• The Transactions of The Korean Institute of Electrical Engineers
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• v.61 no.12
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• pp.1880-1885
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• 2012

Nonlinear dynamical behaviors in thermionic low pressure discharge are investigated using a particle-in-cell(PIC) simulation. An electrostatic PIC code is developed to model the plasma discharge system including the kinetic effects. The elastic collision, excitation collision, ionization collision, and electron-ion recombination collision are considered in this code. The generated electrons and ions are traced to analyze physical characteristics of the plasma. The simulation results show that the nonlinear oscillation structures are observed for cold plasma in the system and the similar structures are observed for warm plasma with a shift in values of the bifurcation parameter. The detailed oscillation process can be subdivided into three distinct mode; anode-glow, temperature-limited, and double-layer modes.

• Textile Coloration and Finishing
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• v.5 no.2
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• pp.134-138
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• 1993

Wool, silk and nylon 6 fabrics were treated with low-temperature plasma under atmospheric pressure of acetone/argon or helium/argon for 30 and 180 sec, and then dyed with leveling type acid dye, C.I. Acid Red 18 and milling type acid dye, C.I. Acid Blue 83. In spite of short time of the plasma treatment for thirty seconds, the color depth of wool fabrics was increased remarkably with both of the plasma gases, aceton/argon or helium/argon and with the kinds of dyes i.e., levelin type or milling type. But the atmosperic low-temperature plasmas did not increase the depth of silk and nylon 6 fabrics dyed with both of the acid dyes regardless of the teated time and plasma gases. It seems that low-temperature plasma by atmospheric-pressure discharge is effective for improvement of dyeing of wools as is the same way with the low-temperature plasma by glow discharge. The kinds of plasma gases and treated time did not influnce the depth of wool fabric pretreted with the atmosperic low-temperature plasmas.

• Applied Science and Convergence Technology
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• v.27 no.2
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• pp.23-25
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• 2018

With respect to the electrode structure and the discharge characteristics, the atmospheric pressure plasma sheet of a thin polyimide film is introduced in this study; here, the flexible plasma device of a dielectric-barrier discharge with the ground electrode and the high-voltage electrode formulated on each surface of a polyimide film whose thickness is approximately $100{\mu}m$, that is operated with a sinusoidal voltage at a frequency of 25 kHz and a low voltage from 1 kV to 2 kV is used. The streamer discharge is appeared along the cross-sectional boundary line between two electrodes at the ignition stage, and the plasma is diffused on the dielectric-layer surface over the high-voltage electrode. In the development of a plasma sheet with thin dielectric films, the avoidance of the insulation breakdown and the reduction of the leakage current have a direct influence on the low-voltage operation.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.557-557
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• 2013

Plasma hardly grows in lowpressure because of lack of collision. But low pressure plasma has useful properties because it has typically low electron density. In here, thermal electron is used to make breakdown in low pressure easily. We changed magnetic field strength and gas to control electron density or temperature. IV characteristic and electron density of the discharge are examined and the characteristic of the discharge in presence of magnetic field is also examined. Results showed that depending on the ionization cross section of the gas, electron density is changed and proper strength of magnetic field is required for high electron density.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.121.1-121.1
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• 2014

Recently, much attention has been given to plasma production under liquid and its applications [1]. However, most of plasma production techniques reported so far utilize high voltage dc, ac, rf or microwave power [2], where damage to discharge electrodes and small discharge volume are remained issues. As an alternative of plasma production method under liquid, we have proposed pulsed microwave excited plasma using slot antenna, where damage to the slot electrode can be minimized and plasma volume can be increased. We have also reported improvement of treatment efficiency with use of reduced-pressure condition during the discharge [3]. To realize low pressure conditions in liquid, various alternative technique can be considered. One possible technique is simultaneous injection of microwave power and ultrasonic wave. Ultrasonic wave induces pressure fluctuation with the wave propagation and is so far used for cavitation production in the water. We propose utilization of reduced pressure induced by ultrasonic cavitation for improvement of the plasma production. Correlation between the plasma production and the ultrasonic power will be discussed.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.53 no.3
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• pp.133-136
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• 2004

Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56(MHz) have been measured over a wide range of power at gas pressure ranging from 1∼70(mTorr).

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.235.2-235.2
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• 2014

Plasma hardly grows in low pressure because of lack of collision. Especially, in extremely low pressure like 1 mTorr, the experiment scale is far larger than mean free path therefore plasma is hardly generated in such low pressure. But low pressure plasma has useful properties like low damage or fine sputtering process because it has typically low electron density. In here, thermal electron is used to make breakdown in low pressure easily and cylindrical geometry is used to help discharge easily. And we changed magnetic field strength to control electron density or temperature. In low pressure, density and temperature behavior is very interesting so its characteristics are examined here.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.36 no.1
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• pp.29-35
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• 1987

TPolystyrene thin films are prepared by glow discharge of sytrene monomer vapor th establish the growth mechanism of organic thin films by the plasma polymerization. As the discharge parameters, discharge current(5mA-20mA), frequency (10kHz-50kHz, 13.56MHz), gaspressure (0.2torr-1.5torr), and discharge time(2min-12min)are adopted. Plasma-polymerized filmsof styrene vapor are identified as polystyrene by IR spectra. The thickness of plasma-polymerized films increases with gas pressure, frequency and discharge current in the region of the low frequency and below the allowed gas pressure where the polymerization occurs. It is suggested that the growth mechanism can be explained by ionic reaction in d.c. and low frequency region, and by radical reaction in high frequency region.

• Journal of the Korean Vacuum Society
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• v.21 no.6
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• pp.301-311
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• 2012

Discharge property of plasma jet devices is investigated for the application to the doping processes of crystalline solar cells and others. Current-voltage characteristics are shown as the typical normal-glow discharge in the various gas pressure of plasma jets, such as in the atmospheric plasma jets of Ar-discharge, in the ambient pressure of atmospheric discharge, and in the ambient Ar-pressure of Ar-discharge. The discharge voltage of atmospheric plasma jet is required as low as about 2.5 kV while the operation voltage of low pressure below 200 Torr is low as about 1 kV in the discharge of atmospheric and Ar plasma jets. With a single channel plasma jet, the irradiated plasma current on the doped silicon wafer is obtained high as the range of 10~50 mA. The temperature increasement of wafer is normally about $200^{\circ}C$. In the result of silicon wafers doped by phosphoric acid with irradiating the plasma jets, the doping profiles of phosphorus atoms shows the possibility of plasma jet doping on solar cells.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1382-1384
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• 1995

In order to study the structure of RF glow discharge driven at 13.56MHz in argon, the discharge voltage, current and phase shift between them will be measured over a wide range of discharge parameters(gas pressure between 1mTorr and 50mTorr with discharge power between 20mW and 200W). In this paper, the dc glow discharge characteristics and plasma parameters of both FTS and CPMS systems are studied experimentally. It is found that for CPMS system discharge is stablized under wider ranges of magnetic field and pressure than for FTS system. The plasma density and electron temperature of the plasma for these two systems are in the range of $10^{10}{\sim}7{\times}10^{11}[cm^{-3}]$ and $3.5{\sim}6.5$[eV], respectively.