• 제목/요약/키워드: nano

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패턴드 미디어를 위한 나노 사출 성형 공정에 관한 연구 (Replication of Patterned Media Using Nano-injection Molding Process)

  • 이남석;최용;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 춘계학술대회 논문집
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    • pp.60-63
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    • 2005
  • In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth.

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ITO/CNT 나노 복합체의 염료감응형 태양전지의 이용 (ITO/CNT Nano Composites as a Counter Electrode for the Dye-Sensitized Solar Cell Applications)

  • 박종현;;정현준;조태연;윤순길
    • 한국전기전자재료학회논문지
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    • 제24권1호
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    • pp.76-80
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    • 2011
  • The ITO/Cabon Nano Tube (CNT) nano composites were deposited by nano cluster deposition (ITO) and arc discharge deposition (CNT) on glass substrates. The structural, optical and photovoltaic performance of ITO/CNT nano composites as a counter electrode of dye-sensitized solar-cells (DSSCs) such films were investigated. At low temperature below $250^{\circ}C$, the ITO films deposited on CNT. The ITO/CNT nano composit showed a good optical and electrical property for the counter electrode of DSSCs. When the as-prepared ITO/CNT nano composites are used for the counter electrodes, the photovoltaic parameters are $V_{OC}$ = 0.69 V, $J_{SC}$ = 5.69 mA/$cm^2$, FF = 0.32, and $\eta$ = 0.53 %. The ITO/CNT nano composites showed the possibility for the counter electrode applications of DSSCs.

물유리를 이용한 나노실리카 제조 시 pH가 미치는 영향 (The Effect of pH on Synthesis of Nano-Silica Using Water Glass)

  • 최진석;안성진
    • 한국재료학회지
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    • 제25권4호
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    • pp.209-213
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    • 2015
  • Synthesis of nano-silica using water glass in a Sol-Gel process is one of several methods to manufacture nano-silica. In nano-silica synthesized from water glass, there are various metal impurities. However, synthesis of nano-silica using water glass in a Sol-Gel process is an interesting method because it is relatively simple and cheap. In this study, nano-silica was synthesized from water glass; we investigated the effect of pH on the synthesis of nano-silica. The morphology of the nanosilica with pH 2 was flat, but the surface of the nano-silica with pH 10 had holes similar to small craters. As a result of ICP-OES analysis, the amount of Na in the nano-silica with pH 2 was found to be 170 mg/kg. On the other hand, the amount of Na in the nano-silica with pH 10 was found to be 56,930 mg/kg. After calcination, the crystal structure of the nano-silica with pH 2 was amorphous. The crystal structure of the nano-silica with pH 10 transformed from amorphous to tridymite. This is because elemental Na in the nano-silica had the effect of decreasing the phase transformation temperature.

금속 나노 스탬퍼 점착방지막으로서의 자기조립 단분자막 특성 연구 (Study on Properties of Self-Assembled Monolayer as Anti-adhesion Layer on Metallic Nano Stamper)

  • 최성우;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 추계학술대회논문집
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    • pp.367-370
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    • 2003
  • In this study, application of SAM (self-assembled monolayer) to nano replication process as an anti-adhesion layer was presented to reduce the surface energy between the nano mold and the replicated polymeric nano patterns. The electron beam lithography was used for master nano patterns and the electorforming process was used to fabricate the nickel nano stamper. Alkanethiol SAM as an anti-adhesion layer was deposited on metallic nano stamper using solution deposition method. To analyze wettability and adhesion force of SAM, contact angle and LFM (Lateral Force Microscopy) were measured at the actual processing temperature and pressure for the case of nano compression molding and at the actual UV dose for the case of nano UV molding. It was found that the surface energy due to SAM deposition on the nickel nano stamper markedly decreased and the quality of SAM on the nickel stamper maintained under the actual molding environments.

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나노패턴 성형을 위한 금속 나노 스탬퍼 제작 (Fabrication of metallic nano-stamper to replicate nanoscale patterns)

  • 김영규;이동철;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 춘계학술대회논문집
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    • pp.481-484
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    • 2003
  • In this study, we fabricated the master metallic nano-stamper with nano pillar patterns to apply replication processes which is adequate for mass production. Master nano patterns with various hole diameters between 300 nm and 1000 nm was fabricated by e-beam lithography. After the seed layer was deposited on the master nano patterns using e-beam evaporation, the nickel was electroformed. In each step, the shape and surface roughness of their patterns were analyzed using SEM and AFM.

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