• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.581-584
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• 2005

Ion beam processing is one of the key technologies to realize mastless and resistless sub 50nm nano fabrication. Unwanted effects, however, may occur since an energetic ion can interact with a target surface in various ways. Depending on the ion energy, the interaction can be swelling, deposition, sputtering, re-deposition, implantation, damage, backscattering and nuclear reaction. Sputtering is the fundamental mechanisms in ion beam induced direct patterning. Re-deposition and backscattering are unwanted mechanisms to avoid. Therefore understanding of ion beam-solid interaction should be advanced for further ion beam related research. In this paper we simulate some important interaction mechanisms between energetic incident ions and solid surfaces and the results are compared with experimental data. The simulation results are agreed well with experimental data.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.489-490
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• 2006

To establish fabrication techniques for nano structure understanding of focused ion beam (FIB) milling process is required. In this study the mathematical model containing the factors related to FIB milling is developed to acquire the optimal fabrication condition. Then, the model is verified by comparison with various nano pattern fabricated in actual FIB system. Consequently, it is demonstrated that the nano patterns with the smallest pitch can be fabricated using developed FIB milling model.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.251-252
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• 2012

Recently, the growing interest in organic microelectronic devices including OLEDs has led to an increasing amount of research into their many potential applications in the area of flexible electronic devices based on plastic substrates. However, these organic devices require a gas barrier coating to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency OLEDs require an extremely low Water Vapor Transition Rate (WVTR) of $1{\times}10^{-6}g/m^2$/day. The Key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required ($1{\times}10^{-6}g/m^2$/day) is the suppression of defect sites and gas diffusion pathways between grain boundaries. In this study, we developed an $Al_2O_3$ nano-crystal structure single gas barrier layer using a Neutral Beam Assisted Sputtering (NBAS) process. The NBAS system is based on the conventional RF magnetron sputtering and neutral beam source. The neutral beam source consists of an electron cyclotron Resonance (ECR) plasma source and metal reflector. The Ar+ ions in the ECR plasma are accelerated in the plasma sheath between the plasma and reflector, which are then neutralized by Auger neutralization. The neutral beam energies were possible to estimate indirectly through previous experiments and binary collision model. The accelerating potential is the sum of the plasma potential and reflector bias. In previous experiments, while adjusting the reflector bias, changes in the plasma density and the plasma potential were not observed. The neutral beam energy is controlled by the metal reflector bias. The NBAS process can continuously change crystalline structures from an amorphous phase to nano-crystal phase of various grain sizes within a single inorganic thin film. These NBAS process effects can lead to the formation of a nano-crystal structure barrier layer which effectively limits gas diffusion through the pathways between grain boundaries. Our results verify the nano-crystal structure of the NBAS processed $Al_2O_3$ single gas barrier layer through dielectric constant measurement, break down field measurement, and TEM analysis. Finally, the WVTR of $Al_2O_3$ nano-crystal structure single gas barrier layer was measured to be under $5{\times}10^{-6}g/m^2$/day therefore we can confirm that NBAS processed $Al_2O_3$ nano-crystal structure single gas barrier layer is suitable for OLED application.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.10a
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• pp.7-7
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• 2011

Quantum beam technology has been expected to develop breakthroughs for nanotechnology during the third basic plan of science and technology (2006~2010). Recently, Green- or Life Innovations has taken over the national interests in the fourth basic science and technology plan (2011~2015). The NIMS (National Institute for Materials Science) has been conducting the corresponding mid-term research plans, as well as other national projects, such as nano-Green project (Global Research for Environment and Energy based on Nanomaterials science). In this lecture, the research trends in Japan and NIMS are firstly reviewed, and the typical achievements are highlighted over key nanotechnology fields. As one of the key nanotechnologies, the quantum beam research in NIMS focused on synchrotron radiation, neutron beams and ion/atom beams, having complementary attributes. The facilities used are SPring-8, nuclear reactor JRR-3, pulsed neutron source J-PARC and ion-laser-combined beams as well as excited atomic beams. Materials studied are typically fuel cell materials, superconducting/magnetic/multi-ferroic materials, quasicrystals, thermoelectric materials, precipitation-hardened steels, nanoparticle-dispersed materials. Here, we introduce a few topics of neutron scattering and ion beam nanofabrication. For neutron powder diffraction, the NIMS has developed multi-purpose pattern fitting software, post RIETAN2000. An ionic conductor, doped Pr2NiO4, which is a candidate for fuel-cell material, was analyzed by neutron powder diffraction with the software developed. The nuclear-density distribution derived revealed the two-dimensional network of the diffusion paths of oxygen ions at high temperatures. Using the high sensitivity of neutron beams for light elements, hydrogen states in a precipitation-strengthened steel were successfully evaluated. The small-angle neutron scattering (SANS) demonstrated the sensitive detection of hydrogen atoms trapped at the interfaces of nano-sized NbC. This result provides evidence for hydrogen embrittlement due to trapped hydrogen at precipitates. The ion beam technology can give novel functionality on a nano-scale and is targeting applications in plasmonics, ultra-fast optical communications, high-density recording and bio-patterning. The technologies developed are an ion-and-laser combined irradiation method for spatial control of nanoparticles, and a nano-masked ion irradiation method for patterning. Furthermore, we succeeded in implanting a wide-area nanopattern using nano-masks of anodic porous alumina. The patterning of ion implantation will be further applied for controlling protein adhesivity of biopolymers. It has thus been demonstrated that the quantum beam-based nanotechnology will lead the innovations both for nano-characterization and nano-fabrication.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2005.05a
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• pp.24-29
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• 2005

Fm (Focused ion beam) system is one of the most important equipments for the nano-scale machining. Various researches have been performed, since it can etch the material and deposit 3-D structure with high-aspect-ratio in the nanometer scale. In spite of those researches, the definite method for the reliability of FIB system has not been reported. In this paper, we proposed the reliability assessment method through nano-pattern fabrication. In the fabricated nano-pattern, the characteristics of FIB system are included. Using this effect, we tried to assess the FIB reliability. First, we suggested reliability assessment items and nano-patterns. And, to know the suitableness of the proposed method, we fabricated several nano-patterns using Nova200(FEI Company) and SMI2050(SEIKO) which are FIB apparatuses. The fabricated nano-patterns are measured with SEM (Scanning Electron Microscope) and compared with designed dimensions. And the compared results showed that the proposed method is suitable for the assessment of FIB system reliability.

• Structural Monitoring and Maintenance
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• v.7 no.2
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• pp.69-84
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• 2020

Based on differential quadrature method (DQM) and nonlocal strain gradient theory (NSGT), forced vibrations of a porous functionally graded (FG) scale-dependent beam in thermal environments have been investigated in this study. The nanobeam is assumed to be in contact with a moving point load. NSGT contains nonlocal stress field impacts together with the microstructure-dependent strains gradient impacts. The nano-size beam is constructed by functionally graded materials (FGMs) containing even and un-even pore dispersions within the material texture. The gradual material characteristics based upon pore effects have been characterized using refined power-law functions. Dynamical deflections of the nano-size beam have been calculated using DQM and Laplace transform technique. The prominence of temperature rise, nonlocal factor, strain gradient factor, travelling load speed, pore factor/distribution and elastic substrate on forced vibrational behaviors of nano-size beams have been explored.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.6 s.183
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• pp.160-165
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• 2006

We have designed a high-transmission nano aperture in a perfect electric conductor film with the incident beam of 532 nm wavelength. The aperture basically has a C-shape and is known to produce a bright spot nearby the aperture in small size less than diffraction limit. The bright spot is strongly coupled with the local plasmon excited through the aperture hole. The characteristics of transmission and peak power of the aperture output were calculated using finite differential time domain (FDTD) technique, and the geometry of the aperture was determined to get a maximum transmission and peak power. To find the effect of the surface plasmon induced near by the aperture, we calculated the variations of the transmittance and the beam sizes by changing the size of the input beam irradiated on the aperture.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.15 no.6
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• pp.71-75
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• 2006

The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its usage in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. The target of this paper is the analysis of FIB sputtering process according to tilt angle, dwell time and overlap for application of 3D micro and pattern fabrication and to find the effective beam scanning conditions using Taguchi method. Therefore we make the conclusions that tilt angle is dominant parameter for sputtering yield. Burr size is reduced as tilt angle is higher.

• Journal of the Korean Vacuum Society
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• v.12 no.4
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• pp.288-292
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• 2003

The fabrication of silicon nano-master with pillar structures using E-beam lithography and ICP etching was investigated for application of 2-dimensional polymer photonic crystal waveguides with air hole structures. Pillar structures with square, hexagon, dodecagon and circle were successfully fabricated. The diameters and structures of fabricated pillars were measured by CD-SEM and SPM-AFM. It was found that the optimal dose for complete circle pillar structures was 432 $\mu$C/$\textrm{cm}^2$.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.5
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• pp.129-133
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• 2007

Focused Ion Beam(FIB) systems is a useful tool for the fabrication of micro-nano scale structures. In this study, the effects of FIB etching on the Au microstructure are systematically investigated. As the fabrication parameters, ion dose, dwell time and beam overlap ratio are studied. First, the increases of Ga ion dose makes the milling yield higher and the sidewall of milling profile steeper. Dwell time is found to have little effects on the milling profile due to the relatively large milling area of $1\times1{\mu}m^2$ used in this study. However, beam overlap significantly affects not only milling rate but also milling profile. As the beam overlap ratio changes from positive to negative, the development of regular cross-stripe patterns at the bottom with low milling rate is observed.