• 제목/요약/키워드: multiple wells

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고속직접변조를 위한 1.55.$\mu$. InGaAsP/InGaAsP SL-MQW DFB-LD의 양자우물구조의 최적화 (Optimization of multiple-quantum-well structures in 1.55.$\mu$ InGaAsP/InGaAsP SL-MQW DFB-LD for high-speed direct modulation)

  • 심종인;한백형
    • 전자공학회논문지D
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    • 제34D권3호
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    • pp.60-73
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    • 1997
  • By introducing a compressive-strained quanternary InGaAsP quantum-wells instead of a conventional ternary InGaAs quantum-wells in 1.55.mu.m DFB-LD, the lasing performances canb e improved and the problems caused by the thickness non-uniformity and the compositional abruptness among the hetero-interpaces canb e relaxed. In this paper, we investigated an iptimum InGaAsP/InGaAsP multiple-quantum-well(MQW) structure as an active layer in a direct-modulated 1.55.mu. DFB-LD from the view point of threshold current, chirping charcteristics, and resonance frequency. The optimum compressive-strained MQW structure was revealed as InGaAsP/InGaAsP structure with strain amount of about 1.2%, number of wells $N_{w}$ of 7, well width $L_{w}$ of 58.agns.. The threshold current density J of 500A/c $m^{2}$, the linewidth enhancement factor a of 1.8, and differential resonance frequency of d $f_{r}$/d(I-I)$^{1}$2/=2GHz/(mA)$^{1}$2/(atI=2 $I_{th}$) were expected in 1.55.mu.m .gamma./4-shifted DFB-LD with the cavity length of 400.mu.m long and kL value of 1.25. These values are considerably improved ones compared to those of 1.55um DFB-LD with InGaAs/InGaAsP MQW which have enhancement factor and the resonance frequence frequency by the detuning of lasing wavelength and gain-peak wavelength. It was found that the linewidth enhancement factor of 20% and differential resonance frequency of 35% without the degradation of the threshold current density could be enhanced in the range of -15nm~-20nm detuning which can be realized by controlling the thickness and Incomposition of InGaAsP well. well.and Incomposition of InGaAsP well. well.

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응력완화 1.3$\mu$m GaInAsP/InP uncooled-LD의 다중양자우물층과 SCH층 구조에 따른 동작 특성 (The operating characteristics of strain-compensated 1.3$\mu$m GaInAsP/InP uncooled-LD with the structure of multiple quantum well and separate confinement heterostructure layers)

  • 조호성;박경현;이정기;장동훈;김정수;박기성;박철순;김홍만;편광의
    • 전자공학회논문지A
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    • 제33A권7호
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    • pp.185-197
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    • 1996
  • We have adopted the strain compensated PBH(planar buried heterostructure) - LD in which the MQW active layer consisted of 1.4% compressively strained GainAsP (E$_{g}$ = 0.905eV) wells and 0.7% tensile strained GaInAsP(E$_{g}$ = 1.107eV) barriers grown by metal organic vapor phase epitaxy (MOVPE). We hav einvestigated effects of number of wells and the structure of the separate confinement heterostructure (SCH) layer in the strain-compensated MQW-PBH-LD. The threshold current, the external quantum efficiency, the transparency current density J$_{o}$, and the gain constant .beta. have been evaluated for uncoated MQW-PBH-LD. As the number of wells increases, the internal quantum efficiency and the transparency current density decreases, whereas the gain contant increases. The small width of the SCH layer shows the large internal quantum efficiency. The small internal loss and the large gain constant have been obtained by inserting the large bandgap SCH layer.

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InGaAs/InAlAs 다중 양자우물을 이용한 표면 반사형 전광 스위치의 해석 (Analysis of Surface Reflection All-Optical Switches using InGaAs/InAlAs Multiple Quantum Wells)

  • 최용호;김경환;최우영
    • 대한전자공학회논문지SD
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    • 제37권9호
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    • pp.23-30
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    • 2000
  • 본 논문에서는 InGaAs/InAlAs 다중 양자우물을 이용한 두가지 타입의 비대칭 Fabry-Perot 전광 스위치에 대한 해석을 시도하였다. 전광 스위치의 동작을 해석하기 위해서 먼저 양자우물의 광 흡수계수와 굴절율의 변화 특성을 계산하였다. 양자우물의 비선형성 해석 결과를 토대로 전광 수위치의 ON/OFF 비와 스위칭 속도를 비교하였다. 시뮬레이션 결과로부터, DBR을 이용한 구조의 전광 수위치는 DBR이 없는 형태의 전광 수위치보다 ON/OFF 비를 향상시킬 수 있을 뿐만 아니라 스위칭 시간도 단축시킬 수 있음을 알 수 있었다.

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Green and Blue Light Emitting InN/GaN Quantum Wells with Nanosize Structures Grown by Metalorganic Chemical Vapor Deposition

  • Kim, Je-Won;Lee, Kyu-Han
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제5권2호
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    • pp.127-130
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    • 2005
  • The structural and electrical properties of InN/GaN multiple quantum wells, which were grown by metalorganic chemical vapor deposition, were characterized by transmission electron microscopy and electroluminescence measurements. As the quantum well growth time was changed, the wavelength was varied from 451 to 531 nm. In the varied current conditions, the blue LED with the InN MQW structures did not have the wavelength shift. With this result, we can expect that the white LEDs with the InN MQW structures do not show the color temperature changes with the variations of applied currents.

GaAs 다중 양자 우물 구조에서 공명 여기된 엑시톤들에 의한 광학적 비선형성의 연구 (Optical Nonlinear Effects of Resonantly Excited Excitons on Excitons in GaAs Multiple Quantum Wells)

  • Park, Moongoo;Je, Koo-Chul;Park, Seung-Han
    • 한국광학회:학술대회논문집
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    • 한국광학회 2001년도 제12회 정기총회 및 01년도 동계학술발표회
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    • pp.50-51
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    • 2001
  • We investigate the effect of resonantly excited excitons on the optical-absorption of the n=1hh and n=2hh exciton resonances in GaAs quantum wells. Under quasistationary excitation condition using the pump and probe beam at tow temperature, we report the first observation of long range Coulomb screening by two dimensional exciton-exciton interaction, and discriminate unambiguously exciton bleaching between by long range Coulomb screening and the Pauli exclusion principle. (omitted)

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Comparison of Quantum Wells based on InGaAs(P)/InP and InGa(Al)As/InAlAs Material Systems in View of Carrier Escape Times for High-Saturation-Optical-Power Electroabsorption Modulators

  • Kim, Kang-Baek;Shin, Dong-Soo
    • Journal of the Optical Society of Korea
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    • 제11권3호
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    • pp.133-137
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    • 2007
  • We compare electroabsorption modulators (EAMs) with multiple quantum wells (MQWs) based on InGaAs(P)/InP and InGa(Al)As/InAlAs material systems. We carefully choose the quantum-well structures so that the structures based on different material systems have similar band-offset energies and excition-peak wavelengths. Assuming the same light wavelength of $1.55{\mu}m$, we show the transfer functions of EAMs with each quantum-well structure and calculate the escape times of photogenerated charge carriers. As the heavy-hole escape time of the quantum well based on InGaAs(P)/InP is much longer than those of photogenerated charge carriers of InGa(Al)As/InAlAs, the EAM based on the InGa(Al)As/InAlAs material seems to be more suitable for high-optical-power operation.

InGaAs/InAlAs 양자우물구조의 발광특성에 대한 In0.4Al0.6As 버퍼층 성장온도의 영향 (Growth Temperature Effects of In0.4Al0.6As Buffer Layer on the Luminescence Properties of InGaAs/InAlAs Quantum Well Structures)

  • 김희연;류미이;임주영;신상훈;김수연;송진동
    • 한국진공학회지
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    • 제20권6호
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    • pp.449-455
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    • 2011
  • $In_{0.4}Al_{0.6}As$ 버퍼층의 성장온도 변화에 따른 $In_{0.5}Ga_{0.5}As/In_{0.5}Al_{0.5}As$ 다중양자우물(multiple quantum wells, MQWs)의 광학적 특성을 포토루미네션스(photoluminescence, PL)와 시간분해 포토루미네션스(time-resolved PL, TRPL) 측정을 이용하여 분석하였다. $In_{0.4}Al_{0.6}As$ 버퍼층은 기판의 온도를 $320^{\circ}C$에서 $580^{\circ}C$까지 다양하게 변화시키며 $1{\mu}m$ 성장하였으며, 그 위에 $In_{0.5}Al_{0.5}As$ 층을 $480^{\circ}C$에서 $1{\mu}m$ 성장한 후 InGaAs/InAlAs MQWs을 성장하였다. MQWs는 6-nm, 4-nm, 그리고 2.5-nm 두께의 $In_{0.5}Ga_{0.5}As$ 양자우물과 10-nm 두께의 $In_{0.5}Al_{0.5}As$ 장벽으로 이루어졌다. 4-nm QW과 6-nm QW로부터 PL 피크가 나타났으나, $In_{0.4}Al_{0.6}As$ 성장온도 변화가 가장 큰($320^{\circ}C$에서 $580^{\circ}C$까지 변화) 시료는 6-nm QW에서의 PL 피크만 나타났다. 낮은 온도($320^{\circ}C$에서 $480^{\circ}C$까지 변화)에서 성장한 $In_{0.4}Al_{0.6}As$ 버퍼층 위에 성장한 MQWs의 PL 특성이 우수하게 나타났다. 발광파장에 따른 TRPL 결과로 4-nm QW과 6-nm QW에서의 캐리어 소멸시간을 얻었다.

High efficiency multiple quantum well device structure in red phosphorescent OLEDs

  • Park, Tae-Jin;Jeon, Woo-Sik;Jang, Jin;Pode, Ramchandra;Kwon, Jang-Hyuk
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.196-199
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    • 2009
  • We report the multiple quantum well (MQW) structure for highly efficient red phosphorescent OLEDs. Various triplet quantum well devices from a single well to five quantum wells are realized using a wide band-gap hole and electron transporting layers, narrow band-gap host and dopant material, and charge control layers (CCL). The maximum external quantum efficiency of 14.8 % with a two quantum well device structure is obtained, which is the highest value among the red phosphorescent OLEDs using same dopant.

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디지털 합금 InGaAlAs 다중 양자 우물의 열처리 온도에 따른 발광 특성 (Effect of Annealing Temperature on the Luminescence Properties of Digital-Alloy InGaAlAs Multiple Quantum Wells)

  • 조일욱;변혜령;류미이;송진동
    • 한국진공학회지
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    • 제22권6호
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    • pp.321-326
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    • 2013
  • 디지털 합금(digital alloy) InGaAlAs 다중 양자 우물(multiple quantum wells: MQWs) 구조의 열처리(rapid thermal annealing: RTA) 온도에 따른 발광 특성을 PL (photoluminescence)와 TRPL (time-resolved PL)를 이용하여 분석하였다. $700^{\circ}C$에서 $850^{\circ}C$까지 온도를 변화시켜 RTA한 디지털 합금 MQWs의 PL 결과는 $750^{\circ}C$에서 RTA한 시료가 가장 강한 PL 세기와 가장 좁은 반치폭을 나타내었다. 이것은 $750^{\circ}C$에서 30초 동안 RTA하였을 때 비발광 재결합 센터가 감소하고 가장 매끄러운 경계면이 형성되는 것을 나타낸다. RTA 온도를 $800^{\circ}C$$850^{\circ}C$로 증가하였을 때 PL 피크는 청색편이 하였으며 PL 세기는 감소하였다. PL 피크의 청색편이는 RTA 온도가 증가함에 따라 InGaAs/InAlAs SPS (short-period superlattice)의 경계면에서의 Ga과 Al의 혼합(intermixing)으로 Al 함량이 증가한 것으로 설명되며, PL 세기의 감소는 경계면의 거칠기의 증가와 인듐의 상분리(phase separation)로 인한 비균일 조성(compositional fluctuation)으로 설명된다. RTA 온도를 증가하였을 때 PL 소멸시간은 증가하였으며, 이것은 비발광 재결합 센터(결정 결함)가 감소한 것을 나타낸다. 디지털 합금 InGaAlAs MQWs 시료의 PL 특성은 적절한 RTA 조건에서 현저히 향상되는 것을 확인하였다.