• 한국재료학회지
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• 제24권7호
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• pp.344-350
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• 2014

Metal films (i.e., Ti, Al and SUH310S) were prepared in a magnetron sputtering apparatus, and their cross-sectional structures were investigated using scanning electron microscopy. The apparatus used consisted of a cylindrical metal target which was electrically grounded, and two anode rings attached to the top and to the bottom of the target. A wire was placed along the center-line of the cylindrical target to provide a substrate. When the electrical potential of the substrate was varied, the metal-film formation rate depended on both the discharge voltage and the electrical potential of the substrate. As we made the magnetic field stronger, the plasma which appeared near the target collected on the plasma wall surface and thereby decreased the bias current. The bias current on the conducting wire was different from that for cation collection. The bias current decreased because the collection of cations decreased when we increased the magnetic-coil current. When the substrate was electrically isolated, the films deposited showed a slightly coarse columnar structure with thin voids between adjacent columns. In contrast, in the case of the grounded substrate, the deposited film did not show any clear columns but instead, showed a densely-packed granular structure. No peeling region was observed between the film and substrate, indicating good adhesion.

• 열처리공학회지
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• 제22권5호
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• pp.275-281
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• 2009

The microstructure of copper films prepared by a sputtering apparatus, which was fabricated to enhance the shadowing effect, was investigated by scanning electron microscopy. Black copper films were deposited on copper wires at an Ar pressure of 10 Pa. The black films had an extremely porous structure composed of separated columns. This structure is quite similar to that of black titanium films prepared by cylindrical magnetron sputtering. These results suggest that the porous structure composed of separated columns is easily formed for metal films by enhancing the shadowing effect.

• 한국안광학회지
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• 제3권1호
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• pp.115-120
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• 1998

RF(radio-frequency) magnetron 스퍼터링 장치에 질소가스와 아르곤가스를 동시에 주입하면서 Ti 타켓을 스퍼터링하여 $TiN_x$ 박막을 유리기판위에 제작하였다. 박막제작시 RF power supply 출력을 240W로, 증착기 내부의 온도는 $200^{\circ}C$를 유지하였다. $TiN_x$ 박막은 알곤 가스를 20sccm으로 고정시킨 상태에서 질소를 3sccm부터 9sccm까지 변화시켜가며 증착시켰다. 이때 박막의 화학적 조성과 성분비를 분석하기 위하여 XPS를 사용하였다.

• 한국안광학회지
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• 제4권1호
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• pp.21-25
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• 1999

RF(radio-frequency) magnetron 스퍼터링 장치에 질소가스와 아르곤가스를 동시에 주입하면서 Ti 타켓을 스퍼터링하여 TiN, 박막을 유리기판위에 제작하였다. 박막제작시 RF power supply 출력은 240W로, 증착기 내부의 온도는 $200^{\circ}C$를 유지하였다. TiN, 박막은 알곤 가스를 20sccm으로 고정시킨 상태에서 질소를 3sccm부터 9secm까지 변화시켜가며 증착시켰다. 이때 박막의 면저항과 화학적 조성과의 관계를 분석하기 위하여 XPS depth profiling과 4점 탐침법을 사용하였다.

• 한국안광학회지
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• 제13권1호
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• pp.59-63
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• 2008

목적: 소형 magnetron sputtering 장치를 이용하여 CR-39 안경렌즈와 glass위에 코팅한 썬글라스 렌즈용 Ti박막의 광학적 특성에 관한 연구이다. 방법: SEM 단면 사진으로 Ti 코팅 박막의 두께를 측정하였고, spectrophotometer를 이용하여 Ti 박막의 투과율과 반사율을 측정하였다. Variable angle spectroscopic ellipsometry (VASE)를 이용하여 파장에 따라 Ti 박막의 굴절률과 소멸계수를 구하였다. 결과: 두께가 60 nm, 120 nm, 140 nm인 시료에 대한 투과율은 가시광선 영역인 파장 400 nm에서 750 nm까지 변화가 크지 않았으며 모두 silver tone에 가까운 color를 보였다. 가까운 파장 400 nm 근처에서 약간 올라가는 경향을 보였고, He d선 (587.6 nm)을 기준으로 할 때 Ti 박막의 두께가 60 nm에서 투과율이 33%, 두께가 120 nm에서 투과율이 25%, 두께가 140 nm에서 투과율이 20%를 보였다. 결론: Ti 박막의 경우 60~140 nm의 모든 두께에서 선글라스용으로 적합한 것을 알 수 있었다. Ti박막에 대한 굴절률이 작게 나오는 것은 Ti박막의 두께가 얇기 때문이라고 여겨진다.

• 열처리공학회지
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• 제23권1호
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• pp.23-28
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• 2010

The cylindrical magnetron sputtering has not been widely used, although this system is useful for only certain types of applications such as fiber coatings. This paper presents electrode configurations which improved the complicacy of the target assembly by using the positive voltage power supply. It is a modified type which has a target constructed with a large cylindrical part, a conical part and a small cylindrical part. When positive voltage was applied to an anode, a stable glow discharge was established and a high deposition rate was obtained. The substrate bias current was monitored to estimate the effect of ion bombardment. As a result, it was found that the substrate current was large. With cylindrical and conical cathode magnetron sputter deposition on the surface of the substrate to prevent re-sputtering, ion impact because it can increase the effectiveness with excellent ductility and adhesion of Ti film deposition can be obtained. We board at the front end of the ground resistance of $5\;k{\Omega}$ attached to the substrate potential can be controlled easily, and Ti film deposition with excellent adhesion can be obtained. Microstructure and morphology of Ti films deposited on pure Cu wires were investigated by scanning electron microscopy in relation to preparation conditions. High level ion bombardment was found to be effective in obtaining a good adhesion for Cu wire coatings.

• 한국자기학회지
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• 제5권5호
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• pp.470-473
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• 1995

We have constructed an apparatus for in sity measurement of stress of the film prepared by sputtering using an optical noncontact displacement detector. A Change of the gap distance between the detector and the substrate, caused by stress of a deposited film, was detected by a corresponding change of the reflectivity. The sensitivity of the displacement detector was $5.9\;{\mu}V/{\AA}$ and thus, it was turned out to be good enough to detect stress caused by deposition of a monoatomic layer. The apparatus was applied to in situ stress measurements of Co/X(X=Pd or Pt) multilayer thin films prepared on the glass substrates by dc magnetron sputtering. At the very beginning of the deposition, both Co and X sublayers have subjected to their own intrinsic stresses. However, when the film was thicker than about $100{\AA}$, constant tensile stress in the Co sublayer and compressive stress in the X sublayer were observed, which is believed to be related to a lattice mismatch between the matching planes of Co and X.

• 한국안광학회지
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• 제14권1호
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• pp.63-68
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• 2009

목적: Magnetron의 세기를 비대칭으로 한 unbalanced magnetron sputtering 장치를 설계 제작하고, 이 장치를 사용하여 sus304시편 위에 TiN을 코팅할 때 산소영향을 연구하고자 한다. 방법: 코팅막의 두께를 알기 위해 실리콘 웨이퍼 위의 코팅막을 SEM으로 단면을 관찰하였고, TiN 코팅박막표면의 성분을 분석하기 위하여 XPS를 사용하였으며, 표면안쪽의 성분을 관찰하기 위해 depth profile을 하였다. 결과: XPS depth profile 데이터로부터 티타늄과 질소 뿐만 아니라 산소가 일정한 양으로 존재하며, 산소의 양은 약 65 at.%의 큰 양이 존재한다는 것을 알 수 있었다. 두께에 따른 색상변화는 세 개의 피크가 모여서 형성이 된 Ti $ 2p_{3/2}$ 피크의 모양이 두께에 따라 약간 다르다는 것을 알 수 있었다. 결론: 코팅 중에 산소가 섞여 순수한 TiN보다는 $ TiO_2$, TiN, $ TiO_{x}N_{y}$ 세가지 조합에 의해 색이 결정되는 것을 알 수 있었다.

• 한국자기학회지
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• 제5권5호
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• pp.641-644
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• 1995

We have studied the effect of the nitrogen on the microstructure, thermomagnetic properties and corrosion resistance of Fe-Hf-C-N nanocrystalline thin films with high permeability and high saturation magnetization. These films were fabricated by reactive sputtering in $Ar+N_{2}$ plasma using an rf magnetron sputtering apparatus. As $P_{N2}$ increases, the microstructure changes from amorphous to crystalline $\alpha$-Fe phase and again returns to amorphous one. Spin wave stiffness constant increases with $P_{N2}$ until 5% $P_{N2}$, and then decreases with the further increase. This trend corresponds well with that of the microstructure with increasing $P_{N2}$. The Fe-Hf-C-N films with over 3% $P_{N2}$ show higher corrosion resistance than the N-free Fe-Hf-C films. The Fe-Hf-C-N films are considered to have high potentials for the head core materials suitable for high density recording systems, owing to their excellent soft magnetic properties and corrosion resistance.

• 한국안광학회지
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• 제6권2호
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• pp.31-35
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• 2001

$TiN_xW_y$ 전도박막층으로 무반사, 무정전 광학박막을 Essential Macleod 프로그램을 이용하여 설계한 결과 [공가 ${\mid}TiN_xW_y{\mid}SiO_2{\mid}$ 유리]층은 단 두층코팅막으로 가시광선 파장영역 (450~700 nm)에서 넓게 AR 코팅이 되었다. RF magnetron 스퍼터링 장치에 질소가스와 아르곤가스를 동시에 주입하면서 Ti 타켓을 스퍼터링하여 $TiN_x$ 광학박막을 7 nm에서 10 nm의 두께로 유리기판 위에 제작하였다. 이 때 박막의 화학적 조성과 성분비를 분석하기 위해 XPS를 사용하였고, 박막의 면저항과 화화적 조성과의 관계를 분석하기 위하여 XPS depth profiling과 4점탐침법을 사용하였다.