Characteristics of $TiN/TiSi_2$ Contact Barrier Layer by Rapid Thermal Anneal in $N_2$ Ambient
(질소 분위기에서 순간역처리에 의해 형성시킨 $TiN/TiSi_2$ Contact Bsrrier Lauer의 특성)
-
- The Transactions of the Korean Institute of Electrical Engineers
- /
- v.41 no.6
- /
- pp.633-639
- /
- 1992