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A Study on the Basic Bodice Pattern for the Fatty Body -The subject of middle-aged women- (비만체형을 위한 기본 Bodice 원형연구 -중년기 부인을 중심으로-)

  • 한애미
    • Journal of the Korean Home Economics Association
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    • v.25 no.3
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    • pp.15-26
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    • 1987
  • The purpose of this study was to develop the pattern drafting method which would be suitable to their physical characteristics for the fatty body of 40∼55 aged Korean women who are more than 1.5 Rohrer's Index and 90㎝ bust girth. The study was composed as follows; 1. Body measurement and statistical analysis: One hundred and thirty women were measured on 29 items. Thirty-four items including 29 measured items and 5 calcutated items were analyzed statistically. 1) Mean, standard deviation, variance, maximum, minimum, range were computed. 2) Correlation coefficients between each items were computed. 2. Development of new bodice pattern drafting method: Measurement items necessary to draft new bodice pattern were bust girth, center back waist length, shoulder width, back width, chest and neck base girth. The new pattern was examined through three wearing tests for completion. 3. Evaluation of the new pattern drafting method: The new pattern was objectively evaluated by the sensory test. The sensory evaluation was applied to evaluate the new pattern for the fatty body women by comparint it with the conventional patterns. The results of sensory tests of the new pattern are as follows: 1) The composite reliability coefficient is 0.7698, and the reliability of sensory test shows high. 2) According to a statistical analysis of the result of the 23 items on the questionaire, all the items showed significant differences(α 0.01) between the two, with the new pattern having higher scores. The new pattern is better conventional pattern as the average mark of the former is 3.901 but that of latter is 2.926. The new pattern drafting method proved to be superior to the conventional one especially in the fitness at the center front neck point, shoulder point, side line, armscye depth, position of bust point, chest width line, under arm dart and the shoulder line.

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Investigation of TaNx diffusion barrier properties using Plasma-Enhanced ALD for copper interconnection

  • Han, Dong-Seok;Mun, Dae-Yong;Gwon, Tae-Seok;Kim, Ung-Seon;Hwang, Chang-Muk;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.178-178
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    • 2010
  • With the scaling down of ULSI(Ultra Large Scale Integration) circuit of CMOS(Complementary Metal Oxide Semiconductor)based electronic devices, the electronic devices become more faster and smaller size that are promising field of semiconductor market. However, very narrow line width has some disadvantages. For example, because of narrow line width, deposition of conformal and thin barrier is difficult. Besides, proportion of barrier width is large, thus resistance is high. Conventional PVD(Physical Vapor Deposition) thin films are not able to gain a good quality and conformal layer. Hence, in order to get over these side effects, deposition of thin layer used of ALD(Atomic Layer Deposition) is important factor. Furthermore, it is essential that copper atomic diffusion into dielectric layer such as silicon oxide and hafnium oxide. If copper line is not surrounded by diffusion barrier, it cause the leakage current and devices degradation. There are some possible methods for improving the these secondary effects. In this study, TaNx, is used of Tertiarybutylimido tris (ethylamethlamino) tantalum (TBITEMAT), was deposited on the 24nm sized trench silicon oxide/silicon bi-layer substrate with good step coverage and high quality film using plasma enhanced atomic layer deposition (PEALD). And then copper was deposited on TaNx barrier using same deposition method. The thickness of TaNx was 4~5 nm. TaNx film was deposited the condition of under $300^{\circ}C$ and copper deposition temperature was under $120^{\circ}C$, and feeding time of TaNx and copper were 5 seconds and 5 seconds, relatively. Purge time of TaNx and copper films were 10 seconds and 6 seconds, relatively. XRD, TEM, AFM, I-V measurement(for testing leakage current and stability) were used to analyze this work. With this work, thin barrier layer(4~5nm) with deposited PEALD has good step coverage and good thermal stability. So the barrier properties of PEALD TaNx film are desirable for copper interconnection.

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A Study on the Shapes of Women′s Neck and Shoulder in Dressmaking I (의복설계를 위한 성인여성의 經部 및 肩部의 유형화 I)

  • 김희숙
    • The Research Journal of the Costume Culture
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    • v.8 no.5
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    • pp.668-680
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    • 2000
  • The study presents the general types and individual differences of the shape of the adult women's neck and shoulder in our country. It is based on the average value, the standard deviation, the maximum value, the standard deviation, the maximum value, the minimum value and c.v. measured from the women at the age of 19 through 64. The results of this study are as follows ; 1. The factors by factor analysis are five. The first is the size factors of the neck and shoulder. The second is shape factor of neck. The third is plane view and length factor of the neck. The fourth is the side view factor of the neck and shoulder. The fifth is the shape factor of shoulder. Therefore the shape of the neck and shoulder should be examined in the shape factors as well as in the size factors as well as in the size factors for the designing body-suitable clothes. 2. The factors of the concrete objects are the solid view of neck and shoulder, the cross-sectional view of neck line, side view of neck and shoulder and length of neck. The explainable measuring items for the factors are the difference of the length between lower neck round line and the 4㎝ above neck round line, the length of neck, the angle of inclination between fore neck and back neck, the angle of inclination of the side shoulder, the difference of the height between fore neck point and back neck point, the width of shoulder, the width of chest and the width of back. 3. The concrete objects of the neck and shoulder have five types ; Type Ⅰ is average type, Type Ⅱ is thick short neck and the drooping shoulder type, Type Ⅲ I is slender long neck and lean-back shoulder type, Type Ⅳ is thick and rising shoulder type and Type Ⅴ is slender and drooping shoulder type.

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Process Characteristics for $YB_{2}Cu_{3}O_{7-d}$ Films Fabricated by Single Target Sputter and Surface Modification Technique

  • Lee, Eue-Jae
    • Korean Journal of Materials Research
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    • v.5 no.5
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    • pp.598-605
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    • 1995
  • Thin films of $YB_{2}Cu_{3}O_{7-d}$ were prepared on various substrated of MgO(100), $SrTiO_{3}$, and $LaAlO_{3}$ by using off-axis magentron sputtering methods and annealing in-situ. The prarameters of film fabrication processes had been optimized through a "follow the lcoal maxima" strategy to yield good quality films in therms of the critical temperature $T_{c}$ and the critical current density $J_{c}$. Optimizedproecsses employing a plane magndtron and an cylindrical magnetron yielded $T_{c}$>90K along with $J_{c}$$10^{6}$A/$\textrm{cm}^2$ at 77K and > 2${\times}$$10^{7}$A/$\textrm{cm}^2$ at 5K. The sampels, however, showed degradationinthe properties, after chemical etching for fabrication of microbridges with the line width of 2-10 mocrons. In particular, the value of $T_{c}$ for the microbridges of 2microns was as small as 80%. The degradation was strongly dependent on the line width through a formula : $T_{c}$(e)=$T_{c}$)b) [1-a exp(-1000 bL)} where $T_{c}$(e) and $T_{c}$ (b) are the values of $T_{c}$ in the absolute scale measured after and before chemical etching, respectively and L is the line width in mm. By utilizing a best fitting technique, the proper constant values of a and to b were found as exp(-1.2) and 0.22, respectively. This formula was very useful in estimatiing the upper limit of the device operationtemperature.

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EFFECT OF MAXILLARY EXPANSION APPLIANCE USING MAGNETIC ATTRACTION FORCE (자석의 견인력을 이용한 상악골 확대 장치의 효과)

  • Lee, Won You;Jang, Ji Cheul;Kim, Hyoung Don;Han, Bu Seuk
    • The korean journal of orthodontics
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    • v.21 no.3
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    • pp.603-614
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    • 1991
  • To study the possibility of attraction magnetic forces to expand maxillary arch, we used 2 big adult dogs, 2 small puppies, 1 small adult dog as experiments, and 1 small adult dog as a control. We measured the intercanine width and intermolar width and histologically observed in the suture and cervical and apex region of teeth and took occlusal X-rays to observe separation of suture line in the maxilla. The results were as follows: 1. Expansion velocities of intercanine (0.25mm/day) and intermolar widths (0.23mm/day) in puppies were faster than those (0.135mm/day, 0.09mm/day) in adults. 2. In all experiments in adults (0.135mm/day) and puppies (0.25mm/day), expansion velocity of intercanine widths were faster than those (0.09mm/day, 0.23mm/day) of intermolar width. 3. In all experiments ectatic changes were observed and cellularities of fibroblast increased in the suture line. Only in adults dogs the separations of palatal suture were observed in the occlusal X-ray view. 4. In the puppies bony deposition was particularly observed in the suture line and micro-bony fragments were often observed. 5. In the all experiments no root resorption was observed in the cervical and root area, but normal root resorption due to eruption of permanent teeth was observed in the puppies.

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Gravure Halftone Dots by Laser Direct Patterning (레이저 직접 패터닝에 의한 그라비아 망점 형성)

  • Suh, Jeong;Han, You-Hie;Kang, Lae-Heuck
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.11
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    • pp.191-198
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    • 2000
  • Laser direct patterning of the coated photoresist (PMER-NSG31B) layer was studied to make halftone dots on gravure printing roll. The selective laser hardening of photoresist by Ar-ion laser(wavelength: 333.6~363.8nm) was controlled by the A/O modulator. The coating thickness in the range of 5~11$\mu m$ could be obtained by using the up-down directional moving device along the vertically located roll. The width, thickness and hardness of the hardened lines formed under the laser power of 200~260㎽ and irradiation time of 4.4~6.6 $\mu$sec/point were investigated after developing. The hardened width increased as the coating thickness increased. Though the hardened thickness was changed due to the effect of the developing solution, the hardened layer showed good resistance to the scratching of 2H pencil. Also, the hardened minimum line widths of 10$\mu m$ could be obtained. The change of line width was also found after etching, and the minimum line widths of 6$\mu m$ could be obtained. The hardened lines showed the good resistance to the etching solution. Finally, the experimental data could be applied to make gravure halftone dots using the developed imaging process, successfully.

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Fabrication and Characterization of Silver Copper(I) Oxide Nanoparticles for a Conductive Paste (은이 코팅된 Copper(I) Oxide 나노 입자 및 도전성 페이스트의 제조 특성)

  • Park, Seung Woo;Son, Jae Hong;Sim, Sang Bo;Choi, Yeon Bin;Bae, Dong Sik
    • Korean Journal of Materials Research
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    • v.29 no.1
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    • pp.37-42
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    • 2019
  • This study investigates Ag coated $Cu_2O$ nanoparticles that are produced with a changing molar ratio of Ag and $Cu_2O$. The results of XRD analysis reveal that each nanoparticle has a diffraction pattern peculiar to Ag and $Cu_2O$ determination, and SEM image analysis confirms that Ag is partially coated on the surface of $Cu_2O$ nanoparticles. The conductive paste with Ag coated $Cu_2O$ nanoparticles approaches the specific resistance of $6.4{\Omega}{\cdot}cm$ for silver paste(SP) as $(Ag)/(Cu_2O)$ the molar ratio increases. The paste(containing 70 % content and average a 100 nm particle size for the silver nanoparticles) for commercial use for mounting with a fine line width of $100{\mu}m$ or less has a surface resistance of 5 to $20{\mu}{\Omega}{\cdot}cm$, while in this research an Ag coated $Cu_2O$ paste has a larger surface resistance, which is disadvantageous. Its performance deteriorates as a material required for application of a fine line width electrode for a touch panel. A touch panel module that utilizes a nano imprinting technique of $10{\mu}m$ or less is expected to be used as an electrode material for electric and electronic parts where large precision(mounting with fine line width) is not required.

Investigation of the Relationship Between Dishing and Mechanical Stress During CMP Process (수직하중에 의한 응력이 CMP 공정의 디싱에 미치는 영향)

  • Hyeong Gu Kim;Seung Hyun Kim;Min Woo Kim;Ik-Tae Im
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.2
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    • pp.30-34
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    • 2023
  • Since dishing in the CMP process is a major factor that hinders the uniformity of the semiconductor thin film, many studies have focused this issue to improve the non-uniformity of the film due to dishing. In the metal layer, the dishing mainly occurs in the central part of the metal due to a difference in a selection ratio between the metal and the dielectric, thereby generating a step on the surface of the metal layer. Factors that cause dishing include the shape of the thin film, the chemical reaction of the slurry, thermal deformation, and the rotational speed of the pad and head, and dishing occurs due to complex interactions between them. This study analyzed the stress generated on the metal layer surface in the CMP process using ANSYS software, a commercial structure analysis program. The stress caused by the vertical load applied from the pad was analyzed by changing the area density and line width of the dummy metal. As a result of the analysis, the stress in the active region decreased as the pattern density and line width of the dummy metal increased, and it was verified that it was valid compared with the previous study that studied the dishing according to the dummy pattern density and line width of the metal layer. In conclusion, it was confirmed that there is a relationship between dishing and normal stress.

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Effects of vertical head rotation on the posteroanterior cephalometric measurements (정모두부방사선사진 촬영시 두부의 수직회전에 따른 투사오차)

  • Koh, Eun-Hee;Lee, Ki-Heon;Hwang, Hyeon-Shik
    • The korean journal of orthodontics
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    • v.33 no.2 s.97
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    • pp.73-84
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    • 2003
  • This study was performed to find out how much projection errors in the cephalometric measurements were made by vertical head rotation in taking posteroanterior cephalograms. 25 adults without any apparent facial asymmetry or severe sagittal skeletal discrepancy were selected and the posteroanterior cephalograms were taken with the head rotated $5^{\circ},\;10^{\circ}$ superior and inferior each to the reference $position(0^{\circ})$. The 7 height, 5 width and 6 angular measurements were taken at each 5 positions. Through the statistical analysis of all measurements taken at each rotated position, folowing results were obtained.1. The projection errors of height measurements were remarkably target than those of width or angular measure nents. f. Among the height measurements, the farther to the rotation axis the measurements were, the larger the projection errors were. 3. Among the width measurements, mandibular width and mandibular width of mandibular first molars showed significant differences between the values taken at each rotated position, while nasal width, maxillary width and intermolar width of maxillary first molars did not. 4. Among the angular measurements, the angle between horizontal reference line and the line that is connected to crista galli and antegonion or maxillare showed significant differences between the values taken at each rotated Position. The above results suggest that it is needed to the effort to keep constant head position for taking the useful posteroanterior cephalogra, because projection errors are caused by vertical head rotation.

GHz Bandwidth Characteristics of Rectangular Spiral type Thin Film Inductors (사각 나선형 박막 인덕터의 GHz 대역 특성)

  • Kim, J.;Jo, S.
    • Journal of the Korean Magnetics Society
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    • v.14 no.1
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    • pp.52-57
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    • 2004
  • In this research, characteristics of air core rectangular spiral type inductors of ㎓ band are numerical analyzed. The basic structure of inductors is a rectangular spiral having 390${\mu}{\textrm}{m}$${\times}$390${\mu}{\textrm}{m}$ size, 5.5 turns, line width of 10 ${\mu}{\textrm}{m}$ and line space of 10 ${\mu}{\textrm}{m}$. Frequency characteristics were simulated up to 10 ㎓. The substrate was modeled as Si, Sapphire, glass and GaAs and the conductor as Cu. The thickness of the conductor was fixed at 2. The number of turns was n.5 to make the input and output terminals to be on the opposite sides. The initial inductance of the basic inductor structure was 13.0 nH, maximum inductance 60.0 nH and resonance frequency 4.25 ㎓. As the dielectric constant of the substrate was increased, the initial inductance varied only slightly, but the resonance frequency decreased considerably. As the number of turns was varied from 1.5 to 9.5, the initial inductance was increased linearly from 2.9 nH to 15.9 nH and, then, saturated at 16.9 nH. The Q factor increased only slightly. The line width and line space of inductors were varied from 5 ${\mu}{\textrm}{m}$ to 20 ${\mu}{\textrm}{m}$, which resulted in the decrease of the initial and maximum inductances. But the resonance frequency was increased. Q factor displayed an increase and a decrease, respectively, when the line width and line space were increased.