• 제목/요약/키워드: metrological traceability

검색결과 5건 처리시간 0.019초

길이 소급성을 갖는 AFM을 이용한 150nm 피치 측정 (150 nm Pitch Measurement using Metrological AFM)

  • 진종한
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2003년도 춘계학술대회 논문집
    • /
    • pp.264-267
    • /
    • 2003
  • Pitch measurements of 150 nm pitch one-dimensional grating standards were carried out using an contact mode atomic force microscopy(C-AFM) with a high resolution three-axis laser interferometer. It was called as 'Nano-metrological AFM' In Nano-metrological AFM, Three laser interferometers were aligned well to the end of AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$-stablilzed He-Ne laser at a wavelength of 633 nm. So, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM has a traceability to the length standard directly. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement(GUM). The Primary source of uncertainty in the pitch-measurements was derived from repeatability of pitch-measurement, and its value was approx 0.186 nm. Expanded uncertainty(k=2) of less than 5.23 nm was obtained. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.

  • PDF

현미경의 길이표준 소급성 확립을 위한 배율 교정 시편 인증 (Certification of magnification standards for the establishment of meter-traceability in microscopy)

  • 김종안;김재완;박병천;엄태봉;강주식
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2005년도 춘계학술대회 논문집
    • /
    • pp.645-648
    • /
    • 2005
  • Microscopy has enabled the development of many advanced technologies, and higher level microscopic techniques are required according to the increase of research in nano-technology and bio-technology fields. Therefore, in many applications, we need to measure the dimension of micro-scale parts accurately, not just to observe their shapes. To establish the meter-traceability in microscopy, gratings have been widely used as a magnification standard. KRISS provides the certification service of magnification standards using an optical diffractometer and a metrological AFM (MAFM). They are based on different measurement principles, and so can give complementary information for each other. In this paper, we describe the configuration of each system and measurement procedures to certificate grating pitch values of magnification standards. Several measurement results are presented, and the discussion about them are also given. Using the optical diffractometer, we can calibrate a grating specimen with uncertainty of less than 50 pm. The MAFM can measure a grating specimen of down to 100 nm pitch value, and the calibrated values usually have uncertainty less than 500 pm.

  • PDF

미터 소급성을 갖는 원자간력 현미경을 이용한 1차원 격자 피치 측정과 불확도 평가 (Pitch Measurement of One-dimensional Gratings Using a Metrological Atomic Force Microscope and Uncertainty Evaluation)

  • 김종안;김재완;박병천;엄태봉;강주식
    • 한국정밀공학회지
    • /
    • 제22권4호
    • /
    • pp.84-91
    • /
    • 2005
  • We measured the pitch of one-dimensional (ID) grating specimens using a metrological atomic force microscope (M-AFM). The ID grating specimens a.e often used as a magnification standard in nano-metrology, such as scanning probe microscopy (SPM) and scanning electron microscopy (SEM). Thus, we need to certify the pitch of grating specimens fur the meter-traceability in nano-metrology. To this end, an M-AFM was setup at KRISS. The M-AFM consists of a commercial AFM head module, a two-axis flexure hinge type nanoscanner with built-in capacitive sensors, and a two-axis heterodyne interferometer to establish the meter-traceability directly. Two kinds of ID grating specimens, each with the nominal pitch of 288 nm and 700 nm, were measured. The uncertainty in pitch measurement was evaluated according to Guide to the Expression of Uncertainty in Measurement. The pitch was calculated from 9 line scan profiles obtained at different positions with 100 ㎛ scan range. The expanded uncertainties (k = 2) in pitch measurement were 0.10 nm and 0.30 nm for the specimens with the nominal pitch of 288 nm and 700 nm. The measured pitch values were compared with those obtained using an optical diffractometer, and agreed within the range of the expanded uncertainty of pitch measurement. We also discussed the effect of averaging in the measurement of mean pitch using M-AFM and main components of uncertainty.

나노미터 영역 길이 측정 위한 미터 소급성을 갖는 원자간력 현미경 개발 (Development of a Metrological Atomic Force Microscope for the Length Measurements of Nanometer Range)

  • 김종안;김재완;박병천;엄태봉;홍재완
    • 한국정밀공학회지
    • /
    • 제21권11호
    • /
    • pp.75-82
    • /
    • 2004
  • A metrological atomic force microscope (M-AFM) was developed fur the length measurements of nanometer range, through the modification of a commercial AFM. To eliminate nonlinearity and crosstalk of the PZT tube scanner of the commercial AFM, a two-axis flexure hinge scanner employing built-in capacitive sensors is used for X-Y motion instead of PZT tube scanner. Then two-dimensional displacement of the scanner is measured using two-axis heterodyne laser interferometer to ensure the meter-traceability. Through the measurements of several specimens, we could verify the elimination of nonlinearity and crosstalk. The uncertainty of length measurements was estimated according to the Guide to the Expression of Uncertainty in Measurement. Among several sources of uncertainty, the primary one is the drift of laser interferometer output, which occurs mainly from the variation of refractive index of air and the thermal stability. The Abbe error, which is proportional to the measured length, is another primary uncertainty source coming from the parasitic motion of the scanner. The expanded uncertainty (k =2) of length measurements using the M-AFM is √(4.26)$^2$+(2.84${\times}$10$^{-4}$ ${\times}$L)$^2$(nm), where f is the measured length in nm. We also measured the pitch of one-dimensional grating and compared the results with those obtained by optical diffractometry. The relative difference between these results is less than 0.01 %.

Development of a Mushroom Powder Certified Reference Material for Element Analysis

  • Betru, Tegegn Gizachew;Yim, Yong-Hyeon;Lee, Kyoung-Seok
    • Mass Spectrometry Letters
    • /
    • 제11권4호
    • /
    • pp.108-112
    • /
    • 2020
  • A certified reference material (CRM) for the analysis of nutrient elements in an edible mushroom (Ganoderma lyceum) powder has been developed (KRISS CRM 108-10-011). The mass fractions of calcium (Ca), iron (Fe), and zinc (Zn) were measured by isotope dilution inductively coupled plasma mass spectrometry (ID ICP/MS). To dissolve the fungi cell wall of mushroom consisted of chitin fibers, sample preparation method by single reaction chamber type microwave-assisted acid digestion with acid mixtures was optimized. The mean measurement results obtained from 12 sample bottles were used to assign as the certified values for the CRM and the between-bottle homogeneities were evaluated from the relative standard deviations. The certified values were metrologically traceable to the definition of the kilogram in the International System of Units (SI). This CRM is expected to be used for validation of analytical methods or quality control of measurement results in analytical laboratories when they determine the mass fractions of elements in mushroom or other similar samples.