• Title/Summary/Keyword: miscut angle

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The Effect of Seed on Top-seeded Melt-growth (TSMG) Processing of a RE-123 Superconductor

  • O, Yong-Taeg;Sung, Tae-Hyun;Jeong, Nyeon-Ho;Kim, Chan-Joong;Shin, Dong-Chan
    • Progress in Superconductivity
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    • v.9 no.1
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    • pp.115-118
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    • 2007
  • This study investigated the effects of different kinds of seed crystals with miscut angles and pretreatment on the characteristics of a RE-123 superconductor processed by a top-seeded melt-growth (TSMG) method. When the seed crystal was heat-treated in an oxygen atmosphere, the surface structure was cleaned removing hydroxide. When the seed crystal had a miscut angle, in addition, the surface structure showed a well defined hill-and-valley structure after heat-treatment. A better microstructure, with a well-distributed small RE-123 phase, was obtained using a high miscut angle after heat-treatment in an oxygen atmosphere. As a result of the microstructure improvement, the magnetic characteristics also improved. The experimental result can be explained by reduction of nucleation activation energy.

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Ohmic Contact Properties of Nonpolar GaN Grown on r-plane Sapphire Substrate with Different Miscut Angle

  • Shin, Dongsu;Park, Jinsub
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.314.1-314.1
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    • 2014
  • The properties of Ni/Au Ohmic contacts formed on nonpolar a-plane GaN grown on r-plane sapphire substrate with different tilt angles are investigated using current-voltage (I-V) measurements. To investigate the effects of pattern direction and size on Ohmic contact properties of a-plane GaN, transmission line method (TLM) patterns are formed either along c-axis and m-axis on nonpolar GaN surface with different size. I-V measurement results show that the size of TLM pattern and formation direction of electrode have an effect on the electrical properties of a-plane GaN. The large sized patterns show the relatively lower sheet resistance compared to the small sized patterns. In addition, the sheet resistance of a-plane GaN along m-axis shows lower values than that along the c-axis. Finally, the effects of miscut angle of r-sapphire substrate ($0.2^{\circ}$, 0.4oand $0.6^{\circ}$) on electrical properties of a-plane GaN will be discussed.

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Detwinning Monoclinic Phase BiMnO3 Thin Film

  • Dash, Umasankar;Raveendra, N.V.;Jung, Chang Uk
    • Journal of Magnetics
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    • v.21 no.2
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    • pp.168-172
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    • 2016
  • $BiMnO_3$ has been a promising candidate as a magnetoelectric multiferroic while there have been many controversial reports on its ferroelectricity. The detailed analysis of its film growth, especially the growth of thin film having monoclinic symmetry has not been reported. We studied the effect of miscut angle, the substrate surface, and film thickness on the symmetry of $BiMnO_3$ thin film. A flat $SrTiO_3$ (110) substrate resulted in a thin film with three domains of $BiMnO_3$ and 1 degree miscut in the $SrTiO_3$ (110) substrate resulted in dominant domain preference in the $BiMnO_3$ thin film. The larger miscut resulted in a nearly perfect detwinned $BiMnO_3$ film with a monoclinic phase. This strong power of domain selection due to the step edge of the substrate was efficient even for the thicker film which showed a rather relaxed growth behavior along the $SrTiO_3$ [1-10] direction.

Initial oxidation process on viinal Si(001) surface: ReaxFF based on molecular dynamics simulation

  • Yun, Gyeong-Han;Lee, Eung-Gwan;Choe, Hui-Chae;Hwang, Yu-Bin;Yun, Geun-Seop;Kim, Byeong-Hyeon;Jeong, Yong-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.300-300
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    • 2011
  • Si oxidation is a key process in developing silicon devices, such as highly integrated metal-oxide-semiconductor (MOS) transistors and antireflection-coating (ARC) on solar cell substrate. Many experimental and theoritical studies have been carried out for elucidating oxidation processes and adsorption structure using ab initio total energy and electronic structure calcultaions. However, the initial oxidation processes at step edge on vicinal Si surface have not been studied using the ReaxFF reactive force field. In this work, strucutural change, charge distribution of oxidized Si throughout the depth from Si surface were observed during oxidation processes on vicinal Si(001) surface inclined by $10.5^{\circ}$ of miscut angle toward [100]. Adsorption energys of step edge and flat terrace were calculated to compare the oxidation reaction at step edge and flat terrace on Si surface.

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