• JSTS:Journal of Semiconductor Technology and Science
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• v.2 no.3
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• pp.205-212
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• 2002

The growth characteristics of metal-organic chemical vapor deposition (MOCVD) $Pb(Zr_xTi_{1-x})O_3 (PZT) thin films were investigated for the application of high-density ferroelectric random access memories (FRAM) devices beyond 64Mbit density. The supply control of Pb precursor plays the most critical role in order to achieve a reliable process for PZT thin film deposition. We have monitored the changes in the microstructure and electrical properties of films on increasing the Pb precursor supply into the reaction chamber. Under optimized conditions, $Ir/IrO_2/PZT(100nm)/Ir capacitor shows well-saturated hysteresis loops with a remanent polarization (Pr) of $~28{\mu}C/textrm{cm}^2$ and coercive voltage of 0.8V at 2.5V. Other issues such as step coverage, compositional uniformity and low temperature deposition was discussed in viewpoint of actual device application.

• Journal of the Microelectronics and Packaging Society
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• v.29 no.1
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• pp.61-66
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• 2022

This study is to increase the surface area and maximize the effect of the catalyst by coating a nanometersized metal catalyst material on the anode layer using atomic layer deposition (ALD) technology. ALD process is known to produce uniform films with well-controlled thickness at the atomic level on substrates. We measured the performance by coating metals (Ni) on Ni/YSZ, which is the most widely known anode material for solid oxide fuel cells. ALD coatings began to show a decrease in cell performance over 3 nm coatings.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.201-202
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• 2003

We developed a novel growth method of aligned carbon nanotubes. Aligned carbon nanotubes are grown on a metal catalyst on a glass substrate using biased Helicon plasma chemical vapor deposition (HPECVD) of $CH_4/H_2$ gases from 400 C to 500 C. The Helicon plasma source is one of the high-density plasma sources and is promising for low temperature carbon deposition. A Ni film was used as a catalyst to reduce the activation energy of the nanotubes' growth. The carbon nanotubes were deposited on the nickel catalysis layer selectively.

• Proceedings of the IEEK Conference
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• 2001.06b
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• pp.21-24
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• 2001

We studied aluminum cluster deposition using molecular dynamics simulation. We investigated the variations of the cluster momentum and the impulse force during collisions, and found that the close-packed cluster impact has some of properties of the single particle collision and the linear chain collisions. We also simulated the series of energetic cluster deposition with energy Per atom. When energy Per atom in cluster has some eV rather than very low, the intermixing occurred easily in growth film and we can obtain a good film without subsequent annealing process.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.186-189
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• 2007

The organic deposition chamber has been developed using belt source evaporation techniques for the first time. The deposition chamber is consisted of the belt source, organic vapor source, and the mask alignment assembly. The rollers operate for the thin metal belt to continuously move with the automatic tension control. It has been proved for the belt source evaporation easy to operate and the alignment of the substrate/shadow mask becomes so simple to use in AMOLED manufacturing industry.

• Journal of the Microelectronics and Packaging Society
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• v.11 no.4 s.33
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• pp.55-59
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• 2004

We fabricates the $TiO_2$ thin film from anatase phase $TiO_2$ powder having good photocatalytic property using aerosol deposition method at room temperature. Aerosol deposition method, which sprays an aerosol powder with ultrasonic velocity and deposits a thin film on substrate at low temperature, has the advantages of low thermal stress and low cost. To fabricate the $TiO_2$ thin film, the aerosol bath pressure and chamber pressure were 500 torr and 0.4 torr, respectively. The difference of aerosol bath pressure and chamber pressure accelerated the $TiO_2$ nano powder to ultrasonic velocity through the nozzle of $0.4 mm{\times}10 mm$ and $TiO_2$ thin film was finally formed. SS mesh with diameter of 50 mm was used as a substrate to apply the $TiO_2$ thin film to water quality purification. The raw powder was dehydrated for the good dispersion of $TiO_2$ powder. To suppress the formation of second particle, the powder was dispersed for 90 min in alcohol bath by ultrasonic treatment and desiccated. The grain size of $1 {\mu}m$ was observed in $TiO_2$ thin film deposited on SUS mesh by scanning electron microscopy (SEM). The anatase phase of $TiO_2$ thin film was also observed by X-ray diffraction (XRD) and the anatase phase of raw powder was nicely maintained after aerosol deposition. The results are applicable to water treatment filter having photocatalytic reaction.

• Economic and Environmental Geology
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• v.23 no.2
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• pp.183-199
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• 1990

Ore deposits of Dongwon mine are composed of numerous gold and silver veins emplaced in sedimentary rocks of Cambrian Choseon Supergroup and granitoids of Cretaceous age. Ore veins of the mine can be divided into gold and silver veins on the base of vein structure, mineral assemblage and vein trends. Mutual relationships between gold and silver veins are uncertain. Gold veins are simple veins which are composed of base-metal sulfides, and electrum with quartz and ankerite. On the other hand, silver veins are complex veins which reveal three distinct stages of mineral deposition based on vein structure; stage I, deposition of small amounts of oxides and pyrite with quartz; stage II, deposition of base-metal sulfides, small amounts of Ag-bearing minerals, calcite and quartz; stage III, deposition of base metal sulfides, electrum, Ag-sulfosalts, native silver, carbonates and quartz. Homogenization temperature and salinity of fluid inclusion from quartz of gold vein are as follows; $229^{\circ}$ to $283^{\circ}C$, 4.7 to 6.4 wt.% equivalent NaCI. The ore mineralogy suggests that temperature(T) and sulfur fugacity($fs_2$) of the formation of the gold vein and stage III of silver vein are estimated as T ; $294^{\circ}$ to $318^{\circ}C$, $fs_2\;10^{-9.4}$ to $10^{-10.1}$ atm. and T; $240^{\circ}$ to $279^{\circ}C$, $fs_2;10^{-11.1}$ to $10^{-17.3}$ atm. respectively. Pressure condition during gold vein formation estimated from data of ore mineralogy and fluid inclusion range 500 to 750 bar.

• The Korean Journal of Applied Statistics
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• v.27 no.4
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• pp.543-552
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• 2014

High bandwidth RF such as Bluetooth, GPRS, EDGE, 3GSM, HSDPA is papular in the mobile phone market. A non-conducting metal coating process requires an e-beam deposition of metal, two steps of UV hard coating primer and top coating; however, it is inefficient. We navigate to the electron beam irradiation conditions(resin surface treatment conditions) in the PC/ABS resin injection process. By analyzing the experimental results, we find the optimum development conditions for the electro deposition pre-treatment process and mass production lines using the plasma generated electron beam source.

• Journal of the Korean Vacuum Society
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• v.19 no.3
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• pp.177-183
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• 2010

We report on the deposition of ZnO films using a metal organic chemical vapor deposition (MOCVD) as a function of pushing pressure and kind of reactant such as oxygen gas and water A diethylzinc (DEZ) is supplied and controlled by Ar pushing pressure through bubbling system. Oxygen gas and water are used as reactant in order to form oxidation. We knew that the surface roughness is related in the process conditions such as reactant kind and DEZ flow rate. A substrate temperature has little role of surface roughness with $O_2$ reactant. However, $H_2O$ reactant makes it to increase over the 20 times. We could get the maximum roughness of 39.16 nm at the 90 sccm of DEZ Ar flow rate, the 8 Pa of $H_2O$ vapor pressure, and the $140^{\circ}C$ of substrate temperature. In this paper, we investigated the ZnO films for the application to the light absorption layer of solar cell layer.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.20 no.6
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• pp.59-69
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• 2021

Directed energy deposition (DED) is an additive manufacturing technology involving a focused high-power laser or electron beam propagating over the substrate, resulting in melt pool formation while simultaneously supplying metal powder to the melt pool area to deposit the material. DED is performed to repair and strengthen parts in various applications, as it can be easily integrate local area cladding and cross-material deposition. In this study, we characterize stainless steel 316 L parts fabricated via DED based on various deposition conditions and geometries to widen the application of DED. The deposition characteristics are investigated by varying the laser power and powder feed rate. Multilayer deposition with a laser power of 362 W and a powder feed rate of 6.61 g/min indicate a height closest to the design value while affording high surface quality. The microhardness of the specimen increases from the top to the bottom of the deposited area. Tensile tests of specimens with two different deposition directions indicate that horizontally long specimens with respect to a substrate demonstrate a higher ultimate tensile strength and yield strength than vertically long specimens with lower elongation.