean Graphic Arts Communication Society
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    • v.30 no.2
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    • pp.1-12
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    • 2012
  • In this experiment, we have manufactured thermal-curable silver pastes for direct printing. And to enhance conductivity, printability, adhesion and hardness during polymer direct-gravure prints, we have manufactured Ag pastes by adding variety of filter contents. Then we have investigated characteristics of rheology in paste according to the gravure printability and the properties of printed conductive patterns. Depending on a variety of Ag powder, there was a big difference in sharpness of printed pattern. And also by the use of carbon, there was a big difference in amount of solvent used, conductivity and in hardness. We could improve doctoring and the sharpness of a pattern by adding Ag paste in carbon particle, but as we have used nano-sized particle, there was an increase in the amount of solvent used and also we have found out that it gives a bad effect as adhesive and hardness becomes weaker. Even though Ag particle has the same spherical shape, the surface treatments could differ from one another. And by the appropriate choice and with the suitable combination of Ag powder, excellent printability and conductivity could be obtained.

The Analysis of Chemical Vapor Deposition Characteristics using Focused Ion Beam (FIB-CVD의 가공 공정 특성 분석)

  • Kang E.G.;Choi H.Z.;Choi B.Y.;Hong W.P.;Lee S.W.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.593-597
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    • 2005
  • FIB equipment can perform sputtering and chemical vapor deposition simultaneously. It is very advantageously used to fabricate a micro structure part having 3D shape because the minimum beam size of ${\phi}$ 10nm and smaller is available. Currently FIB is not being applied in the fabrication of this micro part because of some problems to redeposition and charging effect of the substrate causing reduction of accuracy with regards to shape and productivity. Furthermore, the prediction of the material removal rate information should be required but it has been insufficient for micro part fabrication. The paper have the targets that are FIB-CVD characteristic analysis and minimum line pattern resolution achievement fur 3D micro fabrication. We make conclusions with the analysis of the results of the experiment according to beam current, pattern size and scanning parameters. CVD of 8 pico ampere shows superior CVD yield but CVD of 1318 pico ampere shows the pattern sputtered. And dwell time is dominant parameter relating to CVD yield.

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