• Title/Summary/Keyword: multi-species transport

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Analysis of Domestic and Foreign Contributions using DDM in CMAQ during Particulate Matter Episode Period of February 2014 in Seoul (2014년 2월 서울의 고농도 미세먼지 기간 중에 CMAQ-DDM을 이용한 국내외 기여도 분석)

  • Kim, Jong-Hee;Choi, Dae-Ryun;Koo, Youn-Seo;Lee, Jae-Bum;Park, Hyun-Ju
    • Journal of Korean Society for Atmospheric Environment
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    • v.32 no.1
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    • pp.82-99
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    • 2016
  • This study was carried out to understand the regional contribution of Particulate Matter (PM) emissions from East Asia ($82^{\circ}{\sim}149^{\circ}E$, $18^{\circ}{\sim}53^{\circ}N$) to Seoul during high concentration period in February 2014. The Community Multi-scale Air Quality (CMAQ) version 5.0.2 with Decoupled Direct Method (DDM) was used to analyze levels of contributions over Seoul. In order to validate model performance of the CMAQ, predicted PM and its chemical species concentrations were compared to observations in China and Seoul. Model predictions could depict the daily and hourly variations of observed PM. The calculated PM concentrations, however, had a tendency of underestimation. The discrepancies are due to uncertainties of meteorological data, emission inventories and CMAQ model itself. The high PM concentration in Seoul was induced by stationary anticyclone over the West Coast of Korea during 24 to 27 February. The DDM in CMAQ was used to analyze the contributions of emissions from East Asia on Seoul during this PM episode. $PM_{10}$ concentration in Seoul is contributed by 39.77%~53.19% from China industrial and urban region, 15.37%~37.10% from South Korea, and 9.03%~18.05% North Korea. These indicate that $PM_{10}$ concentrations in Seoul during the episode period are dominated by long-range transport from China region as well as domestic sources. It was also found that the largest contribution region in China were Shandong peninsula during the PM event period.

Assessment of Monitored Natural Attenuation as Remediation Approach for a BTEX Contaminated Site in Uiwang City (의왕시내 BTEX 오염 부지에서의 자연 정화법 이용 적합성 고찰)

  • 이민효;윤정기;박종환;이문순;강진규;이석영
    • Proceedings of the Korean Society of Soil and Groundwater Environment Conference
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    • 1999.04a
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    • pp.149-156
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    • 1999
  • In the United States (U.S.), the monitored natural attenuation (MNA) approach has been used as an alternative remedial option for organic and inorganic compounds retained in soil and dissolved in groundwater. The U.S. Environmental Protection Agency (EPA) defines the MNA as“in-situ naturally-occurring processes include biodegradation, diffusion, dilution, sorption, volatilization, and/or chemical and biochemical stabilization of contaminants and reduce contaminant toxicity, mobility or volume to the levels that are protective of human health and the environment”. The Department of Soil Environment. National Institute Environmental Research (NIER) is in the process for demonstrating the MNA approach as a potential remedial option for the BTEX contaminated site in Uiwang City. The project is charactering the research site in terms of the nature and extend of contamination, biological degradation rate, and geochemical and hydrological properties. The microbial-degradation rate and effectiveness of nutrient and redox supplements will be determined through laboratory batch and column tests. The geochemical process will be monitored for determining the concentration changes of chemical species involved in the electron transfer processes that include methanogenesis, sulfate and iron reduction, denitrification, and aerobic respiration. Through field works, critical soil and hydrogeologic parameters will be acquired to simulate the effects of dispersion, advection, sorption, and biodegradation on the fate and transport of the dissolved-phase BTEX plume using Bioplume III model. The objectives of this multi-years research project are (1) to evaluate the MNA approach using the BTEX contaminated site in Uiwang City, (2) to establish a standard protocol for future application of the approach, (3) to investigate applicability of the passive approach as a secondary treatment remedy after active treatments. In this presentation, the overall picture and philosophy behind the MNA approach will be reviewed. Detailed discussions of the site characterization/monitoring plans and risk-based decision-making processes for the demonstration site will be included.

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The Realization on GAS Sensor Module for Inteligent Wireless Communication (지능형 무선통신용 가스 센서 모듈 구현)

  • Kim, Hyo-Chan;Weon, Young-Su;Cho, Hyung-Rae
    • The Journal of The Korea Institute of Intelligent Transport Systems
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    • v.11 no.6
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    • pp.123-132
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    • 2012
  • Gas sensors has been used very differently that depending on following purposes; Automotive (exhaust gas, fuel mixture gas, oxygen, particulates), agriculture / food industry (fresh, stored, CO2, humidity, NH3, nitrogen oxide gas, organic gas, toxic gas emitted from pesticides and insecticides), industrial / medical (chemical gas, hydrogen, oxygen and toxic gases), military (chemical weapon), environmental measurements (CO and other air pollution consisting of sulfur and nitrogen gas), residential (LNG, LPG, butane, indoor air, humidity). The types of industrial toxic substances are known about 700 species and many of these exist in gaseous form under normal conditions. he multi-gas detection sensors will be developed for casualties that detect the most important and find easy three kinds of gases in marine plant; carbon dioxide(CO2), carbon(CO), ammonia(NH3). Package block consists of gas sensing device minor ingredient, rf front end, zigbee chip. Develope interworking technology between the sensor and zigbee chip inside a package. Conduct a performance test through test jig about prototype zigbee sensor module with rf output power and unwanted emission test. This research task available early address when poisonous gas leaked from large industrial site and contribution for workers' safety at the enclosed space.

Development of an Improved Numerical Methodology for Design and Modification of Large Area Plasma Processing Chamber

  • Kim, Ho-Jun;Lee, Seung-Mu;Won, Je-Hyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.221-221
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    • 2014
  • The present work proposes an improved numerical simulator for design and modification of large area capacitively coupled plasma (CCP) processing chamber. CCP, as notoriously well-known, demands the tremendously huge computational cost for carrying out transient analyses in realistic multi-dimensional models, because electron dissociations take place in a much smaller time scale (${\Delta}t{\approx}10-8{\sim}10-10$) than time scale of those happened between neutrals (${\Delta}t{\approx}10-1{\sim}10-3$), due to the rf drive frequencies of external electric field. And also, for spatial discretization of electron flux (Je), exponential scheme such as Scharfetter-Gummel method needs to be used in order to alleviate the numerical stiffness and resolve exponential change of spatial distribution of electron temperature (Te) and electron number density (Ne) in the vicinity of electrodes. Due to such computational intractability, it is prohibited to simulate CCP deposition in a three-dimension within acceptable calculation runtimes (<24 h). Under the situation where process conditions require thickness non-uniformity below 5%, however, detailed flow features of reactive gases induced from three-dimensional geometric effects such as gas distribution through the perforated plates (showerhead) should be considered. Without considering plasma chemistry, we therefore simulated flow, temperature and species fields in three-dimensional geometry first, and then, based on that data, boundary conditions of two-dimensional plasma discharge model are set. In the particular case of SiH4-NH3-N2-He CCP discharge to produce deposition of SiNxHy thin film, a cylindrical showerhead electrode reactor was studied by numerical modeling of mass, momentum and energy transports for charged particles in an axi-symmetric geometry. By solving transport equations of electron and radicals simultaneously, we observed that the way how source gases are consumed in the non-isothermal flow field and such consequences on active species production were outlined as playing the leading parts in the processes. As an example of application of the model for the prediction of the deposited thickness uniformity in a 300 mm wafer plasma processing chamber, the results were compared with the experimentally measured deposition profiles along the radius of the wafer varying inter-electrode gap. The simulation results were in good agreement with experimental data.

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Development of an Automated and Continuous Analysis System for PM2.5 and Chemical Characterization of the PM2.5 in the Atmosphere at Seoul (자동연속측정시스템 개발 및 이 시스템을 이용한 서울 대기 중 PM2.5의 화학적 조성과 특성에 관한 연구)

  • Lee Bo Kyoung;Kim Young Hoon;Ha Jae Yoon;Lee Dong Soo
    • Journal of Korean Society for Atmospheric Environment
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    • v.21 no.4
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    • pp.439-458
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    • 2005
  • An automated analysis system for water soluble constituents in $PM_{2.5}$ has been developed. The system consists of a high capacity multi tube diffusion scrubber (MTDS), a low temperature particle impactor (LTPI), and two ion (anion and cation) chromatography (IC) systems. Atmospheric particles have been collected by passing sample air through a thermostated MTDS followed by a LTPI. This system allows simultaneous measurements of soluble ions in $PM_{2.5}$ at 30 minutes interval. At the air sampling flow rate of 1.0L/min, the detection limits of the overall system are in the order of tens of $ng/m^3$. This system has been successfully used for the measurement of particulate components of Seoul air from April 2003 to January 2004. $SO_4^{2-},\;NO_3^-,\;NH_4^+,\;NO_2^-,\;Cl^-,\;Na^+,\;K^+,\;Ca^{2+},\;and\;Mg^{2+}$ are the major ionic species for $PM_{2.5}$ at Seoul. Among them, $SO_4^{2-},\;NO_3^-\;and\;NH_4^+$ are the most abundant ions, contributed up to $86\%$ of the total and the concentrations were higher than those in any other urban sites in the world except for Chinese cities. There are high pollutant episodes which contribute about $15\~20\%$ of annual average values of the major ions. During the episode, the all parcels were transported from the asian continent and $PM_{2.5}$ were significantly neutralized. This suggests that aged and long range transported pollutants caused the high pollutant episodes. They showed a distinct daily and seasonal variations:they showed a peak in the early morning caused by the night-time accumulation of particulate matters. Atmospheric reactions including gas-to-particle reactions and inter-particle reactions and meteorological parameters including relative humidity and ambient temperature were described with related to the $PM_{2.5}$ 5 concentrations. All of the ionic species showed higher concentrations during the spring than those for summer and winter.

Transcriptome Analysis of Streptococcus mutans and Separation of Active Ingredients from the Extract of Aralia continentalis (Streptococcus mutans의 전사체 분석과 독활 추출물로부터 활성 성분 분리)

  • Hyeon-Jeong Lee;Da-Young Kang;Yun-Chae Lee;Jeong Nam Kim
    • Journal of Life Science
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    • v.33 no.7
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    • pp.538-548
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    • 2023
  • The research has been conducted on the isolation of antimicrobial compounds from plant natural extracts and their potential application in oral health care products. This study aimed to investigate the antimicrobial mechanism by analyzing the changes in gene expression of Streptococcus mutans, a major oral pathogen, in response to complex compounds extracted from Aralia continentalis and Arctii Semen using organic solvents. Transcriptome analysis (RNA-seq) revealed that both natural extracts commonly upregulated or downregulated the expression of various genes associated with different metabolic and physiological activities. Three genes (SMU_1584c, SMU_2133c, SMU_921), particularly SMU_921 (rcrR), known as a transcription activator of two sugar phosphotransferase systems (PTS) involved in sugar transport and biofilm formation, exhibited consistent high expression levels. Additionally, component analysis of the A. continentalis extract was performed to compare its effects on gene expression changes with the A. Semen extract, and two active compounds were identified through gas chromatography-mass spectrometry (GC-MS) analysis of the active fraction. The n-hexane fraction (ACEH) from the A. continentalis extract exhibited antibacterial specificity against S. mutans, leading to a significant reduction in the viable cell counts of Streptococcus sanguinis and Streptococcus gordonii among the tested multi-species bacterial communities. These findings suggest the broad-spectrum antibacterial activity of the A. continentalis extract and provide essential foundational data for the development of customized antimicrobial materials by elucidating the antibacterial mechanism of the identified active compounds.

GPU Based Feature Profile Simulation for Deep Contact Hole Etching in Fluorocarbon Plasma

  • Im, Yeon-Ho;Chang, Won-Seok;Choi, Kwang-Sung;Yu, Dong-Hun;Cho, Deog-Gyun;Yook, Yeong-Geun;Chun, Poo-Reum;Lee, Se-A;Kim, Jin-Tae;Kwon, Deuk-Chul;Yoon, Jung-Sik;Kim3, Dae-Woong;You, Shin-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.80-81
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    • 2012
  • Recently, one of the critical issues in the etching processes of the nanoscale devices is to achieve ultra-high aspect ratio contact (UHARC) profile without anomalous behaviors such as sidewall bowing, and twisting profile. To achieve this goal, the fluorocarbon plasmas with major advantage of the sidewall passivation have been used commonly with numerous additives to obtain the ideal etch profiles. However, they still suffer from formidable challenges such as tight limits of sidewall bowing and controlling the randomly distorted features in nanoscale etching profile. Furthermore, the absence of the available plasma simulation tools has made it difficult to develop revolutionary technologies to overcome these process limitations, including novel plasma chemistries, and plasma sources. As an effort to address these issues, we performed a fluorocarbon surface kinetic modeling based on the experimental plasma diagnostic data for silicon dioxide etching process under inductively coupled C4F6/Ar/O2 plasmas. For this work, the SiO2 etch rates were investigated with bulk plasma diagnostics tools such as Langmuir probe, cutoff probe and Quadruple Mass Spectrometer (QMS). The surface chemistries of the etched samples were measured by X-ray Photoelectron Spectrometer. To measure plasma parameters, the self-cleaned RF Langmuir probe was used for polymer deposition environment on the probe tip and double-checked by the cutoff probe which was known to be a precise plasma diagnostic tool for the electron density measurement. In addition, neutral and ion fluxes from bulk plasma were monitored with appearance methods using QMS signal. Based on these experimental data, we proposed a phenomenological, and realistic two-layer surface reaction model of SiO2 etch process under the overlying polymer passivation layer, considering material balance of deposition and etching through steady-state fluorocarbon layer. The predicted surface reaction modeling results showed good agreement with the experimental data. With the above studies of plasma surface reaction, we have developed a 3D topography simulator using the multi-layer level set algorithm and new memory saving technique, which is suitable in 3D UHARC etch simulation. Ballistic transports of neutral and ion species inside feature profile was considered by deterministic and Monte Carlo methods, respectively. In case of ultra-high aspect ratio contact hole etching, it is already well-known that the huge computational burden is required for realistic consideration of these ballistic transports. To address this issue, the related computational codes were efficiently parallelized for GPU (Graphic Processing Unit) computing, so that the total computation time could be improved more than few hundred times compared to the serial version. Finally, the 3D topography simulator was integrated with ballistic transport module and etch reaction model. Realistic etch-profile simulations with consideration of the sidewall polymer passivation layer were demonstrated.

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