• Title/Summary/Keyword: mask projection

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The excimer laser ablation of PET for micro-mold insert - The control of cross sectional shape using Fourier optics - (마이크로 금형 제작을 위한 PET의 엑시머 레이저 어블레이션 - 퓨리에 광학을 이용한 가공 단면 형상의 제어 -)

  • Shin, Dong-Sik;Lee, Je-Hoon;Seo, Jung;Kim, Do-Hoon
    • Laser Solutions
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    • v.6 no.3
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    • pp.19-28
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    • 2003
  • The manufacturing process for the microfluidic device can include sequential steps such as master fabrication, electroforming, and injection molding. The laser ablation, using masks, has been applied to the fabrication of channels in microfluidic devices. In this research, an excimer laser was used to engrave microscopic channels on the surface of PET (polyethylene terephthalate), which shows a high absorption ratio for an excimer laser beam with a wavelength of 248 m. When 50-${\mu}{\textrm}{m}$-wide rectangular microscopic channels are ablated with a 500 ${\times}$ 500 ${\mu}{\textrm}{m}$ square mask at a magnification ratio of 1/10, ditch-shaped defects were found in both corners. The measurement of laser beam intensity showed that a coherent image in the PET target caused such defects. Analysis based on the Fourier diffraction theory enabled the prediction of the coherent shape at the image surface as well as the diffraction beam shape between the mask and the image surface. It also showed that the diameter of the aperture had a dominant effect. The application of aperture with a diameter of less than 3 mm helped to eliminate such defects in the ablated rectangular microscopic channels on PET without such ditch-shaped defects.

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Design and Analysis of a Laser Lift-Off System using an Excimer Laser (엑시머 레이저를 사용한 LLO 시스템 설계 및 분석)

  • Kim, Bo Young;Kim, Joon Ha;Byeon, Jin A;Lee, Jun Ho;Seo, Jong Hyun;Lee, Jong Moo
    • Korean Journal of Optics and Photonics
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    • v.24 no.5
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    • pp.224-230
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    • 2013
  • Laser Lift-Off (LLO) is a process that removes a GaN or AIN thin layer from a sapphire wafer to manufacture vertical-type LEDs. It consists of a light source, an attenuator, a mask, a projection lens and a beam homogenizer. In this paper, we design an attenuator and a projection lens. We use the 'ZEMAX' optical design software for analysis of depth of focus and for a projection lens design which makes $7{\times}7mm^2$ beam size by projecting a beam on a wafer. Using the 'LightTools' lighting design software, we analyze the size and uniformity of the beam projected by the projection lens on the wafer. The performance analysis found that the size of the square-shaped beam is $6.97{\times}6.96mm^2$, with 91.8 % uniformity and ${\pm}30{\mu}m$ focus depth. In addition, this study performs dielectric coating using the 'Essential Macleod' to increase the transmittance of an attenuator. As a result, for 23 layers of thin films, the transmittance total has 10-96% at angle of incidence $45-60^{\circ}$ in S-polarization.

Critical Review of Current Trends in ASIC Writing and Layout Analysis

  • Vikram, Abhishek;Agarwal, Vineeta
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.2
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    • pp.236-250
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    • 2016
  • Electrical Designs for Application Specific Integrated Circuits (ASIC) has undergone a change recently with the advent of the sub-wavelength lithography. The optical projection with 193 nm wavelength has been further extended with the use of immersion and other techniques. The competing trends for printing smaller design features have been discussed in this paper with the discussion of the electrical layout analysis to find unfriendly design features. The early knowledge of the unfriendly design features allows remedial actions in time for better yield on the wafer. There are existing standard design qualification criteria being used in the design and fabrication community, but they seem to be insufficient to guarantee defect free designs. This paper proposes an integrated approach for screening the layout with multiple aspects: layout geometry based, graphical analysis and process model based verification. The results have been discussed with few example design features from the 28nm design layout.

A Study on Fabrication of Optical Waveguide using Laser Direct Writing Method (레이저 직접묘화기법에 의한 광도파로 제작에 관한 연구)

  • 신보성;김정민;김재구;조성학;장원석;양성빈
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.10a
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    • pp.391-394
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    • 2003
  • Laser direct writing process is developed 3rd harmonic Diode Pumped Solid State Laser with the near visible wavelength of 355 m sensitive polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D. It is important to reduce line width for image mode waveguides, so some investigations will be carried out in various conditions of process parameters such as laser power, writing speed, laser focus and optical properties of polymer. This process could be to fabricate a single mode waveguide without expensive mask projection method. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8.4 mm width and 7.5 mm height. Propagation loss of straight waveguide measured 3 dB/cm at 1,550 nm.

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Micro machining of Polymers Using Photothermal Process (광열반응을 이용한 폴리머의 미세가공기술)

  • 장원석;신보성;김재구;황경현
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.616-619
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    • 2003
  • Photochemical and photothermal effects have correlation with each other and depend on laser wavelength. Multi-scanning laser ablation process of polymer with DPSS(Diode Pumped Solid State) 3rd harmonic Nd:YVO$_4$ laser with wavelength of 355nm is applied to fabricate three-dimensional micro shape. The DPSSL photomachining system can rapidly and cheaply fabricate 2D pattern or 3D shape with high efficiency because we only use CAD/CAM software and precision stages instead of complex projection mask. Photomachinability of polymer is highly influenced by laser wavelength and its own chemical structure. So the optical characteristics of polymers for 355nm laser source is investigated by experimentally and theoretically.

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A Study on Laser Micro-Patterning using UV Curable Polymer (광경화성 폴리머를 이용한 레이저 미세패터닝의 기초연구)

  • 김정민;신보성;김재구;장원석;양성빈
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.612-615
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    • 2003
  • Maskless laser patterning process is developed using 3rd harmonic Diode Pumped Solid State Laser with near visible wavelength of 355 nm. Photo-sensitive curable polymer is irradiated by UV laser and developed using polymer solvent to obtain quasi-3D patterns. We performed basic experiments for the various process conditions such as laser power, writing speed, laser focus, and polymer optical property to gain the optimal conditions. Experimentally, the patterns of trapezoidal shape were manufactured into dimension of 8${\mu}{\textrm}{m}$ width and 5.4${\mu}{\textrm}{m}$ height. This process could be applied to fabricate a single mode waveguide without expensive mask projection method.

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The excimer laser ablation of PET for nickel electroforming (니켈 전주도금을 위한 PET의 엑시머 레이저 어블레이션)

  • Shin, Dong-Sik;Lee, Je-Hoon;Seo, Jung;Kim, Do-Hoon
    • Laser Solutions
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    • v.6 no.2
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    • pp.35-41
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    • 2003
  • In this study, manufacturing of polymer master and mold insert for micro injection molding was investigated. Ablation by excimer laser radiation could be used successfully to make 3-D microstructure of PET. The mechanism for ablative decomposition of PET with KrF excimer laser(λ: 248nm, pulse duration: 5ns) was explained by photochemical process. And this process showed PET to be adopted in polymer master for nickel mold insert. Nickel electroforming by using laser ablated PET master was preferable for replication method. Finally, it was shown that excimer laser ablation can substitute for X-ray lithography of LIGA process in microstructuring.

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Discriminatory Projection of Camouflaged Texture Through Line Masks

  • Bhajantri, Nagappa;Pradeep, Kumar R.;Nagabhushan, P.
    • Journal of Information Processing Systems
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    • v.9 no.4
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    • pp.660-677
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    • 2013
  • The blending of defective texture with the ambience texture results in camouflage. The gray value or color distribution pattern of the camouflaged images fails to reflect considerable deviations between the camouflaged object and the sublimating background demands improved strategies for texture analysis. In this research, we propose the implementation of an initial enhancement of the image that employs line masks, which could result in a better discrimination of the camouflaged portion. Finally, the gray value distribution patterns are analyzed in the enhanced image, to fix the camouflaged portions.

Clinical Applications of Neuroimaging with Susceptibility Weighted Imaging: Review Article (SWI의 신경영상분야의 임상적 이용)

  • Roh, Keuntak;Kang, Hyunkoo;Kim, Injoong
    • Investigative Magnetic Resonance Imaging
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    • v.18 no.4
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    • pp.290-302
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    • 2014
  • Purpose : Susceptibility-weighted magnetic resonance (MR) sequence is three-dimensional (3D), spoiled gradient-echo pulse sequences that provide a high sensitivity for the detection of blood degradation products, calcifications, and iron deposits. This pictorial review is aimed at illustrating and discussing its main clinical applications. Materials and Methods: SWI is based on high-resolution, 3D, fully velocity-compensated gradient-echo sequences using both magnitude and phase images. To enhance the visibility of the venous structures, the magnitude images are multiplied with a phase mask generated from the filtered phase data, which are displayed at best after post-processing of the 3D dataset with the minimal intensity projection algorithm. A total of 200 patients underwent MR examinations that included SWI on a 3 tesla MR imager were enrolled. Results: SWI is very useful in detecting multiple brain disorders. Among the 200 patients, 80 showed developmental venous anomaly, 22 showed cavernous malformation, 12 showed calcifications in various conditions, 21 showed cerebrovascular accident with susceptibility vessel sign or microbleeds, 52 showed brain tumors, 2 showed diffuse axonal injury, 3 showed arteriovenous malformation, 5 showed dural arteriovenous fistula, 1 showed moyamoya disease, and 2 showed Parkinson's disease. Conclusion: SWI is useful in detecting occult low flow vascular lesions, calcification and microbleed and characterising diverse brain disorders.

Opto-Digital Implementation of Convergence-Controlled Stereo Target Tracking System (주시각이 제어된 스테레오 물체추적 시스템의 광-디지털적 구현)

  • 고정환;이재수;김은수
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.27 no.4B
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    • pp.353-364
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    • 2002
  • In this paper, a new onto-digital stereo object-tracking system using hierarchical digital algorithms and optical BPEJTC is proposed. This proposed system can adaptively track a moving target by controlling the convergence of stereo camera. firstly, the target is detected through the background matching of the sequential input images by using optical BPEJTC and then the target area is segmented by using the target projection mask which is composed by hierarchical digital processing of image subtraction, logical operation and morphological filtering. Secondly, the location's coordinate of the moving target object for each of the sequential input frames can be extracted through carrying out optical BPEJTC between the reference image of the target region mask and the stereo input image. Finally, the convergence and pan/tilt of stereo camera can be sequentially controlled by using these target coordinate values and the target can be kept in tracking. Also, a possibility of real-time implementation of the adaptive stereo object tracking system is suggested through optically implementing the proposed target extraction and convergence control algorithms.