• Title/Summary/Keyword: liquid $SiO_2$

Search Result 346, Processing Time 0.035 seconds

Formation and Photoluminescence of Silicon Oxide Nanowires by Thermal Treatment of Nickel Nanoparticles Deposited on the Silicon Wafer

  • Jang, Seon-Hui;Lee, Yeong-Il;Kim, Dong-Hun
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2011.10a
    • /
    • pp.27.1-27.1
    • /
    • 2011
  • The recent extensive research of one-dimensional (1D) nanostructures such as nanowires (NWs) and nanotubes (NTs) has been the driving force to fabricate new kinds of nanoscale devices in electronics, optics and bioengineering. We attempt to produce silicon oxide nanowires (SiOxNWs) in a simple way without complicate deposition process, gaseous Si containing precursors, or starting material of $SiO_2$. Nickel (Ni) nanoparticles (NPs) were applied on Si wafer and thermally treated in a furnace. The temperature in the furnace was kept in the ranges between 900 and $1,100^{\circ}C$ and a mixture of nitrogen ($N_2$) and hydrogen ($H_2$) flowed through the furnace. The SiOxNWs had widths ranging from 100 to 200 nm with length extending up to ~10 ${\mu}m$ and their structure was amorphous. Ni NPs were acted as catalysts. Since there were no other Si materials introduced into the furnace, the Si wafer was the only Si sources for the growth of SiOxNWs. When the Si wafer with deposition of Ni NPs was heated, the liquid Ni-Si alloy droplets were formed. The droplets as the nucleation sites induce an initiation of the growth of SiOxNWs and absorb oxygen easily. As the droplets became supersaturated, the SiOxNWs were grown, by the reaction between Si and O and continuously dissolving Si and O onto NPs. Photoluminescence (PL) showed that blue emission spectrum was centered at the wavelength of 450 nm (2.76 eV). The details of growth mechanism of SiOxNWs and the effect of Ni NPs on the formation of SiOxNWs will be presented.

  • PDF

Manufacture and Properties of ${\beta}$-SIC-TiB$_2$ Composites Densified by Pressureless Annealing (無加壓 열처리에 의한 ${\beta}$-SIC-TiB$_2$ 複合體의 製造와 特性)

  • Shin, Yong-Deok;Ju, Jin-Young;Park, Mi-Lim
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.50 no.5
    • /
    • pp.221-225
    • /
    • 2001
  • The effect of $Al_2O_3+Y_2O_3$ additives on fracture toughness of ${\beta}-SiC-TiB_2$ composites by hot-pressed sintering was investigated. The ${\beta}-SiC-TiB_2$ ceramic composites were hot-press sintered and pressureless-annealed by adding 16, 20, 24 wt% ${\beta}-SiC-TiB_2$(6:4 wt%) powder as a liquid forming additives at low temperature(1800 $^{\circ}C$) for 4 h. Phase analysis of composites by XRD revealed mostly of ${\alpha}$-SiC(6H), $TiB_2$, and YAG($Al_5Y_3O_{12}$). The relative density was over 95-88 % of the theoretical density, and the porosity increased with increasing $Al_2O_3+Y_2O_3$ contents because of the increasing tendency of pore formation. The fracture toughness showed the highest value of 5.88 MPa${\cdot}m^{1/2}$ for composites added with 20 wt% $Al_2O_3+Y_2O_3$ additives at room temperature. The electrical resistivity showed the lowest value of $5.22{\times}10^{-4}\;{\Omega}\;{\cdot}\;cm$ for composite added with 20 wt% $Al_2O_3+Y_2O_3$ additives at room temperature, and was all positive temperature coefficeint resistance(PTCR) against temperature up to 900 $^{\circ}C$.

  • PDF

Mullitization of Aluminium Silicate Gel (Aluminium Silicate Gel의 Mullite화)

  • 이광식;이형복;정윤중
    • Journal of the Korean Ceramic Society
    • /
    • v.26 no.5
    • /
    • pp.625-630
    • /
    • 1989
  • Aluminium silicate gels were prepared by gel-technique using Al(OH)3 and TEOS as starting materials. Aluminium silicate gel as formed mullite at 120$0^{\circ}C$. From this method, homogeneous mullite was formed available needle-like shaped and close compacted. As excess SiO2 mullite composition, the needle-like shaped crystal, size according to increased with SiO2, was increased from 3${\mu}{\textrm}{m}$ to 7${\mu}{\textrm}{m}$ but liquid phase did not affect the formation of needle-like shaped mullite. As excess Al2O3 mullite composition, the needle-shape mullite crystal could not be detected because Al2O3 acted as chunky behavior.

  • PDF

Control of pretilt angles on $SiO_x$ Thin Film by Electron Beam Evaporation Method (전자빔 경사증착을 이용한 $SiO_x$ 박막의 프리틸트각 제어)

  • Kang, Hyung-Ku;Kim, Young-Hwan;Kim, Jong-Hwan;Han, Jin-Woo;Kang, Soo-Hee;Hwang, Jeoung-Yeon;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2005.11a
    • /
    • pp.311-312
    • /
    • 2005
  • By using 45$^{\circ}$ obliqued evaporation method with electron beam system, uniformly vertical liquid crystal (LC) alignment was achieved. And a high pretilt angles of about 2.5$^{\circ}$ were measured. Also, it was verified that there are no variations of pretilt angle as a function of $SiO_x$ thin film thickness 20nm and 50nm. A good LC alignment states were observed at annealing temperature of 250$^{\circ}C$. The high pretilt angle and the good thermal stability of LC alignment by 45$^{\circ}$ obliqued electron beam evaporation method on the $SiO_x$ thin film can be achieved.

  • PDF

A study on the properties of the Electrocondutive Ceramic $SiC-TiB_2$ Composites according to Annealing Temperature. (Annealing 온도 변화에 따른 $\beta-SiC-TiB_2$ 도전성 세라믹 복합체의 특성 연구)

  • Shin, Yong-Deok;Ju, Jing-Young;Choi, Kwang-Soo;Oh, Sang-Soo;Lee, Dong-Yoon
    • Proceedings of the KIEE Conference
    • /
    • 2002.11a
    • /
    • pp.106-108
    • /
    • 2002
  • The composites were fabricated 61vol.% $\beta-SiC$ and 39vol.% $TiB_2$ powders with the liquid forming additives of l2wt% $Al_2O_3+Y_2O_3$ by pressureless annealing at $1700^{\circ}C,\;1750^{\circ}C,\;1800^{\circ}C$ for 4 hours respectively. The result of Phase analysis of composites by XRD revealed $\alpha-SiC$(6H), $TiB_2$, and YAG($Al_5Y_3O_{12}$) crystal phase. The relative density and the Young's modulus showed the highest value of 92.9701% and 92.884Gpa for composites by pressureless annealing temperature $1700^{\circ}C$ at room temperature.

  • PDF

Studies of Sulphate in Portland Cement Clinker (Cement Technology 1971.9)

  • Gutt W.;Smith M. A.
    • Cement
    • /
    • s.51
    • /
    • pp.20-30
    • /
    • 1973
  • 1) electron-microprobe를 응용하여 $CaO-SiO_2-Al_2O_3$ 계에서 생성한 $C_2S$, $C_3S$ 에 존재하는 sulfate의 solid, solution을 정량적으로 구할 수 있었으며 이 결과로 $C_2S$$Al_2O_3$, $SO_3$ 등이 solid soln 등으로 침적되고 이들이 $C_3S$의 생성을 억제한다는 mechanism이 확인되었다. 2) phase equilibrium(상평형)에 의하면 $Na_2SO_4$, $K_2SO_4$는 mineralizer로서 작용하며 $C_3S$ 의 생성을 돕는다. 그러나 $K_2SO_4$$Al_2SO_3$ 가 결합상태로 존재할 경우는 1,400 $^{\circ}C$에서 광범위한 liquid를 생성하며 quenching하면 glass질과 $\beta-C_2S$ 만이 얻어지고 $C_3S$ 는 생성되지 않는다. 또 이를 1,250 $^{\circ}C$ 까지 서냉하면 $C_2S$ 와 Ca, K, Al, S, 등을 함유한 새로운 물질이 생성된다. 3) $CaO-SiO_2-Al_2O_3-Fe_2O_3$ 계에서 $C_3S$ 의 생성에 미치는 $Na_2SO_4$, $K_2SO_4$ 의 영향을 실험실적으로 검토한 결과 complex interaction이 확인되었으며 $Na_2SO_4$ 는 어떤 경우에는 mineralizing effect를 상실한다는 재미 있는 사실이 발견되었다.

  • PDF

Spark Plasma Sintering and Ultra-Precision Machining Characteristics of SiC

  • Son, Hyeon-Taek;Kim, Dae-Guen;Park, Soon-Sub;Lee, Jong-Hyeon
    • Korean Journal of Materials Research
    • /
    • v.20 no.11
    • /
    • pp.559-569
    • /
    • 2010
  • The liquid-phase sintering method was used to prepare a glass lens forming core composed of SiC-$Al_2O_3-Y_2O_3$. Spark plasma sintering was used to obtain dense sintered bodies. The sintering characteristics of different SiC sources and compositions of additives were studied. Results revealed that, owing to its initial larger surface area, $\alpha$-SiC offers sinterability that is superior to that of $\beta$-SiC. A maximum density of $3.32\;g/cm^3$ (theoretical density [TD] of 99.7%) was obtained in $\alpha$-SiC-10 wt% ($6Al_2O_3-4Y_2O_3$) sintered at $1850^{\circ}C$ without high-energy ball milling. The maximum hardness and compression stress of the sintered body reached 2870 Hv and 1110 MPa, respectively. The optimum ultra-precision machining parameters were a grinding speed of 1243 m/min, work spindle rotation rate of 100 rpm, feed rate of 0.5 mm/min, and depth of cut of $0.2\;{\mu}m$. The surface roughnesses of the thus prepared final products were Ra = 4.3 nm and Rt = 55.3 nm for the aspheric lens forming core and Ra = 4.4 nm and Rt = 41.9 for the spherical lens forming core. These values were found to be sufficiently low, and the cores showed good compatibility between SiC and the diamond-like carbon (DLC) coating material. Thus, these glass lens forming cores have great potential for application in the lens industry.

A study on Fabrication of Ferroelectric SST Thin Films by Liquid Delivery MOCVD Process (Liquid Delivery MOCVD공정을 이용한 강유전체 SBT 박막의 제조기술에 관한 연구)

  • Kang, Dong-Kyun;Paik, Seung-Kyu;Kim, Hyoeng-Ki;Kim, Byong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2003.05c
    • /
    • pp.111-115
    • /
    • 2003
  • 200nm 정도의 두께를 가진 SBT 박막이 liquid delivery MOCVD 공정에 의해 (111) oriented Pt/Ti/$SiO_2$/Si 기판 위에 증착되었다 이 실험에서는 $Sr(TMHD)_2$tetraglyme, $Bi(ph)_3$ 그리고 $Ta(O^iPr)_4$(TMHD)를 출발 물질로 사용하였다. Sr 출발 물질의 열적 안정화를 위해서 adduct로 tetraglyme를 사용하여 실험하였고 유기 용매로는 n-butyl acetate를 사용하였다 Substrate temperature와 reactor pressure는 각각 $570^{\circ}C$와 5Torr로 유지시켰다. 또한 vaporizer의 용도는 $190-200^{\circ}C$, 그리고 delivery line 의 온도는 vaporizer 보다 높게 유지 $(220-230^{\circ}C)$하여 출발 용액을 분당 0.1ml로 50분간 주입하였다. 수송가스로 Ar, 산화제로 $O_2$ 가스를 사용하였다. 제조한 SBT 박막은 $750^{\circ}C$에서 열처리한 후 인가전압 3V와 5V에서 $2P_r$값이 각각 6.47, $8.98{\mu}C/cm^2$이었으며, $2E_c$값은 인가전압 3V와 5V에서 각각 2.05, 2.31V이었다 그리고 $800^{\circ}C$에서는$750^{\circ}C$에서 열처리한 SBT 박막보다 다소 우수한 이력특성을 나타내어 $2P_r$ 값은 인가전압 3V와 5V에서 각각 7.59, $10.18{\mu}C/cm^2$ 이었으며, $2E_c$값은 인가 전압 3V와 5V에서 각각 2.00, 2.21V 이었다.

  • PDF

Growth Characteristics of Amorphous Silicon Oxide Nanowires Synthesized via Annealing of Ni/SiO2/Si Substrates

  • Cho, Kwon-Koo;Ha, Jong-Keun;Kim, Ki-Won;Ryu, Kwang-Sun;Kim, Hye-Sung
    • Bulletin of the Korean Chemical Society
    • /
    • v.32 no.12
    • /
    • pp.4371-4376
    • /
    • 2011
  • In this work, we investigate the growth behavior of silicon oxide nanowires via a solid-liquid-solid process. Silicon oxide nanowires were synthesized at $1000^{\circ}C$ in an Ar and $H_2$ mixed gas. A pre-oxidized silicon wafer and a nickel film are used as the substrate and catalyst, respectively. We propose two distinctive growth modes for the silicon oxide nanowires that both act as a unique solid-liquid-solid growth process. We named the two growth mechanisms "grounded-growth" and "branched-growth" modes to characterize their unique solid-liquid-solid growth behavior. The two growth modes were classified by the generation site of the nanowires. The grounded-growth mode in which the grown nanowires are generated from the substrate and the branchedgrowth mode where the nanowires are grown from the side of the previously grown nanowires or at the metal catalyst drop attached at the tip of the nanowire stem.

Microstructure and Magnetic properties of $Ti_{1-x}Co_xO_2$ Magnetic semiconductor thin films by Metal Organic Chemical Vapor Deposition (유기금속화학기상증착법으로 제조된 자성반도체 $Ti_{1-x}Co_xO_2$ 박막의 미세구조 및 자기적 특성)

  • Seong, Nak-Jin;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2003.07a
    • /
    • pp.155-159
    • /
    • 2003
  • Polycrystalline $Ti_{1-x}Co_xO_2$ thin films on $SiO_2$ (200 nm)/Si (100) substrates were prepared using liquid-delivery metalorganic chemical vapor deposition. Microstructures and ferromagnetic properties were investigated as a function of doped Co concentration. Ferromagnetic behaviors of polycrystalline films were observed at room temperature, and the magnetic and structural properties strongly depended on the Co distribution, which varied widely with doped Co concentration. The annealed $Ti_{1-x}Co_xO_2$ thin films with $x{\leq}0.05$ showed a homogeneous structure without any clusters, and pure ferromagnetic properties of thin films are only attributed to the $Ti_{1-x}Co_xO_2$ (TCO) phases. On the other hand, in case of thin films above x=0.05, Co clusters formed in a homogeneous $Ti_{1-x}Co_xO_2$ Phase, and the overall ferromagnetic (FM) properties depended on both $FM_{TCO}$ and $FM_{Co}$. Co clusters with about 10nm-150nm size decreased the value of Mr (the remanent magnetization) and increased the saturation magnetic field.

  • PDF