• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.50-50
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• 2009

In this paper, the plasma doping is performed on p-type wafers using $PH_3$ gas(10 %) diluted with He gas(90 %). The wafer is placed in the plasma generated with 200 W and a negative DC bias (1 kV) is applied to the substrate for 60 sec under no substrate heating. the flow rate of the diluted $PH_3$ gas and the process pressure are 100 sccm and 10 mTorr, respectively. In order to diffuse and activate the dopant, annealing process such as rapid thermal annealing (RTA) is performed. RTA process is performed either in $N_2$, $O_2$ or $O_2+N_2$ ambient at $900{\sim}950^{\circ}C$ for 10 sec. The sheet resistance is measured using four point probe. The shallow n+/p doping profiles are investigated using secondary ion mass spectromtry (SIMS). The analysis of crystalline defect is also done using transmission electron microscopy (TEM) and double crystal X-ray diffraction (DXRD).

• KSBB Journal
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• 제8권1호
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• pp.10-16
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• 1993

The use of Jerusalem artichoke containing $\beta$-1, 2-fructose oligomer for the production of D-sorbitol and L-sorbose has been studied. The employment of inulinase(0.398%, v/v) for the hydrolysis of 40% (v/w) Jerusalem artichoke juice resulted in 36.7g/1 of glucose and 85.3g/1 of fructose at $50^{\circ}C$. These sugars were utilized as substrates for D-sorbitol and L-sorbose production. Coimmobilization of inulinase and permeabilized cells of Zymomonas mobilis in the mixture of chitin (5%, w/e) and x-carrageenan(4%, w/v) resulted in the production of 30.2g/1 of D-sorbitol by using inulin as a substrate. The process of L-sorbose production from D-sorbitol by Gluconobacter suboxydans was optimized with respect to the substrate concentration, level of dissolved oxygen and glucosic and concentration. Gluconlc acid produced by Zymomonas mobilis from glucose was found to inhibit Gluconobacter suboxtans in conversion of D-sorbitol to L-sorbose. In view of removing such inhibitory effect by gluconic acid, mutants were selected by the NTG (N-methyl-N'-N'-nitro-N-nitrosoguanidlne) treated method. Mutants selected by NTG mutagenesis showed no inhibitory effects of gluconic acrid against L-sorbone production when its concentration increased up to 100g/1. A mutant produced 40.1g/l of L-sorbose in the medium containing 100g/l D-sorbitol and 100g/l-gluconic acid. This result is consider able when compared with L-sorbose concentration (21.7g/1) obtained from the fermentation with wild type strain of Gluconobacter suboxnians.

• JSTS:Journal of Semiconductor Technology and Science
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• 제9권2호
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• pp.91-97
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• 2009

The performance of GaInP/GaAs tandem solar cells with AlInP growth temperatures of 680$^{\circ}C$ and 700 $^{\circ}C$ on n-type GaAs (100) substrate with 2$^{\circ}$ and 6$^{\circ}$ tilt angles has been investigated. The series resistance and open circuit voltage of the fabricated tandem solar cells are affected by the substrate tilt angles and the growth temperatures of the window layer when zinc is doped in the tunnel diode. With carbon doping as a p-type doping source in the tunnel diode and the effort of current matching between top and bottom cells, GaInP/GaAs tandem solar cell has been exhibited 25.58% efficiency.

• Journal of Magnetics
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• 제16권3호
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• pp.271-275
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• 2011

This paper proposes a magnetoelectric (ME) composite transducer structure consisting of a magnetostrictive H-type Fe-Ni fork substrate and piezoelectric PZT plates. The fork composite structure has a higher ME voltage coefficient compared to other ME composite structures due to the higher quality (Q) factor. The ME sensitivity of the fork structure reaches 12 V/Oe (i.e., 150 V/cm Oe). The fork composite with two PZT plates electrically connected in series exhibits over 5 times higher ME voltage coefficient than the output of the rectangle structure in the same size. The experiment shows the composite of a Fe-Ni fork substrate and PZT plates has a significantly enhanced ME voltage coefficient and a higher ME sensitivity relative to the prior sandwiched composite laminates. By the use of a lock-in amplifier with 10 nV resolution, this transducer can detect a weak magnetic field of less than $10^{-12}$ T. This transducer can also be designed for a magnetoelectric energy harvester due to its passive high-efficiency ME energy conversion.

• Journal of Korean Vacuum Science & Technology
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• 제3권1호
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• pp.54-58
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• 1999

We deposited diamond-like carbon (DLC) films using ion beam sputtering of a graphite target on flat substrates for use as a thin film field emitter. An n-type silicon wafer, titanium-coated silicon, and indium tin oxide (ITO) coated glass were used as a substrate. All films exhibited a sudden increase in the emission after a breakdown occurred at high voltage. The morphology of the films after the breakdown depended on the substrate. On ITO and Ti substrates, the DLC film peeled off upon breakdown, but on the Si substrate the surface melting due to breakdown resulted in the formation of various structures such as a sharp point, mound, and crater. By scanning the deformed surface with a tip anode, we found that the emission was concentrated at the deformed sites, indicating that the field enhancement due to the morphology change was responsible for the increased emission.

• 한국결정성장학회지
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• 제9권1호
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• pp.39-42
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• 1999

N-도핑된 3C-SiC (N-SiC(3C))을 화학기상증착(CVD)으로 $1250^{\circ}C$에서 Si(111) 기판 위에 tetramethylsilane(TMS)를 열분해하여 성장하였다. 수송가스는 $H_{2}$이었고, N-SiC(3C) 에피층은 CVD로 성장되는 동안 $NH_{3}$에 의하여 n-형으로 도핑되었다. N-SiC(3C)의 물리적 특성은 적외선 분광(FTIR), X-선 회절(XRD), 라만 스펙트럼(Raman spectrum), 단면 투과전자영상(XTEM), Hall 측정 및 p/n 다이오드의 전압-진압(I-V) 특성에 의하여 조사되었다. N-도핑된 SiC(3C) 에피층의 전도형은 n-형이었고, 전도형은 $NH_{3}$를 사용한 N-dopant에 의하여 저온에서 잘 조절될 수 있다.

• 한국결정학회지
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• 제1권2호
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• pp.99-104
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• 1990

본 연구에서는 고밀도 광원 활용에 의한 유기금속화합물의 광분해 반응을 이용하여 AmBv 형광 전재료의 Hetero-epitaxy를 고찰하였다. 실제로 ArF Excimer laser(파장 193nm)에 의 하여 III족원으로 trlmethylgallium과 V족원으로 Ammonia의 2분자간 광분해 반응을 이용, (001)면 Sapphire 기판상에 증착시켰다. 생성되는 성막상태는 주사식 전자현미경, X-ray 회절 및 전자선 회절법 (RED)에 의하여 평가하였다. Laser광려기 유무에 따라 결정병합 상태 및 결정형태에 현저한 차이를 관찰할 수 있었으며, 특히 결정격자의 방위성에 큰 영향을 주고 있음이 주목되었다. 광원 조사방법은 수직조사에 의한 기판면 여기보다는 수평조사에 의 한 기상 반응물 여기가 더 효과적 이였다. Laser 광여기에 의한 성막층의 격자형성은 다음 과 같은 2가지 Model중 하나로 설명 할 수 있었다. (001)면 Sapphire//wurzite형 GaN의 (001) 면 또는 (001)면 Sapphire//wurzite형 GaN인의 (001) 면 -t Twinned Zincblende형의 GaN(111)면

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1995년도 추계학술대회 논문집
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• pp.71-73
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• 1995

In this work, we synthsized GaN powders by the direct reactions of Ga with NH$_3$at the temperature range of 950∼1150$^{\circ}C$ and we growth the GaN thin films on Si and sapphire substrates using the synthesized GaN powders by the vapor phase epitaxy method. The synthesized powder had hexagonal crystal structures with lattice constants of a$\sub$0/=3.1895${\AA}$, c$\sub$0/=5.18394${\AA}$. The reaction rates of GaN were increased with both reaction time and temperature, however it did not depends on the flow rates of NH$_3$. The island type GaN crystals were grown on (0001) sapphire substrates and fast lateral growth of GaN on (111) Si substrate than sapphire was observed in our experiments.

• 한국세라믹학회지
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• 제31권10호
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• pp.1188-1196
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• 1994

TiN films were deposited onto high speed steel(SKH9) and silicon wafer by plasma-assisted chemical vapor deposition(PACVD) using a TiCl4/N2/H2/Ar gas mixture. The effects of deposition temperature, R.F. power, and H2 concentration on the deposition of TiN were studied. The residual chlorine content and the microhardness of TiN films were also investigated. It was found that TiN films grew with a columnar structure of a strong (200) preferred orientation regardless of the substrate type and the deposition variables. The TiN films consisted of columnar-grains of about 50 to 100 nm in diameter. The columnar grains themselves contained much finer fibrous grains. As deposition temperature increased, the residual chlorine content decreased sharply. R. F. powder enhanced the deposition rate largely. Increasing of H2 concentration had little effect on the residual chlorine.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1996년도 춘계학술대회 논문집
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• pp.72-75
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• 1996

A hydride vapor phase epitaxy (HVPE) method is performed to prepare the GaN thin films on c-plane sapphire substrate. The full-width at half maximum of double crystal X-ray rocking curves from 20$\mu\textrm{m}$-thick GaN was 576 arcsecond. The photoluminescence spectrum measured 10 K shows the hallow bound exciton (I$_2$) line and weak donor-acceptor peak, however, there was not observed deep donor-acceptor pair recombination indicate the GaN crystals prepared in this study are of high purity and high crystalline quality. The GaN layer is n-type conducting with electron mobility of 72 $\textrm{cm}^2$/V$.$sec and with carrier concentration of 6 x 10$\^$18/cm/sup-3/.