The Fabrication of the 0.1$\mu\textrm{m}$ NMOSFET by E-beam Lithography
(E-beam lithography를 이용한 0.1$\mu\textrm{m}$ NMOSFET 제작)
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- Journal of the Korean Institute of Telematics and Electronics A
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- v.31A no.1
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- pp.61-64
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- 1994