• Title/Summary/Keyword: layer 2

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Characteristics of $TiN/TiSi_2$ Contact Barrier Layer by Rapid Thermal Anneal in $N_2$ Ambient (질소 분위기에서 순간역처리에 의해 형성시킨 $TiN/TiSi_2$ Contact Bsrrier Lauer의 특성)

  • 이철진;허윤종;성영권
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.41 no.6
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    • pp.633-639
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    • 1992
  • The physical and electrical properties of TiN/TiSiS12T contact barrier were studied. The TiN/TiSiS12T system was formed by rapid thermal anneal in NS12T ambient after the Ti film was deposited on silicon substrate. The Ti film reacts with NS12T gas to make a TiN layer at the surface and reacts with silicon to make a TiSiS12T layer at the interface respectively. It was found that the formation of TiN/TiSiS12T system depends on RTA temperature. In this experiment, competitive reaction for TiN/TiSiS12T system occured above $600^{\circ}C$. Ti-rich TiNS1xT layer and Ti-rich TiSiS1xT layer were formed at $600^{\circ}C$. stable structure TiN layer and TiSiS1xT layer which has CS149T phase and CS154T phase were formed at $700^{\circ}C$. Both stable TiN layer and CS154T phase TiSiS12T layer were formed at 80$0^{\circ}C$. The thickness of TiN/TiSiS12T system was increased as the thickness of deposited Ti film increased.

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A Study on the Properties of TiN/${TiSi}_{2}$ Bilayer by a Rapid Thermal Anneal in ${NH}_{3}$ Ambient (${NH}_{3}$ 분위기에서 급속열처리에 의한 TiN/${TiSi}_{2}$ 이중구조막의 특성에 대한 고찰)

  • 이철진;성영권
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.41 no.8
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    • pp.869-874
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    • 1992
  • The physical and electrical properties of TiN/TiSiS12T bilayer were studied. The TiN/TiSiS12T bilayer was formed by rapid thermal anneal in NHS13T ambient after the Ti film was deposited on silicon substrate. The Ti film reacts with NHS13T gas to make a TiN layer at the surface and reacts with silicon to make a TiSiS12T layer at the interface respectively. It was found that the formation of TiN/TiSiS12T bilayer depends on RTA temperature. In this experiment, competitive reaction for TiN/TiSiS12T bilayer occured above $600^{\circ}C$. Ti-rich TiNS1xT layer and Ti-rich TiSiS1xT layer and Ti-rich TiSiS1xT layer were formed at $600^{\circ}C$. stable structure TiN layer TiSiS12T layer which has CS149T phase and CS154T phase were formed at $700^{\circ}C$. Both stable TiN layer and CS154T phase TiSiS12T layer were formed at 80$0^{\circ}C$. The thickness of TiN/TiSiS12T bilayer was increased as the thickness of deposited Ti film increased.

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A Study on the Properties of $Al_2$ $O_3$ and $Al_2$ $O_3$/( $Ti_{0.5}$ $Al_{0.5}$)N Coatings Produced by Plasma Enhanced Chemical Vapor Deposition (플라즈마 화학 증착법에 의한 $Al_2$ $O_3$ 단층피막과 $Al_2$ $O_3$/( $Ti_{0.5}$ $Al_{0.5}$)N 이중피막의 제조 및 특성에 관한 연구)

  • 손경석;이승훈;이동각;임주완;이후철;이정중
    • Journal of Surface Science and Engineering
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    • v.34 no.2
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    • pp.105-114
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    • 2001
  • $Al_2$$O_3$ coatings were deposited on M2 high speed steels by the plasma enhanced chemical vapor deposition (PECVD) process, using a gas mixture of AlC1$_3$, $H_2$, $CO_2$ and Ar $Al_2$$O_3$ coatings had interference color and showed amorphous phase. $A1_2$X$A1_3$/($Ti_{0.5}$ /$Al_{0.5}$ )N double layer coatings were produced in the sequence of substrate $NH_3$ plasma pretreatment, ($Ti_{0.5}$$Al_{0.5}$)N depoition process, $Al_2$$O_3$ deposition process. $Al_2$ $O_3$/( $Ti_{0.5}$A $l_{0.5}$)N double layer coatings showed NaCl structure in ( $Ti_{0.5}$A $l_{0.5}$)N layer and amorphous phase in A1$_2$ $O_3$ layer. It was shown that $Al_2$ $O_3$ columns continuously grew onto ( $Ti_{0.5}$A $l_{0.5}$)N columns. ( $Ti_{0.5}$A $l_{0.5}$)N single coating and $Al_2$ $O_3$/( $Ti_{0.5}$A $l_{0.5}$)N double layer coating were oxidized at $700^{\circ}C$, 80$0^{\circ}C$, 90$0^{\circ}C$ for 1hr, 3hr in atmosphere. At 80$0^{\circ}C$, single layer coatings were oxidized, which were examined substrate oxide particle. But $Al_2$ $O_3$/ ( $Ti_{0.5}$A $l_{0.5}$)N double layer coatings maintained the asdeposited state. Therefore, $Al_2$ $O_3$/ ( $Ti_{0.5}$A $l_{0.5}$)N double layer coatings have moreexcellent oxidation resistance than ( $Ti_{0.5}$A $l_{0.5}$)N single layer coatings.X> 0.5/)N single layer coatings.s.

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Calculation of Interaction Parameters in Mixed Layer Minerals and their Application (층상형 혼합광물의 상호작용계수의 계산 및 응용)

  • 이성근;김수진
    • Journal of the Mineralogical Society of Korea
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    • v.10 no.2
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    • pp.97-104
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    • 1997
  • Based on the method of determination for relative stability of each phase from the difference among the interaction parameters of the phases consisting the mixed layer, the types of interactions between layers were specified and interaction parameter between layers in ordered domain was analytically derived as a function parameter between layers in ordered domain was analytically derived as a function of not only temperature and mole fraction of layers but also ordering parameter. Interaction parameter between the different layers in ordered phase, L is as follows:{{{{ {L }_{1 } (X,Q,T)= { C} over { Q} -4(1-2Q) { L}^{2 } - { RT} over {2} ln { 1} over {2 } - { 2RT} over { { X}_{ s} } ln { { 4QX}`_{s } ^{2 } } over {(1- { X}_{s }- { QX}_{s })( { X}_{s }- {QX }_{s } ) } }}}}L2 is the interaction parameter between ordered and disordered phase in domain and is the mole fraction of the domain which represent the infinite length of mixed layer mineral and Q and C are the reaction progress parameter and arbitrary constant, respectively. This equation was used for the I/S mixed layer clay minerals to infer the relative stability of R1 type I/S mixed layer in the temperature range from 373K to 450K. The result of calculation suggest that, owing to the decrease in interaction parameter with increasing temperature. The interaction parameter decreases more rapidly with decreasing mole fraction of smectite in domain, which is consistent with the fact that the probability of finding the series smectite layer is lo in the domain with small mole fraction of smectite layers in natural system.

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P3HT:PCBM-based on Polymer Photovoltaic Cells with PEDOT:PSS-pentacene as a Hole Conducting Layer

  • Kim, Hyun-Soo;Hwang, Jong-Won;Park, Su-Jin;Chae, Hyun-Hee;Choe, Young-Son
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.313-313
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    • 2010
  • The performance of polymer photovoltaic cells based on blends of poly(3-hexylyhiophene) (P3HT) and phenyl-C61-butyric acid methyl ester (PCBM) is strongly influenced by blend composition and thickness. Polymer photovoltaic cells based on bulk-heterojunction have been fabricated with a structure of ITO/poly(3, 4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS)-pentacene/poly (3-hexylthiophene) (P3HT):phenyl-C61-butyric acid methyl ester (PCBM)/Al. We have prepared PEDOT:PSS by dissolving pentacene in N-methylpyrrolidine (NMP) and mixing with PEDOT:PSS. Pentacene was added a maximum concentration of approximately 5.5mg to the PEDOT:PSS solution and sonicated for 10 min. Active layer (P3HT:PCBM) (1:1) was strongly influenced by PEDOT:PSS-pentacene. We have investigated the performance of photovoltaic device with different concentration of P3HT:PCBM (1:1) 2.0wt%, 2.2wt%, 2.4wt% and 2.6wt%, respectively. The photocurrent and power conversion efficiency (PCE) showed a maximum between 2.0wt% and 2.2wt% concentration of P3HT:PCBM. This implied that both morphology and electron transport properties of the layer influenced the performance of the present photovoltaic cells. As the concentration of P3HT:PCBM blends as an active layer was increased, the power conversion efficiency was decreased. P3HT:PCBM layer and PEDOT:PSS-pentacene layer were characterized by work function, UV-visible absorption, atomic force microscopy (AFM), X-ray diffraction (XRD) and scanning electron microscope (SEM).

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Frequency effect of TEOS oxide layer in dual-frequency capacitively coupled CH2F2/C4F8/O2/Ar plasma

  • Lee, J.H.;Kwon, B.S.;Lee, N.E.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.284-284
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    • 2011
  • Recently, the increasing degree of device integration in the fabrication of Si semiconductor devices, etching processes of nano-scale materials and high aspect-ratio (HAR) structures become more important. Due to this reason, etch selectivity control during etching of HAR contact holes and trenches is very important. In this study, The etch selectivity and etch rate of TEOS oxide layer using ACL (amorphous carbon layer) mask are investigated various process parameters in CH2F2/C4F8/O2/Ar plasma during etching TEOS oxide layer using ArF/BARC/SiOx/ACL multilevel resist (MLR) structures. The deformation and etch characteristics of TEOS oxide layer using ACL hard mask was investigated in a dual-frequency superimposed capacitively coupled plasma (DFS-CCP) etcher by different fHF/ fLF combinations by varying the CH2F2/ C4F8 gas flow ratio plasmas. The etch characteristics were measured by on scanning electron microscopy (SEM) And X-ray photoelectron spectroscopy (XPS) analyses and Fourier transform infrared spectroscopy (FT-IR). A process window for very high selective etching of TEOS oxide using ACL mask could be determined by controlling the process parameters and in turn degree of polymerization. Mechanisms for high etch selectivity will discussed in detail.

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Effect of Al2O3-ZrO2 Composite Oxide Thickness on Electrical Properties of Etched Al Foil

  • Chen, Fei;Park, Sang-Shik
    • Korean Journal of Materials Research
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    • v.26 no.3
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    • pp.160-165
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    • 2016
  • To increase the capacitance of an Al electrolytic capacitor, the anodic oxide film, $Al_2O_3$, was partly replaced by an $Al_2O_3-ZrO_2$ (Al-Zr) composite film prepared by the vacuum infiltration method and anodization. The microstructure and composition of the prepared samples were investigated by scanning electron microscopy and transmission electron microscopy. The coated and anodized samples showed multi-layer structures, which consisted of an inner Al hydrate layer, a middle Al-Zr composite layer, and an outer $Al_2O_3$ layer. The thickness of the coating layer could go up to 220 nm when the etched Al foil was coated 8 times. The electrical properties of the samples, such as specific capacitance, leakage current, and withstanding voltages, were also characterized after anodization at 100 V and 600 V. The capacitances of samples with $ZrO_2$ coating were 36.3% and 27.5% higher than those of samples without $ZrO_2$ coating when anodized at 100 V and 600 V, respectively.

Ionospheric F2-layer Perturbations Observed After the M8.8 Chile Earthquake on February 27, 2010, at Long Distance from the Epicenter

  • Hegai, Valery V.;Kim, Vitaly P.;Legen'ka, Anna D.
    • Journal of Astronomy and Space Sciences
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    • v.34 no.1
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    • pp.1-5
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    • 2017
  • The F2-layer critical frequency (foF2) data from several ionosondes are employed to study the long-distance effect of the M8.8 Chile Earthquake of February 27, 2010, on the F2 layer. Significant perturbations of the peak F2-layer electron density have been observed following the earthquake at two South African stations, Hermanus and Madimbo, which are located at great circle distances of ~8,000 and ~10,000 km from the earthquake epicenter, respectively. Simplified estimates demonstrate that the observed ionospheric perturbations can be caused by a long-period acoustic gravity wave produced in the F-region by the earthquake.

2-Layer Fuzzy Controller for Behavior Control of Mobile Robot (이동로봇의 행동제어를 위한 2-Layer Fuzzy Controller)

  • 변광섭;허광승;박창현;심귀보
    • Proceedings of the Korean Institute of Intelligent Systems Conference
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    • 2003.05a
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    • pp.292-295
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    • 2003
  • 로봇의 기능이 다양해지며 복잡해지고 있다 주위의 환경을 감지하는 센서로는 거리정보 뿐만이 아니라 영상 정보, 음성 정보까지 이용하고 있다 본 논문에서는 다양한 입력정보를 가지고 로봇을 제어하기 위한 알고리즘으로 2-Layer Fuzzy Control을 제안한다 장애물 회피의 경우에 다수의 초음파 센서를 이용하였는데 이것을 앞쪽, 왼쪽, 오른쪽으로 분류하여 3개의 sub-controller를 가지고 퍼지 추론을 한 다음 2단계에서는 이 3개의 sub-controller의 출력으로 조합된 퍼지 추론을 하여 통합적인 추론을 한다 본 논문에서는 2-Layer Fuzzy Controller와 비슷한 구조를 갖는 Hierarchical Fuzzy Controller와 성능비교를 하였으며 Robot following에도 적용하여 각각에 대한 시뮬레이션과 실험을 통해 확인한다.

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Superconductor characteristics of BSCCO spray films by Heat treatment (열처리에 따른 BSCCO 용사피막의 초전도특성)

  • Do, Hyeong-Jun;Park, Gyeong-Chae
    • Proceedings of the KWS Conference
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    • 2007.11a
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    • pp.282-284
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    • 2007
  • The superconductor characteristics of BSCCO spray films by Heat treatment was studied. $Bi_2Sr_2CaCu_2O_x$(Bi-2212) is high-Tc superconductor(HTS) coatings have been prepared by Heat treatment. Where high current carrying capabilities are required and therefore thick film and bulk material are called for, the Bi2Sr2Ca1Cu2O8-d(Bi-2212)compound has evoleved as one of the most promising. and the Bi-2212 HTS coating layer is synthesized through the peritectic reaction between Sr-Ca-Cu oxide coating layer and Bi-Cu oxide coating layer by partial melting process. The superconducting characteristics depends on the spray distance which was related to the spray particle melt. The Bi-2212 HTS layer consists of the whisker growth and secondary phase in 2212 layer were observed.

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