• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.10
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• pp.790-793
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• 2011

In this study, the surface modification for a silicon(Si) mold using $CHF_3$ inductively coupled plasma(ICP). The conditions under that plasma was treated a input ICP power 600 W, an operating gas pressure of 10 mTorr and plasma exposure time of 30 sec. The Si mold surface became hydrophobic after plasma treatment in order to $CF_x$(X= 1,2,3) polymer. However, as the de-molding process repeated, it was investigated that the contact angle of Si surface was decreased. So, we attempted to investigate the degradation mechanism of the accurate pattern transfer with increasing the count of the de-molding process using scanning electron microscope (SEM), contact angle, and x-ray photoelectron spectroscopy (XPS) analysis of Si mold surface.

• Tribology and Lubricants
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• v.35 no.2
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• pp.106-113
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• 2019

We investigated the application of tetrahedral amorphous carbon (ta-C) coatings to fabricate a glass lens manufactured using a glass molding process (GMP). In this work, ta-C coatings with different thickness (50, 100, 150 and 200 nm) were deposited on a tungsten carbide (WC-Co) mold using the X-bend filter of a filtered cathode vacuum arc. The effects of thickness on mechanical and tribological properties of the coating were studied. These ta-C coatings were characterized by atomic force microscopy, scanning electron microscopy, nano-indentation measurements, Raman spectrometry, Rockwell-C tests, scratch tests and ball on disc tribometer tests. The nano-indentation measurements showed that hardness increased with an increase in coating thickness. In addition, the G-peak position in the Raman spectra analysis was right shifted from 1520 to $1586cm^{-1}$, indicating that the $sp^3$ content increased with increasing thickness of ta-C coatings. The scratch test showed that, compared to other coatings, the 100-nm-thick ta-C coating displayed excellent adhesion strength without delamination. The friction test was carried out in a nitrogen environment using a ball-on-disk tribometer. The 100-nm-thick ta-C coating showed a low friction coefficient of 0.078. When this coating was applied to a GMP, the life time, i.e., shot counts, dramatically increased up to 2,500 counts, in comparison with Ir-Re coating.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.18 no.6
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• Proceedings of the KSME Conference
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• 2004.04a
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• Design & Manufacturing
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• v.17 no.2
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• pp.55-61
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• 2023

With femtosecond (fs) laser pulse irradiation on metals, various types of nano- and micro-scale structures can be naturally induced at the surface through laser-matter interaction. Two notable structures are laser-induced periodic surface structures (LIPSSs) and cone/spike structures, which are known to significantly modify the optical and physical properties of metal surfaces. In this work, we irradiate fs laser pulses onto various types of metals, cold-rolled steel, pickled & oiled steel, Fe-18Cr-8Ni alloy, Zn-Mg-Al alloy coated steel, and pure Cu which can be useful for precise molding and imprinting processes, and adjust the morphological profiles of LIPSSs and cone/spike structures for clear structural coloration and a larger range of surface wettability control, respectively, by changing the fluence of laser and the speed of raster scan. The periods of LIPSSs on metals used in our experiments are nearly independent of laser fluence. Accordingly, the structural coloration of the surface with LIPSSs can be optimized with the morphological profile of LIPSSs, controlled only by the speed of the raster scan once the laser fluence is determined for each metal sample. However, different from LIPSSs, we demonstrate that the morphological profiles of the cone/spike structures, including their size, shape, and density, can be manipulated with both the laser fluence and the raster scan speed to increase a change in the contact angle. By injection molding and imprinting processes, it is expected that fs laser-induced surface structures on metals can be replicated to the plastic surfaces and potentially beneficial to control the optical and wetting properties of the surface of injection molded and imprinted products.

• Journal of the Korean Ceramic Society
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• v.46 no.1
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• pp.102-107
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• 2009

This study has been focused on an effective surface finishing method combining ELID (ELectrolytic In-process Dressing) and MAP (Magnetic Assisted Polishing) for the nano-precision mirror grinding of glass-lens molding mould. ELID grinding is an excellent technique for mirror grinding of various advanced metallic or nonmetallic materials. A polishing process is also required for elimination of scratches present on ELID grinded surfaces. MAP has been used as polishing method due to its high polishing efficiency and superior surface quality. It also presents some techniques for achieving the nanometer roughness of the hard material such as WC-Co, which are extensively used in precision tooling material.

• Transactions of Materials Processing
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• v.15 no.1 s.82
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• pp.21-26
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• 2006

A optical head unit for nano optical probe array was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09b
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• pp.964-965
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• 2006

The injection molded Fe sintered bodies were fabricated using two kinds of nano Fe powders, $Fe-5%vol.ZrO_2$ and $Fe-10vol.%ZrO_2$ powders. The relationship between microstructure and mechanical properties depending on the $ZrO_2$ contents and sintering temperature were characterized by SEM and TEM techniques. In the wear test, the $Fe-0vol%ZrO_2$ sintered bodies showed mainly adhesive wear, but in the Fe-5%vol. $ZrO_2$ and Fe-10vol. % $ZrO_2$ composites the main wear behavior showed abrasive wear mode.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2006.09a
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• pp.362-363
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• 2006

Nano-structured tungsten carbide compacts with cobalt matrices (WC-Co) offer new opportunities for achieving superior hardness and toughness combinations. A unified modeling and simulation tool has been developed to produce maps of sintering pathways from nanocrystalline WC powder to sintered nano-structured WC-Co compacts. This tool includes (1) die compaction, (2) grain growth, (3) densification, (4) sensitivity analysis, and (5) optimization. All material parameters were obtained by curve fitting based on results with two WC-Co powders. Critical processing parameters are determined based on sensitivity analysis and are optimized to minimize grain size with high density.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.09a
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• pp.29-34
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• 2005

A optical head unit for nano optical probe away was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.