• 제목/요약/키워드: nano beam

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Design and Analysis of Magnetic Field Control in Electron Lenses for a E-Beam Writer (전자빔 가공기용 자기 렌즈의 자기장 제어구조 설계)

  • 노승국;이찬홍;백영종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.401-404
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    • 2004
  • The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

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Flexoelectric effects on dynamic response characteristics of nonlocal piezoelectric material beam

  • Kunbar, Laith A. Hassan;Alkadhimi, Basim Mohamed;Radhi, Hussein Sultan;Faleh, Nadhim M.
    • Advances in materials Research
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    • v.8 no.4
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    • pp.259-274
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    • 2019
  • Flexoelectric effect has a major role on mechanical responses of piezoelectric materials when their dimensions become submicron. Applying differential quadrature (DQ) method, the present article studies dynamic characteristics of a small scale beam made of piezoelectric material considering flexoelectric effect. In order to capture scale-dependency of such piezoelectric beams, nonlocal elasticity theory is utilized and also surface effects are included for better structural modeling. Governing equations have been derived by utilizing Hamilton's rule with the assumption that the scale-dependent beam is subjected to thermal environment leading to uniform temperature variation across the thickness. Obtained results based on DQ method are in good agreement with previous data on pizo-flexoelectric beams. Finally, it would be indicated that dynamic response characteristics and vibration frequencies of the nano-size beam depends on the existence of flexoelectric influence and the magnitude of scale factors.

Modeling and Simulation of Electron-beam Lithography Process for Nano-pattern Designs using ZEP520 Photoresist (ZEP520 포토리지스트를 이용한 나노 패턴 형성을 위한 전자빔 리소그래피 공정 모델링 및 시뮬레이션)

  • Son, Myung-Sik
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.3
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    • pp.25-33
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    • 2007
  • A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

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Stability characteristic of bi-directional FG nano cylindrical imperfect composite: Improving the performance of sports bikes using carbon nanotubes

  • Chaobing Yan;Tong Zhang;Ting Zheng;Tayebeh Mahmoudi
    • Steel and Composite Structures
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    • v.50 no.4
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    • pp.459-474
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    • 2024
  • Classical and first-order nonlocal beam theory are employed in this study to assess the thermal buckling performance of a small-scale conical, cylindrical beam. The beam is constructed from functionally graded (FG) porosity-dependent material and operates under the thermal conditions of the environment. Imperfections within the non-uniform beam vary along both the radius and length direction, with continuous changes in thickness throughout its length. The resulting structure is functionally graded in both radial and axial directions, forming a bi-directional configuration. Utilizing the energy method, governing equations are derived to analyze the thermal stability and buckling characteristics of a nanobeam across different beam theories. Subsequently, the extracted partial differential equations (PDE) are numerically solved using the generalized differential quadratic method (GDQM), providing a comprehensive exploration of the thermal behavior of the system. The detailed discussion of the produced results is based on various applied effective parameters, with a focus on the potential application of nanotubes in enhancing sports bikes performance.

P-side-down mounting by using AuSn alloy solder of semiconductor laser (반도첼 레이저의 AuSn 합금 솔더를 사용한 p-side-down방식의 마운팅)

  • Choi, S.H.;Heo, D.C.;Bae, H.C.;Han, I.K.;Lee, C.
    • Proceedings of the KIEE Conference
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    • 2003.10a
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    • pp.273-275
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    • 2003
  • 본 실험은 고출력 반도체 레이저의 p-side-down 마운팅용 솔더로서 AuSn 합금 솔더(80wt%:20wt%)의 적합성에 대해 연구하였다. $1{\mu}m$이하의 균일도로 폴리싱 된 Cu heat sink의 표면에 두께 $1{\mu}m$의 Ni로 코팅을 한다음, AuSn 다층박막은 e-beam 증착기로 AuSn 합금 솔더는 열증착기로 각각 증착하였다. 열처리는 산화 방지를 위해 $N_2$ 분위기에서 행하였으며, 동일한 압력으로 마운팅을 하였다. 표면의 거칠기와 형상은 AFM(Atomic Force Microscope)과 SEM(Scanning Electron Microscopy)으로 그리고 Au와 Sn의 성분비는 AES(Auger Electron Spectroscopy) 로 비교하였다. 또한 CW(연속발진)을 통한 L-I(Light-Current)측정을 통해 본딩상태를 비교하였다.

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Fabrication of Nano-photonic Crystals with Lattice Constant of 460-nm by Inductively-coupled Plasma Etching Process (유도결합형 플라즈마 식각공정을 통해 제작된 460 nm 격자를 갖는 나노 광결정 특성)

  • Choi, Jae-Ho;Kim, Keun-Joo
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.2 s.15
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    • pp.1-5
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    • 2006
  • The GaN thin film on the 8 periods InGaN/GaN multi-quantum well structure was grown on the sapphire substrate using metal-organic chemical vapor deposition. The nano-scaled triangular-lattice holes with the diameter of 150 nm were patterned on a polymethylmethacrylate blocking film using an electron beam nano-lithography system. The thin slab and two-dimensional photonic crystals with the thickness of 28 nm were fabricated on the GaN layer for the blue light diffraction sources. The photonic crystal with the lattice parameter of 460 nm enhances spectral intensity of photoluminescence indicating that the photonic crystals provides the source of nano-diffraction for the blue light of the 450-nm wavelength.

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Bending of a cracked functionally graded nanobeam

  • Akbas, Seref Doguscan
    • Advances in nano research
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    • v.6 no.3
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    • pp.219-242
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    • 2018
  • In this study, static bending of an edge cracked cantilever nanobeam composed of functionally graded material (FGM) subjected to transversal point load at the free end of the beam is investigated based on modified couple stress theory. Material properties of the beam change in the height direction according to exponential distributions. The cracked nanobeam is modelled using a proper modification of the classical cracked-beam theory consisting of two sub-nanobeams connected through a massless elastic rotational spring. The inclusion of an additional material parameter enables the new beam model to capture the size effect. The new non-classical beam model reduces to the classical beam model when the length scale parameter is set to zero. The considered problem is investigated within the Euler-Bernoulli beam theory by using finite element method. In order to establish the accuracy of the present formulation and results, the deflections are obtained, and compared with the published results available in the literature. Good agreement is observed. In the numerical study, the static deflections of the edge cracked FGM nanobeams are calculated and discussed for different crack positions, different lengths of the beam, different length scale parameter, different crack depths, and different material distributions. Also, the difference between the classical beam theory and modified couple stress theory is investigated for static bending of edge cracked FGM nanobeams. It is believed that the tabulated results will be a reference with which other researchers can compare their results.

A Study on Pattern Fabrication using Proximity Effect Correction in E-Beam Lithography (전자빔 리소그래피에서의 근접효과 보정을 이용한 패턴 제작에 관한 연구)

  • Oh, Se-Kyu;Kim, Dong-Hwan;Kim, Seung-Jae
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.2
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    • pp.1-10
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    • 2009
  • This study describes the electron beam lithography pattern fabrication using the proximity effect correction. When electron beam exposes into electron beam resist, the beam tends to spread inside the substance (forward scattering). And the electron beam reflected from substrate spreads again (back scattering). These two effects influence to distribution of the energy and give rise to a proximity effect while a small pattern is generated. In this article, an electron energy distribution is modeled using Gaussian shaped beam distribution and those parameters in the model are computed to solidify the model. The proximity effect is analyzed through simulations and appropriate corrections to reducing the proximity effect are suggested. It is found that the proximate effect can be reduced by adopting schemes of dose adjustment, and the optimal dose is determined through simulations. The proposed corrected proximity effect correction is proved by experiments.

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