• Proceedings of the Korean Vacuum Society Conference
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• 2003.08a
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• pp.108-108
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• 2003

• Proceedings of the Korean Vacuum Society Conference
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• 2006.08a
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• pp.162-162
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• 2006

• Advances in nano research
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• v.7 no.4
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• pp.249-263
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• 2019

In the current paper, an exact solution method is carried out for analyzing the thermo-mechanical vibration of curved FG nano-beams subjected to uniform thermal environmental conditions, by considering porosity distribution via nonlocal strain gradient beam theory for the first time. Nonlocal strain gradient elasticity theory is adopted to consider the size effects in which the stress for not only the nonlocal stress field but also the strain gradients stress field is considered. It is perceived that during manufacturing of functionally graded materials (FGMs) porosities and micro-voids can be occurred inside the material. Material properties of curved porous FG nanobeam are assumed to be temperature-dependent and are supposed to vary through the thickness direction of beam which modeled via modified power-law rule. Since variation of pores along the thickness direction influences the mechanical and physical properties, porosity play a key role in the mechanical response of curved FG nano-structures. The governing equations and related boundary condition of curved porous FG nanobeam under temperature field are derived via the energy method based on Timoshenko beam theory. An analytical Navier solution procedure is utilized to achieve the natural frequencies of porous FG curved nanobeam supposed to thermal loading. The results for simpler states are confirmed with known data in the literature. The effects of various parameters such as nonlocality parameter, porosity volume fractions, thermal effect, gradient index, opening angle and aspect ratio on the natural frequency of curved FG porous nanobeam are successfully discussed. It is concluded that these parameters play key roles on the dynamic behavior of porous FG curved nanobeam. Presented numerical results can serve as benchmarks for future analyses of curve FG nanobeam with porosity phases.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.175-177
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• 2002

Electrical characteristics of the Si-O superlattice diode as a function of annealing conditions have been studied. The nanocrystalline silicon/adsorbed oxygen superlattice formed by molecular beam epitaxy (MBE) system. Consequently, the experimental results of superlattice diode with multilayer Si-O structure showed the stable and good insulating behavior with high breakdown voltage. This is very useful promise for Si-based optoelectronic and quantum device as well as for the replacement of silicon-on-insulator (SOI) in ultra high speed and lower power CMOS devices in the future, and it can be readily integrated with silicon ULSI processing.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.383-383
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• 2011

Generally, field emitters can be categorized into two types according to the emitter shape, one is a planar field emitter and the other is a point emitter. The planar field emitter is used for displays, flat lamps and signage boards. On the other hands, the point field emitter is expected to play a significant role in x-ray sources and electron beam sources. Such applications of the point field emitters, especially, need large emission current and high emission stability with a small electron beam size. A few reports announced point emitters made by carbon nanotubes (CNTs). However, they still have suffered from poor reproducibility and low emission current. Here, we demonstrated high performance CNT point emitters by attaching CNTs onto graphite rod. Graphite rod exhibited good electrical conductivity and chemical stability. In this method, the shape of the point emitter could be easily controlled by changing the length and diameter of the graphite rod. The CNT point emitter showed emission current over 1 mA at an applied electric field of 1.4 V/${\mu}m$. We consider that the stable emission performance is attributed to the stable contact between CNTs and graphite rod.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.17 no.4
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• pp.145-150
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• 2007

The $SiO_2$ and $TiO_2$ thin films for the multilayer interference filter application were manufactured by electron beam process. In case of electron beam process with ion source, the anode current was controlled by gas volume ratio of $O_2$ and Ar. Substrate temperature of electron beam deposition without ion source was increased from 100 to $250^{\circ}C$ with $50^{\circ}C$ increment. The surface roughness values of $SiO_2$ thin films was most low value at $200^{\circ}C$ substrate temperature and 0.2 A anode current respectively. And the surface roughness values of $TiO_2$ thin films was most low value at room temperature and 0.2 A anode current repectively. The refractive index of $SiO_2$ and $TiO_2$ thin films to be deposited with ion source was usually lower than that of thin films without ion source.

• Polymer(Korea)
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• v.36 no.3
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• pp.344-350
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• 2012

New pressure sensitive adhesives (PSAs) for polarizer film were prepared by electron beam (e-beam) radiation to acrylic copolymers, and their adhesive properties were investigated. The acrylic copolymers were synthesized by free radical polymerization of $n$-butylacrylate (BA), 2-hydroxyethyl methacrylate (HEMA), and acrylic acid (AA). The acrylic copolymers were coated on PET release films to a thickness of 25 ${\mu}m$, laminated to polarizer films, and then radiated with e-beam at room temperature. Gel fractions of all the acrylic copolymers after e-beam radiation at 50 kGy were higher than 93%, and their crosslinking densities were increased with increasing the content of HEMA units. PSA prepared by e-beam radiation of acrylic copolymer synthesized with a feed ratio of BA/HEMA/AA = 89.5/10/0.5 (w/w/w) at a dose of 50 kGy exhibited the best adhesion performances in terms of peel strength, creep resistance, durability and reliability, and light leakage. It is expected that the preparation method of PSAs via e-beam irradiation will improve the producibility and workability of polarizer film for liquid crystal display.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2007.05a
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• pp.368-370
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• 2007

AAO(Anodic Aluminum Oxidation) method has been known that it is practically useful for the fabrication of nano-structures and makes it possible to fabricate the highly ordered nano masters on large surface and even on the 2.5 or 3D surface at low cost comparing to the expensive e-beam lithography or the conventional silicon processing. In this study, by using the multi-step anodizing and etching processes, highly ordered nano patterned master with concave shapes was fabricated. By varying the processing parameters, such as initial matter and chemical conditions; electrical and thermal conditions; time scheduling; and so on, the size and the pitch of the nano pattern can be controlled. Consequently, various alumina/aluminum nano structures can be easily available in any size and shape by optimized anodic oxidation in various aqueous acids. The resulting good filled uniform nano molded structure through hot embossing molding process shows the validity of the fabricated nano pattern masters.

• Proceedings of the Korean Vacuum Society Conference
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• 2009.08a
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• pp.186-186
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• 2009

• Proceedings of the Korean Vacuum Society Conference
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• 2009.08a
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• pp.187-187
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• 2009