• Journal of the Korean Society for Precision Engineering
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• v.13 no.6
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• pp.45-51
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• 1996

Silicon wafers are required to be finished under the roughness of nanometer order for the subsequent chip fabrication processes. Recently, the finish grinding techniques have been researched for the improvement of accuracy and surface roughness simultaneously. Among them, the grinding technique using fine abrasive has been known as an easily accessible method. However, the manufacture of the fine grit grinding wheel has been very difficult because of the coherence of the grits. In this paper, the development of the ultrafine grit silica($SiO_2$) grinding wheel by the combination of the binder coating and the vacuum forming techniques is reported. And, the mechanochemical removal effects of the grinding conditions are discussed. Finally, a successful result of Ra O.4nm. Rmax 4nm in the ground surface roughness of a 6 inch silicon wafer was achieved.

• Journal of the Korean Society for Heat Treatment
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• v.8 no.1
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• pp.44-52
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• 1995

The specimen for laser hardening have been carried out using SM45C which is coated with black paint or graphite for better absorption. Segmented mirror was used in order to produce a square beam ($10{\times}10mm$) at the surface with a homegeneous intensity distribution across the beam. $CO_2$-Laser power was changed from 2kW to 4kW and transfer velocity was varied from 0.1m/min to 2.0m/min. The maximum hardness and case depth of SM45C steel are 790Hv and 1.5mm by laser hardening. When the surface of specimens was melted during laser hardening. the surface hardness of SM45C steel was decreased. The surface hardness of 2 layer coated specimen(black paint: $15.4{\mu}m$, graphite coating: $9.5{\mu}m$) was increased than that of 1 layer coated specimen. It is desirable to prepare 2 or more coating layer on the steel surface in order to sufficient case depth and hardness in laser hardening. The graphite coating on the specimen surface was obtained more uniform temperature distribution than black paint coating in laser hardening process.

• Tribology and Lubricants
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• v.39 no.5
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• pp.190-196
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• 2023

Anti-adhesion coatings are very important in the processing of adhesive materials such as optical clear adhesive (OCA) films. Choosing the appropriate release coating material for dies and tools can be quite challenging. Hydrophobic surface treatment is usually performed, and its performance is often estimated by the static water contact angle (CA). However, the relationship between the release performance and the CA is not well understood. In this study, the water CAs of surfaces coated with anti-adhesion materials and the peel strengths of the acrylic-based adhesive films are evaluated. STC5 and SUS304 are selected as the base materials. Base materials with different surface roughnesses are produced by hairline finishing, mirror-polishing, and end milling. Four fluoropolymer compounds, including a self-assembled monolayer, are selected to make the base surface hydrophobic. Static, advancing, and receding CAs are mostly increased due to the coating, but the CA hysteresis is found to increase or decrease depending on the coating material. The peel strengths all decreased after coating and are largely dependent on the coating material, with significantly lower values observed for fluorosilane and perfluoropolyether silane coatings. The peel strength is observed to correlate better with the static CA and advancing CA than with the receding CA or hysteresis. However, it is not possible to accurately predict the anti-adhesion performance based on water CA alone, as the peel strengths are not fully proportional to the CAs.

• The Journal of the Convergence on Culture Technology
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• v.7 no.3
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• pp.463-468
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• 2021

In this paper, when a refractive index grating and a gain grating were simultaneously present in a DFB laser having a wavelength of 1.55 ㎛, a dielectric film coating was applied so that reflection did not occur on the right mirror surface, so that 𝜌_r=0. In case of 𝛿L>0, the characteristics of the oscillation frequency and oscillation gain were analyzed. When the grating phase of the left mirror surface continues to decrease from 𝜋, the graph lines of each mode gradually shift to the left. In case of 𝜅L=10, the threshold gain of the oscillation mode is the lowest. In this case, the mode selectivity is relatively low. From 𝜅L=0.5 to 𝜅L=6, the mode selectivity and the frequency stability are excellent. In the case of DFB lasers with an anti-reflection coated mirror, the threshold gain of the oscillation mode increases but the mode selectivity is about twice as excellent, compared with DFB lasers of having two cleaved facets.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.110-111
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• 2008

Diamond material were manufactured using electrical pyrolysis method and hot filament method. Surface morphology was observed with SEM and its microstructure was investigated using Raman spectroscopy. The accumulation of the particles was observed to have strong selective and to deposit at the substrate only on the roughly polished steel surface compared to the mirror polished implying that the particle was a charged.

• Journal of Korean Ophthalmic Optics Society
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• v.7 no.1
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• pp.75-78
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• 2002

Thirty three layer $TiO_2/SiO_2$ coating mirrors with high reflectance through a 620~820nm wavelength range have been designed and fabricated by electron beam evaporation method. Multilayer films were deposited on glass(BK7) and sequentially. The high reflector design is based on alternating high and low refractive index layers. $n_H$ and $n_L$ such that a "stopband"(or area of high reflectivity) is created that is centered around the design wavelength. ${\lambda}_0$. The measured transmittance spectrum with an incident wavelength at an incident angle of $40^{\circ}{\pm}7^{\circ}$ exhibited a reflectance of 99.9% at the wavelength of 620~820nm but high peak transmittance in the wavelength region from 700 to 740nm.

• Journal of the Optical Society of Korea
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• v.17 no.2
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• pp.142-147
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• 2013

In order to deduce the difficulty of fixing the Ritchey-Chretien (R-C) dual reflective optical system and enhance the stability of the secondary mirror, a compact integral structure is presented here composed of two transmitting and two reflective aspheric surfaces. The four surfaces were manufactured from a single germanium lens and integrated together. The two reflective surfaces formed by coating the inner reflecting films were assembled in one lens. It makes the installation of the two mirrors easier and the structure of the secondary mirror more stable. A design of mid-wave infrared (MWIR) compact imaging system is presented with a spectral range chosen as $3.7-4.8{\mu}m$. The effective focal length is f=90 mm. The field of view (FOV) for the lens is $4.88^{\circ}$. It has good imaging capability with Modulation Transfer Function (MTF) of all field of view more than 0.55 close to the diffraction limitation. Outdoor experiments were carried out and it is shown that the integral catadioptric optical system performs well on imaging.

• The Journal of the Korea institute of electronic communication sciences
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• v.9 no.2
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• pp.255-260
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• 2014

Recently infrared cameras have been widely used to diagnosis degradation status of the power substitution system. At the place of high magnetic field, however, electronic parts of infrared camera take a place problem that is not reasonable working due to high magnetic field. To solve this problem, we may generally use reflector, it has a problem that the performance of reflection degrade caused by flexure of the reflector. In this paper, in order to overcome these problem, technique of design for reflector is proposed to reduce error and to increase measurement efficiency. The reflector is made by coating using aluminum on the acrylic sheet.

• Journal of the Korean Society for Precision Engineering
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• v.20 no.5
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• pp.218-224
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• 2003

This paper describes a novel MEMS integration technique on a CMOS chip. MEMS integration on CMOS circuit has many advantages in view of manufacturing cost and reliability. The surface topography of a CMOS chip from a commercial foundry has 0.9 ${\mu}{\textrm}{m}$ bumps due to the conformal coating on aluminum interconnect patterns, which are used for addressing each MEMS element individually. Therefore, it is necessary to achieve a flat mirror-like CMOS chip fer the microelectromechanical system (MEMS) such as micro mirror array. Such CMOS chip needs an additional thickness of the dielectric passivation layer to ease the subsequent planarization process. To overcome a temperature limit from the aluminum thermal degradation, this study uses RF sputtering of silicon nitride at low temperature and then polishes the CMOS chip together with the surrounding dummy pieces to define a polishing plane. Planarization reduces 0.9 ${\mu}{\textrm}{m}$ of the bumps to less than 25 nm.

• Korean Journal of Optics and Photonics
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• v.13 no.3
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• pp.209-214
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• 2002

The effect of surface roughness on mirror scattering has been studied. Five kinds of substrates with different surface roughness were fabricated. On those substrates, a dielectric multi-layer coating with high reflectivity was deposited by ion beam sputtering and electron beam evaporation. A total integrated scattering measurement set-up was built for the evaluation of deposited samples. Most of the ion beam sputtered mirrors showed lower scattering than the electron beam evaporated one, which deposited on substrates similar in surface roughness. Over ~2 $\AA$ in surface roughness, scattering strongly depend on the micro-structure of the super-polished surface. The lowest scattering we have achieved is 2.06 ppm by ion beam sputtering from the substrate with surface roughness of 0.23 $\AA$.